WO2022018100A1 - Procédé de fonctionnalisation d'un substrat à base d'un polymère par dépôt chimique d'une couche mince - Google Patents
Procédé de fonctionnalisation d'un substrat à base d'un polymère par dépôt chimique d'une couche mince Download PDFInfo
- Publication number
- WO2022018100A1 WO2022018100A1 PCT/EP2021/070300 EP2021070300W WO2022018100A1 WO 2022018100 A1 WO2022018100 A1 WO 2022018100A1 EP 2021070300 W EP2021070300 W EP 2021070300W WO 2022018100 A1 WO2022018100 A1 WO 2022018100A1
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- WO
- WIPO (PCT)
- Prior art keywords
- substrate
- thin layer
- deposition
- sheet
- face
- Prior art date
Links
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Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/54—Apparatus specially adapted for continuous coating
- C23C16/545—Apparatus specially adapted for continuous coating for coating elongated substrates
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/01—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes on temporary substrates, e.g. substrates subsequently removed by etching
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/04—Coating on selected surface areas, e.g. using masks
- C23C16/045—Coating cavities or hollow spaces, e.g. interior of tubes; Infiltration of porous substrates
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/40—Oxides
- C23C16/403—Oxides of aluminium, magnesium or beryllium
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45523—Pulsed gas flow or change of composition over time
- C23C16/45525—Atomic layer deposition [ALD]
- C23C16/45555—Atomic layer deposition [ALD] applied in non-semiconductor technology
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/458—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/56—After-treatment
-
- D—TEXTILES; PAPER
- D21—PAPER-MAKING; PRODUCTION OF CELLULOSE
- D21H—PULP COMPOSITIONS; PREPARATION THEREOF NOT COVERED BY SUBCLASSES D21C OR D21D; IMPREGNATING OR COATING OF PAPER; TREATMENT OF FINISHED PAPER NOT COVERED BY CLASS B31 OR SUBCLASS D21G; PAPER NOT OTHERWISE PROVIDED FOR
- D21H11/00—Pulp or paper, comprising cellulose or lignocellulose fibres of natural origin only
- D21H11/16—Pulp or paper, comprising cellulose or lignocellulose fibres of natural origin only modified by a particular after-treatment
- D21H11/18—Highly hydrated, swollen or fibrillatable fibres
-
- D—TEXTILES; PAPER
- D21—PAPER-MAKING; PRODUCTION OF CELLULOSE
- D21H—PULP COMPOSITIONS; PREPARATION THEREOF NOT COVERED BY SUBCLASSES D21C OR D21D; IMPREGNATING OR COATING OF PAPER; TREATMENT OF FINISHED PAPER NOT COVERED BY CLASS B31 OR SUBCLASS D21G; PAPER NOT OTHERWISE PROVIDED FOR
- D21H11/00—Pulp or paper, comprising cellulose or lignocellulose fibres of natural origin only
- D21H11/16—Pulp or paper, comprising cellulose or lignocellulose fibres of natural origin only modified by a particular after-treatment
- D21H11/20—Chemically or biochemically modified fibres
Definitions
- the present invention relates to the field of methods for functionalizing a substrate based on a polymer by chemical deposition of a thin layer, from gaseous precursors.
- the present invention relates more particularly to the functionalization of a biobased substrate by chemical deposition of a thin layer, from gaseous precursors. It finds a particularly advantageous application in the field of thermally insulating materials and food packaging.
- the aim is to obtain materials with good barrier properties to oxygen and water, and mechanical properties compatible with their shaping.
- biosourced polymers are promising candidates for this.
- these polymers are generally considered to be less efficient than substrates of petrochemical origin, particularly with regard to their mechanical properties as well as their barrier properties to oxygen and water.
- these substrates often have a complex geometry, for example they are porous and/or have a high surface roughness.
- SALD Spatial Atomic Layer Deposition
- SALDs can be implemented to functionalize a substrate which is presented before and after deposition in the form of a stack comprising a plurality of sheets, for example in the form of a coil. More particularly, the coil is unwound to move between the various precursor injection zones during functionalization, then the functionalized substrate can be wound again to reform the coil.
- SALD processes there are Close Proximity SALD processes in which a reel of a substrate is unwound and moves along the circumference of a drum. Along this circumference, different precursors are supplied and are spatially separated from each other by inert gas barriers.
- Document US 2011/0048327 A1 discloses a process for functionalizing a PET film arranged in a roll on a cassette configured to maintain a spacing between roll turns.
- An object of the present invention is therefore to provide an improved method of chemical vapor deposition compatible with functionalization of a substrate on an industrial scale.
- a non-limiting objective of the invention may also be to provide an improved chemical vapor deposition process compatible with the functionalization of a bio-based substrate, and in particular based on cellulose, on an industrial scale.
- a method for functionalizing a cellulose-based substrate by chemical deposition of at least one thin layer, from gaseous precursors comprising: - a supply of a cellulose-based substrate o comprising at least one sheet having a first face and a second face opposite the first face, at least one face having a surface roughness greater than or equal to 0.1 ⁇ m, o the first face having a part superimposed on another part belonging to the first face or to the second face of the at least one sheet, said parts being superimposed, o so as to provide at least locally a spacing between said parts, configured to allow diffusion of the precursors gas phase, then - a gas phase chemical deposition of at least one thin layer on the substrate as provided by diffusion of the gaseous precursors, the gaseous precursors diffusing at least in each e spacing.
- a method for functionalizing a substrate based on a polymer by chemical deposition of at least one thin layer, from gaseous precursors comprising: providing a substrate comprising a plurality of at least partly superimposed two by two to form a stack, each sheet having a first face and a second face opposite the first face, each part of the face of one sheet being superimposed on part of the face of another sheet in the stack, presenting at least locally a spacing at the part of the face of the other sheet, the spacing being configured to allow diffusion of the gaseous precursors, then chemical deposition in the gaseous phase of at least one layer thin on the substrate as provided by diffusion of the gaseous precursors, the gaseous precursors diffusing at least in each spacing.
