CH645740A5 - Method for manufacturing photographic masks of tinted glass from a photographic emulsion - Google Patents
Method for manufacturing photographic masks of tinted glass from a photographic emulsion Download PDFInfo
- Publication number
- CH645740A5 CH645740A5 CH728780A CH728780A CH645740A5 CH 645740 A5 CH645740 A5 CH 645740A5 CH 728780 A CH728780 A CH 728780A CH 728780 A CH728780 A CH 728780A CH 645740 A5 CH645740 A5 CH 645740A5
- Authority
- CH
- Switzerland
- Prior art keywords
- glass
- silver
- emulsion
- ions
- tinted
- Prior art date
Links
- 239000011521 glass Substances 0.000 title claims description 123
- 239000000839 emulsion Substances 0.000 title claims description 78
- 238000000034 method Methods 0.000 title claims description 57
- 238000004519 manufacturing process Methods 0.000 title claims 10
- 229910052709 silver Inorganic materials 0.000 claims description 68
- 239000004332 silver Substances 0.000 claims description 68
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims description 45
- 239000000758 substrate Substances 0.000 claims description 36
- -1 silver ions Chemical class 0.000 claims description 26
- 150000002500 ions Chemical class 0.000 claims description 23
- 230000008569 process Effects 0.000 claims description 23
- 238000012546 transfer Methods 0.000 claims description 19
- 230000009467 reduction Effects 0.000 claims description 18
- 239000000126 substance Substances 0.000 claims description 14
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 13
- 108010010803 Gelatin Proteins 0.000 claims description 13
- 238000000576 coating method Methods 0.000 claims description 13
- 238000013461 design Methods 0.000 claims description 13
- 230000005684 electric field Effects 0.000 claims description 13
- 229920000159 gelatin Polymers 0.000 claims description 13
- 239000008273 gelatin Substances 0.000 claims description 13
- 235000019322 gelatine Nutrition 0.000 claims description 13
- 235000011852 gelatine desserts Nutrition 0.000 claims description 13
- 239000003638 chemical reducing agent Substances 0.000 claims description 12
- 238000011161 development Methods 0.000 claims description 12
- 229910002804 graphite Inorganic materials 0.000 claims description 12
- 239000010439 graphite Substances 0.000 claims description 12
- 238000005054 agglomeration Methods 0.000 claims description 10
- 230000002776 aggregation Effects 0.000 claims description 10
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical group [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims description 9
- 238000010438 heat treatment Methods 0.000 claims description 7
- 238000013508 migration Methods 0.000 claims description 7
- 230000005012 migration Effects 0.000 claims description 7
- 239000000463 material Substances 0.000 claims description 6
- 238000011282 treatment Methods 0.000 claims description 6
- 230000015572 biosynthetic process Effects 0.000 claims description 5
- 150000001768 cations Chemical class 0.000 claims description 5
- 239000011248 coating agent Substances 0.000 claims description 5
- 229910001413 alkali metal ion Inorganic materials 0.000 claims description 4
- 238000004061 bleaching Methods 0.000 claims description 4
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 claims description 4
- 239000003795 chemical substances by application Substances 0.000 claims description 3
- 230000000694 effects Effects 0.000 claims description 3
- 229910021645 metal ion Inorganic materials 0.000 claims description 3
- JPVYNHNXODAKFH-UHFFFAOYSA-N Cu2+ Chemical compound [Cu+2] JPVYNHNXODAKFH-UHFFFAOYSA-N 0.000 claims description 2
- 230000008901 benefit Effects 0.000 claims description 2
- 229910001431 copper ion Inorganic materials 0.000 claims description 2
- 239000013078 crystal Substances 0.000 claims description 2
- 229910052751 metal Inorganic materials 0.000 claims description 2
- 239000002184 metal Substances 0.000 claims description 2
- 238000012545 processing Methods 0.000 claims description 2
- 230000005855 radiation Effects 0.000 claims description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 2
- 239000000377 silicon dioxide Substances 0.000 claims description 2
- 239000005361 soda-lime glass Substances 0.000 claims description 2
- 229910001887 tin oxide Inorganic materials 0.000 claims description 2
- QHGNHLZPVBIIPX-UHFFFAOYSA-N tin(ii) oxide Chemical compound [Sn]=O QHGNHLZPVBIIPX-UHFFFAOYSA-N 0.000 claims 6
- 238000005530 etching Methods 0.000 claims 5
