KR860000448A - 불연속 입자들 층의 균일 분포방법 및 장치 - Google Patents

불연속 입자들 층의 균일 분포방법 및 장치 Download PDF

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KR860000448A
KR860000448A KR1019850004619A KR850004619A KR860000448A KR 860000448 A KR860000448 A KR 860000448A KR 1019850004619 A KR1019850004619 A KR 1019850004619A KR 850004619 A KR850004619 A KR 850004619A KR 860000448 A KR860000448 A KR 860000448A
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웨인 코크 로널드 (외 1)
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원본미기재
더 푸록타 앤드 갬불 캄파니
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    • B—PERFORMING OPERATIONS; TRANSPORTING
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    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B15/00—Layered products comprising a layer of metal
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    • A61F13/00—Bandages or dressings; Absorbent pads
    • A61F13/15—Absorbent pads, e.g. sanitary towels, swabs or tampons for external or internal application to the body; Supporting or fastening means therefor; Tampon applicators
    • A61F13/53—Absorbent pads, e.g. sanitary towels, swabs or tampons for external or internal application to the body; Supporting or fastening means therefor; Tampon applicators characterised by the absorbing medium
    • A61F13/534—Absorbent pads, e.g. sanitary towels, swabs or tampons for external or internal application to the body; Supporting or fastening means therefor; Tampon applicators characterised by the absorbing medium having an inhomogeneous composition through the thickness of the pad
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    • A—HUMAN NECESSITIES
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    • A61F13/00—Bandages or dressings; Absorbent pads
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    • A61F13/53—Absorbent pads, e.g. sanitary towels, swabs or tampons for external or internal application to the body; Supporting or fastening means therefor; Tampon applicators characterised by the absorbing medium
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    • A61F2013/53051—Absorbent pads, e.g. sanitary towels, swabs or tampons for external or internal application to the body; Supporting or fastening means therefor; Tampon applicators characterised by the absorbing medium having superabsorbent materials, i.e. highly absorbent polymer gel materials being only in particular parts or specially arranged
    • A—HUMAN NECESSITIES
    • A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61F—FILTERS IMPLANTABLE INTO BLOOD VESSELS; PROSTHESES; DEVICES PROVIDING PATENCY TO, OR PREVENTING COLLAPSING OF, TUBULAR STRUCTURES OF THE BODY, e.g. STENTS; ORTHOPAEDIC, NURSING OR CONTRACEPTIVE DEVICES; FOMENTATION; TREATMENT OR PROTECTION OF EYES OR EARS; BANDAGES, DRESSINGS OR ABSORBENT PADS; FIRST-AID KITS
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    • A—HUMAN NECESSITIES
    • A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61F—FILTERS IMPLANTABLE INTO BLOOD VESSELS; PROSTHESES; DEVICES PROVIDING PATENCY TO, OR PREVENTING COLLAPSING OF, TUBULAR STRUCTURES OF THE BODY, e.g. STENTS; ORTHOPAEDIC, NURSING OR CONTRACEPTIVE DEVICES; FOMENTATION; TREATMENT OR PROTECTION OF EYES OR EARS; BANDAGES, DRESSINGS OR ABSORBENT PADS; FIRST-AID KITS
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    • A61F13/53—Absorbent pads, e.g. sanitary towels, swabs or tampons for external or internal application to the body; Supporting or fastening means therefor; Tampon applicators characterised by the absorbing medium
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    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
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    • Y10T156/00—Adhesive bonding and miscellaneous chemical manufacture
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    • Y10T156/1002—Methods of surface bonding and/or assembly therefor with permanent bending or reshaping or surface deformation of self sustaining lamina
    • Y10T156/1007—Running or continuous length work
    • Y10T156/1023—Surface deformation only [e.g., embossing]
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
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Abstract

내용 없음

Description

불연속 입자들 층의 균일 분포방법 및 장치
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
제1도는 이 발명이 3차원 양각 장치 및 바람직한 입자분포의 단순화된 사시도. 제2도는 이 발명에 따라 3층 적층 구조물의 층들 사이에 입자들을 실질적으로 균일하게 분포시키기 위한 방법 및 장치의 단순화된 계략도. 제3도는 제1도의 3-3선을 따라 단면을 취하여, 제1도에 일반적으로 나타낸 형태의 2층 정층 구조물을 예시하는 확대 단면도.
도면의 주요부분에 대한 부호의 설명
1:호퍼(hopper), 2:체임버, 3:송곳, 4:배출도관, 6:이덕터(eductor), 5:슬로트, 7:분포도관, 8,9,11,12:곧은부분, 10:입자, 13:노즐출구, 14,15:노즐, 16,17:인입구, 18,19:도관, 20:웨브, 25:분리기, 28:체임버, 29:지지격자, 30:웨브, 31:공전로울, 38,41:돌기, 35,39:양자로울, 60:적층구조물, 51:골, 53:마루, 160:적층구조물.

