KR860007728A - 반도체 장치용 본딍 와이어 - Google Patents

반도체 장치용 본딍 와이어

Info

Publication number
KR860007728A
KR860007728A KR1019860002278A KR860002278A KR860007728A KR 860007728 A KR860007728 A KR 860007728A KR 1019860002278 A KR1019860002278 A KR 1019860002278A KR 860002278 A KR860002278 A KR 860002278A KR 860007728 A KR860007728 A KR 860007728A
Authority
KR
South Korea
Prior art keywords
semiconductor devices
bonded wire
bonded
wire
semiconductor
Prior art date
Application number
KR1019860002278A
Other languages
English (en)
Other versions
KR900001243B1 (ko
Inventor
나오유기 호소다
나오기 우지야마
류스게 가와나가
도시아기 오노
Original Assignee
미쯔비시긴조구 가부시기가이샤
미쯔비시덴기 가부시기 가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP60065142A external-priority patent/JPS61224443A/ja
Priority claimed from JP60141822A external-priority patent/JPH0736431B2/ja
Priority claimed from JP60161666A external-priority patent/JPS6222469A/ja
Priority claimed from JP60235988A external-priority patent/JPS6294969A/ja
Application filed by 미쯔비시긴조구 가부시기가이샤, 미쯔비시덴기 가부시기 가이샤 filed Critical 미쯔비시긴조구 가부시기가이샤
Publication of KR860007728A publication Critical patent/KR860007728A/ko
Application granted granted Critical
Publication of KR900001243B1 publication Critical patent/KR900001243B1/ko

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Classifications

    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22CALLOYS
    • C22C9/00Alloys based on copper
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    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
    • H01L21/50Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the subgroups H01L21/06 - H01L21/326, e.g. sealing of a cap to a base of a container
    • H01L21/60Attaching or detaching leads or other conductive members, to be used for carrying current to or from the device in operation
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    • H01L2224/02Bonding areas; Manufacturing methods related thereto
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    • H01L2224/05617Material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof the principal constituent melting at a temperature of greater than or equal to 400°C and less than 950°C
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  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Wire Bonding (AREA)
  • Conductive Materials (AREA)
KR1019860002278A 1985-03-29 1986-03-27 반도체 장치용 본딍 와이어 KR900001243B1 (ko)

Applications Claiming Priority (8)

Application Number Priority Date Filing Date Title
JP60-65142 1985-03-29
JP60065142A JPS61224443A (ja) 1985-03-29 1985-03-29 半導体装置用ボンデイングワイヤ
JP60141822A JPH0736431B2 (ja) 1985-06-28 1985-06-28 半導体装置のボンディングワイヤ用高純度銅の製造法
JP60-141822 1985-06-28
JP60161666A JPS6222469A (ja) 1985-07-22 1985-07-22 半導体装置用ボンデイングワイヤ
JP60-161666 1985-07-22
JP60235988A JPS6294969A (ja) 1985-10-22 1985-10-22 半導体装置用ボンデイングワイヤ
JP60-235988 1985-10-22

Publications (2)

Publication Number Publication Date
KR860007728A true KR860007728A (ko) 1986-10-15
KR900001243B1 KR900001243B1 (ko) 1990-03-05

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KR1019860002278A KR900001243B1 (ko) 1985-03-29 1986-03-27 반도체 장치용 본딍 와이어

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US (1) US4726859A (ko)
KR (1) KR900001243B1 (ko)
DE (1) DE3610582A1 (ko)
GB (1) GB2178761B (ko)
SG (1) SG93190G (ko)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2175009B (en) * 1985-03-27 1990-02-07 Mitsubishi Metal Corp Wire for bonding a semiconductor device and process for producing the same
JPH084100B2 (ja) * 1987-02-27 1996-01-17 タツタ電線株式会社 ボンディング線
SG144124A1 (en) * 2006-12-29 2008-07-29 United Test & Assembly Ct Ltd Copper wire bonding on organic solderability preservative materials
JP4709296B2 (ja) * 2009-04-17 2011-06-22 日立電線株式会社 希薄銅合金材料の製造方法
JP5384224B2 (ja) * 2009-06-29 2014-01-08 三洋電機株式会社 太陽電池
WO2012120982A1 (ja) * 2011-03-07 2012-09-13 Jx日鉱日石金属株式会社 α線量が少ない銅又は銅合金及び銅又は銅合金を原料とするボンディングワイヤ
JP6032455B2 (ja) * 2011-09-29 2016-11-30 高周波熱錬株式会社 インターコネクタ用銅線の焼鈍方法
SG190480A1 (en) * 2011-12-01 2013-06-28 Heraeus Materials Tech Gmbh 3n copper wire with trace additions for bonding in microelectronics device
JP6341330B1 (ja) 2017-12-06 2018-06-13 千住金属工業株式会社 Cuボール、OSP処理Cuボール、Cu核ボール、はんだ継手、はんだペースト、フォームはんだ及びCuボールの製造方法

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL219101A (ko) * 1956-10-31 1900-01-01
US4311522A (en) * 1980-04-09 1982-01-19 Amax Inc. Copper alloys with small amounts of manganese and selenium
GB2175009B (en) * 1985-03-27 1990-02-07 Mitsubishi Metal Corp Wire for bonding a semiconductor device and process for producing the same

Also Published As

Publication number Publication date
GB2178761A (en) 1987-02-18
KR900001243B1 (ko) 1990-03-05
GB8607529D0 (en) 1986-04-30
GB2178761B (en) 1989-09-20
US4726859A (en) 1988-02-23
SG93190G (en) 1991-01-18
DE3610582A1 (de) 1986-11-06

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