DE68907559D1 - Sulfoniumsalze, ihre anwendung und ihre herstellung. - Google Patents
Sulfoniumsalze, ihre anwendung und ihre herstellung.Info
- Publication number
- DE68907559D1 DE68907559D1 DE8989119568T DE68907559T DE68907559D1 DE 68907559 D1 DE68907559 D1 DE 68907559D1 DE 8989119568 T DE8989119568 T DE 8989119568T DE 68907559 T DE68907559 T DE 68907559T DE 68907559 D1 DE68907559 D1 DE 68907559D1
- Authority
- DE
- Germany
- Prior art keywords
- production
- application
- sulphonium salts
- sulphonium
- salts
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C381/00—Compounds containing carbon and sulfur and having functional groups not covered by groups C07C301/00 - C07C337/00
- C07C381/12—Sulfonium compounds
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C2603/00—Systems containing at least three condensed rings
- C07C2603/02—Ortho- or ortho- and peri-condensed systems
- C07C2603/04—Ortho- or ortho- and peri-condensed systems containing three rings
- C07C2603/22—Ortho- or ortho- and peri-condensed systems containing three rings containing only six-membered rings
- C07C2603/24—Anthracenes; Hydrogenated anthracenes
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/115—Cationic or anionic
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Inorganic Chemistry (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Epoxy Resins (AREA)
- Heterocyclic Carbon Compounds Containing A Hetero Ring Having Nitrogen And Oxygen As The Only Ring Hetero Atoms (AREA)
- Polymerisation Methods In General (AREA)
- Polymerization Catalysts (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US07/272,965 US5047568A (en) | 1988-11-18 | 1988-11-18 | Sulfonium salts and use and preparation thereof |
Publications (2)
Publication Number | Publication Date |
---|---|
DE68907559D1 true DE68907559D1 (de) | 1993-08-19 |
DE68907559T2 DE68907559T2 (de) | 1994-02-17 |
Family
ID=23041988
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE89119568T Expired - Fee Related DE68907559T2 (de) | 1988-11-18 | 1989-10-21 | Sulfoniumsalze, ihre Anwendung und ihre Herstellung. |
Country Status (9)
Country | Link |
---|---|
US (1) | US5047568A (de) |
EP (1) | EP0369194B1 (de) |
JP (1) | JPH0615525B2 (de) |
KR (1) | KR930003866B1 (de) |
AU (1) | AU620936B2 (de) |
BR (1) | BR8905837A (de) |
CA (1) | CA2002425C (de) |
DE (1) | DE68907559T2 (de) |
ES (1) | ES2058436T3 (de) |
Families Citing this family (25)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5141969A (en) * | 1988-11-21 | 1992-08-25 | Eastman Kodak Company | Onium salts and the use thereof as photoinitiators |
US5500453A (en) * | 1992-02-07 | 1996-03-19 | Toyo Ink Manufacturing Co., Ltd. | (Oxo)sulfonium complex, polymerizable composition containing the complex, and method of polymerizing the composition |
JPH06107913A (ja) * | 1992-08-10 | 1994-04-19 | Siemens Ag | 反応樹脂混合物 |
US5302757A (en) * | 1992-09-14 | 1994-04-12 | Eastman Kodak Company | Ultraviolet light sensitive onium salts |
US5347040A (en) * | 1992-12-09 | 1994-09-13 | E. I. Du Pont De Nemours And Company | Sensitized onium salts |
KR100355254B1 (en) * | 1993-02-15 | 2003-03-31 | Clariant Finance Bvi Ltd | Positive type radiation-sensitive mixture |
EP0704433B1 (de) * | 1993-06-15 | 1998-10-14 | Nippon Soda Co., Ltd. | Neue sulfoniumsalzverbindung und polymerisationsinitiator |
US5550171A (en) * | 1995-05-31 | 1996-08-27 | International Business Machines Corporation | Polymeric sulfonium salt photoinitiators |
DE69630959T2 (de) * | 1995-08-22 | 2004-06-03 | Nippon Soda Co. Ltd. | Neue sulfoniumsalzverbindungen, polymerisierungsinitiator, härtbare zusammensetzung und stärkungsverfahren |
US5922783A (en) | 1997-02-27 | 1999-07-13 | Loctite Corporation | Radiation-curable, cyanoacrylate-containing compositions |
US6031014A (en) * | 1998-12-08 | 2000-02-29 | Crivello; James V. | Initiator compositions and methods for their synthesis and use |
JP4567132B2 (ja) * | 2000-01-06 | 2010-10-20 | 長春人造樹脂廠股▲分▼有限公司 | エポキシ樹脂組成物 |
EP2236488A1 (de) | 2001-03-30 | 2010-10-06 | The Arizona Board of Regents on behalf of the University of Arizona | Materialien, Verfahren und Verwendungen zur fotochemischen Erzeugung von Säuren und/oder Radikalenspezies |
AT500298A1 (de) * | 2002-06-14 | 2005-11-15 | Agrolinz Melamin Gmbh | Verfahren zur härtung von aminoplasten |
US20050126697A1 (en) * | 2003-12-11 | 2005-06-16 | International Business Machines Corporation | Photochemically and thermally curable adhesive formulations |
JP2007084594A (ja) * | 2005-09-20 | 2007-04-05 | Fujifilm Corp | インク組成物、インクジェット記録方法、印刷物、平版印刷版の製造方法、及び、平版印刷版 |
EP2842980B1 (de) | 2013-08-09 | 2021-05-05 | DSM IP Assets B.V. | Niedrigviskose flüssige strahlungshärtbare harzzusammensetzungen für zahnregulierungsform zur herstellung von zusatzstoffen |
CN104610511B (zh) | 2013-11-05 | 2018-11-16 | 帝斯曼知识产权资产管理有限公司 | 用于加成制造的稳定的基质填充的液体可辐射固化树脂组合物 |
EP3294780A4 (de) | 2015-06-08 | 2018-11-21 | DSM IP Assets B.V. | Flüssige hybride uv/vis-strahlungshärtbare harzzusammensetzungen zur generativen fertigung |
CN108027558B (zh) | 2015-10-01 | 2022-03-25 | 科思创(荷兰)有限公司 | 用于加成法制造的液体、混杂的可紫外/可见光辐射固化树脂组合物 |
CN108472834B (zh) | 2015-11-17 | 2021-05-25 | 帝斯曼知识产权资产管理有限公司 | 用于加成法制造的经改进的不含锑的可辐射固化组合物及其在熔模铸造工艺中的应用 |
KR102427130B1 (ko) | 2016-03-14 | 2022-08-01 | 코베스트로 (네덜란드) 비.브이. | 개선된 인성 및 고온 내성을 갖는 부가 제조용 방사선 경화성 조성물 |
CN111788269B (zh) | 2017-12-15 | 2023-10-20 | 科思创(荷兰)有限公司 | 用于高温喷射粘性热固性材料以经由增材制造创建固体制品的组合物和方法 |
US11180594B2 (en) | 2017-12-29 | 2021-11-23 | Covestro (Netherlands) B.V. | Compositions and articles for additive fabrication and methods of using the same |
US11866526B2 (en) | 2019-08-30 | 2024-01-09 | Stratasys, Inc. | Liquid, hybrid UV/vis radiation curable resin compositions for additive fabrication |
Family Cites Families (26)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3190893A (en) * | 1961-02-17 | 1965-06-22 | Kefalas As | Method of producing 9, 10-dihydroanthracenes |
US3484467A (en) * | 1967-01-05 | 1969-12-16 | American Cyanamid Co | Diaryl - (n,n - diarylaminoaryl)-aminium hexafluoroantimonates and hexafluoroarsenates |
US3969414A (en) * | 1973-04-11 | 1976-07-13 | The Dow Chemical Company | Naphthylmethyl sulfonium compounds |
US4161478A (en) * | 1974-05-02 | 1979-07-17 | General Electric Company | Photoinitiators |
US3981897A (en) * | 1975-05-02 | 1976-09-21 | General Electric Company | Method for making certain halonium salt photoinitiators |
GB1512981A (en) * | 1974-05-02 | 1978-06-01 | Gen Electric | Curable epoxide compositions |
US4058401A (en) * | 1974-05-02 | 1977-11-15 | General Electric Company | Photocurable compositions containing group via aromatic onium salts |
GB1516512A (en) * | 1974-05-02 | 1978-07-05 | Gen Electric | Chalcogenium salts |
US4136102A (en) * | 1974-05-02 | 1979-01-23 | General Electric Company | Photoinitiators |
US4256828A (en) * | 1975-09-02 | 1981-03-17 | Minnesota Mining And Manufacturing Company | Photocopolymerizable compositions based on epoxy and hydroxyl-containing organic materials |
