JPS5366376A - Photo mask - Google Patents

Photo mask

Info

Publication number
JPS5366376A
JPS5366376A JP14265876A JP14265876A JPS5366376A JP S5366376 A JPS5366376 A JP S5366376A JP 14265876 A JP14265876 A JP 14265876A JP 14265876 A JP14265876 A JP 14265876A JP S5366376 A JPS5366376 A JP S5366376A
Authority
JP
Japan
Prior art keywords
photo mask
avoid
covering
resin film
center
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP14265876A
Other languages
Japanese (ja)
Other versions
JPS5427707B2 (en
Inventor
Takashi Ariga
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP14265876A priority Critical patent/JPS5366376A/en
Publication of JPS5366376A publication Critical patent/JPS5366376A/en
Publication of JPS5427707B2 publication Critical patent/JPS5427707B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Electrodes Of Semiconductors (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)

Abstract

PURPOSE: To avoid the residual air at the center of contact surface and to avoid difficulty in separation due to excessive adhesion, by covering the pattern surface of photo mask with the resin film having fine surface unevenness.
COPYRIGHT: (C)1978,JPO&Japio
JP14265876A 1976-11-26 1976-11-26 Photo mask Granted JPS5366376A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14265876A JPS5366376A (en) 1976-11-26 1976-11-26 Photo mask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14265876A JPS5366376A (en) 1976-11-26 1976-11-26 Photo mask

Publications (2)

Publication Number Publication Date
JPS5366376A true JPS5366376A (en) 1978-06-13
JPS5427707B2 JPS5427707B2 (en) 1979-09-11

Family

ID=15320475

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14265876A Granted JPS5366376A (en) 1976-11-26 1976-11-26 Photo mask

Country Status (1)

Country Link
JP (1) JPS5366376A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57179850A (en) * 1981-04-30 1982-11-05 Fujitsu Ltd Keeping method for photo mask
JPS5950444A (en) * 1982-09-16 1984-03-23 Tokyo Ohka Kogyo Co Ltd Photomask for microfabrication
JPS61223842A (en) * 1985-03-29 1986-10-04 Nec Kyushu Ltd Photomask
JPS6267548A (en) * 1985-09-20 1987-03-27 Fujitsu Ltd Photomask

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11321252B2 (en) 2018-05-18 2022-05-03 International Business Machines Corporation Selecting a priority queue from which to process an input/output (I/O) request using a machine learning module

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS49131681A (en) * 1973-04-20 1974-12-17
JPS5179575A (en) * 1975-01-06 1976-07-10 Hitachi Ltd

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS49131681A (en) * 1973-04-20 1974-12-17
JPS5179575A (en) * 1975-01-06 1976-07-10 Hitachi Ltd

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57179850A (en) * 1981-04-30 1982-11-05 Fujitsu Ltd Keeping method for photo mask
JPS5950444A (en) * 1982-09-16 1984-03-23 Tokyo Ohka Kogyo Co Ltd Photomask for microfabrication
US4735890A (en) * 1982-09-16 1988-04-05 Tokyo Ohka Kogyo Kabushiki Kaisha Photomasks for photolithographic fine patterning
JPS61223842A (en) * 1985-03-29 1986-10-04 Nec Kyushu Ltd Photomask
JPS6267548A (en) * 1985-09-20 1987-03-27 Fujitsu Ltd Photomask

Also Published As

Publication number Publication date
JPS5427707B2 (en) 1979-09-11

Similar Documents

Publication Publication Date Title
JPS5434839A (en) Roller in fixing device
JPS52133339A (en) Latent adhesive and its production
JPS5366376A (en) Photo mask
JPS5394770A (en) Photo mask
JPS52123824A (en) Solid pikup element
JPS51137733A (en) Method to form a pattern coating with pictures or letters
JPS52152980A (en) Preparation of polyvinyl chloride floorings
JPS5231753A (en) Method of manufacturing reflector
JPS5384712A (en) Photographic material
JPS5368578A (en) Photo mask
JPS5429975A (en) Photo mask
JPS52141066A (en) Roller
JPS52149975A (en) Production of semiconductor device
JPS52124786A (en) Lighting fixture
JPS5313915A (en) Camera
JPS52131462A (en) Manufacture of semiconductor device
JPS5421272A (en) Metal photo mask
JPS5228760A (en) Adiabatic material
JPS5255381A (en) Photo exposure method
JPS522598A (en) Manufacturing method of card and the card
JPS5251872A (en) Production of semiconductor device
JPS5350241A (en) Electrodeposit coating
JPS52117072A (en) Hard mask
JPS52119067A (en) Semiconductor device
JPS5349954A (en) Formation of organic material mask