KR840006419A - 감광성 전사물질 및 감광성 내식막의 제조방법 - Google Patents
감광성 전사물질 및 감광성 내식막의 제조방법 Download PDFInfo
- Publication number
- KR840006419A KR840006419A KR1019830004643A KR830004643A KR840006419A KR 840006419 A KR840006419 A KR 840006419A KR 1019830004643 A KR1019830004643 A KR 1019830004643A KR 830004643 A KR830004643 A KR 830004643A KR 840006419 A KR840006419 A KR 840006419A
- Authority
- KR
- South Korea
- Prior art keywords
- film
- photosensitive
- transfer material
- auxiliary
- photoresist
- Prior art date
Links
- 239000000463 material Substances 0.000 title claims 11
- 229920002120 photoresistant polymer Polymers 0.000 title claims 10
- 238000004519 manufacturing process Methods 0.000 title claims 3
- 238000000034 method Methods 0.000 title 1
- 239000011229 interlayer Substances 0.000 claims 6
- 229920001169 thermoplastic Polymers 0.000 claims 3
- 239000004416 thermosoftening plastic Substances 0.000 claims 3
- 239000002671 adjuvant Substances 0.000 claims 2
- 238000010030 laminating Methods 0.000 claims 1
- 230000003746 surface roughness Effects 0.000 claims 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C1/00—Photosensitive materials
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/115—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having supports or layers with means for obtaining a screen effect or for obtaining better contact in vacuum printing
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/34—Imagewise removal by selective transfer, e.g. peeling away
- G03F7/346—Imagewise removal by selective transfer, e.g. peeling away using photosensitive materials other than non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Architecture (AREA)
- Structural Engineering (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Materials For Photolithography (AREA)
- Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
- Drying Of Semiconductors (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Semiconductor Memories (AREA)
- Manufacturing Of Printed Circuit Boards (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Photoreceptors In Electrophotography (AREA)
Abstract
내용 없음
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
Claims (11)
- 감광막에 접하고, 거친 표면을 가진 일시 가요성 보조필름 및 열가소성 감광막으로 구성되는 감광성 전사물질.
- 제 1항에 있어서, 보조필름과 떨어져 있는 감광막의 표면이 막보다 보조필름에 더 점착성 있는 표면 필름으로 덮힌 감광성 전사물질.
- 제 1항에 있어서, 보조필름이 투명한 감광성 전사물질.
- 제 1항에 있어서, 감광막과 보조필름의 사이에 있는 얇은 중간막이 보조필름보다 감광막에 훨씬 견고하게 점착하고, 150℃까지 가열하여도 점착되지 않으며, 감광막에 사용되는 현상액에 용해되도록 제조한 감광성 전사물질.
- 제 1항에 있어서, 보조필름의 평균 표면조도가 0.5㎛ 내지 5㎛ 범위인 감광성 전사물질.
- 제 4항에 있어서, 중간막의 두께가 1 내지 5㎛의 범위인 감광성 전사물질.
- 제 4항에 있어서, 중간막이 수용성인 감광성 전사물질.
- 제 4항에 있어서, 중간막이 감광막을 구성하는 적어도 한 조성물의 최소량으로 구성되는 감광성 전사 물질.
- 제 1항에 있어서, 감광성 막이 광중합성막으로 구성되는 감광성 전사물질.
- 가요성 보조필름의 한쪽 면에 열가소성 감광막을 다른쪽 면에 영구 보조제를 적층시키며, 투명한 보조필름을 사용하고 감광막이 있는 표면은 거칠며, 감광막은 보조필름을 박리시키기 전에 상에 노풀시켜 보조필름을 통해서 감광하고 가요성 보조필름을 박리한 후 상을 현상하는 내식막의 제조방법.
