KR840000314B1 - 착색된 유리 포토마스크의 제조방법 - Google Patents

착색된 유리 포토마스크의 제조방법 Download PDF

Info

Publication number
KR840000314B1
KR840000314B1 KR1019800003771A KR800003771A KR840000314B1 KR 840000314 B1 KR840000314 B1 KR 840000314B1 KR 1019800003771 A KR1019800003771 A KR 1019800003771A KR 800003771 A KR800003771 A KR 800003771A KR 840000314 B1 KR840000314 B1 KR 840000314B1
Authority
KR
South Korea
Prior art keywords
glass
silver
emulsion
colored
ions
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
KR1019800003771A
Other languages
English (en)
Korean (ko)
Other versions
KR830003748A (ko
Inventor
마이틴 어언즈 버어그 프레드
Original Assignee
피이피이지이 인더스트니이즈 인코포레이팃드
로오즈 엠 페코라
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 피이피이지이 인더스트니이즈 인코포레이팃드, 로오즈 엠 페코라 filed Critical 피이피이지이 인더스트니이즈 인코포레이팃드
Publication of KR830003748A publication Critical patent/KR830003748A/ko
Application granted granted Critical
Publication of KR840000314B1 publication Critical patent/KR840000314B1/ko
Expired legal-status Critical Current

Links

Images

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C5/00—Photographic processes or agents therefor; Regeneration of such processing agents
    • G03C5/26—Processes using silver-salt-containing photosensitive materials or agents therefor
    • G03C5/40—Chemically transforming developed images
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/50—Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Surface Treatment Of Glass (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
KR1019800003771A 1979-10-01 1980-09-29 착색된 유리 포토마스크의 제조방법 Expired KR840000314B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US06/080,875 US4309495A (en) 1978-08-02 1979-10-01 Method for making stained glass photomasks from photographic emulsion
US80875 1993-06-21

Publications (2)

Publication Number Publication Date
KR830003748A KR830003748A (ko) 1983-06-22
KR840000314B1 true KR840000314B1 (ko) 1984-03-16

Family

ID=22160203

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019800003771A Expired KR840000314B1 (ko) 1979-10-01 1980-09-29 착색된 유리 포토마스크의 제조방법

Country Status (6)

Country Link
US (1) US4309495A (https=)
JP (1) JPS5674252A (https=)
KR (1) KR840000314B1 (https=)
CH (1) CH645740A5 (https=)
DE (1) DE3036555C2 (https=)
NL (1) NL8005413A (https=)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100646986B1 (ko) * 2005-08-22 2006-11-23 엘지전자 주식회사 포토마스크 및 이를 이용한 노광 방법

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4421836A (en) * 1981-09-25 1983-12-20 Ppg Industries, Inc. Method for repairing silver image glass photomasks with Ni
US4390592A (en) * 1981-11-20 1983-06-28 Ppg Industries, Inc. Low temperature reduction process for photomasks
US4407891A (en) * 1981-11-20 1983-10-04 Ppg Industries, Inc. Low temperature reduction process for large photomasks
CN1033345C (zh) * 1989-03-02 1996-11-20 东芝株式会社 荫罩的图形印相版
JPH05503172A (ja) * 1990-01-31 1993-05-27 プレステク，インコーポレイテッド フォトマスク製造のための改良型方法及び装置
US5217829A (en) * 1990-02-22 1993-06-08 Presstek, Inc. Method for producing photomasks
EP0548385A1 (en) * 1991-12-20 1993-06-30 Corning Incorporated Method for burying optical waveguide paths
US5354633A (en) * 1993-09-22 1994-10-11 Presstek, Inc. Laser imageable photomask constructions
US6277006B1 (en) * 1998-05-21 2001-08-21 Eastman Kodak Company Coated media bearing surface for conveying abrasive media and the like
US6303262B1 (en) 1998-06-18 2001-10-16 Mitsubishi Paper Mills Ltd. Photomask material, photomask and methods for the production thereof
FR2839560B1 (fr) * 2002-05-07 2005-10-14 Commissariat Energie Atomique Masque pour photolithographie a elements absorbeurs/dephaseurs inclus
DE102004035239B4 (de) * 2004-07-21 2011-08-18 boraident GmbH, 06118 Verfahren zur Herstellung einer Prüfmarkierung von Glas und Verwendung der Prüfmarkierung zum Nachweis der bei der Erzeugung der Prüfmarkierung herrschenden Temperatur- und Zeitbedingungen
JP2006201538A (ja) * 2005-01-21 2006-08-03 Seiko Epson Corp マスク、マスクの製造方法、パターン形成方法、配線パターン形成方法

