ATE447728T1 - Lichtempfindliche verbindung und lichtempfindliches harz - Google Patents
Lichtempfindliche verbindung und lichtempfindliches harzInfo
- Publication number
- ATE447728T1 ATE447728T1 AT01103264T AT01103264T ATE447728T1 AT E447728 T1 ATE447728 T1 AT E447728T1 AT 01103264 T AT01103264 T AT 01103264T AT 01103264 T AT01103264 T AT 01103264T AT E447728 T1 ATE447728 T1 AT E447728T1
- Authority
- AT
- Austria
- Prior art keywords
- chem
- photosensitive
- compound
- photosensitive resin
- group
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/016—Diazonium salts or compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/008—Azides
- G03F7/012—Macromolecular azides; Macromolecular additives, e.g. binders
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Materials For Photolithography (AREA)
- Thiazole And Isothizaole Compounds (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Nitrogen Condensed Heterocyclic Rings (AREA)
- Photoreceptors In Electrophotography (AREA)
- Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
- Macromonomer-Based Addition Polymer (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2000035734A JP4390237B2 (ja) | 2000-02-14 | 2000-02-14 | 感光性化合物及び感光性樹脂 |
Publications (1)
Publication Number | Publication Date |
---|---|
ATE447728T1 true ATE447728T1 (de) | 2009-11-15 |
Family
ID=18559892
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AT01103264T ATE447728T1 (de) | 2000-02-14 | 2001-02-12 | Lichtempfindliche verbindung und lichtempfindliches harz |
Country Status (8)
Country | Link |
---|---|
US (1) | US6610791B2 (de) |
EP (1) | EP1128214B1 (de) |
JP (1) | JP4390237B2 (de) |
KR (1) | KR100618047B1 (de) |
CN (1) | CN1208685C (de) |
AT (1) | ATE447728T1 (de) |
DE (1) | DE60140333D1 (de) |
TW (1) | TW594394B (de) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4036440B2 (ja) * | 2002-03-29 | 2008-01-23 | 東洋合成工業株式会社 | 新規な感光性化合物及び感光性樹脂並びに感光性組成物 |
JP4385812B2 (ja) * | 2004-03-26 | 2009-12-16 | 株式会社日立製作所 | 薄膜トランジスタおよびその製造方法 |
DE102004050478A1 (de) * | 2004-10-15 | 2006-04-27 | Chemische Fabrik Budenheim Kg | Formmasse für die Herstellung schwer entflammbarer Gegenstände, Pigment hierfür und dessen Verwendung |
KR100817619B1 (ko) * | 2005-03-31 | 2008-03-31 | 도요 고세이 고교 가부시키가이샤 | 감광성 수지 및 감광성 조성물 및 광가교체 |
KR100728490B1 (ko) * | 2005-09-23 | 2007-06-14 | (주)이그잭스 | 감광성 물질 및 이를 유효 성분으로 포함하는 컬러브라운관의 블랙 매트릭스 형성용 감광성 수지 조성물 |
US8026200B2 (en) * | 2008-05-01 | 2011-09-27 | Advanced Technology Materials, Inc. | Low pH mixtures for the removal of high density implanted resist |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS53325B2 (de) | 1974-04-26 | 1978-01-07 | ||
JPS565761A (en) | 1979-06-29 | 1981-01-21 | Asahi Chemical Ind | Novel laminate |
JPS565762A (en) | 1979-06-28 | 1981-01-21 | Uchida Yoko:Kk | Automatic adjusting circuit for background density in stencil paper making machine |
JPS5611906A (en) | 1979-07-11 | 1981-02-05 | Agency Of Ind Science & Technol | Photo-insolubilizable polyvinyl alcohol derivative and its preparation |
JPH02204750A (ja) | 1989-02-03 | 1990-08-14 | Hitachi Ltd | 感光性組成物、及びそれを用いたパターン形成方法 |
JPH0426849A (ja) | 1990-05-23 | 1992-01-30 | Hitachi Ltd | 水溶性感光性化合物、その合成方法、感光性組成物及びパターン形成方法 |
JP2936438B2 (ja) | 1990-09-28 | 1999-08-23 | 東京応化工業株式会社 | 水溶性感光性樹脂組成物 |
JPH0527404A (ja) | 1991-07-19 | 1993-02-05 | Fuji Photo Film Co Ltd | プリント処理装置 |
JPH05113661A (ja) | 1991-10-23 | 1993-05-07 | Hitachi Ltd | 感光性組成物及びそれを用いたパターン形成方法並びにけい光面形成方法 |
JPH06239930A (ja) | 1993-02-18 | 1994-08-30 | Hitachi Chem Co Ltd | 水溶性感光性樹脂水溶液の製造方法 |
JP3517074B2 (ja) | 1996-05-15 | 2004-04-05 | 未来工業株式会社 | 円穿孔用センターの表示機能を備えたボックス探知器、及び該センターの表示具 |
DE69809629T2 (de) * | 1997-05-13 | 2003-09-11 | Toyo Gosei Kogyo Kk | Photoempfindliche Verbindungen, photoempfindliche Harzzusammensetzungen, und Verfahren zur Herstellung von Mustern unter Verwendung dieser Verbindungen oder dieser Zusammensetzungen |
-
2000
- 2000-02-14 JP JP2000035734A patent/JP4390237B2/ja not_active Expired - Fee Related
-
2001
- 2001-02-12 DE DE60140333T patent/DE60140333D1/de not_active Expired - Lifetime
- 2001-02-12 AT AT01103264T patent/ATE447728T1/de not_active IP Right Cessation
- 2001-02-12 EP EP01103264A patent/EP1128214B1/de not_active Expired - Lifetime
- 2001-02-13 KR KR1020010006926A patent/KR100618047B1/ko not_active IP Right Cessation
- 2001-02-13 TW TW090103103A patent/TW594394B/zh not_active IP Right Cessation
- 2001-02-14 CN CNB011123362A patent/CN1208685C/zh not_active Expired - Fee Related
- 2001-02-14 US US09/783,056 patent/US6610791B2/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
KR20010088330A (ko) | 2001-09-26 |
CN1309329A (zh) | 2001-08-22 |
US6610791B2 (en) | 2003-08-26 |
US20010047068A1 (en) | 2001-11-29 |
JP2001226360A (ja) | 2001-08-21 |
JP4390237B2 (ja) | 2009-12-24 |
EP1128214A1 (de) | 2001-08-29 |
DE60140333D1 (de) | 2009-12-17 |
KR100618047B1 (ko) | 2006-08-29 |
TW594394B (en) | 2004-06-21 |
EP1128214B1 (de) | 2009-11-04 |
CN1208685C (zh) | 2005-06-29 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
RER | Ceased as to paragraph 5 lit. 3 law introducing patent treaties |