Claims (33)

  1. 제1속도로 주행하는 이동 다공성 웨브 최상부며느이 소정부분을 따라 불연속 입자들 층을 실질직으로 균일하게 분포시켜서, 상기 입자들이 상기 이동 웨브 최상부면의 소정부분을 100%미만 차지하게 하는 방법으로서, (a) 상기 입자들을 이동 가스흐름에 이월시키고, (b) 상기 이동 다공성 웨브의 주행방향에 실질적으로 평행한 방향으로 상기 월된 입자들을 포함한 가스흐름을 배출하도록 향하고 있고 최상부면에 인접히 위치된 노즐 출구를 가진 도관을 통해 상기 가스흐름을 통과시키고, (c) 상기 이동 다공성 웨브의 주행방향에 수직한 방향으로 상기 도관의 노즐 출구폭을 가로질러 측정해서 볼때 상기 입자들의 실질적으로 균일한 분포를 제공하도록 상기 도관 내측에서 상기 가스흐름에 이월된 상기 입자들을 혼합시키고, (d) 상기 균일하게 분포된 이월 입자들을 포함한 상기 가스 흐름을 제2 속도로 상기 이동 당공성 웨브 최상부면의 상기 소정부분에 인접히 상기 도관으로 부터 배출시키고, (e) 상기 이동 당공성 웨브의 소정부분 폭과 일치하고 상기 도관의 노즐 출구에 가까이 위치한 지역에서 상기 웨브의 최하부면에 인접한 유체압력을 상기 웨브의 최상부면에 인접한 유체압력보다 낮은 수준에서 유지시킴으로써, 상기 가스흐름에 있는 가스의 대부분이 상기 웨브의 최상부면에서 최하부면으로 흡인됨에 따라 상기 배출된 가스흐름에 이월된 균일분포된 입자들이 상기 이동 다공성 웨브의 최상부면 소정부분위로 실질적으로 균일하게 침착되는 단계들로 구성되는 방법.
  2. 제1항에 있어서, 입자들은 이동하는 가스 흐름에 이월되도록실질적으로 균일한 흐름으로 가스 이덕터의 인입구로 이송되는 것을 특징으로 하는 방법.
  3. 제1항 혹은 제2항에 있어서, 가스흐름과 거기에 이월된 입자들은 도관을 통과함에 따라 대략 90°의 방향변화를 겪게되는 것을 특징으로 하는 방법.
  4. 제1항 내지 제3항중 어느 한 항에 있어서, 가스 흐름 및 거기에 이월된 입자들의 속도는 그것들이 도관을 통하는 동안에 증가하는 것을 특징으로 하는 방법.
  5. 제4항에 있어서, 유동방향에 실질적으로 수직한 방향에서 보아 단면 유동면적이 감소하며 속도가 증가되고, 상기 유동면적의 감소는 도관으로의 인입구와 상기 도관의 노즐 출구 사이에서 일어나는 것을 특징으로 하는 방법.
  6. 제1항 내지 제5항중 어는 한항에 있어서, 가스흐름 및 그안에 이월된 입자들의 제2 속도는 도관의 노즐 출구에서 측정할 때 이동 다공성 웨브의 제1 속도보다 더 큰 것을 특징으로 하는 방법.
  7. 제6항에 있어서, 제2속도는 제1속도의 적어도 2배인 것을 특징으로 하는 방법.
  8. 제1항내지 제7항중 어느 한항에 있어서, 이동 다공성 웨브의 최하부면에 인접한 유체압력은 대기압 보다 낮은 것을 특징으로 하는 방법.
  9. 제1항 내지 제8항중 어느 한 항에 있어서, 가스 흐름에 내포된 대부분의 가스가 상기 웨브의 최상부면에서 최하부면으로 흡입된메 따라, 이동 다공성 웨브의 최상부면 소정부분에 침착되지 않은 입자들을 재순환시키는 것을 특징으로 하는 방법.
  10. 제1항 내지 제9항중 어느 한 항에 있어서, 상기 입자들이 도관 내측에 있는 동안 가스흐름에 이월된 입자들은 상기 입자들이 상기 도관의 벽들에 부딪힘에 따라 운반되는 것을 특징으로 하는 방법.
  11. 제1항 내지 제10항중 어느 한 항에 있어서, 이동 다공성 웨브는 3차원 흡수성 배트를 포함하고, 상기 이동 다공성 웨브 최상부면의 소정부분상에 침착된 입자들은 상기 웨브의 격자에 얽히게 되는 것을 특징으로 하는 방법.
  12. 제1항 내지 제11항중 어느 한 항에 있어서, 이동 다공성 웨브가 종이 티슈플라이를 포함하는 것을 특징으로하는 방법.
