KR830003526A - 광(光)경화성 조성물 - Google Patents

광(光)경화성 조성물 Download PDF

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Publication number
KR830003526A
KR830003526A KR1019800003761A KR800003761A KR830003526A KR 830003526 A KR830003526 A KR 830003526A KR 1019800003761 A KR1019800003761 A KR 1019800003761A KR 800003761 A KR800003761 A KR 800003761A KR 830003526 A KR830003526 A KR 830003526A
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KR
South Korea
Prior art keywords
divalent
monovalent
radical
aromatic
photocurable composition
Prior art date
Application number
KR1019800003761A
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English (en)
Other versions
KR840001676B1 (ko
Inventor
빈센트 크리벨로 제임스
힝와이 람 쥬리아
Original Assignee
삼손 헬프콜
제네랄 일렉트릭 캄파니
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed by 삼손 헬프콜, 제네랄 일렉트릭 캄파니 filed Critical 삼손 헬프콜
Publication of KR830003526A publication Critical patent/KR830003526A/ko
Application granted granted Critical
Publication of KR840001676B1 publication Critical patent/KR840001676B1/ko

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J3/00—Processes of treating or compounding macromolecular substances
    • C08J3/24—Crosslinking, e.g. vulcanising, of macromolecules
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C381/00—Compounds containing carbon and sulfur and having functional groups not covered by groups C07C301/00 - C07C337/00
    • C07C381/12—Sulfonium compounds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G85/00—General processes for preparing compounds provided for in this subclass

Abstract

내용 없음

Description

광(光)경화성 조성물
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음

Claims (1)

  1. 다음 구조식 (I)의 트리아릴 설포니움염 유기물질을 0.1 내지 15중량 배합하는 것과 이 배합물을 발광시키는 것을 특징으로 하는 양이온 중합 유기물질의 심부 경화용 광(光) 경화성 조성물
    [(R)a(R1)b(R2)cS]+[Y]-(I)
    상기 구조식에서
    R는 구조식를 갖는 1가의 유리레디칼이며,
    R1은 1가의 C(6-13) 방향족 유기레디칼이고,
    R2는 헤테로사이클 또는 융합한 구조를 형성하는 2가의 C(6-20) 방향족 레디칼이며,
    R3는 1가 또는 2가 C(1-13) 방향족 레디칼이고,
    R4는 2가 또는 3가 C(6-13) 방향족 레디칼이며,
    X는 -S- 또는 -O-이며,
    Y는 M이 금속 또는 인 및 비소로 부터 선정된 메탈로이드이고 또 Q가 할로겐인 MQn의 비 친핵성 음이온이고,
    Z는 -O-, -S-,및 -(CH2)e-로부터 선정된 2가 레디칼이며,
    a는 1에서 3까지를 포함하는 정수이고,
    b는 0에서 2개지를 포함하는 모든수이며,
    c는 0에서 1까지를 포함하는 모든수이고, 또 a+b+c의 합이 3이되며,
    d는 0 또는 1까지의 모든 수이고, 또 e는 1 내지 4를 포함하는 정수이다.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019800003761A 1979-09-28 1980-09-27 광경화성 조성물 KR840001676B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US7969279A 1979-09-28 1979-09-28
US079,692 1979-09-28

Publications (2)

Publication Number Publication Date
KR830003526A true KR830003526A (ko) 1983-06-21
KR840001676B1 KR840001676B1 (ko) 1984-10-13

Family

ID=22152176

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019800003761A KR840001676B1 (ko) 1979-09-28 1980-09-27 광경화성 조성물

Country Status (10)