- 229920002120 photoresistant polymer Polymers 0.000 claims 5
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims 4
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N Iron oxide Chemical compound [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 claims 4
- 229910052804 chromium Inorganic materials 0.000 claims 4
- 239000011651 chromium Substances 0.000 claims 4
- 239000005357 flat glass Substances 0.000 claims 4
- 239000000203 mixture Substances 0.000 claims 4
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 claims 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims 2
- 229910000272 alkali metal oxide Inorganic materials 0.000 claims 2
- 238000004043 dyeing Methods 0.000 claims 2
- 229910052708 sodium Inorganic materials 0.000 claims 2
- 239000011734 sodium Substances 0.000 claims 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims 1
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 claims 1
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 claims 1
- 238000013459 approach Methods 0.000 claims 1
- 238000000149 argon plasma sintering Methods 0.000 claims 1
- 230000000903 blocking effect Effects 0.000 claims 1
- 239000005388 borosilicate glass Substances 0.000 claims 1
- 238000003486 chemical etching Methods 0.000 claims 1
- 238000004140 cleaning Methods 0.000 claims 1
- 229910052802 copper Inorganic materials 0.000 claims 1
- 239000010949 copper Substances 0.000 claims 1
- 230000008021 deposition Effects 0.000 claims 1
- 238000009792 diffusion process Methods 0.000 claims 1
- 230000006872 improvement Effects 0.000 claims 1
- 238000009434 installation Methods 0.000 claims 1
- 238000005342 ion exchange Methods 0.000 claims 1
- 229910052742 iron Inorganic materials 0.000 claims 1
- 229910052744 lithium Inorganic materials 0.000 claims 1
- 238000004377 microelectronic Methods 0.000 claims 1
- 239000011664 nicotinic acid Substances 0.000 claims 1
- 239000011368 organic material Substances 0.000 claims 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 claims 1
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 claims 1
- 238000000206 photolithography Methods 0.000 claims 1
- 229910052700 potassium Inorganic materials 0.000 claims 1
- 239000011591 potassium Substances 0.000 claims 1
- CHWRSCGUEQEHOH-UHFFFAOYSA-N potassium oxide Chemical compound [O-2].[K+].[K+] CHWRSCGUEQEHOH-UHFFFAOYSA-N 0.000 claims 1
- 229910001950 potassium oxide Inorganic materials 0.000 claims 1
- 238000002360 preparation method Methods 0.000 claims 1
- KKCBUQHMOMHUOY-UHFFFAOYSA-N sodium oxide Chemical compound [O-2].[Na+].[Na+] KKCBUQHMOMHUOY-UHFFFAOYSA-N 0.000 claims 1
- 229910001948 sodium oxide Inorganic materials 0.000 claims 1
- 230000004304 visual acuity Effects 0.000 claims 1
- 229910001928 zirconium oxide Inorganic materials 0.000 claims 1
- 239000010410 layer Substances 0.000 description 30
- 239000007789 gas Substances 0.000 description 8
- 230000018109 developmental process Effects 0.000 description 7
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 3
- 239000006185 dispersion Substances 0.000 description 3
- 239000000243 solution Substances 0.000 description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 2
- 238000004040 coloring Methods 0.000 description 2
- 239000004020 conductor Substances 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 230000003247 decreasing effect Effects 0.000 description 2
- 239000003599 detergent Substances 0.000 description 2
- 238000005868 electrolysis reaction Methods 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 238000002834 transmittance Methods 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 240000007817 Olea europaea Species 0.000 description 1
- LSNNMFCWUKXFEE-UHFFFAOYSA-N Sulfurous acid Chemical compound OS(O)=O LSNNMFCWUKXFEE-UHFFFAOYSA-N 0.000 description 1
- 238000002835 absorbance Methods 0.000 description 1
- 239000002250 absorbent Substances 0.000 description 1
- 230000002745 absorbent Effects 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 239000000443 aerosol Substances 0.000 description 1
- 230000032683 aging Effects 0.000 description 1
- 230000001476 alcoholic effect Effects 0.000 description 1
- 239000002585 base Substances 0.000 description 1
- 239000006121 base glass Substances 0.000 description 1
- 239000003153 chemical reaction reagent Substances 0.000 description 1
- 239000011247 coating layer Substances 0.000 description 1
- 239000000084 colloidal system Substances 0.000 description 1
