KR900007795A - 설포늄 염 및 이의 용도 및 제조방법 - Google Patents
설포늄 염 및 이의 용도 및 제조방법 Download PDFInfo
- Publication number
- KR900007795A KR900007795A KR1019890016674A KR890016674A KR900007795A KR 900007795 A KR900007795 A KR 900007795A KR 1019890016674 A KR1019890016674 A KR 1019890016674A KR 890016674 A KR890016674 A KR 890016674A KR 900007795 A KR900007795 A KR 900007795A
- Authority
- KR
- South Korea
- Prior art keywords
- compound
- group
- general formula
- composition
- anthracenyl
- Prior art date
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Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C381/00—Compounds containing carbon and sulfur and having functional groups not covered by groups C07C301/00 - C07C337/00
- C07C381/12—Sulfonium compounds
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C2603/00—Systems containing at least three condensed rings
- C07C2603/02—Ortho- or ortho- and peri-condensed systems
- C07C2603/04—Ortho- or ortho- and peri-condensed systems containing three rings
- C07C2603/22—Ortho- or ortho- and peri-condensed systems containing three rings containing only six-membered rings
- C07C2603/24—Anthracenes; Hydrogenated anthracenes
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/115—Cationic or anionic
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Inorganic Chemistry (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Epoxy Resins (AREA)
- Heterocyclic Carbon Compounds Containing A Hetero Ring Having Nitrogen And Oxygen As The Only Ring Hetero Atoms (AREA)
- Polymerisation Methods In General (AREA)
- Polymerization Catalysts (AREA)
Abstract
내용 없음
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
Claims (19)
- 일반식(1)의 화합물.상기식에서, Ar은 나프틸, 안트라실, 페릴 및 피릴의 그룹중에서 선택된, 용합된 방향족 라디칼이고, R1은 알킬렌 및 알케닐렌, 산소원자에 의해 차단된 알킬렌 및 알케닐렌쇄, 및 펜단트 하이드록시 그룹을 갖는 이들의 치환된 유도체의 그룹중에서 선택된2가 가교그룹이며, R2및 R3은 각각 독립적으로 알킬, 아릴, 알크아릴, 아르알킬 및 치환된 아릴의 그룹중에서 선택되며, 단 R2및 R3중 하나 이하는 알킬이고, A-는 비-친핵성 음이온이다.
- 제1항에 있어서, Ar이 안트라실인 화합물.
- 제1항에 있어서, R1이 1내지 10개의 탄소원자를 함유하는 화합물.
- 제1항에 있어서, R1이 1내지 4개으의 탄소원자를 함유하는 화합물.
- 제1항에 있어서, R1이 3개의 탄소원자를 함유하는 화합물.
- 제1항에 있어서, R1이 펜단트 하이드록시 그룹을 함유하는 화합물.
- 제1항에 있어서, A-가 SbF6 -, PF6 -, AsF6 -, CF3SO3 -및 ClO4 -의 그룹중에서 선택되는 비-친핵성 음이온인 화합물.
- 제1항에 있어서, A-가 SbF6 -인 화합물.
- 제1항에 있어서, R2및 R3가 각각 페닐인 화합물.
- 제1항에 있어서, R2및 R3가 각각 페닐 또는 탄소수 1내지 4의 알킬 그룹이며, 단 R2및 R3중 하나 이하는 알킬인 화합물.
- 제1항에 있어서, 3-(9-안트라세닐)프로필 디페닐 설포늄 헥사플루오로안티모네이트인 화합물.
- 제1항에 있어서, 3-(9-안트라세닐)-2-하이드록시-3-옥시프로필 디페닐 설포늄 헥사플로오로안티모네이트인 화합물.
- 에폭시 중합체, 및 에폭시 중합체의 경화를 촉진시키기에 충분한 양의 제1항에 따른 일반식(1)의 화합물을 함유함을 특징으로 하는 광경화성 조성물.
- 제13항에 있어서, 언급된 화합물의 양이 에폭시 중합체를 기준으로 10중량% 이하인 조성물.
- 제13항에 있어서, 언급된 화합물의 양이 에폭시 중합체의 약 0.5 내지 약 4중량%인 조성물.
- 제13항에 있어서, 언급된 화합물이 3-(9-안트라세닐)프로필 디페닐 설포늄 헥사플로오로안티모네이트인 조성물.
- 제14항에 있어서, 언급된 화합물이 3-(9-안트라세닐)-하이드록시-3-옥시프로필 디페닐 설포늄 헥사플로오로안티모네이트인 조성물.
- 수소 이온 및 비-친핵성 짝 음이온의 존재하에서, 일반식 Ar-R4(여기서, R4는 글리시딜 에테르 그룹이고, Ar은 제1항에서 정의한 바와 같다)의 화합물을 일반식 R2SR3(여기서, R2및 R3은 제1항에서 정의한 바와 같다)의 화합물과 반응시킴을 특징으로 하여, R1이 하이드록시 유도체인 제1항에 따른 일반식(1)의 화합물을 제조하는 방법.