- the stack thus has a spacing between the sheets, such that the at least one thin layer is deposited on each face of each sheet in the stack .
- the substrate is thus functionalized.
- the method allows the deposition of at least one thin layer on each face of each sheet of the stack without requiring deployment or unrolling of the substrate.
- the faces of the sheets of the stack are functionalized in parallel. The method makes it possible to functionalize a substrate of extended surface in a simplified way, thus allowing applications on an industrial scale.
- the equipment associated with the process is also simplified, since it is not necessary to have recourse to many moving parts intended for the deployment or the unwinding of the substrate. The robustness and therefore the lifetime of the associated equipment are therefore improved.
- the method Since the process and the associated equipment are simplified, the cost of the functionalized substrate obtained can also be reduced compared to existing solutions. Thanks to the diffusion of the gaseous precursors in the stack, the method also makes it possible to functionalize a substrate having a complex geometry, for example a porous substrate and/or having a high surface roughness.
- cellulose-based substrates whose face or faces have a roughness greater than or equal to 0.1 ⁇ m. It is thus possible to functionalize a substrate based on a biosourced polymer having a complex geometry, for example a porous substrate and/or having a high surface roughness. Since the chemical deposition is made from gaseous precursors, the method also avoids immersing the substrate in a liquid phase that can damage certain substrates, and in particular biosourced substrates. Since the substrate is based on cellulose, the process makes it possible to obtain a functionalized substrate from a biodegradable, renewable and recyclable material.
- cellulose-based substrates generally have the property of absorbing liquids, for example water, and of deteriorating in a humid environment, the process makes it possible to deposit a protective layer of the substrate.
- a roughness greater than or equal to 0.1 ⁇ m made it possible to create, at least locally, the spacing to allow the diffusion of the gaseous precursors. It is therefore not necessary to use an intercalation compound configured to save the spacing.
- the functionalization of the substrate is therefore further simplified.
- this roughness facilitates the diffusion of the precursors in the contact zone between the intercalation compound and the substrate.
- said superimposed parts are opposite, preferably directly opposite.
- the substrate can be placed in a deposition chamber and be immobile at least in translation relative to the deposition chamber during the chemical deposition of the thin layer.
- the equipment associated with the method is further simplified, since it is not necessary to have recourse to parts intended for moving the substrate.
- Another aspect of the invention relates to a substrate obtained by the functionalization method according to the first aspect of the invention.
- FIG. 1 schematically illustrates the steps of the substrate functionalization method according to different embodiments of the invention.
- FIGS. 2A to 2E schematically represent the substrate comprising a stack of a plurality of sheets according to different embodiments.
- FIGS 3A-3E schematically represent the substrate illustrated in Figures 2A-2E, with an intercalation compound between the sheets of the stack.
- Figures 4A to 4D schematically represent the substrate illustrated in Figures 2A, 2B, 2D and 2E, after deposition of a thin layer according to one embodiment of the functionalization method according to the first aspect of the invention.
- FIG. 5 schematically represents an atomic layer deposition reactor implemented by the functionalization process according to the first aspect of the invention.
- FIGS. 6A and 6B schematically represent a sectional view of the functionalized substrate according to two embodiments of the functionalization method according to the first aspect of the invention.
- the substrate may be placed in a deposition chamber and be immobile at least in translation relative to the deposition chamber during the chemical deposition of the thin layer.
- the substrate can be immobile in translation and in rotation relative to the deposition chamber during the chemical deposition of the thin layer; the substrate can be placed on a wall of the deposition chamber, without an additional support member for the substrate, and more particularly without a support member configured to provide the spacing between the parts of the at least one sheet; during the chemical deposition of the at least one thin layer, the substrate may be free of an intercalation compound, or equivalently of an element forming a spacer between the parts of the at least one sheet.
- the method is easier to implement.
- the functionalization of the substrate is improved by limiting the risk that a zone covered by the intercalation compound is not functionalized.
- the compactness of the stack is increased, thus increasing the yield of functionalization of the substrate; the chemical deposition of the at least one thin layer is carried out directly on the substrate.
- the chemical deposition of the at least one thin layer can be performed without depositing a tie layer prior to the deposition of the at least one thin layer; the at least one thin layer having a thickness e 3 , each spacing is greater than 2e 3 +L d , with L d a distance greater than 50 nm.
- each spacing allows the diffusion of the precursors in the stack while limiting the risk of filling in each spacing between the sheets of the stack; each spacing is less than 5 mm, or even less than 1 mm, or even less than 0.5 mm, or even less than 20 ⁇ m; each spacing can only be defined by the shape of the at least one sheet, for example in the form of a coil, a stack or a fold, for example accordion, and/or the surface roughness of the substrate; the substrate may have a length and/or a width, in the plane of main extension of the sheets of the stack, of between a few centimeters and a few meters, for example between 1 cm and 3 m.
- the at least one thin layer is deposited by atomic layer deposition.
- Deposition by atomic layers facilitates the deposition of a thin layer while further minimizing the risk of filling in the spaces between the sheets of the stack; - the deposition temperature of the at least one thin layer is lower than
- the deposition temperature of the at least one thin layer is between ambient temperature and 200° C., for example between 20° C. and 200° C., or even between 60° C. and 150° C.; - the at least one thin layer deposited, or even the assembly formed by the thin layers deposited, has a thickness e 3 of less than 100 nm, over at least 80%, even at least 90%, even at least 99%, of the at least one thin layer deposited, and preferably a thickness of between 1 Angstrom and 100 nm, or even between 10 nm and 60 nm, or even between 10 and 40 nm.
