KR20160032128A - 필름의 롤 가공 - Google Patents

필름의 롤 가공 Download PDF

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Publication number
KR20160032128A
KR20160032128A KR1020167002325A KR20167002325A KR20160032128A KR 20160032128 A KR20160032128 A KR 20160032128A KR 1020167002325 A KR1020167002325 A KR 1020167002325A KR 20167002325 A KR20167002325 A KR 20167002325A KR 20160032128 A KR20160032128 A KR 20160032128A
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KR
South Korea
Prior art keywords
film
fluid
gap
roll
coating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
KR1020167002325A
Other languages
English (en)
Korean (ko)
Inventor
앤드류 제이 아우더컬크
로버트 알 키슈케
에린 에이 맥도웰
니콜라스 티 가브리엘
유진 브이 존슨
켈리 에스 존슨
Original Assignee
쓰리엠 이노베이티브 프로퍼티즈 컴파니
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 쓰리엠 이노베이티브 프로퍼티즈 컴파니 filed Critical 쓰리엠 이노베이티브 프로퍼티즈 컴파니
Publication of KR20160032128A publication Critical patent/KR20160032128A/ko
Withdrawn legal-status Critical Current

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/02—Surface treatment of glass, not in the form of fibres or filaments, by coating with glass
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D7/00—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00—Processes for applying liquids or other fluent materials
    • B05D1/002—Processes for applying liquids or other fluent materials the substrate being rotated
    • B05D1/005—Spin coating
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00—Processes for applying liquids or other fluent materials
    • B05D1/02—Processes for applying liquids or other fluent materials performed by spraying
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/001—General methods for coating; Devices therefor
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/28—Surface treatment of glass, not in the form of fibres or filaments, by coating with organic material
    • C03C17/30—Surface treatment of glass, not in the form of fibres or filaments, by coating with organic material with silicon-containing compounds
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D2252/00—Sheets
    • B05D2252/02—Sheets of indefinite length
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D2252/00—Sheets
    • B05D2252/10—Applying the material on both sides

Landscapes

  • Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Wood Science & Technology (AREA)
  • Chemical Vapour Deposition (AREA)
  • Laminated Bodies (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Surface Treatment Of Glass (AREA)
KR1020167002325A 2013-07-16 2014-07-16 필름의 롤 가공 Withdrawn KR20160032128A (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201361846672P 2013-07-16 2013-07-16
US61/846,672 2013-07-16
PCT/US2014/046785 WO2015009779A1 (en) 2013-07-16 2014-07-16 Roll processing of film

Publications (1)

Publication Number Publication Date
KR20160032128A true KR20160032128A (ko) 2016-03-23

Family

ID=52346691

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020167002325A Withdrawn KR20160032128A (ko) 2013-07-16 2014-07-16 필름의 롤 가공

Country Status (6)

Country Link
US (1) US10252940B2 (enExample)
EP (1) EP3022331A4 (enExample)
JP (1) JP2016532774A (enExample)
KR (1) KR20160032128A (enExample)
CN (1) CN105378148B (enExample)
WO (1) WO2015009779A1 (enExample)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20190010084A1 (en) * 2015-08-21 2019-01-10 Corning Incorporated Systems and Methods for Bulk Processing Substrate Webs
FR3112796B1 (fr) 2020-07-21 2022-11-25 Inst Polytechnique Grenoble Procédé de fonctionnalisation d’un substrat à base d’un polymère par dépôt chimique d’une couche mince