- 230000000295 complement effect Effects 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 239000007772 electrode material Substances 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 239000003779 heat-resistant material Substances 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 230000035515 penetration Effects 0.000 description 1
- 239000010957 pewter Substances 0.000 description 1
- 229910000498 pewter Inorganic materials 0.000 description 1
- 239000002002 slurry Substances 0.000 description 1
- 241000894007 species Species 0.000 description 1
- 230000003595 spectral effect Effects 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 239000000725 suspension Substances 0.000 description 1
- 229910001432 tin ion Inorganic materials 0.000 description 1
- 238000009834 vaporization Methods 0.000 description 1
- 230000008016 vaporization Effects 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C1/00—Photosensitive materials
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C5/00—Photographic processes or agents therefor; Regeneration of such processing agents
- G03C5/26—Processes using silver-salt-containing photosensitive materials or agents therefor
- G03C5/40—Chemically transforming developed images
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/50—Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Surface Treatment Of Glass (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US06/080,875 US4309495A (en) | 1978-08-02 | 1979-10-01 | Method for making stained glass photomasks from photographic emulsion |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CH645740A5 true CH645740A5 (en) | 1984-10-15 |
Family
ID=22160203
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CH728780A CH645740A5 (en) | 1979-10-01 | 1980-09-29 | Method for manufacturing photographic masks of tinted glass from a photographic emulsion |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US4309495A (https=) |
| JP (1) | JPS5674252A (https=) |
| KR (1) | KR840000314B1 (https=) |
| CH (1) | CH645740A5 (https=) |
| DE (1) | DE3036555C2 (https=) |
| NL (1) | NL8005413A (https=) |
Families Citing this family (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4421836A (en) * | 1981-09-25 | 1983-12-20 | Ppg Industries, Inc. | Method for repairing silver image glass photomasks with Ni |
| US4390592A (en) * | 1981-11-20 | 1983-06-28 | Ppg Industries, Inc. | Low temperature reduction process for photomasks |
| US4407891A (en) * | 1981-11-20 | 1983-10-04 | Ppg Industries, Inc. | Low temperature reduction process for large photomasks |
| CN1033345C (zh) * | 1989-03-02 | 1996-11-20 | 东芝株式会社 | 荫罩的图形印相版 |
| JPH05503172A (ja) * | 1990-01-31 | 1993-05-27 | プレステク，インコーポレイテッド | フォトマスク製造のための改良型方法及び装置 |
| US5217829A (en) * | 1990-02-22 | 1993-06-08 | Presstek, Inc. | Method for producing photomasks |
| EP0548385A1 (en) * | 1991-12-20 | 1993-06-30 | Corning Incorporated | Method for burying optical waveguide paths |
| US5354633A (en) * | 1993-09-22 | 1994-10-11 | Presstek, Inc. | Laser imageable photomask constructions |
| US6277006B1 (en) * | 1998-05-21 | 2001-08-21 | Eastman Kodak Company | Coated media bearing surface for conveying abrasive media and the like |
| US6303262B1 (en) | 1998-06-18 | 2001-10-16 | Mitsubishi Paper Mills Ltd. | Photomask material, photomask and methods for the production thereof |
| FR2839560B1 (fr) * | 2002-05-07 | 2005-10-14 | Commissariat Energie Atomique | Masque pour photolithographie a elements absorbeurs/dephaseurs inclus |
| DE102004035239B4 (de) * | 2004-07-21 | 2011-08-18 | boraident GmbH, 06118 | Verfahren zur Herstellung einer Prüfmarkierung von Glas und Verwendung der Prüfmarkierung zum Nachweis der bei der Erzeugung der Prüfmarkierung herrschenden Temperatur- und Zeitbedingungen |
| JP2006201538A (ja) * | 2005-01-21 | 2006-08-03 | Seiko Epson Corp | マスク、マスクの製造方法、パターン形成方法、配線パターン形成方法 |
| KR100646986B1 (ko) * | 2005-08-22 | 2006-11-23 | 엘지전자 주식회사 | 포토마스크 및 이를 이용한 노광 방법 |
Family Cites Families (39)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2314804A (en) * | 1938-12-07 | 1943-03-23 | Corning Glass Works | Glass article |
| US2455719A (en) * | 1945-06-01 | 1948-12-07 | Woldemar A Weyl | Glass manufacture |
| US2468402A (en) * | 1945-06-14 | 1949-04-26 | Bausch & Lomb | Method of marking glass |
| US2732298A (en) * | 1952-12-05 | 1956-01-24 | Method of producing a photograph | |
| US2904432A (en) * | 1954-09-29 | 1959-09-15 | Corning Glass Works | Method of producing a photograph in glass |
| NL204868A (https=) * | 1955-02-25 | |||
| US3515587A (en) * | 1963-04-06 | 1970-06-02 | Bausch & Lomb | Method for changing the optical characteristics of an article |
| US3489624A (en) * | 1965-03-31 | 1970-01-13 | Westinghouse Canada Ltd | Etching techniques for glass |
| US3551304A (en) * | 1965-07-12 | 1970-12-29 | Bausch & Lomb | Method for producing a composite article |
| US3370948A (en) * | 1966-04-13 | 1968-02-27 | Bausch & Lomb | Method for selective etching of alkali glass |
| US3508982A (en) * | 1967-01-03 | 1970-04-28 | Itt | Method of making an ultra-violet selective template |
| US3510371A (en) * | 1967-01-25 | 1970-05-05 | Itt | Method of making an ultraviolet sensitive template |
| US3542612A (en) * | 1967-08-11 | 1970-11-24 | Western Electric Co | Photolithographic masks and methods for their manufacture |
| US3561963A (en) * | 1967-09-11 | 1971-02-09 | Signetics Corp | Transparent mask and method for making the same |
| US3573948A (en) * | 1968-01-29 | 1971-04-06 | Ppg Industries Inc | Methods of making an image plane plate |
| US3620795A (en) * | 1968-04-29 | 1971-11-16 | Signetics Corp | Transparent mask and method for making the same |
| GB1264958A (https=) * | 1968-07-15 | 1972-02-23 | ||
| US3653864A (en) * | 1969-03-17 | 1972-04-04 | Corning Glass Works | Dealkalization of glass surfaces |
| JPS5022877B1 (https=) * | 1969-07-28 | 1975-08-02 | ||
| US3732792A (en) * | 1970-12-14 | 1973-05-15 | Ppg Industries Inc | Image plane plate |
| FR2128937A5 (https=) * | 1971-03-09 | 1972-10-27 | Ragonot Ets | |
| US3907566A (en) * | 1971-07-23 | 1975-09-23 | Canon Kk | Photosensitive material containing inorganic compound coated metal particles and the use thereof in photographic development processes |
| US3715244A (en) * | 1971-08-26 | 1973-02-06 | Corning Glass Works | Chromium film microcircuit mask |
| US3720515A (en) * | 1971-10-20 | 1973-03-13 | Trw Inc | Microelectronic circuit production |
| JPS5038342B2 (https=) * | 1971-12-01 | 1975-12-09 | ||
| US3857689A (en) * | 1971-12-28 | 1974-12-31 | Nippon Selfoc Co Ltd | Ion exchange process for manufacturing integrated optical circuits |
| GB1423171A (en) * | 1972-06-05 | 1976-01-28 | Pilkington Brothers Ltd | Manufacture of surface glass |
| US3811855A (en) * | 1972-10-10 | 1974-05-21 | Rca Corp | Method of treating a glass body to provide an ion-depleted region therein |
| US3836348A (en) * | 1973-02-22 | 1974-09-17 | Nippon Selfoc Co Ltd | Method for manufacturing optical integrated circuits utilizing an external electric field |
| IT1009218B (it) * | 1973-04-02 | 1976-12-10 | Glaverbel | Procedimento per colorare un ogget to di vetro o per modificarne il colore e oggetto cosi ottenuto |
| US3879183A (en) * | 1973-08-15 | 1975-04-22 | Rca Corp | Corona discharge method of depleting mobile ions from a glass region |
| JPS5230848B2 (https=) * | 1973-10-09 | 1977-08-11 | ||
| US4113486A (en) * | 1973-10-22 | 1978-09-12 | Fuji Photo Film Co., Ltd. | Method for producing a photomask |
| AU7016574A (en) * | 1974-06-18 | 1975-12-18 | Matvienko V Y | Photomasks |
| US3896016A (en) * | 1974-07-05 | 1975-07-22 | Rca Corp | Fabrication of liquid crystal devices |
| US3991227A (en) * | 1975-01-27 | 1976-11-09 | Rca Corporation | Method for forming electrode patterns in transparent conductive coatings on glass substrates |
| US3991228A (en) * | 1975-01-27 | 1976-11-09 | Rca Corporation | Deposition of tin oxide films on glass |
| US4144066A (en) * | 1977-11-30 | 1979-03-13 | Ppg Industries, Inc. | Electron bombardment method for making stained glass photomasks |
| US4155735A (en) * | 1977-11-30 | 1979-05-22 | Ppg Industries, Inc. | Electromigration method for making stained glass photomasks |
-
1979
- 1979-10-01 US US06/080,875 patent/US4309495A/en not_active Expired - Lifetime
-
1980
- 1980-09-27 DE DE3036555A patent/DE3036555C2/de not_active Expired
- 1980-09-29 KR KR1019800003771A patent/KR840000314B1/ko not_active Expired
- 1980-09-29 CH CH728780A patent/CH645740A5/fr not_active IP Right Cessation
- 1980-09-30 NL NL8005413A patent/NL8005413A/nl not_active Application Discontinuation
- 1980-09-30 JP JP13667580A patent/JPS5674252A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| KR830003748A (ko) | 1983-06-22 |
| DE3036555C2 (de) | 1982-08-19 |
| JPS6157624B2 (https=) | 1986-12-08 |
| KR840000314B1 (ko) | 1984-03-16 |
| JPS5674252A (en) | 1981-06-19 |
| US4309495A (en) | 1982-01-05 |
| DE3036555A1 (de) | 1981-04-02 |
| NL8005413A (nl) | 1981-04-03 |
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