  13. 제1항 내지 제12항중 어느 한 항에 있어서, 이동 다공성 웨브가 비제직 물질을 포함하는 것을 특징으로 하는 방법.
  14. 제1항 내지 제13항중 어느 한 항에 있어서, 입자들이 제1이동 다공성 웨브 최상부면의 소정부분상에 실질적으로 균일하게 침착된 후에 제1 이동 다공성 웨브 상에 제2 웨브를 중첩시키는 것을 특징으로 하는 방법.
  15. 제14항에 있어서, 제1 및 제2 웨브들을 3차원적으로 양각하여 그것들을 서로에 대해 고정하고 그것들 사이에 균일하게 분포된 입자들의 위치를 고착시키는 것을 특징으로 하는 방법
  16. 제1항 내지 제15항중 어느 한 항에 있어서, 입자들으 균일한 흐름을 이동 가스흐름안에 이송하는 것을 특징으로 하는 방법.
  17. 제16항에 있어서, 균일한 흐름이 회전 송곳에 의해 이루어지는것을 특징으로 하는 방법.
  18. 제1항 내지 제17항중 어느 한항에 있어서, 노즐 출구의 폭은 입자들이 침착되는 상기 이동 다공성웨브 최상부면의 소정부분의 폭에 상당하고 상기 웨브의 소정부분과 수직으로 정렬하는 것을 특징으로 하는 방법.
  19. 제1항 내지 제18항중 어느 한 항에 있어서, 입자들은 초호흡수성 중합체로 되어있고 이동 다공성웨브의 기공들보다 크기에 있어서 평균적으로 더 큰것을 특징으로 하는 방법.
  20. 제1항내지 제 19항중 어느 한 항에 있어서, 가스흐름 및 고안에 이월된 입자들이 상기 도관을 통과함에 따라 도간을 진동시키는 것을 특징으로 하는 방법.
  21. 제1항 내지 제20항중 어느 한항에 있어서, 입자들은 이동 다공성웨브의소정부분위로 실질적으로 균일하게 분포되어서 상기 웨브 최상부면의 소정부분을 50%미만 차지하게 되는 것을 특징으로 하는 방법.
  22. 제1항 내지 제21항중 어느 한항에 있어서, 이동 당공성 웨브의 소정부분 폭이 상기 웨브의 전폭을 포함하는 것을 특징으로 하는 방법.
  23. 제1 속도 주행하는 이동 다공성 웨브 최상부면의 소정부분을 따라 불연속 입자들 층을 실질적으로 균일하게 분포시켜서 상기 입자들이 상기 이동 웨브 최상부면의 상기 소정부분을 100%미만 차지하게 하는 장치로서, (a) 상기 입자들을 실질적으로 균일한 흐름으로 가스 이덕터의 인입구로 이송하는 수단,(b) 이동 가스 흐름에 상기 입자들을 이월시키는 수단, (c) 상기 이월된 입자들을 포함한 상기 가스흐름을 상기 이동웨브의 주행방향에 실질적으로 평행한 방향으로 배출하도록 향하고 상기 이동 웨브의 최상부면에 인접히 위치된 노즐 출구를 통해 상기 가스흐름을 통과시키는 도관수단, (d) 상기 이도 다공성 웨브의 주행 방향에 수직한 방향으로 상기 도관의 노즐 출구폭을 가로질러 측정해서 볼 때, 상기 입자들의 실질적으로 균일한 분토를 제공하도록 상기 가스흐름에 이월된 입자들을 상기 도관 내측에서 혼합시키는 수단, (e) 상기 제1 속도보다 더 큰 제2 속도로 상기 균일하게 분포된 이월 입자들을 포함하는 상기 가스흐름을, 상기 이동 다공성 웨브 최상부면의 상기 소정부분에 인접히 상기 도관으로부터 배출시키도록, 상기도관 수단의 배출단부에 있는 노늘 출구수단, 및 (f) 상기 이동 다공성 웨브의 소정부분 폭과 일치하고 상기 도관의 노즐 출구에 가까이 위치한 지역에서 상기 이동 웨브의 최하부면에 입접한 유체압력을 상기이동 웨브의 최상부면에 인접한 유체압력보다 낮은 수중에 유지시킴으로써, 상기 가스흐름에 있는 대부분의 가스가 상기 웨브의 최상부면에서 최하부면으로 흡인됨에 따라, 상기 배출된 가스 흐름에 이월된 균일분포 입자들이 상기 이동 다공성 웨브 최상부면의 상기 소정부분 위에 실질적으로 균일하게 침착되게 하는 수단을 특징으로 하는 장치.