Family Cites Families (33)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3923556A (en) 1973-12-03 1975-12-02 Wilson Eng Co Inc Lee Formation of open coil with spacer band
US4110878A (en) * 1976-06-15 1978-09-05 Kurt Wenzel Method for manufacturing an impregnated wound foil capacitor
FR2528225A1 (fr) * 1982-06-04 1983-12-09 Europ Composants Electron Procede de fabrication d'un pave elementaire de condensateur multi-couches et dispositif pour sa mise en oeuvre
US5505995A (en) * 1995-02-02 1996-04-09 Minnesota Mining And Manufacturing Company Method and apparatus for coating substrates using an air knife
EP0806990B1 (en) * 1995-02-02 2001-06-27 Minnesota Mining And Manufacturing Company Method and apparatus for applying thin fluid coatings
DE19839916A1 (de) * 1998-09-02 2000-03-09 Jagenberg Papiertech Gmbh Verfahren und Vorrichtung zur Verminderung des Volumens oder Drucks eines Fluids, das von sich bewegenden Oberflächen in einen Spalt eingeschleppt wird
US6168827B1 (en) 1999-08-30 2001-01-02 General Electric Company Fiber coating method
DE60039229D1 (de) * 1999-12-28 2008-07-31 Teijin Ltd Polyester film rolle
JP2002246310A (ja) * 2001-02-14 2002-08-30 Sony Corp 半導体薄膜の形成方法及び半導体装置の製造方法、これらの方法の実施に使用する装置、並びに電気光学装置
US7115304B2 (en) 2004-02-19 2006-10-03 Nanosolar, Inc. High throughput surface treatment on coiled flexible substrates
US8304019B1 (en) 2004-02-19 2012-11-06 Nanosolar Inc. Roll-to-roll atomic layer deposition method and system
CN101189360B (zh) * 2005-04-06 2010-09-01 东洋制罐株式会社 通过表面波等离子体形成蒸镀膜的方法及装置
US7407892B2 (en) * 2005-05-11 2008-08-05 Micron Technology, Inc. Deposition methods
JP4783117B2 (ja) * 2005-10-21 2011-09-28 東レ・ダウコーニング株式会社 シリカ系ガラス薄層付き無機質基板、その製造方法、コーテイング剤および半導体装置
WO2007106076A2 (en) 2006-03-03 2007-09-20 Prasad Gadgil Apparatus and method for large area multi-layer atomic layer chemical vapor processing of thin films
US20070281089A1 (en) 2006-06-05 2007-12-06 General Electric Company Systems and methods for roll-to-roll atomic layer deposition on continuously fed objects
US8236116B2 (en) * 2007-06-06 2012-08-07 Centre Luxembourgeois De Recherches Pour Le Verre Et Al Ceramique S.A. (C.R.V.C.) Method of making coated glass article, and intermediate product used in same
JP2009013473A (ja) * 2007-07-05 2009-01-22 Dainippon Printing Co Ltd 薄膜形成装置および薄膜形成方法
US7760486B2 (en) * 2007-08-28 2010-07-20 E. I. Du Pont De Nemours And Company Aluminum electrolytic capacitors utilizing fine fiber spacers
US20090087646A1 (en) * 2007-10-01 2009-04-02 Cf Supplies International Ltd. Coated substrate, composition for treating a substrate and process of treatment
JP5071428B2 (ja) 2009-04-15 2012-11-14 住友金属鉱山株式会社 金属ベース層付耐熱性樹脂フィルムと金属膜付耐熱性樹脂フィルムの製造方法および金属ベース層付耐熱性樹脂フィルムの製造装置
US20100304155A1 (en) 2009-05-29 2010-12-02 Fujifilm Corporation Film deposition method, film deposition apparatus, and gas barrier film
US8529700B2 (en) 2009-08-31 2013-09-10 E I Du Pont De Nemours And Company Apparatus for gaseous vapor deposition
JP5486249B2 (ja) * 2009-09-11 2014-05-07 富士フイルム株式会社 成膜方法
JP5681192B2 (ja) 2009-09-22 2015-03-04 スリーエム イノベイティブ プロパティズ カンパニー 多孔性非セラミック基材上に原子層堆積コーティングを適用する方法
US8637117B2 (en) 2009-10-14 2014-01-28 Lotus Applied Technology, Llc Inhibiting excess precursor transport between separate precursor zones in an atomic layer deposition system
KR101461424B1 (ko) * 2009-11-30 2014-11-13 나노스캐일 컴포넌츠, 인코포레이티드 텍스처링된 전극 기반의 에너지 저장 장치를 제조하는 방법
JP5621258B2 (ja) 2009-12-28 2014-11-12 ソニー株式会社 成膜装置および成膜方法
ES2617956T3 (es) 2010-07-23 2017-06-20 Lotus Applied Technology, Llc Mecanismo de transporte de sustrato que pone en contacto un único lado de un sustrato de banda flexible para una deposición de película fina de rollo a rollo
JP5733507B2 (ja) 2011-03-17 2015-06-10 凸版印刷株式会社 成膜方法
BR112014010116A8 (pt) 2011-10-31 2017-06-20 3M Innovative Properties Co métodos para a aplicação de um revestimento a um substrato em forma cilíndrica
JP5536018B2 (ja) * 2011-11-29 2014-07-02 月島機械株式会社 真空成膜装置および樹脂フィルムの真空成膜方法
AU2013301619A1 (en) * 2012-08-09 2015-02-05 Dsm Ip Assets B.V. Roll coating process and apparatus

Also Published As

Publication number Publication date
JP2016532774A (ja) 2016-10-20
CN105378148A (zh) 2016-03-02
WO2015009779A1 (en) 2015-01-22
US10252940B2 (en) 2019-04-09
US20160152518A1 (en) 2016-06-02
CN105378148B (zh) 2018-03-27
EP3022331A1 (en) 2016-05-25
EP3022331A4 (en) 2017-01-04

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Legal Events

Date Code Title Description
PA0105 International application

Patent event date: 20160127

Patent event code: PA01051R01D

Comment text: International Patent Application

PG1501 Laying open of application
PC1203 Withdrawal of no request for examination
WITN Application deemed withdrawn, e.g. because no request for examination was filed or no examination fee was paid