KR840006419A - 감광성 전사물질 및 감광성 내식막의 제조방법 - Google Patents

감광성 전사물질 및 감광성 내식막의 제조방법 Download PDF

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Publication number
KR840006419A
KR840006419A KR1019830004643A KR830004643A KR840006419A KR 840006419 A KR840006419 A KR 840006419A KR 1019830004643 A KR1019830004643 A KR 1019830004643A KR 830004643 A KR830004643 A KR 830004643A KR 840006419 A KR840006419 A KR 840006419A
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South Korea
Prior art keywords
film
photosensitive
transfer material
auxiliary
photoresist
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KR1019830004643A
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English (en)
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KR910004874B1 (ko
Inventor
가이슬러 울리히
Original Assignee
닥터. 벼틀라우퍼, 닥터. 오일러
훽스트 아크티엔 게젤샤프트
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Application filed by 닥터. 벼틀라우퍼, 닥터. 오일러, 훽스트 아크티엔 게젤샤프트 filed Critical 닥터. 벼틀라우퍼, 닥터. 오일러
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/115—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having supports or layers with means for obtaining a screen effect or for obtaining better contact in vacuum printing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/34—Imagewise removal by selective transfer, e.g. peeling away
    • G03F7/346—Imagewise removal by selective transfer, e.g. peeling away using photosensitive materials other than non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Materials For Photolithography (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Drying Of Semiconductors (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Semiconductor Memories (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Photoreceptors In Electrophotography (AREA)

Abstract

내용 없음

Description

감광성 전사물질 및 감광성 내식막의 제조방법
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음

Claims (11)

  1. 감광막에 접하고, 거친 표면을 가진 일시 가요성 보조필름 및 열가소성 감광막으로 구성되는 감광성 전사물질.
  2. 제 1항에 있어서, 보조필름과 떨어져 있는 감광막의 표면이 막보다 보조필름에 더 점착성 있는 표면 필름으로 덮힌 감광성 전사물질.
  3. 제 1항에 있어서, 보조필름이 투명한 감광성 전사물질.
  4. 제 1항에 있어서, 감광막과 보조필름의 사이에 있는 얇은 중간막이 보조필름보다 감광막에 훨씬 견고하게 점착하고, 150℃까지 가열하여도 점착되지 않으며, 감광막에 사용되는 현상액에 용해되도록 제조한 감광성 전사물질.
  5. 제 1항에 있어서, 보조필름의 평균 표면조도가 0.5㎛ 내지 5㎛ 범위인 감광성 전사물질.
  6. 제 4항에 있어서, 중간막의 두께가 1 내지 5㎛의 범위인 감광성 전사물질.
  7. 제 4항에 있어서, 중간막이 수용성인 감광성 전사물질.
  8. 제 4항에 있어서, 중간막이 감광막을 구성하는 적어도 한 조성물의 최소량으로 구성되는 감광성 전사 물질.
  9. 제 1항에 있어서, 감광성 막이 광중합성막으로 구성되는 감광성 전사물질.
  10. 가요성 보조필름의 한쪽 면에 열가소성 감광막을 다른쪽 면에 영구 보조제를 적층시키며, 투명한 보조필름을 사용하고 감광막이 있는 표면은 거칠며, 감광막은 보조필름을 박리시키기 전에 상에 노풀시켜 보조필름을 통해서 감광하고 가요성 보조필름을 박리한 후 상을 현상하는 내식막의 제조방법.
  11. 중간막과 감광막 위에 있는 거친 표면을 가진 일시 가요성 보조필름, 150℃까지 가열해도 점착하지 않는 얇은 중간막 및 보조필름보다 감광막에 더 견고하게 점착하고 감광막에 사용하는 현상액에 용해하며, 감광막이 없는 표면에 영구 보조제로 전사물질를 적층시키고, 감광막을 상에 노출시켜서 상을 현상하는 중간막, 중간막의 위에 피막된 열가소성 감광막으로 구성되는 전사물질을 사용하는 내식막의 제조방법.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019830004643A 1982-10-02 1983-09-30 감광성 전이물질 및 감광성 내식막 스텐슬의 제조방법 KR910004874B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DEP3236560.8 1982-10-02
DEP3236560,8 1982-10-02
DE19823236560 DE3236560A1 (de) 1982-10-02 1982-10-02 Lichtempfindliches schichtuebertragungsmaterial und verfahren zur herstellung einer photoresistschablone

Publications (2)

Publication Number Publication Date
KR840006419A true KR840006419A (ko) 1984-11-29
KR910004874B1 KR910004874B1 (ko) 1991-07-15

Family

ID=6174792

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019830004643A KR910004874B1 (ko) 1982-10-02 1983-09-30 감광성 전이물질 및 감광성 내식막 스텐슬의 제조방법

Country Status (11)

Country Link
US (1) US4559292A (ko)
EP (1) EP0105421B1 (ko)
JP (1) JPH0612413B2 (ko)
KR (1) KR910004874B1 (ko)
AT (1) ATE35060T1 (ko)
AU (1) AU558773B2 (ko)
CA (1) CA1242100A (ko)
DE (2) DE3236560A1 (ko)
ES (1) ES526181A0 (ko)
FI (1) FI74156C (ko)
IL (1) IL69876A (ko)

