ES8501539A1 - Un material de transferencia fotosensible - Google Patents
Un material de transferencia fotosensibleInfo
- Publication number
- ES8501539A1 ES8501539A1 ES526181A ES526181A ES8501539A1 ES 8501539 A1 ES8501539 A1 ES 8501539A1 ES 526181 A ES526181 A ES 526181A ES 526181 A ES526181 A ES 526181A ES 8501539 A1 ES8501539 A1 ES 8501539A1
- Authority
- ES
- Spain
- Prior art keywords
- photosensitive
- layer
- photosensitive layer
- support film
- obtaining
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C1/00—Photosensitive materials
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/115—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having supports or layers with means for obtaining a screen effect or for obtaining better contact in vacuum printing
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/34—Imagewise removal by selective transfer, e.g. peeling away
- G03F7/346—Imagewise removal by selective transfer, e.g. peeling away using photosensitive materials other than non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds
Abstract
PROCEDIMIENTO PARA FABRICAR UN ESTARCIDO FOTORRESISTENTE.COMPRENDE: A) LAMINAR UNA CAPA FOTOSENSIBLE TERMOPLASTICA APLICADA A UNA PELICULA SOPORTE FLEXIBLE, CON SU SUPERFICIE LIBRE A UN SOPORTE PERMANENTE; B) EXPONER LA CAPA FOTOSENSIBLE EN IMAGEN Y C) REVELARLA EN UNA IMAGEN EN RELIEVE DESPUES DE SEPARAR LA PELICULA SOPORTE FLEXIBLE. SE UTILIZA UNA PELICULA SOPORTE TRANSPARENTE, EN LA QUE LA SUPERFICIE QUE LLEVA LA CAPA FOTOSENSIBLE ES DE ASPEREZA SUPERFICIAL ENTRE 0,5 A 10 BMBM Y SE EXPONE LA CAPA FOTOSENSIBLE A TRAVES DE LA PELICULA SOPORTE, ANTES DE SEPARAR LA PELICULA SOPORTE.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE19823236560 DE3236560A1 (de) | 1982-10-02 | 1982-10-02 | Lichtempfindliches schichtuebertragungsmaterial und verfahren zur herstellung einer photoresistschablone |
Publications (2)
Publication Number | Publication Date |
---|---|
ES526181A0 ES526181A0 (es) | 1984-11-16 |
ES8501539A1 true ES8501539A1 (es) | 1984-11-16 |
Family
ID=6174792
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
ES526181A Expired ES8501539A1 (es) | 1982-10-02 | 1983-09-30 | Un material de transferencia fotosensible |
Country Status (11)
Country | Link |
---|---|
US (1) | US4559292A (es) |
EP (1) | EP0105421B1 (es) |
JP (1) | JPH0612413B2 (es) |
KR (1) | KR910004874B1 (es) |
AT (1) | ATE35060T1 (es) |
AU (1) | AU558773B2 (es) |
CA (1) | CA1242100A (es) |
DE (2) | DE3236560A1 (es) |
ES (1) | ES8501539A1 (es) |
FI (1) | FI74156C (es) |
IL (1) | IL69876A (es) |
Families Citing this family (29)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59181342A (ja) * | 1983-03-31 | 1984-10-15 | Nitto Electric Ind Co Ltd | 剥離現像方法 |
US4587199A (en) * | 1983-07-11 | 1986-05-06 | E. I. Du Pont De Nemours And Company | Controlled roughening of a photosensitive composition |
JPS61169829A (ja) * | 1985-01-23 | 1986-07-31 | Fuji Photo Film Co Ltd | 光重合性組成物 |
US4719169A (en) * | 1986-04-18 | 1988-01-12 | Hoechst Celanese Corporation | Protective coating for images |
JPH0623845B2 (ja) * | 1986-06-23 | 1994-03-30 | 富士写真フイルム株式会社 | 感光性受像シート材料及び画像転写方法 |
JPH07101309B2 (ja) * | 1987-05-29 | 1995-11-01 | 富士写真フイルム株式会社 | 感光性転写材料 |
US5213945A (en) * | 1988-02-26 | 1993-05-25 | Morton International, Inc. | Dry film photoresist for forming a conformable mask and method of application to a printed circuit board or the like |
JPH07107603B2 (ja) * | 1988-10-07 | 1995-11-15 | 曙フォトマスク株式会社 | スクリーン印刷用スクリーン及びその製造方法 |
JPH0345548U (es) * | 1989-09-08 | 1991-04-26 | ||
DE3931467A1 (de) * | 1989-09-21 | 1991-04-04 | Hoechst Ag | Durch strahlung polymerisierbares gemisch und verfahren zur herstellung einer loetstopmaske |
JP2613990B2 (ja) * | 1990-08-01 | 1997-05-28 | 矢崎総業株式会社 | 分岐回路構成体 |