- 일반식 Ar-R1X(여기서, X는 할라이드이고, Ar 및 R1은 제1항에서 정의한 바와 같다)의 화합물, 일반식 R2SR3(여기서, R2및 R3은 제1항에서 정의한 바와 같다)의 화합물, 및 일반식 MA(여기서, M은 1가 알칼리 금속 또는 1가 전이금속이고, A는 비-친핵성 음이온이다)의 비-친핵성 음이온의 금속성 화합물 또는 이의 디옥산 부가물을 반응시킴을 특징으로 하여, 제1항에 따른 일반식(1)의 화합물을 제조하는 방법.※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019920027575A KR930002458B1 (ko) | 1988-11-18 | 1992-12-30 | 광경화성 에폭시 조성물 |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US07/272,965 US5047568A (en) | 1988-11-18 | 1988-11-18 | Sulfonium salts and use and preparation thereof |
US272,965 | 1988-11-18 |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019920027575A Division KR930002458B1 (ko) | 1988-11-18 | 1992-12-30 | 광경화성 에폭시 조성물 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR900007795A true KR900007795A (ko) | 1990-06-02 |
KR930003866B1 KR930003866B1 (ko) | 1993-05-14 |
Family
ID=23041988
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019890016674A KR930003866B1 (ko) | 1988-11-18 | 1989-11-17 | 설포늄염 및 이의 제조방법 |
Country Status (9)
Country | Link |
---|---|
US (1) | US5047568A (ko) |
EP (1) | EP0369194B1 (ko) |
JP (1) | JPH0615525B2 (ko) |
KR (1) | KR930003866B1 (ko) |
AU (1) | AU620936B2 (ko) |
BR (1) | BR8905837A (ko) |
CA (1) | CA2002425C (ko) |
DE (1) | DE68907559T2 (ko) |
ES (1) | ES2058436T3 (ko) |
Families Citing this family (25)
Publication number | Priority date | Publication date | Assignee | Title |
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US5141969A (en) * | 1988-11-21 | 1992-08-25 | Eastman Kodak Company | Onium salts and the use thereof as photoinitiators |
US5500453A (en) * | 1992-02-07 | 1996-03-19 | Toyo Ink Manufacturing Co., Ltd. | (Oxo)sulfonium complex, polymerizable composition containing the complex, and method of polymerizing the composition |
JPH06107913A (ja) * | 1992-08-10 | 1994-04-19 | Siemens Ag | 反応樹脂混合物 |
US5302757A (en) * | 1992-09-14 | 1994-04-12 | Eastman Kodak Company | Ultraviolet light sensitive onium salts |
US5347040A (en) * | 1992-12-09 | 1994-09-13 | E. I. Du Pont De Nemours And Company | Sensitized onium salts |
KR100355254B1 (en) * | 1993-02-15 | 2003-03-31 | Clariant Finance Bvi Ltd | Positive type radiation-sensitive mixture |
JP3716416B2 (ja) * | 1993-06-15 | 2005-11-16 | 日本曹達株式会社 | 新規スルホニウム塩化合物および重合開始剤 |
US5550171A (en) * | 1995-05-31 | 1996-08-27 | International Business Machines Corporation | Polymeric sulfonium salt photoinitiators |
DE69630959T2 (de) * | 1995-08-22 | 2004-06-03 | Nippon Soda Co. Ltd. | Neue sulfoniumsalzverbindungen, polymerisierungsinitiator, härtbare zusammensetzung und stärkungsverfahren |
US5922783A (en) | 1997-02-27 | 1999-07-13 | Loctite Corporation | Radiation-curable, cyanoacrylate-containing compositions |
US6031014A (en) * | 1998-12-08 | 2000-02-29 | Crivello; James V. | Initiator compositions and methods for their synthesis and use |
JP4567132B2 (ja) * | 2000-01-06 | 2010-10-20 | 長春人造樹脂廠股▲分▼有限公司 | エポキシ樹脂組成物 |
WO2002079691A1 (en) | 2001-03-30 | 2002-10-10 | The Arizona Board Of Regents On Behalf Of The University Of Arizona | Materials, methods, and uses for photochemical generation of acids and/or radical species |
AT500298A1 (de) * | 2002-06-14 | 2005-11-15 | Agrolinz Melamin Gmbh | Verfahren zur härtung von aminoplasten |
US20050126697A1 (en) * | 2003-12-11 | 2005-06-16 | International Business Machines Corporation | Photochemically and thermally curable adhesive formulations |
JP2007084594A (ja) * | 2005-09-20 | 2007-04-05 | Fujifilm Corp | インク組成物、インクジェット記録方法、印刷物、平版印刷版の製造方法、及び、平版印刷版 |
