JPS5366376A - Photo mask - Google Patents
Photo maskInfo
- Publication number
- JPS5366376A JPS5366376A JP14265876A JP14265876A JPS5366376A JP S5366376 A JPS5366376 A JP S5366376A JP 14265876 A JP14265876 A JP 14265876A JP 14265876 A JP14265876 A JP 14265876A JP S5366376 A JPS5366376 A JP S5366376A
- Authority
- JP
- Japan
- Prior art keywords
- photo mask
- avoid
- covering
- resin film
- center
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Electrodes Of Semiconductors (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
Abstract
PURPOSE: To avoid the residual air at the center of contact surface and to avoid difficulty in separation due to excessive adhesion, by covering the pattern surface of photo mask with the resin film having fine surface unevenness.
COPYRIGHT: (C)1978,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14265876A JPS5366376A (en) | 1976-11-26 | 1976-11-26 | Photo mask |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14265876A JPS5366376A (en) | 1976-11-26 | 1976-11-26 | Photo mask |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5366376A true JPS5366376A (en) | 1978-06-13 |
JPS5427707B2 JPS5427707B2 (en) | 1979-09-11 |
Family
ID=15320475
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP14265876A Granted JPS5366376A (en) | 1976-11-26 | 1976-11-26 | Photo mask |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5366376A (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57179850A (en) * | 1981-04-30 | 1982-11-05 | Fujitsu Ltd | Keeping method for photo mask |
JPS5950444A (en) * | 1982-09-16 | 1984-03-23 | Tokyo Ohka Kogyo Co Ltd | Photomask for microfabrication |
JPS61223842A (en) * | 1985-03-29 | 1986-10-04 | Nec Kyushu Ltd | Photomask |
JPS6267548A (en) * | 1985-09-20 | 1987-03-27 | Fujitsu Ltd | Photomask |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US11321252B2 (en) | 2018-05-18 | 2022-05-03 | International Business Machines Corporation | Selecting a priority queue from which to process an input/output (I/O) request using a machine learning module |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS49131681A (en) * | 1973-04-20 | 1974-12-17 | ||
JPS5179575A (en) * | 1975-01-06 | 1976-07-10 | Hitachi Ltd |
-
1976
- 1976-11-26 JP JP14265876A patent/JPS5366376A/en active Granted
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS49131681A (en) * | 1973-04-20 | 1974-12-17 | ||
JPS5179575A (en) * | 1975-01-06 | 1976-07-10 | Hitachi Ltd |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57179850A (en) * | 1981-04-30 | 1982-11-05 | Fujitsu Ltd | Keeping method for photo mask |
JPS5950444A (en) * | 1982-09-16 | 1984-03-23 | Tokyo Ohka Kogyo Co Ltd | Photomask for microfabrication |
US4735890A (en) * | 1982-09-16 | 1988-04-05 | Tokyo Ohka Kogyo Kabushiki Kaisha | Photomasks for photolithographic fine patterning |
JPS61223842A (en) * | 1985-03-29 | 1986-10-04 | Nec Kyushu Ltd | Photomask |
JPS6267548A (en) * | 1985-09-20 | 1987-03-27 | Fujitsu Ltd | Photomask |
Also Published As
Publication number | Publication date |
---|---|
JPS5427707B2 (en) | 1979-09-11 |
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