KR20230062883A - 패턴 산출 장치, 패턴 산출 방법, 마스크, 노광 장치, 디바이스 제조 방법, 컴퓨터 프로그램, 및, 기록 매체 - Google Patents
패턴 산출 장치, 패턴 산출 방법, 마스크, 노광 장치, 디바이스 제조 방법, 컴퓨터 프로그램, 및, 기록 매체 Download PDFInfo
- Publication number
- KR20230062883A KR20230062883A KR1020237013989A KR20237013989A KR20230062883A KR 20230062883 A KR20230062883 A KR 20230062883A KR 1020237013989 A KR1020237013989 A KR 1020237013989A KR 20237013989 A KR20237013989 A KR 20237013989A KR 20230062883 A KR20230062883 A KR 20230062883A
- Authority
- KR
- South Korea
- Prior art keywords
- mask pattern
- exposure
- mask
- pattern
- area
- Prior art date
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Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/50—Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
- G03F1/70—Adapting basic layout or design of masks to lithographic process requirements, e.g., second iteration correction of mask patterns for imaging
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Engineering & Computer Science (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Manufacturing Optical Record Carriers (AREA)
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JPJP-P-2017-073024 | 2017-03-31 | ||
JP2017073024 | 2017-03-31 | ||
KR1020217042410A KR20220000929A (ko) | 2017-03-31 | 2018-03-30 | 패턴 산출 장치, 패턴 산출 방법, 마스크, 노광 장치, 디바이스 제조 방법, 컴퓨터 프로그램, 및, 기록 매체 |
PCT/JP2018/013852 WO2018181985A1 (ja) | 2017-03-31 | 2018-03-30 | パターン算出装置、パターン算出方法、マスク、露光装置、デバイス製造方法、コンピュータプログラム、及び、記録媒体 |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020217042410A Division KR20220000929A (ko) | 2017-03-31 | 2018-03-30 | 패턴 산출 장치, 패턴 산출 방법, 마스크, 노광 장치, 디바이스 제조 방법, 컴퓨터 프로그램, 및, 기록 매체 |
Publications (1)
Publication Number | Publication Date |
---|---|
KR20230062883A true KR20230062883A (ko) | 2023-05-09 |
Family
ID=63678035
Family Applications (3)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020237013989A KR20230062883A (ko) | 2017-03-31 | 2018-03-30 | 패턴 산출 장치, 패턴 산출 방법, 마스크, 노광 장치, 디바이스 제조 방법, 컴퓨터 프로그램, 및, 기록 매체 |
KR1020197030978A KR102345078B1 (ko) | 2017-03-31 | 2018-03-30 | 패턴 산출 장치, 패턴 산출 방법, 마스크, 노광 장치, 디바이스 제조 방법, 컴퓨터 프로그램, 및, 기록 매체 |
KR1020217042410A KR20220000929A (ko) | 2017-03-31 | 2018-03-30 | 패턴 산출 장치, 패턴 산출 방법, 마스크, 노광 장치, 디바이스 제조 방법, 컴퓨터 프로그램, 및, 기록 매체 |
Family Applications After (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020197030978A KR102345078B1 (ko) | 2017-03-31 | 2018-03-30 | 패턴 산출 장치, 패턴 산출 방법, 마스크, 노광 장치, 디바이스 제조 방법, 컴퓨터 프로그램, 및, 기록 매체 |
KR1020217042410A KR20220000929A (ko) | 2017-03-31 | 2018-03-30 | 패턴 산출 장치, 패턴 산출 방법, 마스크, 노광 장치, 디바이스 제조 방법, 컴퓨터 프로그램, 및, 기록 매체 |
Country Status (5)
Country | Link |
---|---|
JP (2) | JP6915680B2 (ja) |
KR (3) | KR20230062883A (ja) |
CN (1) | CN110476121A (ja) |
TW (2) | TWI808078B (ja) |
WO (1) | WO2018181985A1 (ja) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2020109440A (ja) * | 2019-01-04 | 2020-07-16 | 株式会社Joled | フォトマスクの製造方法、表示パネルの製造方法、および、フォトマスク |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20100266961A1 (en) | 2009-04-21 | 2010-10-21 | Nikon Corporation | Movable body apparatus, exposure apparatus, exposure method, and device manufacturing method |
Family Cites Families (21)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5437946A (en) * | 1994-03-03 | 1995-08-01 | Nikon Precision Inc. | Multiple reticle stitching for scanning exposure system |
