DE68907559D1 - SULPHONIUM SALTS, THEIR APPLICATION AND THEIR PRODUCTION. - Google Patents

SULPHONIUM SALTS, THEIR APPLICATION AND THEIR PRODUCTION.

Info

Publication number
DE68907559D1
DE68907559D1 DE8989119568T DE68907559T DE68907559D1 DE 68907559 D1 DE68907559 D1 DE 68907559D1 DE 8989119568 T DE8989119568 T DE 8989119568T DE 68907559 T DE68907559 T DE 68907559T DE 68907559 D1 DE68907559 D1 DE 68907559D1
Authority
DE
Germany
Prior art keywords
production
application
sulphonium salts
sulphonium
salts
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE8989119568T
Other languages
German (de)
Other versions
DE68907559T2 (en
Inventor
Raymond W Angelo
Jeffrey D Gelorme
Joseph P Kuczynski
William H Lawrence
Socrates P Pappas
Logan L Simpson
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Application granted granted Critical
Publication of DE68907559D1 publication Critical patent/DE68907559D1/en
Publication of DE68907559T2 publication Critical patent/DE68907559T2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C381/00—Compounds containing carbon and sulfur and having functional groups not covered by groups C07C301/00 - C07C337/00
    • C07C381/12—Sulfonium compounds
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C2603/00—Systems containing at least three condensed rings
    • C07C2603/02—Ortho- or ortho- and peri-condensed systems
    • C07C2603/04—Ortho- or ortho- and peri-condensed systems containing three rings
    • C07C2603/22—Ortho- or ortho- and peri-condensed systems containing three rings containing only six-membered rings
    • C07C2603/24—Anthracenes; Hydrogenated anthracenes
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/115—Cationic or anionic
DE89119568T 1988-11-18 1989-10-21 Sulfonium salts, their application and their preparation. Expired - Fee Related DE68907559T2 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US07/272,965 US5047568A (en) 1988-11-18 1988-11-18 Sulfonium salts and use and preparation thereof

Publications (2)

Publication Number Publication Date
DE68907559D1 true DE68907559D1 (en) 1993-08-19
DE68907559T2 DE68907559T2 (en) 1994-02-17

Family

ID=23041988

Family Applications (1)

Application Number Title Priority Date Filing Date
DE89119568T Expired - Fee Related DE68907559T2 (en) 1988-11-18 1989-10-21 Sulfonium salts, their application and their preparation.

Country Status (9)

Country Link
US (1) US5047568A (en)
EP (1) EP0369194B1 (en)
JP (1) JPH0615525B2 (en)
KR (1) KR930003866B1 (en)
AU (1) AU620936B2 (en)
BR (1) BR8905837A (en)
CA (1) CA2002425C (en)
DE (1) DE68907559T2 (en)
ES (1) ES2058436T3 (en)

Families Citing this family (25)

* Cited by examiner, † Cited by third party
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US5141969A (en) * 1988-11-21 1992-08-25 Eastman Kodak Company Onium salts and the use thereof as photoinitiators
US5500453A (en) * 1992-02-07 1996-03-19 Toyo Ink Manufacturing Co., Ltd. (Oxo)sulfonium complex, polymerizable composition containing the complex, and method of polymerizing the composition
JPH06107913A (en) * 1992-08-10 1994-04-19 Siemens Ag Reactive resin mixture
US5302757A (en) * 1992-09-14 1994-04-12 Eastman Kodak Company Ultraviolet light sensitive onium salts
US5347040A (en) * 1992-12-09 1994-09-13 E. I. Du Pont De Nemours And Company Sensitized onium salts
KR100355254B1 (en) * 1993-02-15 2003-03-31 Clariant Finance Bvi Ltd Positive type radiation-sensitive mixture
DE69413973T2 (en) * 1993-06-15 1999-04-15 Nippon Soda Co NEW SULPHONIUM SALTS COMPOUND AND POLYMERIZATION INITIATOR
US5550171A (en) * 1995-05-31 1996-08-27 International Business Machines Corporation Polymeric sulfonium salt photoinitiators
DE846681T1 (en) * 1995-08-22 1998-11-19 Nippon Soda Co NEW SULPHONIUM SALT COMPOUNDS, POLYMERIZATION INITIATOR, HARDENABLE COMPOSITION AND STRENGTHENING PROCEDURE
US5922783A (en) 1997-02-27 1999-07-13 Loctite Corporation Radiation-curable, cyanoacrylate-containing compositions
US6031014A (en) * 1998-12-08 2000-02-29 Crivello; James V. Initiator compositions and methods for their synthesis and use
JP4567132B2 (en) * 2000-01-06 2010-10-20 長春人造樹脂廠股▲分▼有限公司 Epoxy resin composition
EP1390664A4 (en) 2001-03-30 2008-01-02 Univ Arizona Materials, methods, and uses for photochemical generation of acids and/or radical species
AT500298A1 (en) * 2002-06-14 2005-11-15 Agrolinz Melamin Gmbh METHOD FOR HARDENING AMINO LOADS
US20050126697A1 (en) * 2003-12-11 2005-06-16 International Business Machines Corporation Photochemically and thermally curable adhesive formulations
JP2007084594A (en) * 2005-09-20 2007-04-05 Fujifilm Corp Ink composition, inkjet-recording method, printed matter, method for producing lithographic printing plate and lithographic printing plate
JP6414411B2 (en) 2013-08-09 2018-10-31 ディーエスエム アイピー アセッツ ビー．ブイ．Ｄｓｍ Ｉｐ Ａｓｓｅｔｓ Ｂ．Ｖ． Low viscosity liquid radiation curable dental aligner mold resin composition for additive manufacturing
JP6056032B2 (en) 2013-11-05 2017-01-11 ディーエスエム アイピー アセッツ ビー．ブイ． Stabilized matrix filled liquid radiation curable resin composition for additive molding
EP3294780A4 (en) 2015-06-08 2018-11-21 DSM IP Assets B.V. Liquid, hybrid uv/vis radiation curable resin compositions for additive fabrication
EP3341793B1 (en) 2015-10-01 2021-05-26 DSM IP Assets B.V. Liquid, hybrid uv/vis radiation curable resin compositions for additive fabrication
WO2017087614A1 (en) 2015-11-17 2017-05-26 Dsm Ip Assets, B.V. Improved antimony-free radiation curable compositions for additive fabrication, and applications thereof in investment casting processes
WO2017160845A1 (en) 2016-03-14 2017-09-21 Dsm Ip Assets B.V. Radiation curable compositions for additive fabrication with improved toughness and high temperature resistance
WO2019117723A1 (en) 2017-12-15 2019-06-20 Dsm Ip Assets B.V. Compositions and methods for high-temperature jetting of viscous thermosets to create solid articles via additive fabrication
KR20200104368A (en) 2017-12-29 2020-09-03 디에스엠 아이피 어셋츠 비.브이. Compositions and articles for additive manufacturing, and methods of using the same
JP2022546933A (en) 2019-08-30 2022-11-10 コベストロ （ネザーランズ） ビー．ブイ． Liquid hybrid UV/VIS radiation curable resin composition for additive manufacturing