- 중간막과 감광막 위에 있는 거친 표면을 가진 일시 가요성 보조필름, 150℃까지 가열해도 점착하지 않는 얇은 중간막 및 보조필름보다 감광막에 더 견고하게 점착하고 감광막에 사용하는 현상액에 용해하며, 감광막이 없는 표면에 영구 보조제로 전사물질를 적층시키고, 감광막을 상에 노출시켜서 상을 현상하는 중간막, 중간막의 위에 피막된 열가소성 감광막으로 구성되는 전사물질을 사용하는 내식막의 제조방법.※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DEP3236560.8 | 1982-10-02 | ||
DEP3236560,8 | 1982-10-02 | ||
DE19823236560 DE3236560A1 (de) | 1982-10-02 | 1982-10-02 | Lichtempfindliches schichtuebertragungsmaterial und verfahren zur herstellung einer photoresistschablone |
Publications (2)
Publication Number | Publication Date |
---|---|
KR840006419A true KR840006419A (ko) | 1984-11-29 |
KR910004874B1 KR910004874B1 (ko) | 1991-07-15 |
Family
ID=6174792
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019830004643A KR910004874B1 (ko) | 1982-10-02 | 1983-09-30 | 감광성 전이물질 및 감광성 내식막 스텐슬의 제조방법 |
Country Status (11)
Country | Link |
---|---|
US (1) | US4559292A (ko) |
EP (1) | EP0105421B1 (ko) |
JP (1) | JPH0612413B2 (ko) |
KR (1) | KR910004874B1 (ko) |
AT (1) | ATE35060T1 (ko) |
AU (1) | AU558773B2 (ko) |
CA (1) | CA1242100A (ko) |
DE (2) | DE3236560A1 (ko) |
ES (1) | ES526181A0 (ko) |
FI (1) | FI74156C (ko) |
IL (1) | IL69876A (ko) |
Families Citing this family (29)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59181342A (ja) * | 1983-03-31 | 1984-10-15 | Nitto Electric Ind Co Ltd | 剥離現像方法 |
US4587199A (en) * | 1983-07-11 | 1986-05-06 | E. I. Du Pont De Nemours And Company | Controlled roughening of a photosensitive composition |
JPS61169829A (ja) * | 1985-01-23 | 1986-07-31 | Fuji Photo Film Co Ltd | 光重合性組成物 |
US4719169A (en) * | 1986-04-18 | 1988-01-12 | Hoechst Celanese Corporation | Protective coating for images |
JPH0623845B2 (ja) * | 1986-06-23 | 1994-03-30 | 富士写真フイルム株式会社 | 感光性受像シート材料及び画像転写方法 |
JPH07101309B2 (ja) * | 1987-05-29 | 1995-11-01 | 富士写真フイルム株式会社 | 感光性転写材料 |
US5213945A (en) * | 1988-02-26 | 1993-05-25 | Morton International, Inc. | Dry film photoresist for forming a conformable mask and method of application to a printed circuit board or the like |
JPH07107603B2 (ja) * | 1988-10-07 | 1995-11-15 | 曙フォトマスク株式会社 | スクリーン印刷用スクリーン及びその製造方法 |
JPH0345548U (ko) * | 1989-09-08 | 1991-04-26 | ||
DE3931467A1 (de) * | 1989-09-21 | 1991-04-04 | Hoechst Ag | Durch strahlung polymerisierbares gemisch und verfahren zur herstellung einer loetstopmaske |
JP2613990B2 (ja) * | 1990-08-01 | 1997-05-28 | 矢崎総業株式会社 | 分岐回路構成体 |
EP0471483A1 (en) * | 1990-08-03 | 1992-02-19 | Canon Kabushiki Kaisha | Surface reforming method, process for production of printing plate, printing plate and printing process |
JPH0580503A (ja) * | 1991-06-25 | 1993-04-02 | Fuji Photo Film Co Ltd | 感光性転写材料及び画像形成方法 |
DE4243912A1 (de) * | 1992-04-09 | 1993-10-14 | Fuji Photo Film Co Ltd | Lichtempfindliches Übertragungsmaterial und Bilderzeugungs-Verfahren unter Verwendung desselben |
US5391458A (en) * | 1992-12-18 | 1995-02-21 | Morton International, Inc. | Photoresist processing for improved resolution having a bake step to remove the tackiness of the laminated photosensitive layer prior to contact imagewise exposure |
TW475098B (en) * | 1995-10-27 | 2002-02-01 | Tokyo Ohka Kogyo Co Ltd | Photosensitive resin composition and photosensitive resin laminated film containing the same |
JP3592827B2 (ja) * | 1996-03-06 | 2004-11-24 | 富士写真フイルム株式会社 | 感光性エレメント及び多層配線基板の製造方法 |
US5993945A (en) * | 1996-05-30 | 1999-11-30 | International Business Machines Corporation | Process for high resolution photoimageable dielectric |
US5795647A (en) * | 1996-09-11 | 1998-08-18 | Aluminum Company Of America | Printing plate having improved wear resistance |
US6022670A (en) * | 1997-05-08 | 2000-02-08 | International Business Machines Corporation | Process for high resolution photoimageable dielectric |
US6399270B1 (en) * | 1998-12-04 | 2002-06-04 | Konica Corporation | Support for printing plate and printing plate |
CA2477779A1 (en) * | 2002-03-14 | 2003-09-25 | E.I. Du Pont De Nemours And Company | Photosensitive element for use as flexographic printing plate |
US20080213570A1 (en) * | 2007-02-16 | 2008-09-04 | Jennifer Hoyt Lalli | Self-assembled conductive deformable films |
