GB1475599A - Process for producing ultraviolet-shielding photomasks - Google Patents

Process for producing ultraviolet-shielding photomasks

Info

Publication number
GB1475599A
GB1475599A GB3258174A GB3258174A GB1475599A GB 1475599 A GB1475599 A GB 1475599A GB 3258174 A GB3258174 A GB 3258174A GB 3258174 A GB3258174 A GB 3258174A GB 1475599 A GB1475599 A GB 1475599A
Authority
GB
United Kingdom
Prior art keywords
polymer
alcohol
soluble
photomasks
july
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB3258174A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Holdings Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Publication of GB1475599A publication Critical patent/GB1475599A/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/008—Azides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/695—Compositions containing azides as the photosensitive substances
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Graft Or Block Polymers (AREA)

Abstract

1475599 Photomasks FUJI PHOTO FILM CO Ltd 23 July 1974 [23 July 1973] 32581/74 Heading G2C [Also in Division C3] A process of producing an ultraviolet shielding photomask comprises (i) irradiating actinic light through a transparent positive or negative image to imagewise expose a photographic film comprising a transparent support bearing a photosensitive layer comprising a polymer of molecular weight in the range from 1000 to 1000000 which is soluble in water, in an alcohol or in a weakly alkaline solution, which polymer is either mixed with or contains bonded to a side chain a photosensitive aromatic azide compound present in sufficient amount that on exposure to such light the polymer is cross-linked and the azide compound forms a dye with an optical density of at least 1À0 over the entire wavelength range from 340 to 450 mÁ; and (ii) washing out the unirradiated areas of the polymer by dissolving in water, a weakly alkaline aqueous solution or an alcohol to form a hardened and coloured relief image at the surface of the photo-sensitive layer. Preferred are those containing e.g. a benzylidene or cinnamylidene group. A combination of azides may be used to give uniform density over the specified wavelength range. Suitable soluble polymers are alcohol-soluble polyamide resins, polymers of 2-hydroxyethyl acrylate or methacrylate, a polymer having cis -4-cyclohexene -1, 2-carboxylate side chains, polyvinyl alcohol with grafted acrylonitrile or acrylamide, styrene-maleic anhydride copolymer, crotonic acid/vinyl acetate copolymer, acid cellulose derivatives, polyvinyl pyridine, polyvinyl pyrrolidone, novolak, novolakmodified phenol resin or a xylene resin.
GB3258174A 1973-07-23 1974-07-23 Process for producing ultraviolet-shielding photomasks Expired GB1475599A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8284973A JPS5140452B2 (en) 1973-07-23 1973-07-23

Publications (1)

Publication Number Publication Date
GB1475599A true GB1475599A (en) 1977-06-01

Family

ID=13785815

Family Applications (1)

Application Number Title Priority Date Filing Date
GB3258174A Expired GB1475599A (en) 1973-07-23 1974-07-23 Process for producing ultraviolet-shielding photomasks

Country Status (5)

Country Link
JP (1) JPS5140452B2 (en)
DE (1) DE2435390A1 (en)
FR (1) FR2238953B1 (en)
GB (1) GB1475599A (en)
IT (1) IT1016966B (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3440508A1 (en) * 1983-11-25 1985-06-05 Armstrong World Industries, Inc., Lancaster, Pa. METHOD FOR PHOTOLYTICALLY DEVELOPING A COLORED IMAGE ON A CELLULOSE MATERIAL WITH MONOSULFONYLAZIDES
US9513551B2 (en) 2009-01-29 2016-12-06 Digiflex Ltd. Process for producing a photomask on a photopolymeric surface

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5294632A (en) * 1976-02-04 1977-08-09 Mitsui Constr Transfer method in compressed air of material lock and its device
US4197133A (en) * 1977-10-14 1980-04-08 Ciba-Geigy Corporation Photo-curable compositions of matter containing bis-azidophthalimidyl derivatives
IT1138814B (en) * 1980-07-03 1986-09-17 Rca Corp METHOD FOR THE FORMATION OF SURFACE SURFACE DRAWINGS WITH FAR ULTRAVIOLET AND PHOTOSENSITIVE PROTECTIVE COMPOSITION FOR THIS METHOD
JPS61166542A (en) * 1985-01-18 1986-07-28 Hitachi Chem Co Ltd Photosensitive composition

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1572068C3 (en) * 1966-03-12 1976-01-08 Hoechst Ag, 6000 Frankfurt Photosensitive layer for the production of printing forms
DE1294191B (en) * 1967-07-06 1969-07-31 Kalle Ag Photosensitive copying material with a photo-crosslinkable layer
DE1597614B2 (en) * 1967-07-07 1977-06-23 Hoechst Ag, 6000 Frankfurt LIGHT-SENSITIVE COPY DIMENSIONS

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3440508A1 (en) * 1983-11-25 1985-06-05 Armstrong World Industries, Inc., Lancaster, Pa. METHOD FOR PHOTOLYTICALLY DEVELOPING A COLORED IMAGE ON A CELLULOSE MATERIAL WITH MONOSULFONYLAZIDES
US9513551B2 (en) 2009-01-29 2016-12-06 Digiflex Ltd. Process for producing a photomask on a photopolymeric surface

Also Published As

Publication number Publication date
DE2435390A1 (en) 1975-02-13
JPS5140452B2 (en) 1976-11-04
FR2238953A1 (en) 1975-02-21
FR2238953B1 (en) 1977-10-21
IT1016966B (en) 1977-06-20
JPS5032924A (en) 1975-03-29

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Legal Events

Date Code Title Description
PS Patent sealed
PCNP Patent ceased through non-payment of renewal fee