Family Cites Families (39)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2314804A (en) * 1938-12-07 1943-03-23 Corning Glass Works Glass article
US2455719A (en) * 1945-06-01 1948-12-07 Woldemar A Weyl Glass manufacture
US2468402A (en) * 1945-06-14 1949-04-26 Bausch & Lomb Method of marking glass
US2732298A (en) * 1952-12-05 1956-01-24 Method of producing a photograph
US2904432A (en) * 1954-09-29 1959-09-15 Corning Glass Works Method of producing a photograph in glass
NL204868A (https=) * 1955-02-25
US3515587A (en) * 1963-04-06 1970-06-02 Bausch & Lomb Method for changing the optical characteristics of an article
US3489624A (en) * 1965-03-31 1970-01-13 Westinghouse Canada Ltd Etching techniques for glass
US3551304A (en) * 1965-07-12 1970-12-29 Bausch & Lomb Method for producing a composite article
US3370948A (en) * 1966-04-13 1968-02-27 Bausch & Lomb Method for selective etching of alkali glass
US3508982A (en) * 1967-01-03 1970-04-28 Itt Method of making an ultra-violet selective template
US3510371A (en) * 1967-01-25 1970-05-05 Itt Method of making an ultraviolet sensitive template
US3542612A (en) * 1967-08-11 1970-11-24 Western Electric Co Photolithographic masks and methods for their manufacture
US3561963A (en) * 1967-09-11 1971-02-09 Signetics Corp Transparent mask and method for making the same
US3573948A (en) * 1968-01-29 1971-04-06 Ppg Industries Inc Methods of making an image plane plate
US3620795A (en) * 1968-04-29 1971-11-16 Signetics Corp Transparent mask and method for making the same
GB1264958A (https=) * 1968-07-15 1972-02-23
US3653864A (en) * 1969-03-17 1972-04-04 Corning Glass Works Dealkalization of glass surfaces
JPS5022877B1 (https=) * 1969-07-28 1975-08-02
US3732792A (en) * 1970-12-14 1973-05-15 Ppg Industries Inc Image plane plate
FR2128937A5 (https=) * 1971-03-09 1972-10-27 Ragonot Ets
US3907566A (en) * 1971-07-23 1975-09-23 Canon Kk Photosensitive material containing inorganic compound coated metal particles and the use thereof in photographic development processes
US3715244A (en) * 1971-08-26 1973-02-06 Corning Glass Works Chromium film microcircuit mask
US3720515A (en) * 1971-10-20 1973-03-13 Trw Inc Microelectronic circuit production
JPS5038342B2 (https=) * 1971-12-01 1975-12-09
US3857689A (en) * 1971-12-28 1974-12-31 Nippon Selfoc Co Ltd Ion exchange process for manufacturing integrated optical circuits
GB1423171A (en) * 1972-06-05 1976-01-28 Pilkington Brothers Ltd Manufacture of surface glass
US3811855A (en) * 1972-10-10 1974-05-21 Rca Corp Method of treating a glass body to provide an ion-depleted region therein
US3836348A (en) * 1973-02-22 1974-09-17 Nippon Selfoc Co Ltd Method for manufacturing optical integrated circuits utilizing an external electric field
IT1009218B (it) * 1973-04-02 1976-12-10 Glaverbel Procedimento per colorare un ogget to di vetro o per modificarne il colore e oggetto cosi ottenuto
US3879183A (en) * 1973-08-15 1975-04-22 Rca Corp Corona discharge method of depleting mobile ions from a glass region
JPS5230848B2 (https=) * 1973-10-09 1977-08-11
US4113486A (en) * 1973-10-22 1978-09-12 Fuji Photo Film Co., Ltd. Method for producing a photomask
AU7016574A (en) * 1974-06-18 1975-12-18 Matvienko V Y Photomasks
US3896016A (en) * 1974-07-05 1975-07-22 Rca Corp Fabrication of liquid crystal devices
US3991227A (en) * 1975-01-27 1976-11-09 Rca Corporation Method for forming electrode patterns in transparent conductive coatings on glass substrates
US3991228A (en) * 1975-01-27 1976-11-09 Rca Corporation Deposition of tin oxide films on glass
US4144066A (en) * 1977-11-30 1979-03-13 Ppg Industries, Inc. Electron bombardment method for making stained glass photomasks
US4155735A (en) * 1977-11-30 1979-05-22 Ppg Industries, Inc. Electromigration method for making stained glass photomasks