- the deposition of the at least one thin layer can be configured so that the at least one thin layer deposited has a thickness of less than 100 nm, and preferably a thickness of between 1 angstrom and 100 nm, or even between 10 nm and 60 nm, even between 10 and 40 nm, over at least 80%, even at least 90%, even at least 99%, of the at least one thin layer deposited; the deposition of the at least one thin layer comprises at least one injection of the gaseous precursors so as to expose the substrate to the gaseous precursors for a period of between 1 second and 1 hour, or even between 1 second and 10 minutes, preferably between 1 second and 30 seconds; - During the chemical deposition of the at least one thin layer, the pressure of a reactive atmosphere comprising the gaseous precursors is between 0.1 mbar and 1000 mbar; the sheets of the stack are integral with each other, for example they form a continuous substrate, or equivalently a monolithic substrate, for example folded or rolled up on itself.
- the substrate can be in the form of a coil or a fold.
- the stack is a coil or a superposition of sheets obtained by folding a monolithic sheet; said parts belong to the same face of the sheet, the sheet being folded so that the parts face each other in pairs; said parts belong to two opposite sides of the sheet, the sheet being rolled up so that the parts face each other in pairs; the sheets of the stack are distinct or not joined together, for example they form a discontinuous substrate.
- the sheets are at least partially superimposed.
- the stack is a superposition of non-united sheets, such as a ream; said parts belong to separate sheets, for example stacked or superimposed, so that the parts are facing two by two;
- the substrate has, on at least one of its faces, and preferably on each face, a surface roughness substantially greater than 0.1 ⁇ m;
- the substrate has, on at least one of its faces, and preferably on each face, a surface roughness of between 0.1 ⁇ m and 200 ⁇ m, preferably 100 ⁇ m, more preferably 20 ⁇ m;
- the substrate has, on at least one of its faces, and preferably on each face, a surface roughness substantially less than 200 ⁇ m, preferably 100 ⁇ m, more preferably 20 ⁇ m;
- the substrate has an open porosity.
- the gaseous precursors diffuse into each spacing between the sheets and through the sheets in the stacking direction of the sheets.
- the surface of the substrate in contact with the gaseous precursors is therefore maximized compared to existing solutions.
- the method makes it possible to obtain a porous substrate functionalized by a thin layer in a reduced time compared to existing solutions.
- the thin layer is thus deposited on the internal cavities of each sheet.
- the substrate having an open porosity is chosen from a foam, a xerogel, an airgel, a cryogel and a paper; the substrate can be configured so that the gaseous precursors do not cross the faces of the at least one sheet.
- the substrate can be non-porous or be closed; each sheet of the stack has a thickness e 2 oo of less than 5 mm, preferably less than 1 mm, preferably less than 0.5 mm; the substrate include sheets selected from at least one of paper and cloth, which may in particular have a thickness e 2 oo of less than 5 mm, preferably 1 mm, preferably less than 0.5 mm.
- each sheet is a paper or a fabric; each sheet of the stack has a thickness e 20 o greater than 1 mm, each sheet preferably being a foam, a xerogel, a cryogel or an airgel; the substrate is based on a biobased polymer, and preferably the substrate is based on cellulose and/or based on starch.
- the substrate can be based on one of cellulose fibers and cellulose nanofibers; the method further comprises, before supplying the substrate, a shaping of a polymer-based material, from which the substrate is formed, or even constituted, so as to form the stack; shaping the material may include placing an intercalation compound between sheets of material, preferably between each pair of sheets superimposed two by two in the stack.
- the intercalation compound makes it possible to modulate the spacing between the sheets.
- the intercalation compound is porous.
- the gaseous precursors can diffuse through the intercalation compound;
- the at least one thin layer deposited is a layer based on a material chosen from an oxide, a nitride and an oxynitride;
- the method may further comprise, after the chemical deposition of the at least one thin layer, a calcination of the substrate.
- the substrate can be heated to a temperature between the degradation temperature of the substrate and the degradation temperature of the at least one thin layer.
- the terms “superposed”, “over”, “overcomes”, “covers”, “underlying”, “opposite” and their equivalents do not mean not necessarily “in contact with”.
- the deposition of a first layer on a second layer does not necessarily mean that the two layers are directly in contact with one another, but means that the first layer covers at least partially the second layer by being either directly in contact with it, or by being separated from it by at least one other layer or at least one other element.
- a layer can also be composed of several sub-layers of the same material or of different materials. It is specified that, in the context of the present invention, the thickness of a layer or of the substrate, and the spacing between the sheets of the substrate, is measured in a direction perpendicular to the surface along which this layer, this substrate or these leaves present(s) its or their maximum extension. In figures 2A, 2B, 3A, 3B, 4A, 4B, 6A and 6B, the thickness is measured along the z axis. In figures 2C and 2D, 3C, 3D and 4C, the thickness is measured in a direction perpendicular to the z axis.
- compound or material based on a material A means a compound or material comprising this material A, and possibly other materials.
- biobased refers to materials of natural origin, for example from renewable resources, and more particularly materials from biomass of animal, algal or plant origin.
- paper generally designates the material made with plant fibers or their derivatives, such as cellulose fibers, microfibers or nanofibers.
- these fibers are typically extracted from wood by various processes, for example chemical, mechanical, thermomechanical or chemical-thermomechanical processes, which leads to the production of fiber pulps or pulps. They are then typically suspended in water and may undergo a certain number of stages, such as purification, refining, dilution, transport, storage, before being drained, for example on a linen cloth. training.
- the wet fibrous mat is typically then pressed and dried to obtain the paper sheet. These sheets can be coated, impregnated or transformed during or after their manufacture.
- the term “paper” can in particular apply to sheets whose basis weight is less than 250 g/m 2 .
- Nanocellulose is a heterogeneous nanomaterial composed of elements of micrometric size, fragments of cellulose fibers, and at least 50% by number of nano-objects (i.e. objects of which at least one of the dimensions is between 1 and 100 nanometers -nm).
- These cellulosic nano-objects are more particularly microfibers or microfibrils, MFCs, or CMFs (short for cellulose microfibrils), or even nanofibers or nanofibrils, NFC or CNF (short for cellulose nanofibrils).