JPH08297692A (ja) * | 1994-09-16 | 1996-11-12 | Mitsubishi Electric Corp | 光近接補正装置及び方法並びにパタン形成方法 |
JP2001068398A (ja) * | 1999-08-27 | 2001-03-16 | Hitachi Ltd | 半導体集積回路装置の製造方法およびマスクの製造方法 |
JP2003043667A (ja) * | 2001-07-30 | 2003-02-13 | Ricoh Opt Ind Co Ltd | 濃度分布マスクの製造方法 |
JP2004233861A (ja) * | 2003-01-31 | 2004-08-19 | Nikon Corp | マスク、露光方法及びデバイス製造方法 |
JP4886169B2 (ja) * | 2003-02-21 | 2012-02-29 | キヤノン株式会社 | マスク及びその設計方法、露光方法、並びに、デバイス製造方法 |
JP2004303951A (ja) | 2003-03-31 | 2004-10-28 | Nikon Corp | 露光装置及び露光方法 |
JP4514427B2 (ja) * | 2003-10-03 | 2010-07-28 | リコー光学株式会社 | 稠密構造物品の製造方法及びそこで用いる露光用マスク、並びにマイクロレンズアレイ |
JP2006171113A (ja) * | 2004-12-13 | 2006-06-29 | Toshiba Corp | マスクデータ作成装置、マスクデータ作成方法、露光マスク、半導体装置の製造方法及びマスクデータ作成プログラム |
US20070031764A1 (en) * | 2005-08-03 | 2007-02-08 | Meng-Chi Liou | Exposure process |
JP4984810B2 (ja) * | 2006-02-16 | 2012-07-25 | 株式会社ニコン | 露光方法、露光装置及びフォトマスク |
JP2007049208A (ja) | 2006-11-21 | 2007-02-22 | Nikon Corp | 露光装置、露光方法及びデバイス製造方法 |
JP2008185908A (ja) * | 2007-01-31 | 2008-08-14 | Nikon Corp | マスクの製造方法、露光方法、露光装置、および電子デバイスの製造方法 |
US20080299499A1 (en) * | 2007-05-30 | 2008-12-04 | Naomasa Shiraishi | Exposure method, method of manufacturing plate for flat panel display, and exposure apparatus |
JP5077656B2 (ja) * | 2007-06-18 | 2012-11-21 | 株式会社ニコン | パターンデータ処理方法及びシステム、並びに露光方法及び装置 |
JP2009170832A (ja) * | 2008-01-21 | 2009-07-30 | Seiko Epson Corp | レイアウトパターンの演算方法、フォトマスク、半導体装置の製造方法、半導体装置、並びに電子機器 |
JP2012054302A (ja) * | 2010-08-31 | 2012-03-15 | V Technology Co Ltd | 露光方法及び露光装置 |
JP2013195583A (ja) * | 2012-03-16 | 2013-09-30 | Nikon Corp | マスク、露光方法、露光装置およびデバイス製造方法 |
JP5677356B2 (ja) * | 2012-04-04 | 2015-02-25 | キヤノン株式会社 | マスクパターンの生成方法 |
JP6108693B2 (ja) * | 2012-06-08 | 2017-04-05 | キヤノン株式会社 | パターン作成方法 |
JP6136354B2 (ja) * | 2013-02-22 | 2017-05-31 | 大日本印刷株式会社 | 露光マスク製造方法、露光マスクを用いた露光方法、露光マスクを製造するために用いられる基準マスク、および露光マスク |
-
2018
- 2018-03-30 KR KR1020237013989A patent/KR20230062883A/ko not_active Application Discontinuation
- 2018-03-30 CN CN201880022622.0A patent/CN110476121A/zh active Pending
- 2018-03-30 KR KR1020197030978A patent/KR102345078B1/ko active IP Right Grant
- 2018-03-30 JP JP2019509403A patent/JP6915680B2/ja active Active
- 2018-03-30 TW TW107111251A patent/TWI808078B/zh active
- 2018-03-30 KR KR1020217042410A patent/KR20220000929A/ko not_active Application Discontinuation
- 2018-03-30 WO PCT/JP2018/013852 patent/WO2018181985A1/ja active Application Filing
- 2018-03-30 TW TW112121544A patent/TW202340854A/zh unknown
-
2021
- 2021-07-14 JP JP2021116439A patent/JP7215528B2/ja active Active
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20100266961A1 (en) | 2009-04-21 | 2010-10-21 | Nikon Corporation | Movable body apparatus, exposure apparatus, exposure method, and device manufacturing method |
Also Published As
Publication number | Publication date |
---|---|
KR102345078B1 (ko) | 2021-12-29 |
JP2021167972A (ja) | 2021-10-21 |
WO2018181985A1 (ja) | 2018-10-04 |
TW201903515A (zh) | 2019-01-16 |
KR20220000929A (ko) | 2022-01-04 |
TWI808078B (zh) | 2023-07-11 |
JP6915680B2 (ja) | 2021-08-04 |
CN110476121A (zh) | 2019-11-19 |
JP2023052499A (ja) | 2023-04-11 |
KR20190124799A (ko) | 2019-11-05 |
JP7215528B2 (ja) | 2023-01-31 |
JPWO2018181985A1 (ja) | 2019-12-26 |
TW202340854A (zh) | 2023-10-16 |
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