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100646986B1 (ko) * 2005-08-22 2006-11-23 엘지전자 주식회사 포토마스크 및 이를 이용한 노광 방법

Also Published As

Publication number Publication date
KR830003748A (ko) 1983-06-22
CH645740A5 (en) 1984-10-15
DE3036555C2 (de) 1982-08-19
JPS6157624B2 (https=) 1986-12-08
JPS5674252A (en) 1981-06-19
US4309495A (en) 1982-01-05
DE3036555A1 (de) 1981-04-02
NL8005413A (nl) 1981-04-03

Similar Documents

Publication Publication Date Title
KR840000314B1 (ko) 착색된 유리 포토마스크의 제조방법
US4155735A (en) Electromigration method for making stained glass photomasks
US4894303A (en) High energy beam-sensitive glasses
US4567104A (en) High energy beam colored glasses exhibiting insensitivity to actinic radiation
US2326012A (en) Glass article and method of making it
US4670366A (en) High energy beam sensitive glasses
US2732298A (en) Method of producing a photograph
US3732792A (en) Image plane plate
US4286052A (en) Method for making stained glass photomasks using stabilized glass
JPH02293351A (ja) 光導波路の製造法とそれに使用するイオン交換マスク
DE965266C (de) Verfahren zur Herstellung dauerhafter zweidimensionaler photographischer Bilder in der Oberflaeche alkalihaltiger Silikatglaeser
US4383016A (en) Method for repairing glass photomasks
DE2016056C3 (de) Gefärbte transparente Photomaske
USRE31220E (en) Electromigration method for making stained glass photomasks
US4407891A (en) Low temperature reduction process for large photomasks
US4285988A (en) Stained glass photomasks and method of making by electrodealkalization
US4390592A (en) Low temperature reduction process for photomasks
US4168168A (en) Method of making durable photomasks with metal ion diffusion
DE3301604C2 (de) Verfahren zum Herstellen von Farbmustern in Glasplatten und deren Anwendung für Photomasken
KR0143762B1 (ko) 광경화성 유전층에서의 패턴 형성 방법
US3473927A (en) Double negative exposure method for photosensitively opacifiable glass
US4421836A (en) Method for repairing silver image glass photomasks with Ni
US1957433A (en) Method of making a photographic printing plate
GB2163274A (en) Low temperature reduction process for photomasks
JPH0429203A (ja) カラーフィルター

Legal Events

Date Code Title Description
PA0109 Patent application

St.27 status event code: A-0-1-A10-A12-nap-PA0109

PE0902 Notice of grounds for rejection

St.27 status event code: A-1-2-D10-D21-exm-PE0902

P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

P13-X000 Application amended

St.27 status event code: A-2-2-P10-P13-nap-X000

PG1501 Laying open of application

St.27 status event code: A-1-1-Q10-Q12-nap-PG1501

PG1605 Publication of application before grant of patent

St.27 status event code: A-2-2-Q10-Q13-nap-PG1605

PE0701 Decision of registration

St.27 status event code: A-1-2-D10-D22-exm-PE0701

PR0701 Registration of establishment

St.27 status event code: A-2-4-F10-F11-exm-PR0701

PR1002 Payment of registration fee

St.27 status event code: A-2-2-U10-U11-oth-PR1002

Fee payment year number: 1

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 6

Fee payment year number: 5

Fee payment year number: 4

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 7

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

PC1903 Unpaid annual fee

St.27 status event code: A-4-4-U10-U13-oth-PC1903

Not in force date: 19910317

Payment event data comment text: Termination Category : DEFAULT_OF_REGISTRATION_FEE

PC1903 Unpaid annual fee

St.27 status event code: N-4-6-H10-H13-oth-PC1903

Ip right cessation event data comment text: Termination Category : DEFAULT_OF_REGISTRATION_FEE

Not in force date: 19910317