- Cellulose micro- or nanofibrils typically have a diameter of between 5 and 100 nm and a length of between 0.2 and 5 ⁇ m. It is noted that, in the context of the present invention, the terms “nanofibrillated cellulose” or “cellulose nanofibers” are used interchangeably to designate nanofibrillated cellulose, or cellulose nanofibers (NFC), and microfibrillated cellulose, or microfibers of cellulose (MFC).
- the term “fabric” refers to a substrate formed by the interlacing of fibers or textile threads.
- a “woven” fabric has at least one set of warp threads extending along a first direction, and one set of weft threads extending along a second direction, distinct from the first.
- non-woven refers to a fabric made up of an assembly of textile fibers arranged at random.
- the fibers may typically have undergone a fusion, in particular in the case of thermoplastic fibers, or a binding by means of a binder such as starch, glue, casein, rubber, latex, a cellulose derivative or a resin. synthetic.
- a parameter “substantially equal to/greater than/less than” a given value means that this parameter is equal to/greater than/less than the given value, to within plus or minus 10%, or even within plus or minus 5%, of this value.
- porosity of a substrate or a layer we mean the volume not occupied by the material composing it, relative to the apparent volume of the substrate or the layer.
- This volume proportion can be occupied by vacuum, gas or a liquid, for example water. This proportion is delimited by a plurality of cavities.
- porosity is meant a volume not occupied by the material and formed in the material.
- the porosity of the material is homogeneous, that is to say that the porosity per unit volume is substantially identical in any portion of the same determined size of the material.
- Open porosity designates the porosity of a substrate or of a layer in communication with the environment of the substrate or of the layer. In an open porosity, the cavities can be larger than 10 nm.
- a material for example a fabric or a paper, called “open” designates a material having a porosity at least partly in communication with the environment of the substrate.
- a gas can pass through the open material.
- This gas can more particularly comprise the gaseous precursors of the deposition of the thin layer.
- the porosity of the material may in particular be greater than 5%, or even 30%, or even 40%, or even 50% of the apparent volume of the material.
- a material, for example a fabric or a paper, called “closed” designates a material having a porosity that does not allow a gas to pass through the material.
- This gas can more particularly comprise the gaseous precursors of the deposition of the thin layer.
- the closed material may have low porosity, typically less than 5% of the apparent volume of the material.
- a closed paper is a paper impregnated with a material filling at least in part, or even completely, its porosity.
- a closed paper can be a refined paper, for example a tracing paper.
- Method 1 comprises providing a substrate 2 based on a polymer, preferably based or made of cellulose.
- the substrate 2 can in particular be supplied to a reactor 5 for depositing a thin layer, described in detail later.
- the substrate 2 provided is a multi-layered substrate 2.
- This substrate 2 comprises at least one sheet 200 having a first face 200a and a second face 200b opposite the first face 200a.
- the substrate is configured so that the sheet(s) 200 have portions 200c superimposed between them.
- the substrate comprises a stack 20 of a plurality of parts 200c of sheets 200.
- the parts 200c of the sheet(s) 200 are at least partially superimposed two by two to form a stack 20.
- the parts 200c of the sheet or sheets 200 superimposed two by two are also separated by a spacing 201, at least locally non-zero, described in more detail later.
- method 1 comprises chemical deposition 11 of at least one thin layer 3 from gaseous precursors.
- a plurality of thin layers 3 of the same material or of different materials can be deposited.
- the deposit 11 is for example produced by chemical vapor deposition (CVD, acronym Chemical Vapor Deposition), or preferably by atomic layer deposition (ALD, acronym for Atomic Layer Deposition).
- the deposition 11 of the thin layer 3 can be performed on a tie layer previously deposited on the substrate 2.
- a tie layer can be based on a polymer.
- the thin layer 3 is deposited 11 directly on the substrate 2, without an intermediate adhesion layer.
- the deposition 11 is performed on the substrate 2 as provided 10. More particularly, between the supply 10 of the substrate 2 and the deposition 11, or even the end of the deposition 11, the arrangement of the substrate 2, and in particular the spacing 201 between the parts 200c of the sheet(s) 200 remain substantially constant.
- the substrate 2 is placed in a deposition chamber 50 of the reactor 5 and is immobile relative to the deposition chamber 50 during the deposition 11 of the thin layer 3.
- the substrate 2 rests on a wall of the deposition chamber 50 of the reactor 5 without additional holding device.
- no element of reactor 5 is configured to maintain spacing 201. The process is thus simplified and its cost minimized, while allowing the gaseous precursors to diffuse into the spacing.
- the spacing 201 between two sheets 200 superimposed directly on each other in the stack 20 is configured to allow the diffusion of the gaseous precursors in the stack 20.
- the surface of the sheets 200 of the substrate 2 is accessible to the precursors.
- the entire surface of the sheets 200 is accessible to the precursors.
- the gaseous precursors can diffuse to deposit on this accessible surface and form the thin layer 3 there.
- the surfaces of each sheet 200 of the stack 20 are therefore functionalized in parallel.
- the deposit 11 is preferably configured so that the precursors diffuse throughout the stack 20.
- the deposit can in particular be configured so that the thin layer 3 is deposited at least on 90%, even 95%, even 99 % of the surface of the sheets 200 of the stack 20.
- the surface of the sheets 200 designates the surface accessible by the gaseous precursors.
- the deposition parameters such as the exposure time 110 of the substrate to the precursors, the pressure of the reactive atmosphere containing the precursors, the deposition temperature, and in particular the temperature at which the substrate 2 is heated, can be adjusted.
- the absence of intercalation compound 4, described later, or of an element of the reactor 5 configured to maintain the spacing 201 makes it possible to increase the accessible surface for the functionalization by the layer 3. Thanks to this spacing , the deposit 11 makes it possible to avoid an unfolding or unrolling of the substrate 2 which would be intended to expose one or both faces of its sheets to the precursors. It is therefore not necessary for the deposition reactor 5 to comprise many moving parts intended for the deployment or unwinding of the substrate 2.
- the deposition chamber 50 can be free of moving parts configured to deploy or unwind the substrate 2.
- the substrate 2 is made more compact.
- the surface of the substrate 2 in contact with the gaseous precursors at each instant of the deposit 11 is therefore maximized with respect to existing solutions.
- the method makes it possible to functionalize a large substrate surface by a thin layer in a reduced time compared to existing solutions.
- a substrate 2 of extended surface can also be functionalized by limiting the volume of the deposition chamber 50.
- the equipment associated with the process is therefore simplified. The robustness and lifetime of the associated equipment are therefore improved. It is therefore understood that the method 1 makes it possible to functionalize a substrate 2 of extended surface in a simplified way, thus allowing applications on an industrial scale.
- the deposition allows infiltration of the precursors at the surface of the sheets 200 of the stack 20.
- the chemical deposition 11 from gaseous precursor thus makes it possible to functionalize a substrate 2 based on a polymer having a complex geometry, for example a porous substrate and/or having a high surface roughness. Since the deposit 11 is made from gaseous precursors, the method also avoids immersing the substrate 2 in a liquid phase that can damage certain substrates, and in particular substrates based on bio-based polymers such as cellulose and polylactic acid.
- the method may further comprise, prior to supplying the substrate
- a shaping of at least one material to obtain a substrate 2 comprising the stack 20 For this, at least one material based on a polymer, and preferably on cellulose, can be provided 12. The material can then be shaped 13, for example folded, rolled up, cut, and/or assembled to obtain the stack 20.
- the shaping 13 of the material can further comprise the arrangement of an intercalation compound 4, described in more detail later.
- the intercalation compound 4 is in particular configured to induce and finely control the spacing 201 between the sheets 200 of the stack 20.
- the substrate 2 is an example of a intercalation compound.
- the method 1 can further comprise, after the deposition 11, an at least partial, or even total, calcination 14 of the substrate 2.
- the substrate 2 can be heated to a temperature on the one hand higher than the degradation temperature of the substrate 2, and on the other hand lower than the degradation temperature of the thin layer 3.
- the substrate 2 can be heated until substantially all of the substrate 2 is calcined.
- Substrate 2 then plays the role of structuring agent (or template in English) for the deposition of the thin layer 3.
- the material forming the substrate 2 can be calcined while keeping the thin layer 3 structured according to the spatial configuration of the substrate 2.
- a structure is then obtained composed of at least 90 %, or even at least 99%, of the thin layer 3.
- the substrate 2 is based on cellulose and the substrate 2 can be heated to a temperature above 200° C., or even between 200° C. and 1500 °C.
- the substrate 2 When the substrate 2 is based on cellulose, the substrate 2 can be heated to a temperature of between 500°C and 1500°C, or even between 600°C and 1500°C. From 600°C, total calcination of the cellulose is favoured, even guaranteed.
- the method 1 can further comprise, after the deposition 11, shaping
- the functionalized substrate 2 can for example be unfolded, unrolled, folded, cut, disassembled or assembled or a combination of these actions.
- the intercalation compound 4 can, if necessary, be removed from the functionalized substrate 2. It should be noted that the shaping of the substrate 15 can be carried out before or after the calcination 14 of the substrate 2. For example, the intercalation compound 4 can be removed before the calcination 14, which is particularly advantageous in the case where the temperature degradation of the intercalation compound is greater than that of the thin layer 3.
- the stack 20 is now detailed with reference to FIGS. 2A to 2E.
- the substrate 2 comprises a plurality of sheets 200 at least partially superimposed two by two to form the stack 20.
- the stack comprises at least two sheets 200, or even at least five sheets 200, or even at least ten sheets 200.
- each of the sheets 200 can extend substantially in a main plane of extension (x, y) and be at least partially juxtaposed with another sheet of the stack in a direction z substantially perpendicular to the plane (x, y).
- Each sheet 200 has a first side 200a and a second side 200b opposite the first side.
- a part 200c of the face 200a of a sheet 200 can be superimposed on a part 200c of the face 200b of another sheet 200.
- these parts 200c can present between them at least locally the spacing 201
- at least two sheets 200 adjacent in the direction z, or even the two sheets of each pair of sheets 200 adjacent in the direction z of the stack 20 are superimposed on each other at least over 50%, or even at least over 70%, or even at least over 90%, or even at least over 95% of the surfaces of their faces 200a, 200b facing each other.
- the spacing 201 can be considered as an average over all of the parts 200c of the faces 200a, 200b of the sheets 200 facing each other, in the stack 20.
- the spacing 201 is then non-zero on average. This therefore does not exclude local contact points between the sheets 200a.
- the substrate 2 can be seen as discontinuous.
- the substrate 2 can have a first density in the thickness e 2 oo of the sheets 200. This density can be substantially homogeneous in the sheets 200.
- the substrate 2 can have a second density at the interface between the sheets 200, the second density being lower at the first density, or even substantially zero.
- the interface between the sheets preferably has a length in the z direction equal to the spacing 201.
- the thickness e 3 can be an apparent thickness.
- Each spacing 201 may be less than 5 mm, or even less than 1 mm, or even less than 0.5 mm, preferably less than 200 ⁇ m, or even less than 20 ⁇ m.
- the spacing can be substantially equal to the surface roughness of the sheets 200.
- the sheets 200 of the stack 20 can be distinct from each other.
- the sheets of the stack form a non-monolithic substrate 2, such as a ream.
- the sheets 200 of the stack 20 can be integral with each other, for example they form a monolithic substrate 2.
- the substrate 2 can be considered to be formed from a single sheet 200.
- the sheets can be assembled together, for example by weaving or by gluing.
- the substrate 2 can also be free of discontinuity between the sheets 200.
- the stack 20 can be a superposition of parts 200c of a sheet 200, obtained by folding a sheet monolithic.
- Part 200c of sheet 200 can then be delimited between an edge of substrate 2 and a fold of substrate 2 substantially parallel to this edge, or between two consecutive folds of substrate 2.
- Parts 200c of sheet 200 of substrate 2 can extend each in a plane, the planes of the different parts 200c of the sheet 200 being substantially parallel to each other.
- the stack 20 can be a coil, as illustrated by FIGS. 2C and 2D.
- the substrate 2 can be rolled up on itself to form a sheet 200 rolled up on itself.
- This coil may have an axis of revolution A in the direction z.
- the parts 200c of the sheet 200 can be superimposed according to a stacking direction T perpendicular to the axis A, as illustrated in FIG. 2D.
- the parts 200c of the sheet 200 then extend in a succession of curved planes forming a spiral centered on the axis A, as illustrated by FIG. 2D.
- sheets 200 could be rolled up so as to each form a cylinder and the cylinders thus formed would be placed concentrically to form the stack 20.
- the sheet(s) 200 may also have a three-dimensional geometry, and in particular a complex geometry.
- complex geometry it is meant that the sheet(s) 200 are non-planar.
- the sheet(s) 200 extend for example in a main extension plane (x, y) and in the direction z.
- FIG. 2D several sheets 200 with complex geometry can be stacked.
- a form of "egg box" is illustrated in Figure 2E without limitation. It is possible to provide any other shape compatible with a stack of sheets 200, for example a corrugated, crenellated shape.
- the substrate can be in the form of a capsule, for example a coffee capsule, a bottle, a can, a tray, a plate, a straw, a glass, or even a cup.
- the substrate 2 is formed from, or even consists of, a material based on a polymer and more particularly based on or made of cellulose.
- the substrate 2 can therefore have the properties of the material constituting it.
- the material has the advantage of being at least partly and preferably totally biodegradable, renewable and recyclable.
- This material may have, on at least one of its faces, a surface roughness substantially between 5 nm and 20 ⁇ m, or even between 0.1 ⁇ m and 200 ⁇ m, preferably between 0.1 and 100 ⁇ m, preferably between 0 .1 ⁇ m and 20 ⁇ m, or even between 100 nm and 1000 nm.
- the roughness is substantially greater than or equal to 0.1 ⁇ m.
- the spacing 201 can thus be induced locally by the surface roughness of the sheets 200, the sheets 200 locally presenting points of contact.
- a roughness substantially greater than or equal to 0.1 ⁇ m makes it possible to provide sufficient spacing to allow the diffusion of the gaseous precursors.
- the roughness is substantially less than or equal to 200 ⁇ m, preferably 100 ⁇ m.
- a roughness measurement of the surface of the cellulosic material can be carried out by optical profilometry.
- the observation of the topography of the surface can be made over ranges ranging from a few pm 2 to a few mm 2 .
- Confocal microscopy and/or interferometry techniques can be used depending on the expected roughness of the cellulosic material. These two techniques make it possible to reach respectively nanometric and sub-nanometric resolutions.
- the extracted topography makes it possible to go back to the mean amplitude parameters conventionally used such as the deviation from the arithmetic mean (Ra) and the deviation from the quadratic mean (Rq, also called RMS from English "Root Mean Square”):
- the substrate 2 may have open porosity.
- the gaseous precursors thus diffuse into the spacing 201 between the sheets 200 and through the sheets 200 in the z direction according to the examples illustrated in FIGS. 2A and 2B or in any plane perpendicular to the z axis according to the examples illustrated in the Figures 2C and 2D.
- the substrate 2 has an open porosity
- the faces 200a, 200b of each sheet 200 can be at least partly formed by the cavities that it has. It is therefore understood that a porous substrate can have a surface roughness in the ranges stated above, for example greater than 0.1 ⁇ m.
- Method 1 makes it possible to deposit a thin layer 3 in the cavities of the sheets 200.
- the thin layer 3 deposited can be of substantially constant thickness in the volume of the sheets 200.
- the diffusion of the precursors in the stack 20 is facilitated.
- the substrate is porous, the surface of the substrate 2 in contact with the gaseous precursors at each time of deposit 11 is further maximized.
- the method makes it possible to functionalize a large substrate surface by a thin layer in an even shorter time.
- a measurement of porosity ( ⁇ ) can be carried out from the measurement of the density of the porous substrate 2 ⁇ p pore ux) and knowledge of the theoretical density of the cellulose (Pceimiose) In the case where the fluid contained in the pores is air, the following equation can be used:
- Pporous and Pceiiuiose have the same unit (typically in kg/m 3 ). Thus 0 will ideally be equal to zero for a solid cellulose material and equal to 1 for a material containing exclusively air.
- the value of p pore ux can be calculated from the measurement of the mass (m porous ) and the volume (V porous ) of the porous sample according to the equation:
- the measurement can for example be made on a porous sample being either a sheet or a set of non-stacked sheets (0 either a stack of sheets
- the spacing 201 between the sheets 200 can be modulated during the shaping 13 of the material from which the substrate is formed.
- the stack 20 can be more or less packed.
- a coil can be wound more or less tightly.
- the spacing 201 can further be provided by an intercalation compound 4.
- the intercalation compound 4 can be placed on the material so that it is located between the sheets 200 of the stack 20, preferably between each pair of sheets superposed together in the stack.
- This arrangement 130 can be made for example during the shaping 13 of the material from which the substrate 2 is formed.
- the intercalation compound 4 can be superposed on at least one face of the material, on at least 50%, even 70%, even at least 90% even at least 100% of the surface of this face of the material.
- the assembly formed by the material and the intercalation compound 4 can then be shaped 13, for example folded, rolled up, cut, and/or assembled to obtain the stack 20 of the substrate 2.
- the intercalation compound 4 can be porous. Thus, the gaseous precursors can diffuse through the intercalation compound 4. Alternatively or complementary, the intercalation compound 4 can have a surface roughness of between 5 nm and 1000 nm and thus allow the diffusion of the gaseous precursors at the interface between the intercalation compound 4 and the sheets 200 in the stack 20.
- the intercalating compound can be monolithic or discontinuous.
- the intercalation compound 4 is an open paper.
- the opened paper has a high porosity and/or roughness within the indicated ranges, in order to facilitate the diffusion of the gaseous precursors.
- the intercalation compound 14 is a grid.