Family Cites Families (26)

* Cited by examiner, † Cited by third party
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US3190893A (en) * 1961-02-17 1965-06-22 Kefalas As Method of producing 9, 10-dihydroanthracenes
US3484467A (en) * 1967-01-05 1969-12-16 American Cyanamid Co Diaryl - (n,n - diarylaminoaryl)-aminium hexafluoroantimonates and hexafluoroarsenates
US3969414A (en) * 1973-04-11 1976-07-13 The Dow Chemical Company Naphthylmethyl sulfonium compounds
GB1512981A (en) * 1974-05-02 1978-06-01 Gen Electric Curable epoxide compositions
US4161478A (en) * 1974-05-02 1979-07-17 General Electric Company Photoinitiators
US3981897A (en) * 1975-05-02 1976-09-21 General Electric Company Method for making certain halonium salt photoinitiators
US4058401A (en) * 1974-05-02 1977-11-15 General Electric Company Photocurable compositions containing group via aromatic onium salts
GB1516511A (en) * 1974-05-02 1978-07-05 Gen Electric Curable epoxide compositions
US4136102A (en) * 1974-05-02 1979-01-23 General Electric Company Photoinitiators
US4256828A (en) * 1975-09-02 1981-03-17 Minnesota Mining And Manufacturing Company Photocopolymerizable compositions based on epoxy and hydroxyl-containing organic materials
US4069054A (en) * 1975-09-02 1978-01-17 Minnesota Mining And Manufacturing Company Photopolymerizable composition containing a sensitized aromatic sulfonium compound and a cationacally polymerizable monomer
US4081276A (en) * 1976-10-18 1978-03-28 General Electric Company Photographic method
US4310469A (en) * 1978-12-29 1982-01-12 General Electric Company Diaryliodonium salts
US4241204A (en) * 1979-02-12 1980-12-23 General Electric Company Cationically curable organic resin compositions containing sulfonium salts and an organic oxidant
US4250053A (en) * 1979-05-21 1981-02-10 Minnesota Mining And Manufacturing Company Sensitized aromatic iodonium or aromatic sulfonium salt photoinitiator systems
US4442197A (en) * 1982-01-11 1984-04-10 General Electric Company Photocurable compositions
US4537725A (en) * 1982-09-18 1985-08-27 Ciba-Geigy Corporation Diaryliodosyl salts
GB8330692D0 (en) * 1983-11-17 1983-12-29 Sericol Group Ltd Preparation of photoinitiators
US4503211A (en) * 1984-05-31 1985-03-05 Minnesota Mining And Manufacturing Co. Epoxy resin curing agent, process and composition
US4708925A (en) * 1984-12-11 1987-11-24 Minnesota Mining And Manufacturing Company Photosolubilizable compositions containing novolac phenolic resin
JPS61190524A (en) * 1985-01-25 1986-08-25 Asahi Denka Kogyo Kk Energy ray-curable composition
GB8529448D0 (en) * 1985-11-29 1986-01-08 Ward Blenkinsop & Co Ltd Thioxanthone derivatives
US4837124A (en) * 1986-02-24 1989-06-06 Hoechst Celanese Corporation High resolution photoresist of imide containing polymers
US4760013A (en) * 1987-02-17 1988-07-26 International Business Machines Corporation Sulfonium salt photoinitiators
US4933377A (en) * 1988-02-29 1990-06-12 Saeva Franklin D Novel sulfonium salts and the use thereof as photoinitiators
CA1339983C (en) * 1988-03-03 1998-08-04 Fumio Hamazu Polyfluoride sulfonium compounds and polymerization initiator thereof

Also Published As

Publication number Publication date
AU620936B2 (en) 1992-02-27
JPH0615525B2 (en) 1994-03-02
CA2002425A1 (en) 1990-05-18
JPH02149556A (en) 1990-06-08
KR930003866B1 (en) 1993-05-14
KR900007795A (en) 1990-06-02
US5047568A (en) 1991-09-10
EP0369194A2 (en) 1990-05-23
CA2002425C (en) 1996-01-02
DE68907559T2 (en) 1994-02-17
EP0369194B1 (en) 1993-07-14
EP0369194A3 (en) 1990-12-27
ES2058436T3 (en) 1994-11-01
AU4466889A (en) 1990-05-24
BR8905837A (en) 1990-06-12

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee