FR3112796B1 - Procédé de fonctionnalisation d’un substrat à base d’un polymère par dépôt chimique d’une couche mince - Google Patents

Procédé de fonctionnalisation d’un substrat à base d’un polymère par dépôt chimique d’une couche mince Download PDF

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Publication number
FR3112796B1
FR3112796B1 FR2007668A FR2007668A FR3112796B1 FR 3112796 B1 FR3112796 B1 FR 3112796B1 FR 2007668 A FR2007668 A FR 2007668A FR 2007668 A FR2007668 A FR 2007668A FR 3112796 B1 FR3112796 B1 FR 3112796B1
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France
Prior art keywords
thin layer
functionalizing
polymer
chemical deposition
substrate
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Active
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FR2007668A
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English (en)
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FR3112796A1 (fr
Inventor
Erwan Gicquel
Frédéric Mercier
Raphaël Boichot
Elisabeth Blanquet
Evelyne Mauret
Roman Reboud
Julien Bras
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Centre National de la Recherche Scientifique CNRS
Institut Polytechnique de Grenoble
Universite Grenoble Alpes
Original Assignee
Centre National de la Recherche Scientifique CNRS
Institut Polytechnique de Grenoble
Universite Grenoble Alpes
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Priority to FR2007668A priority Critical patent/FR3112796B1/fr
Application filed by Centre National de la Recherche Scientifique CNRS, Institut Polytechnique de Grenoble, Universite Grenoble Alpes filed Critical Centre National de la Recherche Scientifique CNRS
Priority to PCT/EP2021/070300 priority patent/WO2022018100A1/fr
Priority to JP2023504396A priority patent/JP2023535419A/ja
Priority to US18/006,335 priority patent/US20230272522A1/en
Priority to EP21748562.2A priority patent/EP4185733A1/fr
Priority to CN202180059276.5A priority patent/CN116194617A/zh
Priority to KR1020237005942A priority patent/KR20230042324A/ko
Publication of FR3112796A1 publication Critical patent/FR3112796A1/fr
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Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/54—Apparatus specially adapted for continuous coating
    • C23C16/545—Apparatus specially adapted for continuous coating for coating elongated substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/01—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes on temporary substrates, e.g. substrates subsequently removed by etching
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/04—Coating on selected surface areas, e.g. using masks
    • C23C16/045—Coating cavities or hollow spaces, e.g. interior of tubes; Infiltration of porous substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides
    • C23C16/403—Oxides of aluminium, magnesium or beryllium
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45523—Pulsed gas flow or change of composition over time
    • C23C16/45525—Atomic layer deposition [ALD]
    • C23C16/45555—Atomic layer deposition [ALD] applied in non-semiconductor technology
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/458—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/56—After-treatment
    • D—TEXTILES; PAPER
    • D21—PAPER-MAKING; PRODUCTION OF CELLULOSE
    • D21H—PULP COMPOSITIONS; PREPARATION THEREOF NOT COVERED BY SUBCLASSES D21C OR D21D; IMPREGNATING OR COATING OF PAPER; TREATMENT OF FINISHED PAPER NOT COVERED BY CLASS B31 OR SUBCLASS D21G; PAPER NOT OTHERWISE PROVIDED FOR
    • D21H11/00—Pulp or paper, comprising cellulose or lignocellulose fibres of natural origin only
    • D21H11/16—Pulp or paper, comprising cellulose or lignocellulose fibres of natural origin only modified by a particular after-treatment
    • D21H11/18—Highly hydrated, swollen or fibrillatable fibres
    • D—TEXTILES; PAPER
    • D21—PAPER-MAKING; PRODUCTION OF CELLULOSE
    • D21H—PULP COMPOSITIONS; PREPARATION THEREOF NOT COVERED BY SUBCLASSES D21C OR D21D; IMPREGNATING OR COATING OF PAPER; TREATMENT OF FINISHED PAPER NOT COVERED BY CLASS B31 OR SUBCLASS D21G; PAPER NOT OTHERWISE PROVIDED FOR
    • D21H11/00—Pulp or paper, comprising cellulose or lignocellulose fibres of natural origin only
    • D21H11/16—Pulp or paper, comprising cellulose or lignocellulose fibres of natural origin only modified by a particular after-treatment
    • D21H11/20—Chemically or biochemically modified fibres

Landscapes

  • Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Inorganic Chemistry (AREA)
  • Biochemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Laminated Bodies (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Chemical Vapour Deposition (AREA)
  • Treatments Of Macromolecular Shaped Articles (AREA)

Abstract

Procédé de fonctionnalisation d’un substrat à base d’un polymère par dépôt chimique d’une couche mince L’invention concerne un procédé de fonctionnalisation d’un substrat (2) à base d’un polymère par dépôt chimique d’au moins une couche mince (3), à partir de précurseurs gazeux, comprenant la fourniture d’un substrat comprenant un empilement (20) d’une pluralité de feuilles (200), les feuilles (200) présentant entre elles deux à deux, au moins localement un espacement (201) configuré pour permettre une diffusion des précurseurs gazeux. Le procédé comprend ensuite le dépôt chimique en phase gazeuse d’au moins une couche mince (3) sur le substrat (2) tel que fourni par diffusion des précurseurs gazeux, les précurseurs gazeux diffusant au moins dans chaque espacement (201). Figure pour l’abrégé : Fig.4A
FR2007668A 2020-07-21 2020-07-21 Procédé de fonctionnalisation d’un substrat à base d’un polymère par dépôt chimique d’une couche mince Active FR3112796B1 (fr)

Priority Applications (7)

Application Number Priority Date Filing Date Title
FR2007668A FR3112796B1 (fr) 2020-07-21 2020-07-21 Procédé de fonctionnalisation d’un substrat à base d’un polymère par dépôt chimique d’une couche mince
JP2023504396A JP2023535419A (ja) 2020-07-21 2021-07-20 薄膜の化学的堆積によりポリマー系基材を機能化するための方法
US18/006,335 US20230272522A1 (en) 2020-07-21 2021-07-20 Method for functionalizing a polymer-based substrate by chemical deposition of a thin layer
EP21748562.2A EP4185733A1 (fr) 2020-07-21 2021-07-20 Procédé de fonctionnalisation d'un substrat à base d'un polymère par dépôt chimique d'une couche mince
PCT/EP2021/070300 WO2022018100A1 (fr) 2020-07-21 2021-07-20 Procédé de fonctionnalisation d'un substrat à base d'un polymère par dépôt chimique d'une couche mince
CN202180059276.5A CN116194617A (zh) 2020-07-21 2021-07-20 通过化学沉积薄层使聚合物基的基材功能化的方法
KR1020237005942A KR20230042324A (ko) 2020-07-21 2021-07-20 박층의 화학적 증착에 의해 폴리머-기반 기재를 관능화하는 방법

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FR2007668A FR3112796B1 (fr) 2020-07-21 2020-07-21 Procédé de fonctionnalisation d’un substrat à base d’un polymère par dépôt chimique d’une couche mince
FR2007668 2020-07-21

Publications (2)

Publication Number Publication Date
FR3112796A1 FR3112796A1 (fr) 2022-01-28
FR3112796B1 true FR3112796B1 (fr) 2022-11-25

Family

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FR2007668A Active FR3112796B1 (fr) 2020-07-21 2020-07-21 Procédé de fonctionnalisation d’un substrat à base d’un polymère par dépôt chimique d’une couche mince

Country Status (7)

Country Link
US (1) US20230272522A1 (fr)
EP (1) EP4185733A1 (fr)
JP (1) JP2023535419A (fr)
KR (1) KR20230042324A (fr)
CN (1) CN116194617A (fr)
FR (1) FR3112796B1 (fr)
WO (1) WO2022018100A1 (fr)

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3087233A (en) * 1960-11-16 1963-04-30 Fram Corp Pervious metal fiber material and method of making the same
US7115304B2 (en) * 2004-02-19 2006-10-03 Nanosolar, Inc. High throughput surface treatment on coiled flexible substrates
FI122032B (fi) * 2008-10-03 2011-07-29 Teknologian Tutkimuskeskus Vtt Kuitutuote, jossa on barrierkerros ja menetelmä sen valmistamiseksi
US8551249B2 (en) * 2009-08-31 2013-10-08 E I Du Pont De Nemours And Company Film cassette for gaseous vapor deposition
WO2011037798A1 (fr) * 2009-09-22 2011-03-31 3M Innovative Properties Company Procédé d'application de revêtements par dépôt de couches atomiques sur des substrats poreux non céramiques
JP6231483B2 (ja) * 2011-10-31 2017-11-15 スリーエム イノベイティブ プロパティズ カンパニー ロール形態の基材にコーティングを適用する方法
CN105378148B (zh) * 2013-07-16 2018-03-27 3M创新有限公司 膜的卷处理
US20180179629A1 (en) * 2015-06-25 2018-06-28 Vladimir Mancevski Apparatus and Methods for High Volume Production of Graphene and Carbon Nanotubes on Large-Sized Thin Foils

Also Published As

Publication number Publication date
KR20230042324A (ko) 2023-03-28
WO2022018100A1 (fr) 2022-01-27
FR3112796A1 (fr) 2022-01-28
CN116194617A (zh) 2023-05-30
EP4185733A1 (fr) 2023-05-31
JP2023535419A (ja) 2023-08-17
US20230272522A1 (en) 2023-08-31

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