JPS5655420A - Depth hardening of photohardenable composition - Google Patents
Depth hardening of photohardenable compositionInfo
- Publication number
- JPS5655420A JPS5655420A JP13310380A JP13310380A JPS5655420A JP S5655420 A JPS5655420 A JP S5655420A JP 13310380 A JP13310380 A JP 13310380A JP 13310380 A JP13310380 A JP 13310380A JP S5655420 A JPS5655420 A JP S5655420A
- Authority
- JP
- Japan
- Prior art keywords
- photohardenable composition
- depth hardening
- hardening
- depth
- photohardenable
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C381/00—Compounds containing carbon and sulfur and having functional groups not covered by groups C07C301/00 - C07C337/00
- C07C381/12—Sulfonium compounds
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J3/00—Processes of treating or compounding macromolecular substances
- C08J3/24—Crosslinking, e.g. vulcanising, of macromolecules
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G85/00—General processes for preparing compounds provided for in this subclass
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Epoxy Resins (AREA)
- Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
- Polymerisation Methods In General (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US7969279A | 1979-09-28 | 1979-09-28 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5655420A true JPS5655420A (en) | 1981-05-16 |
JPS6336332B2 JPS6336332B2 (en) | 1988-07-20 |
Family
ID=22152176
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP13310380A Granted JPS5655420A (en) | 1979-09-28 | 1980-09-26 | Depth hardening of photohardenable composition |
Country Status (10)
Country | Link |
---|---|
JP (1) | JPS5655420A (en) |
KR (1) | KR840001676B1 (en) |
AU (1) | AU539699B2 (en) |
BR (1) | BR8006335A (en) |
CA (1) | CA1120181A (en) |
DE (1) | DE3035807A1 (en) |
ES (1) | ES8200089A1 (en) |
FR (1) | FR2466457A1 (en) |
GB (1) | GB2061280B (en) |
ZA (1) | ZA805273B (en) |
Cited By (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1993013139A1 (en) * | 1985-01-25 | 1993-07-08 | Hiroshi Tsuchiya | Energy ray-hardenable composition |
US6306481B1 (en) | 1996-07-25 | 2001-10-23 | Hitachi, Ltd. | Multilayer circuit board having insulating layer with via-holes |
US6805439B2 (en) | 2001-09-06 | 2004-10-19 | Brother Kogyo Kabushiki Kaisha | Active energy beam-curable composition, ink containing the same, and printer accommodating the same ink |
US6866376B2 (en) | 2001-09-28 | 2005-03-15 | Brother Kogyo Kabushiki Kaisha | Active energy beam-curable composition, ink containing the same, and printer accommodating the same ink |
EP1983023A1 (en) | 2007-02-02 | 2008-10-22 | JSR Corporation | Radiation-curable composition, composite and manufacturing method thereof |
JP2009501148A (en) * | 2005-07-01 | 2009-01-15 | チバ ホールディング インコーポレーテッド | Sulfonium salt initiator |
JP2009079049A (en) * | 2002-12-25 | 2009-04-16 | Jsr Corp | Onium salt compound, radiation-sensitive acid generating agent and positive-type radiation-sensitive resin composition |
USRE42593E1 (en) | 1996-12-13 | 2011-08-02 | Dsm Ip Assets B.V. | Photo-curable resin composition used for photo-fabrication of three-dimensional object |
EP2402818A1 (en) | 2010-06-30 | 2012-01-04 | FUJIFILM Corporation | Photosensitive composition, pattern forming material, and photosensitive film, pattern forming method, pattern film, low refractive index film, optical device and solid-state imaging device each using the same |
Families Citing this family (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB2069486B (en) * | 1980-02-19 | 1984-09-26 | Gen Electric | Method for making triarylsulphonium salts |
GB8330692D0 (en) * | 1983-11-17 | 1983-12-29 | Sericol Group Ltd | Preparation of photoinitiators |
DE3909688A1 (en) * | 1989-03-23 | 1990-09-27 | Espe Stiftung | METHOD FOR GLUING OR POOLING SUBSTRATES AND DEVICE FOR CARRYING OUT ITSELF |
US5166125A (en) * | 1992-02-19 | 1992-11-24 | Eastman Kodak Company | Method of forming color filter array element with patternable overcoat layer |
US5166126A (en) * | 1992-02-19 | 1992-11-24 | Eastman Kodak Company | Color filter array element with protective overcoat layer and method of forming same |
WO1995017755A1 (en) * | 1993-12-22 | 1995-06-29 | Abb Patent Gmbh | Process for producing an insulation system |
US7365104B2 (en) | 2005-03-31 | 2008-04-29 | Eastman Kodak Company | Light curable articles containing azinium salts |
WO2007118794A1 (en) | 2006-04-13 | 2007-10-25 | Ciba Holding Inc. | Sulphonium salt initiators |
EP2125713B1 (en) | 2006-10-04 | 2012-04-18 | Basf Se | Sulphonium salt photoinitiators |
JP5570424B2 (en) | 2007-10-10 | 2014-08-13 | ビーエーエスエフ ソシエタス・ヨーロピア | Sulfonium salt initiator |
WO2009047152A1 (en) | 2007-10-10 | 2009-04-16 | Basf Se | Sulphonium salt initiators |
EP2197840B1 (en) | 2007-10-10 | 2013-11-06 | Basf Se | Sulphonium salt initiators |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4161478A (en) * | 1974-05-02 | 1979-07-17 | General Electric Company | Photoinitiators |
US4173476A (en) * | 1978-02-08 | 1979-11-06 | Minnesota Mining And Manufacturing Company | Complex salt photoinitiator |
-
1980
- 1980-08-26 ZA ZA00805273A patent/ZA805273B/en unknown
- 1980-09-09 GB GB8029024A patent/GB2061280B/en not_active Expired
- 1980-09-23 DE DE19803035807 patent/DE3035807A1/en active Granted
- 1980-09-25 CA CA000361443A patent/CA1120181A/en not_active Expired
- 1980-09-26 JP JP13310380A patent/JPS5655420A/en active Granted
- 1980-09-26 ES ES495420A patent/ES8200089A1/en not_active Expired
- 1980-09-26 FR FR8020689A patent/FR2466457A1/en active Granted
- 1980-09-27 KR KR1019800003761A patent/KR840001676B1/en active IP Right Grant
- 1980-09-29 AU AU62780/80A patent/AU539699B2/en not_active Ceased
- 1980-09-29 BR BR8006335A patent/BR8006335A/en unknown
Cited By (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1993013139A1 (en) * | 1985-01-25 | 1993-07-08 | Hiroshi Tsuchiya | Energy ray-hardenable composition |
US6306481B1 (en) | 1996-07-25 | 2001-10-23 | Hitachi, Ltd. | Multilayer circuit board having insulating layer with via-holes |
USRE42593E1 (en) | 1996-12-13 | 2011-08-02 | Dsm Ip Assets B.V. | Photo-curable resin composition used for photo-fabrication of three-dimensional object |
US6805439B2 (en) | 2001-09-06 | 2004-10-19 | Brother Kogyo Kabushiki Kaisha | Active energy beam-curable composition, ink containing the same, and printer accommodating the same ink |
US6866376B2 (en) | 2001-09-28 | 2005-03-15 | Brother Kogyo Kabushiki Kaisha | Active energy beam-curable composition, ink containing the same, and printer accommodating the same ink |
JP2009079049A (en) * | 2002-12-25 | 2009-04-16 | Jsr Corp | Onium salt compound, radiation-sensitive acid generating agent and positive-type radiation-sensitive resin composition |
JP2009501148A (en) * | 2005-07-01 | 2009-01-15 | チバ ホールディング インコーポレーテッド | Sulfonium salt initiator |
EP1983023A1 (en) | 2007-02-02 | 2008-10-22 | JSR Corporation | Radiation-curable composition, composite and manufacturing method thereof |
EP2402818A1 (en) | 2010-06-30 | 2012-01-04 | FUJIFILM Corporation | Photosensitive composition, pattern forming material, and photosensitive film, pattern forming method, pattern film, low refractive index film, optical device and solid-state imaging device each using the same |
Also Published As
Publication number | Publication date |
---|---|
FR2466457B1 (en) | 1985-03-08 |
BR8006335A (en) | 1981-04-14 |
ZA805273B (en) | 1981-11-25 |
GB2061280B (en) | 1984-05-16 |
AU6278080A (en) | 1981-04-09 |
AU539699B2 (en) | 1984-10-11 |
DE3035807A1 (en) | 1981-04-09 |
ES495420A0 (en) | 1981-10-16 |
GB2061280A (en) | 1981-05-13 |
CA1120181A (en) | 1982-03-16 |
KR840001676B1 (en) | 1984-10-13 |
DE3035807C2 (en) | 1993-04-01 |
ES8200089A1 (en) | 1981-10-16 |
FR2466457A1 (en) | 1981-04-10 |
KR830003526A (en) | 1983-06-21 |
JPS6336332B2 (en) | 1988-07-20 |
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