CN104345562B (zh) | 2013-08-09 | 2020-04-24 | 帝斯曼知识产权资产管理有限公司 | 用于增材制造的低粘度液体辐射可固化的牙对准器模具树脂组合物 |
CN109503761B (zh) | 2013-11-05 | 2022-02-01 | 科思创(荷兰)有限公司 | 用于加成制造的稳定的基质填充的液体可辐射固化树脂组合物 |
CN107636025B (zh) | 2015-06-08 | 2021-02-02 | 帝斯曼知识产权资产管理有限公司 | 用于加成法制造的液体、混杂的紫外/可见光可辐射固化树脂组合物 |
EP3341793B1 (en) | 2015-10-01 | 2021-05-26 | DSM IP Assets B.V. | Liquid, hybrid uv/vis radiation curable resin compositions for additive fabrication |
JP2018536731A (ja) | 2015-11-17 | 2018-12-13 | ディーエスエム アイピー アセッツ ビー.ブイ.Dsm Ip Assets B.V. | 改善された付加造形用アンチモンフリー放射線硬化性組成物およびインベストメント鋳造プロセスにおけるその用途 |
JP6798071B2 (ja) | 2016-03-14 | 2020-12-09 | ディーエスエム アイピー アセッツ ビー.ブイ.Dsm Ip Assets B.V. | 改善された靭性および耐高温性を有する付加造形用放射線硬化性組成物 |
US11578221B2 (en) | 2017-12-15 | 2023-02-14 | Covestro (Netherlands) B.V. | Compositions and methods for high-temperature jetting of viscous thermosets to create solid articles via additive fabrication |
CN111526977B (zh) | 2017-12-29 | 2022-07-01 | 科思创(荷兰)有限公司 | 用于加成制造的组合物和制品及其使用方法 |
CN114341732A (zh) | 2019-08-30 | 2022-04-12 | 科思创(荷兰)有限公司 | 用于增材制造的液体混合紫外/可见光辐射可固化树脂组合物 |
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US4503211A (en) * | 1984-05-31 | 1985-03-05 | Minnesota Mining And Manufacturing Co. | Epoxy resin curing agent, process and composition |
US4708925A (en) * | 1984-12-11 | 1987-11-24 | Minnesota Mining And Manufacturing Company | Photosolubilizable compositions containing novolac phenolic resin |
JPS61190524A (ja) * | 1985-01-25 | 1986-08-25 | Asahi Denka Kogyo Kk | エネルギ−線硬化性組成物 |
GB8529448D0 (en) * | 1985-11-29 | 1986-01-08 | Ward Blenkinsop & Co Ltd | Thioxanthone derivatives |
US4837124A (en) * | 1986-02-24 | 1989-06-06 | Hoechst Celanese Corporation | High resolution photoresist of imide containing polymers |
US4760013A (en) * | 1987-02-17 | 1988-07-26 | International Business Machines Corporation | Sulfonium salt photoinitiators |
US4933377A (en) * | 1988-02-29 | 1990-06-12 | Saeva Franklin D | Novel sulfonium salts and the use thereof as photoinitiators |
EP0331496B1 (en) * | 1988-03-03 | 1992-09-16 | Sanshin Kagaku Kogyo Co., Ltd. | Polyfluoride sulfonium compounds and polymerization initiator thereof |
-
1988
- 1988-11-18 US US07/272,965 patent/US5047568A/en not_active Expired - Fee Related
-
1989
- 1989-10-18 JP JP1269268A patent/JPH0615525B2/ja not_active Expired - Lifetime
- 1989-10-21 EP EP89119568A patent/EP0369194B1/en not_active Expired - Lifetime
- 1989-10-21 ES ES89119568T patent/ES2058436T3/es not_active Expired - Lifetime
- 1989-10-21 DE DE89119568T patent/DE68907559T2/de not_active Expired - Fee Related
- 1989-11-07 CA CA002002425A patent/CA2002425C/en not_active Expired - Fee Related
- 1989-11-14 AU AU44668/89A patent/AU620936B2/en not_active Ceased
- 1989-11-17 KR KR1019890016674A patent/KR930003866B1/ko not_active IP Right Cessation
- 1989-11-20 BR BR898905837A patent/BR8905837A/pt not_active Application Discontinuation
Also Published As
Publication number | Publication date |
---|---|
AU620936B2 (en) | 1992-02-27 |
KR930003866B1 (ko) | 1993-05-14 |
EP0369194A3 (en) | 1990-12-27 |
BR8905837A (pt) | 1990-06-12 |
DE68907559T2 (de) | 1994-02-17 |
JPH02149556A (ja) | 1990-06-08 |
US5047568A (en) | 1991-09-10 |
JPH0615525B2 (ja) | 1994-03-02 |
ES2058436T3 (es) | 1994-11-01 |
CA2002425A1 (en) | 1990-05-18 |
EP0369194A2 (en) | 1990-05-23 |
AU4466889A (en) | 1990-05-24 |
EP0369194B1 (en) | 1993-07-14 |
CA2002425C (en) | 1996-01-02 |
DE68907559D1 (de) | 1993-08-19 |
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