EP0471483A1 (en) * | 1990-08-03 | 1992-02-19 | Canon Kabushiki Kaisha | Surface reforming method, process for production of printing plate, printing plate and printing process |
JPH0580503A (ja) * | 1991-06-25 | 1993-04-02 | Fuji Photo Film Co Ltd | 感光性転写材料及び画像形成方法 |
DE4243912A1 (de) * | 1992-04-09 | 1993-10-14 | Fuji Photo Film Co Ltd | Lichtempfindliches Übertragungsmaterial und Bilderzeugungs-Verfahren unter Verwendung desselben |
US5391458A (en) * | 1992-12-18 | 1995-02-21 | Morton International, Inc. | Photoresist processing for improved resolution having a bake step to remove the tackiness of the laminated photosensitive layer prior to contact imagewise exposure |
TW475098B (en) * | 1995-10-27 | 2002-02-01 | Tokyo Ohka Kogyo Co Ltd | Photosensitive resin composition and photosensitive resin laminated film containing the same |
JP3592827B2 (ja) * | 1996-03-06 | 2004-11-24 | 富士写真フイルム株式会社 | 感光性エレメント及び多層配線基板の製造方法 |
US5993945A (en) * | 1996-05-30 | 1999-11-30 | International Business Machines Corporation | Process for high resolution photoimageable dielectric |
US5795647A (en) * | 1996-09-11 | 1998-08-18 | Aluminum Company Of America | Printing plate having improved wear resistance |
US6022670A (en) * | 1997-05-08 | 2000-02-08 | International Business Machines Corporation | Process for high resolution photoimageable dielectric |
US6399270B1 (en) * | 1998-12-04 | 2002-06-04 | Konica Corporation | Support for printing plate and printing plate |
CA2477779A1 (en) * | 2002-03-14 | 2003-09-25 | E.I. Du Pont De Nemours And Company | Photosensitive element for use as flexographic printing plate |
US20080213570A1 (en) * | 2007-02-16 | 2008-09-04 | Jennifer Hoyt Lalli | Self-assembled conductive deformable films |
US20040234886A1 (en) * | 2003-03-12 | 2004-11-25 | Rudolph Michael Lee | Photosensitive element for use as flexographic printing plate |
JP2015066853A (ja) * | 2013-09-30 | 2015-04-13 | 富士フイルム株式会社 | レーザー彫刻型フレキソ印刷版原版及びその製造方法、並びに、フレキソ印刷版の製版方法 |
TWI592760B (zh) * | 2014-12-30 | 2017-07-21 | 羅門哈斯電子材料韓國有限公司 | 與經外塗佈之光致抗蝕劑一起使用之塗層組合物 |
JP2018014446A (ja) * | 2016-07-22 | 2018-01-25 | イビデン株式会社 | ソルダーレジスト及びプリント配線板 |
CN106498616B (zh) * | 2016-12-26 | 2018-09-21 | 浙江海森纺机科技有限公司 | 手套机机头联动系统及功能驱动夹 |
US20220066322A1 (en) * | 2020-08-26 | 2022-03-03 | Tamura Corporation | Photosensitive dry film, and printed wiring board with photosensitive dry film |
Family Cites Families (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US1591304A (en) * | 1925-07-16 | 1926-07-06 | Walter W Giveans | Stripping films |
US3010390A (en) * | 1954-06-29 | 1961-11-28 | Buskes Willem Marie | Planographic printing plates |
BE609350A (es) * | 1960-10-19 | 1900-01-01 | ||
DE1522515C2 (de) | 1965-08-03 | 1980-10-09 | Du Pont | Verfahren zur Herstellung gedruckter Schaltungen |
DE2106574A1 (de) * | 1970-03-03 | 1971-09-23 | Shpley Co Inc | Lichtempfindliches Laminat |
US4193797A (en) | 1971-03-22 | 1980-03-18 | E. I. Dupont De Nemours And Company | Method for making photoresists |
DE2123702B2 (de) | 1971-05-13 | 1979-11-08 | Hoechst Ag, 6000 Frankfurt | Verfahren zur Herstellung eines Reliefbildes |
JPS5236698B2 (es) * | 1973-01-29 | 1977-09-17 | ||
US3891443A (en) * | 1973-02-01 | 1975-06-24 | Polychrome Corp | Mat finish photosensitive relief plates |
US3909328A (en) | 1973-04-10 | 1975-09-30 | Du Pont | Decoration of substrates by thermal transfer of photosensitive, thermoplastic, dye-imaged film |
JPS5019961A (es) * | 1973-06-29 | 1975-03-03 | ||
CH621416A5 (es) | 1975-03-27 | 1981-01-30 | Hoechst Ag | |
DE2718254C3 (de) | 1977-04-25 | 1980-04-10 | Hoechst Ag, 6000 Frankfurt | Strahlungsempfindliche Kopiermasse |
US4278752A (en) | 1978-09-07 | 1981-07-14 | E. I. Du Pont De Nemours And Company | Flame retardant radiation sensitive element |
US4232108A (en) * | 1979-05-01 | 1980-11-04 | E. I. Du Pont De Nemours And Company | Marking transfer sheets |