  24. 제23항에 있어서, 도관 수관 수단은 가스흐름 및 그안에 이월된 입자들이 상기 도간을 통과함에 따라 거의 90°의 방향전환을 겪게하는 것을 특징으로 하는장치.
  25. 제23항 혹은 제24항에 있어서, 도관수단은 그 인입단부와 그 노즐 출구 단부 사이에서 유동방향에 실질적으로 수직한 방향에서 보아 단면 유동면적의 감소를 나타내는 것을 특징으로 하는 장치.
  26. 제23항 내지 제24항에 어느 한 항에 있어서, 대기압보다 낮은 수준으로 이동 다공성 웨브의 최하부면에 인접한 유체압력을 유지시키는 수단을 특징으로 하는 장치.
  27. 제23항 내지 제26항중 어느 한 항에 있어서, 가스 흐름을 포함된 대부분의 가스가 상기 이동 다공성 웨브의 최상부면에서 최하부면으로 흡인됨에 따라, 상기 웨브 최상부면의 소정부분 위에 침니되지 않은 입자들을 재순환시키는 수단을 특징으로 하는 장치.
  28. 제23항 내지 제27항중 어느 한 항에 있어서, 입자들이 제1 이동 다공성 웨브 최상부면의 소정부분 위에 실질적으로 균일하게 분포된 후에 제1 이동 다공성 웨브위에 다른 웨브를 중첩시키기 위한 수단을 특징으로 하는 장치.
  29. 제 28항에 있어서, 제1 및 제2 웨브들을 3차원적으로 양각하여 그 웨브들을 서로 고정시키고 그 뭬브들 사이에 균일하게 분포된 입자들의 위치를 고착시키기 위한 수단을 특징으로 하는 장치.
  30. 제 23항 내지 제 29항중 어느 한 항에 있어서, 입자들이 균일한 흐름을 공급하는 수단이 회전 송곳을 포함하는 것을 특징으로 하는 장치.
  31. 제23항 내지 제30항중 어느 한 항에 있어서, 노즐 출구의 폭은 입자들이 침착되는 이동 다공성 웨브 최상부면의 소정부분 폭에 상당하고, 상기 웨브의 소정부분과 수직으로 정렬하는 것을 특징으로 하는 장치.
  32. 제23항 내지 제31항중 어느 한 항에 있어서, 가스흐름 및 그 안에 이월된 입자들이 상기 도관을 통과함에 따라 도관을 진동시키기 위한 수단을 특징으로 하는 장치.
  33. ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019850004619A 1984-06-29 1985-06-28 이산 입자의 층의 균일 분포방법 및 장치 KR940004020B1 (ko)

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US06/625,932 US4551191A (en) 1984-06-29 1984-06-29 Method for uniformly distributing discrete particles on a moving porous web
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AU4429485A (en) 1987-01-08
ES8607763A1 (es) 1986-06-01
ES544678A0 (es) 1986-06-01
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EP0168196B1 (en) 1989-05-17
US4551191A (en) 1985-11-05
CA1253752A (en) 1989-05-09
ES8607762A1 (es) 1986-06-01
JPH0784692B2 (ja) 1995-09-13
ES544690A0 (es) 1986-06-01
JPS6192859A (ja) 1986-05-10
DE3570193D1 (en) 1989-06-22
EP0168196A1 (en) 1986-01-15
AU566858B2 (en) 1987-10-29

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