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JPS59181342A (ja) * 1983-03-31 1984-10-15 Nitto Electric Ind Co Ltd 剥離現像方法
US4587199A (en) * 1983-07-11 1986-05-06 E. I. Du Pont De Nemours And Company Controlled roughening of a photosensitive composition
JPS61169829A (ja) * 1985-01-23 1986-07-31 Fuji Photo Film Co Ltd 光重合性組成物
US4719169A (en) * 1986-04-18 1988-01-12 Hoechst Celanese Corporation Protective coating for images
JPH0623845B2 (ja) * 1986-06-23 1994-03-30 富士写真フイルム株式会社 感光性受像シート材料及び画像転写方法
JPH07101309B2 (ja) * 1987-05-29 1995-11-01 富士写真フイルム株式会社 感光性転写材料
US5213945A (en) * 1988-02-26 1993-05-25 Morton International, Inc. Dry film photoresist for forming a conformable mask and method of application to a printed circuit board or the like
JPH07107603B2 (ja) * 1988-10-07 1995-11-15 曙フォトマスク株式会社 スクリーン印刷用スクリーン及びその製造方法
JPH0345548U (ko) * 1989-09-08 1991-04-26
DE3931467A1 (de) * 1989-09-21 1991-04-04 Hoechst Ag Durch strahlung polymerisierbares gemisch und verfahren zur herstellung einer loetstopmaske
JP2613990B2 (ja) * 1990-08-01 1997-05-28 矢崎総業株式会社 分岐回路構成体
EP0471483A1 (en) * 1990-08-03 1992-02-19 Canon Kabushiki Kaisha Surface reforming method, process for production of printing plate, printing plate and printing process
JPH0580503A (ja) * 1991-06-25 1993-04-02 Fuji Photo Film Co Ltd 感光性転写材料及び画像形成方法
DE4243912A1 (de) * 1992-04-09 1993-10-14 Fuji Photo Film Co Ltd Lichtempfindliches Übertragungsmaterial und Bilderzeugungs-Verfahren unter Verwendung desselben
US5391458A (en) * 1992-12-18 1995-02-21 Morton International, Inc. Photoresist processing for improved resolution having a bake step to remove the tackiness of the laminated photosensitive layer prior to contact imagewise exposure
TW475098B (en) * 1995-10-27 2002-02-01 Tokyo Ohka Kogyo Co Ltd Photosensitive resin composition and photosensitive resin laminated film containing the same
JP3592827B2 (ja) * 1996-03-06 2004-11-24 富士写真フイルム株式会社 感光性エレメント及び多層配線基板の製造方法
US5993945A (en) * 1996-05-30 1999-11-30 International Business Machines Corporation Process for high resolution photoimageable dielectric
US5795647A (en) * 1996-09-11 1998-08-18 Aluminum Company Of America Printing plate having improved wear resistance
US6022670A (en) * 1997-05-08 2000-02-08 International Business Machines Corporation Process for high resolution photoimageable dielectric
US6399270B1 (en) * 1998-12-04 2002-06-04 Konica Corporation Support for printing plate and printing plate
CA2477779A1 (en) * 2002-03-14 2003-09-25 E.I. Du Pont De Nemours And Company Photosensitive element for use as flexographic printing plate
US20080213570A1 (en) * 2007-02-16 2008-09-04 Jennifer Hoyt Lalli Self-assembled conductive deformable films
US20040234886A1 (en) * 2003-03-12 2004-11-25 Rudolph Michael Lee Photosensitive element for use as flexographic printing plate
JP2015066853A (ja) * 2013-09-30 2015-04-13 富士フイルム株式会社 レーザー彫刻型フレキソ印刷版原版及びその製造方法、並びに、フレキソ印刷版の製版方法
TWI592760B (zh) * 2014-12-30 2017-07-21 羅門哈斯電子材料韓國有限公司 與經外塗佈之光致抗蝕劑一起使用之塗層組合物
JP2018014446A (ja) * 2016-07-22 2018-01-25 イビデン株式会社 ソルダーレジスト及びプリント配線板
CN106498616B (zh) * 2016-12-26 2018-09-21 浙江海森纺机科技有限公司 手套机机头联动系统及功能驱动夹
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Also Published As

Publication number Publication date
ES8501539A1 (es) 1984-11-16
EP0105421A1 (de) 1984-04-18
IL69876A (en) 1987-02-27
EP0105421B1 (de) 1988-06-08
FI74156B (fi) 1987-08-31
IL69876A0 (en) 1983-12-30
AU1986283A (en) 1984-04-05
JPS5975245A (ja) 1984-04-27
JPH0612413B2 (ja) 1994-02-16
ES526181A0 (es) 1984-11-16
DE3236560A1 (de) 1984-04-05
FI833517A0 (fi) 1983-09-29
US4559292A (en) 1985-12-17
FI74156C (fi) 1987-12-10
DE3377022D1 (en) 1988-07-14
CA1242100A (en) 1988-09-20
KR910004874B1 (ko) 1991-07-15
FI833517A (fi) 1984-04-03
ATE35060T1 (de) 1988-06-15
AU558773B2 (en) 1987-02-05

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