- the substrate 2 may be free of intercalation compound or equivalently of any additional element to the substrate 2 making it possible to maintain the spacing 201.
- the spacing 201 may preferably be defined solely by the shape of the substrate 2 and /or its surface roughness.
- a sheet 200 in the form of a fold or a coil as illustrated for example in FIGS. 2B and 2D induces a spacing by the folds or the turns of the sheet.
- a sheet 200 having a three-dimensional shape with a complex geometry as illustrated for example in FIGS. 2B and 2D induces spacing by the folds or turns of the sheet.
- the process is therefore simplified, in particular by avoiding additional handling of the substrate to set up the intercalation compound.
- the risk of an area of the substrate 2 not being functionalized, because it is covered by the intercalation compound is avoided.
- the material from which the substrate 2 is formed can be a material having a rigidity allowing it to be shaped. More particularly, the Young's modulus of the material can be between 0.01 MPa and 100 MPa.
- each sheet 200 of the stack 20 may have a thickness e 2 oo of less than 5 mm, preferably less than 1 mm, preferably less than 0.5 mm.
- each sheet is preferably a paper or a fabric.
- each sheet 200 may have a thickness e 2 oo than 5 mm.
- each sheet is preferably a foam, or a dehydrated gel such as a xerogel, a cryogel and an airgel.
- the material from which the substrate 20 is formed is based on, or even consists of, a bio-based polymer and more particularly of cellulose.
- the functionalized substrate obtained is mostly biobased.
- the substrate 2 is based on starch, for example polylactic acid (abbreviated as PLA) or its derivatives.
- the substrate is based on cellulose.
- the substrate can be based on or made from lignocellulosic material, including cellulose and lignin.
- the molar mass of the monomer unit of the cellulose can be substantially equal to 162 g/mol.
- the density of the cellulose can be substantially equal to 1.54 g. cm 3 .
- the Young's modulus of cellulose can be between 3 and 4 GPa.
- the material can be open or closed.
- Substrate 20 can be formed from a variety of materials. According to one example, this plurality comprises at least one open material and at least one closed material.
- the substrate 20 can for example comprise a stack 20 of sheets 200, the sheets 200 being, alternately in the stack 20, based on an open material and based on a closed material.
- the substrate 20 can be obtained by winding or folding a superposition of an open material and a closed material.
- the open material can form an intercalation compound 4.
- the material may in particular be based on cellulose fibers and/or cellulose nanofibers.
- the material is a fabric. Note that the fabric can be open or closed.
- the substrate comprising a stack of material, it is possible to functionalize the fabric in a simplified way and in parallel.
- the material is a wood.
- the material is a paper.
- the material is a closed paper, such as parchment paper, tracing paper or silicone paper.
- the substrate can be an open paper, a foam, a dehydrated gel such as an airgel, a xerogel and a cryogel.
- An open paper is for example a blotting paper.
- a cellulose-based material, of the paper type can be obtained by the conventional techniques of the paper industry as well as by the techniques for obtaining dehydrated gel, that is to say a gel whose free water fraction has been removed, for example by sol-gel synthesis then by evaporation of the free fraction of water, for example by freeze-drying.
- the material is particular paper, for example cardboard.
- the material can be based on or made from molded cellulose.
- Molded cellulose is a material essentially made from paper, in particular recycled paper, and water. Molded cellulose is for example used in packaging applications. A substrate 2 based on molded cellulose can in particular have a three-dimensional geometry as illustrated in FIG. 2E. Molded cellulose packaging is generally coated with a plastic coating typically applied by hand or by dipping. The method makes it possible to functionalize a substrate based on or made of molded cellulose in a simplified way and compatible with an application on an industrial scale.
- a dehydrated gel can be obtained by dehydrating a gel.
- a dehydrated gel may comprise a proportion of water of less than 10%, or even less than 5%, or even less than 1%, relative to the total mass of the dehydrated gel.
- a xerogel can be obtained by air drying. During drying, the water evaporates and exerts high capillary traction on the polymer chains, which has the effect of shrinking them, typically at a rate greater than 90%. A low porosity gel is formed, typically less than 40% porosity.
- a gel can be dehydrated by replacing water with a liquid phase, then changing to a gaseous state, for example by supercritical drying, to obtain an airgel.
- Supercritical drying makes it possible to avoid phase changes of the solvent in the gel which can deteriorate its microstructure.
- Supercritical drying makes it possible to preserve the porosity of the gel as well as the spatial arrangement of the polymer chains, with a shrinkage rate typically lower than 15%.
- An airgel typically has a porosity greater than 98%.
- a gel can further be treated by lyophilization to obtain a cryogel.
- the gel can for example be immersed in a bath of liquid nitrogen for freezing in the shape of a mould. Then, by sublimation at low temperature, for example at less than 0° C., the cryogel is obtained.
- a cryogel typically has a porosity greater than 98%.
- airgel denotes all dehydrated gels, and therefore whether it is a xerogel, a cryogel or an airgel.
- the substrate 2 obtained after the chemical vapor deposition 11 of the thin layer 3 is illustrated by way of example in FIGS. 4A to 4D. Note that in FIG. 4D, the spacing 201 appears greater than that of FIGS. 2E and 3E for better readability of the figure with the representation of the thin layer 3.
- the deposition temperature 11, and more particularly the temperature at which the substrate 2 is heated may be less than 200°C, or even between room temperature and 200°C, or even between 20°C and 200°C, and preferably between 60°C and 150°C. Thus, the energy cost of the process is minimized. Since the degradation temperature of the cellulose is substantially 200° C., this temperature also makes it possible to minimize, or even avoid, degradation of the substrate 2 during deposition.
- the deposit 11 can in particular be configured so that the thin layer 3 deposited has a thickness of less than 100 nm over at least 80%, even at least 90%, even at least 99%, of the at least one thin layer 3 deposited.
- the thickness of thin layer 3 is between 1 angstrom, which typically corresponds to an atomic monolayer, and 100 nm, or even between 10 nm and 60 nm, or even between 10 and 40 nm.
