JPS5655420A - Depth hardening of photohardenable composition - Google Patents

Depth hardening of photohardenable composition

Info

Publication number
JPS5655420A
JPS5655420A JP13310380A JP13310380A JPS5655420A JP S5655420 A JPS5655420 A JP S5655420A JP 13310380 A JP13310380 A JP 13310380A JP 13310380 A JP13310380 A JP 13310380A JP S5655420 A JPS5655420 A JP S5655420A
Authority
JP
Japan
Prior art keywords
photohardenable composition
depth hardening
hardening
depth
photohardenable
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP13310380A
Other languages
Japanese (ja)
Other versions
JPS6336332B2 (en
Inventor
Binsento Kuribero Jieimusu
Hiinguuwai Ramu Jiyuria
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
General Electric Co
Original Assignee
General Electric Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by General Electric Co filed Critical General Electric Co
Publication of JPS5655420A publication Critical patent/JPS5655420A/en
Publication of JPS6336332B2 publication Critical patent/JPS6336332B2/ja
Granted legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C381/00Compounds containing carbon and sulfur and having functional groups not covered by groups C07C301/00 - C07C337/00
    • C07C381/12Sulfonium compounds
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J3/00Processes of treating or compounding macromolecular substances
    • C08J3/24Crosslinking, e.g. vulcanising, of macromolecules
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G85/00General processes for preparing compounds provided for in this subclass

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Epoxy Resins (AREA)
  • Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
  • Polymerisation Methods In General (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
JP13310380A 1979-09-28 1980-09-26 Depth hardening of photohardenable composition Granted JPS5655420A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US7969279A 1979-09-28 1979-09-28

Publications (2)

Publication Number Publication Date
JPS5655420A true JPS5655420A (en) 1981-05-16
JPS6336332B2 JPS6336332B2 (en) 1988-07-20

Family

ID=22152176

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13310380A Granted JPS5655420A (en) 1979-09-28 1980-09-26 Depth hardening of photohardenable composition

Country Status (10)

Country Link
JP (1) JPS5655420A (en)
KR (1) KR840001676B1 (en)
AU (1) AU539699B2 (en)
BR (1) BR8006335A (en)
CA (1) CA1120181A (en)
DE (1) DE3035807A1 (en)
ES (1) ES8200089A1 (en)
FR (1) FR2466457A1 (en)
GB (1) GB2061280B (en)
ZA (1) ZA805273B (en)

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1993013139A1 (en) * 1985-01-25 1993-07-08 Hiroshi Tsuchiya Energy ray-hardenable composition
US6306481B1 (en) 1996-07-25 2001-10-23 Hitachi, Ltd. Multilayer circuit board having insulating layer with via-holes
US6805439B2 (en) 2001-09-06 2004-10-19 Brother Kogyo Kabushiki Kaisha Active energy beam-curable composition, ink containing the same, and printer accommodating the same ink
US6866376B2 (en) 2001-09-28 2005-03-15 Brother Kogyo Kabushiki Kaisha Active energy beam-curable composition, ink containing the same, and printer accommodating the same ink
EP1983023A1 (en) 2007-02-02 2008-10-22 JSR Corporation Radiation-curable composition, composite and manufacturing method thereof
JP2009501148A (en) * 2005-07-01 2009-01-15 チバ ホールディング インコーポレーテッド Sulfonium salt initiator
JP2009079049A (en) * 2002-12-25 2009-04-16 Jsr Corp Onium salt compound, radiation-sensitive acid generating agent and positive-type radiation-sensitive resin composition
USRE42593E1 (en) 1996-12-13 2011-08-02 Dsm Ip Assets B.V. Photo-curable resin composition used for photo-fabrication of three-dimensional object
EP2402818A1 (en) 2010-06-30 2012-01-04 FUJIFILM Corporation Photosensitive composition, pattern forming material, and photosensitive film, pattern forming method, pattern film, low refractive index film, optical device and solid-state imaging device each using the same

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2069486B (en) * 1980-02-19 1984-09-26 Gen Electric Method for making triarylsulphonium salts
GB8330692D0 (en) * 1983-11-17 1983-12-29 Sericol Group Ltd Preparation of photoinitiators
DE3909688A1 (en) * 1989-03-23 1990-09-27 Espe Stiftung METHOD FOR GLUING OR POOLING SUBSTRATES AND DEVICE FOR CARRYING OUT ITSELF
US5166125A (en) * 1992-02-19 1992-11-24 Eastman Kodak Company Method of forming color filter array element with patternable overcoat layer
US5166126A (en) * 1992-02-19 1992-11-24 Eastman Kodak Company Color filter array element with protective overcoat layer and method of forming same
WO1995017755A1 (en) * 1993-12-22 1995-06-29 Abb Patent Gmbh Process for producing an insulation system
US7365104B2 (en) 2005-03-31 2008-04-29 Eastman Kodak Company Light curable articles containing azinium salts
WO2007118794A1 (en) 2006-04-13 2007-10-25 Ciba Holding Inc. Sulphonium salt initiators
EP2125713B1 (en) 2006-10-04 2012-04-18 Basf Se Sulphonium salt photoinitiators
JP5570424B2 (en) 2007-10-10 2014-08-13 ビーエーエスエフ ソシエタス・ヨーロピア Sulfonium salt initiator
WO2009047152A1 (en) 2007-10-10 2009-04-16 Basf Se Sulphonium salt initiators
EP2197840B1 (en) 2007-10-10 2013-11-06 Basf Se Sulphonium salt initiators

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4161478A (en) * 1974-05-02 1979-07-17 General Electric Company Photoinitiators
US4173476A (en) * 1978-02-08 1979-11-06 Minnesota Mining And Manufacturing Company Complex salt photoinitiator

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1993013139A1 (en) * 1985-01-25 1993-07-08 Hiroshi Tsuchiya Energy ray-hardenable composition
US6306481B1 (en) 1996-07-25 2001-10-23 Hitachi, Ltd. Multilayer circuit board having insulating layer with via-holes
USRE42593E1 (en) 1996-12-13 2011-08-02 Dsm Ip Assets B.V. Photo-curable resin composition used for photo-fabrication of three-dimensional object
US6805439B2 (en) 2001-09-06 2004-10-19 Brother Kogyo Kabushiki Kaisha Active energy beam-curable composition, ink containing the same, and printer accommodating the same ink
US6866376B2 (en) 2001-09-28 2005-03-15 Brother Kogyo Kabushiki Kaisha Active energy beam-curable composition, ink containing the same, and printer accommodating the same ink
JP2009079049A (en) * 2002-12-25 2009-04-16 Jsr Corp Onium salt compound, radiation-sensitive acid generating agent and positive-type radiation-sensitive resin composition
JP2009501148A (en) * 2005-07-01 2009-01-15 チバ ホールディング インコーポレーテッド Sulfonium salt initiator
EP1983023A1 (en) 2007-02-02 2008-10-22 JSR Corporation Radiation-curable composition, composite and manufacturing method thereof
EP2402818A1 (en) 2010-06-30 2012-01-04 FUJIFILM Corporation Photosensitive composition, pattern forming material, and photosensitive film, pattern forming method, pattern film, low refractive index film, optical device and solid-state imaging device each using the same

Also Published As

Publication number Publication date
FR2466457B1 (en) 1985-03-08
BR8006335A (en) 1981-04-14
ZA805273B (en) 1981-11-25
GB2061280B (en) 1984-05-16
AU6278080A (en) 1981-04-09
AU539699B2 (en) 1984-10-11
DE3035807A1 (en) 1981-04-09
ES495420A0 (en) 1981-10-16
GB2061280A (en) 1981-05-13
CA1120181A (en) 1982-03-16
KR840001676B1 (en) 1984-10-13
DE3035807C2 (en) 1993-04-01
ES8200089A1 (en) 1981-10-16
FR2466457A1 (en) 1981-04-10
KR830003526A (en) 1983-06-21
JPS6336332B2 (en) 1988-07-20

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