JPS5642629A (en) * | 1979-09-17 | 1981-04-20 | Diafoil Co Ltd | Biaxially-stretched polyester film for photograph |
DE3036694A1 (de) | 1980-09-29 | 1982-06-03 | Hoechst Ag, 6000 Frankfurt | Gummielastische, ethylenisch ungesaettigte polyurethane und dieselben enthaltendes durch strahlung polymerisierbares gemisch |
-
1982
- 1982-10-02 DE DE19823236560 patent/DE3236560A1/de not_active Withdrawn
-
1983
- 1983-09-14 JP JP58168533A patent/JPH0612413B2/ja not_active Expired - Lifetime
- 1983-09-22 DE DE8383109447T patent/DE3377022D1/de not_active Expired
- 1983-09-22 EP EP83109447A patent/EP0105421B1/de not_active Expired
- 1983-09-22 AT AT83109447T patent/ATE35060T1/de not_active IP Right Cessation
- 1983-09-28 CA CA000437782A patent/CA1242100A/en not_active Expired
- 1983-09-29 FI FI833517A patent/FI74156C/fi not_active IP Right Cessation
- 1983-09-29 US US06/537,000 patent/US4559292A/en not_active Expired - Lifetime
- 1983-09-30 KR KR1019830004643A patent/KR910004874B1/ko not_active IP Right Cessation
- 1983-09-30 IL IL69876A patent/IL69876A/xx not_active IP Right Cessation
- 1983-09-30 ES ES526181A patent/ES8501539A1/es not_active Expired
- 1983-10-04 AU AU19862/83A patent/AU558773B2/en not_active Ceased
Also Published As
Publication number | Publication date |
---|---|
IL69876A (en) | 1987-02-27 |
FI833517A (fi) | 1984-04-03 |
AU1986283A (en) | 1984-04-05 |
IL69876A0 (en) | 1983-12-30 |
ES526181A0 (es) | 1984-11-16 |
FI74156C (fi) | 1987-12-10 |
JPH0612413B2 (ja) | 1994-02-16 |
DE3377022D1 (en) | 1988-07-14 |
FI833517A0 (fi) | 1983-09-29 |
DE3236560A1 (de) | 1984-04-05 |
EP0105421B1 (de) | 1988-06-08 |
ATE35060T1 (de) | 1988-06-15 |
KR910004874B1 (ko) | 1991-07-15 |
US4559292A (en) | 1985-12-17 |
JPS5975245A (ja) | 1984-04-27 |
KR840006419A (ko) | 1984-11-29 |
FI74156B (fi) | 1987-08-31 |
AU558773B2 (en) | 1987-02-05 |
EP0105421A1 (de) | 1984-04-18 |
CA1242100A (en) | 1988-09-20 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
ES8501539A1 (es) | Un material de transferencia fotosensible | |
DE2967245D1 (en) | Substrate for flexible printed circuits and method of fabricating the same, and film | |
GB1537634A (en) | Method of making a negative mask on a substrate | |
MX9204476A (es) | Procedimiento para la fabricacion de una herramienta con forma de rodillo para gofrar o estampar. | |
EP0116415A3 (en) | Improvements in or relating to the production of lines of separation in a sheet or other member | |
DE3063170D1 (en) | Lithographic resist composition for use in a method of forming a film on a substrate | |
AU537479B2 (en) | Resistant material | |
DE3466090D1 (en) | Light-sensitive water-developable registration material for producing printing or relief forms, and resists | |
DE3070434D1 (en) | Mask for copying a pattern onto a photoresist layer, process for the production of this mask, and its use in a photolithographic process | |
GB2030779A (en) | Improvements in or relating to the manufacture of flexible printed circuits | |
JPS578502A (en) | Formation of light shielding layer for platelike lens | |
GB2148539B (en) | Lithographic mask | |
EP0517923A4 (en) | Method of forming minute resist pattern | |
JPS5366376A (en) | Photo mask | |
JPS57108858A (en) | Photosensitive resin plate material superior in adhesion of original film | |
JPS53147531A (en) | Forming method for thin film pattern | |
JPS5646230A (en) | Exposing method | |
DE2964127D1 (en) | Process for pre-conditioning a film and apparatus for carrying out the process | |
JPS57176041A (en) | Photomask for printing circuit and exposure method using this | |
JPS5242378A (en) | Etching processor | |
DE2962614D1 (en) | Process for making an electrolysis pad | |
JPS5614453A (en) | Glass decorating method | |
JPS5713740A (en) | Forming method for conductor pattern | |
JPS5417840A (en) | Film forming method | |
JPS5727262A (en) | Pattern forming mask |