US4069054A (en) * | 1975-09-02 | 1978-01-17 | Minnesota Mining And Manufacturing Company | Photopolymerizable composition containing a sensitized aromatic sulfonium compound and a cationacally polymerizable monomer |
US4081276A (en) * | 1976-10-18 | 1978-03-28 | General Electric Company | Photographic method |
US4310469A (en) * | 1978-12-29 | 1982-01-12 | General Electric Company | Diaryliodonium salts |
US4241204A (en) * | 1979-02-12 | 1980-12-23 | General Electric Company | Cationically curable organic resin compositions containing sulfonium salts and an organic oxidant |
US4250053A (en) * | 1979-05-21 | 1981-02-10 | Minnesota Mining And Manufacturing Company | Sensitized aromatic iodonium or aromatic sulfonium salt photoinitiator systems |
US4442197A (en) * | 1982-01-11 | 1984-04-10 | General Electric Company | Photocurable compositions |
US4537725A (en) * | 1982-09-18 | 1985-08-27 | Ciba-Geigy Corporation | Diaryliodosyl salts |
GB8330692D0 (en) * | 1983-11-17 | 1983-12-29 | Sericol Group Ltd | Preparation of photoinitiators |
US4503211A (en) * | 1984-05-31 | 1985-03-05 | Minnesota Mining And Manufacturing Co. | Epoxy resin curing agent, process and composition |
US4708925A (en) * | 1984-12-11 | 1987-11-24 | Minnesota Mining And Manufacturing Company | Photosolubilizable compositions containing novolac phenolic resin |
JPS61190524A (ja) * | 1985-01-25 | 1986-08-25 | Asahi Denka Kogyo Kk | エネルギ−線硬化性組成物 |
GB8529448D0 (en) * | 1985-11-29 | 1986-01-08 | Ward Blenkinsop & Co Ltd | Thioxanthone derivatives |
US4837124A (en) * | 1986-02-24 | 1989-06-06 | Hoechst Celanese Corporation | High resolution photoresist of imide containing polymers |
US4760013A (en) * | 1987-02-17 | 1988-07-26 | International Business Machines Corporation | Sulfonium salt photoinitiators |
US4933377A (en) * | 1988-02-29 | 1990-06-12 | Saeva Franklin D | Novel sulfonium salts and the use thereof as photoinitiators |
CA1339983C (en) * | 1988-03-03 | 1998-08-04 | Fumio Hamazu | Polyfluoride sulfonium compounds and polymerization initiator thereof |
-
1988
- 1988-11-18 US US07/272,965 patent/US5047568A/en not_active Expired - Fee Related
-
1989
- 1989-10-18 JP JP1269268A patent/JPH0615525B2/ja not_active Expired - Lifetime
- 1989-10-21 ES ES89119568T patent/ES2058436T3/es not_active Expired - Lifetime
- 1989-10-21 DE DE89119568T patent/DE68907559T2/de not_active Expired - Fee Related
- 1989-10-21 EP EP89119568A patent/EP0369194B1/de not_active Expired - Lifetime
- 1989-11-07 CA CA002002425A patent/CA2002425C/en not_active Expired - Fee Related
- 1989-11-14 AU AU44668/89A patent/AU620936B2/en not_active Ceased
- 1989-11-17 KR KR1019890016674A patent/KR930003866B1/ko not_active IP Right Cessation
- 1989-11-20 BR BR898905837A patent/BR8905837A/pt not_active Application Discontinuation
Also Published As
Publication number | Publication date |
---|---|
KR930003866B1 (ko) | 1993-05-14 |
AU620936B2 (en) | 1992-02-27 |
CA2002425A1 (en) | 1990-05-18 |
DE68907559T2 (de) | 1994-02-17 |
EP0369194A3 (en) | 1990-12-27 |
CA2002425C (en) | 1996-01-02 |
ES2058436T3 (es) | 1994-11-01 |
KR900007795A (ko) | 1990-06-02 |
EP0369194B1 (de) | 1993-07-14 |
JPH0615525B2 (ja) | 1994-03-02 |
EP0369194A2 (de) | 1990-05-23 |
US5047568A (en) | 1991-09-10 |
BR8905837A (pt) | 1990-06-12 |
AU4466889A (en) | 1990-05-24 |
JPH02149556A (ja) | 1990-06-08 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |