KR900003685A - 광중합성 기록 물질 - Google Patents

광중합성 기록 물질 Download PDF

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Publication number
KR900003685A
KR900003685A KR1019890011315A KR890011315A KR900003685A KR 900003685 A KR900003685 A KR 900003685A KR 1019890011315 A KR1019890011315 A KR 1019890011315A KR 890011315 A KR890011315 A KR 890011315A KR 900003685 A KR900003685 A KR 900003685A
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KR
South Korea
Prior art keywords
recording material
dye
material according
layer
coating layer
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KR1019890011315A
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English (en)
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KR0132430B1 (ko
Inventor
제르타니 루돌프
모르 디에터
프라스 베르너
Original Assignee
베트라우퍼, 오일러
훽스트 아크티엔게젤샤프트
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Publication of KR900003685A publication Critical patent/KR900003685A/ko
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Publication of KR0132430B1 publication Critical patent/KR0132430B1/ko

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C5/00—Photographic processes or agents therefor; Regeneration of such processing agents
    • G03C5/26—Processes using silver-salt-containing photosensitive materials or agents therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/092—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by backside coating or layers, by lubricating-slip layers or means, by oxygen barrier layers or by stripping-release layers or means

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Materials For Photolithography (AREA)
  • Polymerisation Methods In General (AREA)

Abstract

내용 없음

Description

광중합성 기록 물질
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음

Claims (13)

  1. 층 지지체, 광중합 층 및 대기 산소에 대한 투과성이 낮으며 물 또는 물/알콜 혼합물에 용해되는 중합체를 함유하는 피복층으로 이루어지는 광중합성 기록 물질에 있어서, 피복층이 20℃에서 수용성이고, 300내지 700mm범위의 광을 흡수하며 이 범위내에서 목적하는 복사 광원의 방사 범위에 상응하는 비흡수 영역을 갖는 염료 또는 여러가지 염료의 적절한 혼합물을 추가로 함유함을 특징으로 하는 광중합성 기록 물질.
  2. 제1항에 있어서, 염료가 디-또는 트리아릴카베늄 염료, 아조 염료, 아자(18) 애뉼렌 염료, 니트로 염료, 니트로소 염료, 폴리메틴 염료, 카보닐 염료 또는 황 염료임을 특징으로 하는 광중합성 기록 물질.
  3. 제1항에 있어서, 피복층의 단위 면적당 중량이 0.2g/㎡ 내지 10g/㎡임을 특징으로 하는 기록 물질.
  4. 제1항에 있어서, 피복층에 염료 0.05내지 50중량%를 함유함을 특징으로 하는 기록 물질.
  5. 제1항에 있어서, 염료의 흡수 영역에서 피복층이 0.5내지 2.5의 광학 밀도를 가짐을 특징으로 하는 기록 물질.
  6. 제1항에 있어서, 복사 광원의 방사 영역이 350내지 400nm, 400내지 450nm 또는 488내지 514nm임을 특징으로 하는 기록 물질.
  7. 제1항에 있어서, 광중합 층이 필수 구성성분으로서 중합성 결합제, 하나 이상의 말단 에틸렌계 불포화 그룹 및 중합 개시제를 가지며, 화학선으로 활성화시킬 수 있는 유리-라디칼-중합성 화합물을 함유함을 특징으로 하는 기록 물질.
  8. 제1항에 있어서, 층이 중합 개시제로서 광환원성 염료를 함유함을 특징으로 하는 기록 물질.
  9. 제8항에 있어서, 유리-라디칼-중합성 화합물이 광환원성 염료의 존재하에 노출에 의해 광산화가능한 그룹 하나 이상을 갖는 다가 알콜의 아크릴산 또는 알크아클산 에스테르임을 특징으로 하는 기록 물질.
  10. 제8항에 있어서, 광개시제로서 광분해적으로 분해되는 트리할로메틸 화합물 및 광개시제로 작용하는 아크리딘, 페나진 또는 퀴녹살린 화합물을 추가로 함유하는 특징으로 하는 기록 물질.
  11. 제7항에 있어서, 결합제가 수불용성이고, 알칼리성 수용액에 용해됨을 특징으로 하는 기록 물질.
  12. 제1항에 있어서, 광중합 층의 단위 면적당 중량이 0.5내지 20g/㎡임을 특징으로 하는 기록 물질.
  13. 제1항에 있어서, 층 지지체가 평판 인쇄에 적합한 친수성 표면을 가짐을 특징으로 하는 기록 물질.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019890011315A 1988-08-11 1989-08-09 광중합성 기록물질 KR0132430B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE3827245A DE3827245A1 (de) 1988-08-11 1988-08-11 Photopolymerisierbares aufzeichnungsmaterial
DEP3827245.8 1988-08-11

Publications (2)

Publication Number Publication Date
KR900003685A true KR900003685A (ko) 1990-03-26
KR0132430B1 KR0132430B1 (ko) 1998-04-14

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KR1019890011315A KR0132430B1 (ko) 1988-08-11 1989-08-09 광중합성 기록물질

Country Status (5)

Country Link
US (1) US5922508A (ko)
EP (1) EP0354475B1 (ko)
JP (1) JP2840640B2 (ko)
KR (1) KR0132430B1 (ko)
DE (2) DE3827245A1 (ko)

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KR102209143B1 (ko) 2019-07-31 2021-01-29 주식회사 성현 발전설비용 회전형 열교환기의 공기 누출을 방지하는 익스펜션 슬리브 씰 제조 방법

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Publication number Priority date Publication date Assignee Title
KR102209143B1 (ko) 2019-07-31 2021-01-29 주식회사 성현 발전설비용 회전형 열교환기의 공기 누출을 방지하는 익스펜션 슬리브 씰 제조 방법

Also Published As

Publication number Publication date
JP2840640B2 (ja) 1998-12-24
EP0354475A3 (de) 1991-03-20
US5922508A (en) 1999-07-13
DE58909494D1 (de) 1995-12-21
DE3827245A1 (de) 1990-02-15
EP0354475B1 (de) 1995-11-15
JPH0289055A (ja) 1990-03-29
EP0354475A2 (de) 1990-02-14
KR0132430B1 (ko) 1998-04-14

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