US20040234886A1 (en) * | 2003-03-12 | 2004-11-25 | Rudolph Michael Lee | Photosensitive element for use as flexographic printing plate |
JP2015066853A (ja) * | 2013-09-30 | 2015-04-13 | 富士フイルム株式会社 | レーザー彫刻型フレキソ印刷版原版及びその製造方法、並びに、フレキソ印刷版の製版方法 |
TWI592760B (zh) * | 2014-12-30 | 2017-07-21 | 羅門哈斯電子材料韓國有限公司 | 與經外塗佈之光致抗蝕劑一起使用之塗層組合物 |
JP2018014446A (ja) * | 2016-07-22 | 2018-01-25 | イビデン株式会社 | ソルダーレジスト及びプリント配線板 |
CN106498616B (zh) * | 2016-12-26 | 2018-09-21 | 浙江海森纺机科技有限公司 | 手套机机头联动系统及功能驱动夹 |
US20220066322A1 (en) * | 2020-08-26 | 2022-03-03 | Tamura Corporation | Photosensitive dry film, and printed wiring board with photosensitive dry film |
Family Cites Families (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US1591304A (en) * | 1925-07-16 | 1926-07-06 | Walter W Giveans | Stripping films |
US3010390A (en) * | 1954-06-29 | 1961-11-28 | Buskes Willem Marie | Planographic printing plates |
FR1310056A (ko) * | 1960-10-19 | 1963-03-04 | ||
DE1522515C2 (de) | 1965-08-03 | 1980-10-09 | Du Pont | Verfahren zur Herstellung gedruckter Schaltungen |
DE2106574A1 (de) * | 1970-03-03 | 1971-09-23 | Shpley Co Inc | Lichtempfindliches Laminat |
US4193797A (en) | 1971-03-22 | 1980-03-18 | E. I. Dupont De Nemours And Company | Method for making photoresists |
DE2123702C3 (de) * | 1971-05-13 | 1988-05-26 | Hoechst Ag, 6230 Frankfurt | Verfahren zur Herstellung eines Reliefbildes |
JPS5236698B2 (ko) * | 1973-01-29 | 1977-09-17 | ||
US3891443A (en) * | 1973-02-01 | 1975-06-24 | Polychrome Corp | Mat finish photosensitive relief plates |
US3909328A (en) | 1973-04-10 | 1975-09-30 | Du Pont | Decoration of substrates by thermal transfer of photosensitive, thermoplastic, dye-imaged film |
JPS5019961A (ko) * | 1973-06-29 | 1975-03-03 | ||
CH621416A5 (ko) | 1975-03-27 | 1981-01-30 | Hoechst Ag | |
DE2718254C3 (de) | 1977-04-25 | 1980-04-10 | Hoechst Ag, 6000 Frankfurt | Strahlungsempfindliche Kopiermasse |
US4278752A (en) | 1978-09-07 | 1981-07-14 | E. I. Du Pont De Nemours And Company | Flame retardant radiation sensitive element |
US4232108A (en) * | 1979-05-01 | 1980-11-04 | E. I. Du Pont De Nemours And Company | Marking transfer sheets |
JPS5642629A (en) * | 1979-09-17 | 1981-04-20 | Diafoil Co Ltd | Biaxially-stretched polyester film for photograph |
DE3036694A1 (de) | 1980-09-29 | 1982-06-03 | Hoechst Ag, 6000 Frankfurt | Gummielastische, ethylenisch ungesaettigte polyurethane und dieselben enthaltendes durch strahlung polymerisierbares gemisch |
-
1982
- 1982-10-02 DE DE19823236560 patent/DE3236560A1/de not_active Withdrawn
-
1983
- 1983-09-14 JP JP58168533A patent/JPH0612413B2/ja not_active Expired - Lifetime
- 1983-09-22 AT AT83109447T patent/ATE35060T1/de not_active IP Right Cessation
- 1983-09-22 DE DE8383109447T patent/DE3377022D1/de not_active Expired
- 1983-09-22 EP EP83109447A patent/EP0105421B1/de not_active Expired
- 1983-09-28 CA CA000437782A patent/CA1242100A/en not_active Expired
- 1983-09-29 FI FI833517A patent/FI74156C/fi not_active IP Right Cessation
- 1983-09-29 US US06/537,000 patent/US4559292A/en not_active Expired - Lifetime
- 1983-09-30 KR KR1019830004643A patent/KR910004874B1/ko not_active IP Right Cessation
- 1983-09-30 IL IL69876A patent/IL69876A/xx not_active IP Right Cessation
- 1983-09-30 ES ES526181A patent/ES526181A0/es active Granted
- 1983-10-04 AU AU19862/83A patent/AU558773B2/en not_active Ceased
Also Published As
Publication number | Publication date |
---|---|
ES8501539A1 (es) | 1984-11-16 |
EP0105421A1 (de) | 1984-04-18 |
IL69876A (en) | 1987-02-27 |
EP0105421B1 (de) | 1988-06-08 |
FI74156B (fi) | 1987-08-31 |
IL69876A0 (en) | 1983-12-30 |
AU1986283A (en) | 1984-04-05 |
JPS5975245A (ja) | 1984-04-27 |
JPH0612413B2 (ja) | 1994-02-16 |
ES526181A0 (es) | 1984-11-16 |
DE3236560A1 (de) | 1984-04-05 |
FI833517A0 (fi) | 1983-09-29 |
US4559292A (en) | 1985-12-17 |
FI74156C (fi) | 1987-12-10 |
DE3377022D1 (en) | 1988-07-14 |
CA1242100A (en) | 1988-09-20 |
KR910004874B1 (ko) | 1991-07-15 |
FI833517A (fi) | 1984-04-03 |
ATE35060T1 (de) | 1988-06-15 |
AU558773B2 (en) | 1987-02-05 |
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