Country Link
JP (1) JPS5655420A (ko)
KR (1) KR840001676B1 (ko)
AU (1) AU539699B2 (ko)
BR (1) BR8006335A (ko)
CA (1) CA1120181A (ko)
DE (1) DE3035807A1 (ko)
ES (1) ES495420A0 (ko)
FR (1) FR2466457A1 (ko)
GB (1) GB2061280B (ko)
ZA (1) ZA805273B (ko)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2069486B (en) * 1980-02-19 1984-09-26 Gen Electric Method for making triarylsulphonium salts
GB8330692D0 (en) * 1983-11-17 1983-12-29 Sericol Group Ltd Preparation of photoinitiators
JPS61190524A (ja) * 1985-01-25 1986-08-25 Asahi Denka Kogyo Kk エネルギ−線硬化性組成物
DE3909688A1 (de) * 1989-03-23 1990-09-27 Espe Stiftung Verfahren zum kleben oder vergiessen von substraten und vorrichtung zur seiner durchfuehrung
US5166125A (en) * 1992-02-19 1992-11-24 Eastman Kodak Company Method of forming color filter array element with patternable overcoat layer
US5166126A (en) * 1992-02-19 1992-11-24 Eastman Kodak Company Color filter array element with protective overcoat layer and method of forming same
WO1995017755A1 (de) * 1993-12-22 1995-06-29 Abb Patent Gmbh Verfahren zur herstellung einer isolation
JPH1041633A (ja) * 1996-07-25 1998-02-13 Hitachi Ltd 多層配線板とそれに用いる感光性樹脂組成物
JP3765896B2 (ja) 1996-12-13 2006-04-12 Ｊｓｒ株式会社 光学的立体造形用光硬化性樹脂組成物
JP2003073481A (ja) 2001-09-06 2003-03-12 Brother Ind Ltd 活性エネルギー線硬化型組成物、それを含有するインク及びそのインクを使用するプリンタ
JP2003105077A (ja) 2001-09-28 2003-04-09 Brother Ind Ltd 活性エネルギー線硬化型組成物、それを含有するインク及びそのインクを使用するプリンタ
JP4947021B2 (ja) * 2002-12-25 2012-06-06 Ｊｓｒ株式会社 オニウム塩化合物、感放射線性酸発生剤およびポジ型感放射線性樹脂組成物
US7365104B2 (en) 2005-03-31 2008-04-29 Eastman Kodak Company Light curable articles containing azinium salts
KR101334046B1 (ko) 2005-07-01 2013-12-02 시바 홀딩 인크 설포늄염 개시제
CN101466804B (zh) 2006-04-13 2012-02-22 西巴控股有限公司 硫鎓盐引发剂
JP5290183B2 (ja) 2006-10-04 2013-09-18 チバ ホールディング インコーポレーテッド スルホニウム塩光開始剤
TW200838967A (en) 2007-02-02 2008-10-01 Jsr Corp Composition for radiation-curable adhesive, composite, and method for producing the composite
KR101571912B1 (ko) 2007-10-10 2015-11-25 바스프 에스이 술포늄 염 개시제
KR101599562B1 (ko) 2007-10-10 2016-03-03 바스프 에스이 술포늄 염 개시제
CN101952248B (zh) 2007-10-10 2014-04-16 巴斯夫欧洲公司 锍盐引发剂
JP5622564B2 (ja) 2010-06-30 2014-11-12 富士フイルム株式会社 感光性組成物、パターン形成材料、並びに、これを用いた感光性膜、パターン形成方法、パターン膜、低屈折率膜、光学デバイス、及び、固体撮像素子

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4161478A (en) * 1974-05-02 1979-07-17 General Electric Company Photoinitiators
US4173476A (en) * 1978-02-08 1979-11-06 Minnesota Mining And Manufacturing Company Complex salt photoinitiator

Also Published As

Publication number Publication date
AU539699B2 (en) 1984-10-11
FR2466457B1 (ko) 1985-03-08
GB2061280A (en) 1981-05-13
GB2061280B (en) 1984-05-16
BR8006335A (pt) 1981-04-14
KR840001676B1 (ko) 1984-10-13
ES8200089A1 (es) 1981-10-16
AU6278080A (en) 1981-04-09
JPS5655420A (en) 1981-05-16
DE3035807C2 (ko) 1993-04-01
DE3035807A1 (de) 1981-04-09
JPS6336332B2 (ko) 1988-07-20
ES495420A0 (es) 1981-10-16
FR2466457A1 (fr) 1981-04-10
ZA805273B (en) 1981-11-25
CA1120181A (en) 1982-03-16

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