- the functionalized substrate obtained can be bio-based at least at 95% by mass relative to its total mass.
- these thickness ranges of thin layer 3 limit, or even avoid, an alteration of the appearance, and in particular of the color of the substrate 2. For example, if the material from which the substrate is formed
- the material obtained from process 1 is also transparent. According to one example, the thickness of the thin layer 3 is substantially constant over at least
- the at least one thin layer 3 deposited 50%, or even at least 80%, or even at least 90%, or even at least 99%, of the at least one thin layer 3 deposited.
- the pressure of the reactive atmosphere comprising the gaseous precursors can be between 0.1 mbar and 1000 mbar, or even between 0.1 mbar and 100 mbar.
- the pressure of the reactive atmosphere can be substantially constant.
- the pressure of the reactive atmosphere comprising the gaseous precursors can vary within a range between 0.1 and 1000 mbar, or even between 0.1 and 100 mbar.
- substrate 20 can be exposed simultaneously to the various gaseous precursors.
- the thin layer can be exposed simultaneously to the various gaseous precursors.
- ALD deposition has several advantages over chemical vapor deposition (CVD). These benefits are detailed below. Deposition by ALD is particularly suitable for functionalizing a substrate based on a polymer, in particular a biobased polymer such as cellulose, and/or having a complex geometry.
- ALD deposition also makes it possible to deposit thin layers 3 having varied microstructures.
- the thin layer 3 deposited by ALD can be amorphous, monocrystalline or polycrystalline.
- the thin layer 3 can have a preferential crystalline orientation.
- the thin layer 3 is compliant, that is to say that the thin layer 3 has the same thickness, within manufacturing tolerances, despite changes in layer direction. Thanks to the deposition by ALD, the thickness of the thin layer 3 can be finely controlled. The deposition being consistent and of controlled thickness, it is understood that the deposition by ALD facilitates the deposition 11 of a thin layer 3 by minimizing the risk of filling in the spaces 201 between the sheets 200 of the stack 20.
- the deposition 11 by ALD of a thin layer 3 with a thickness of less than 100 nm on a substrate 2 based on a bio-based polymer, and in particular based on cellulose, is sufficient to improve the mechanical properties and/or the barrier properties to gases, in particular to oxygen and carbon dioxide, and to water, of the substrate 2.
- the deposition 11 by ALD comprises a deposition sequence of a plurality of cycles comprising an exposure 110 of the substrate 2 to the gaseous precursors, as illustrated by the dotted arrow in step 110 of FIG. 1. In a cycle, the exposure 110 can be followed by a purge with an inert gas, for example dinitrogen.
- the substrate can be exposed 110 to gaseous precursors for a period of between 1 second and 1 hour, or even between 1 second and 10 minutes, preferably between 1 second and 30 seconds.
- the purge can last between 1 second and 1 hour, or even between 1 second and 30 seconds.
- an ALD deposition reactor 5 is now described with reference to FIG. 5.
- the reactor 5 can be temperature-regulated or not.
- the substrate 2 is provided in a deposition chamber 50.
- Reservoirs 52 contain the precursors, each reservoir being connected to the deposition chamber 50 and possibly having a flow rate regulation system. It should be noted that in the reservoirs 51, the precursors can be in the solid, liquid or gaseous state. The precursors have passed into the gaseous state to be led into the deposition chamber 50, for example via a bubbling system in the reservoirs 51.
- the reactor further comprises a pumping system 53, for example connected to the deposition chamber 50.
- the reactor further comprises valves 52 allowing the operation of the reactor according to the desired mode.
- the reactor 5 is configured relative to the substrate 20 so that the gaseous precursors are injected parallel to at least one main extension direction of the spacing 201.
- the gaseous precursors can be injected in the direction x.
- the gaseous precursors can be injected along the z direction.
- the thin layer 3 deposited can be based on, or even consist of, a material whose deposition temperature is compatible with the stability temperature of the substrate 2. More particularly, this material can be chosen from an oxide, a nitride and an oxynitride . These materials may for example have the chemical formula: oxide: Al 2 0 3 , Ti0 2 , Si0 2 , AgO; ZnO
- - nitride AIN, TiN, TaN, NbN, oxynitride: AION, NbON, TaON.
- the precursors associated with the material of the thin layer 3 are known to those skilled in the art.
- the precursors for depositing a thin layer 3 of Al 2 0 3 can be trimethylaluminium and water.
- the precursors for depositing a thin layer 3 of Ti0 2 can be titanium tetraisopropoxide and water.
- a deposition of a thin layer 3 of oxide, nitride or oxynitride in the ranges of thicknesses previously described, on a substrate based on a polymer, in particular biosourced makes it possible to significantly improve its barrier properties to water and oxygen, and flame retardancy.
- the mechanical properties of the substrate 2 are not degraded by this deposit.
- the substrate 2 obtained notably has a similar rigidity to the non-functionalized substrate 2 in a dry environment.
- the mechanical properties of the functionalized substrate 2 in a humid environment can be improved compared to the non-functionalized substrate 2.
- a structure formed at least 90%, or even 99%, by a thin layer 3 of oxide, nitride or oxynitride has a resistance to high temperatures , typically up to 1800°C.
- the structure also has a thermal flow barrier property, advantageous for thermal insulation.
- a closed paper, such as a film of cellulose nanofibers, functionalized by method 1 is particularly suitable for applications as packaging, for storing food, or as a substrate for an organic light-emitting diode (OLED).
- a functionalized airgel can have a porosity greater than 98, or even 99
- the functionalized airgel preserves its structural integrity during brief passages at very high temperatures, for example greater than 1600° C. and has low thermal conductivity, for example less than 0.026 Wm 1 .K 1 at substantially 20° C. and at substantially 1 atmosphere (equal to 1013 hPa in the international system of units).
- a functionalized airgel is particularly suitable for thermal insulation.
- An open paper is particularly suitable for forming a membrane.
- FIG. 6A A functionalized closed paper is illustrated in FIG. 6A, comprising cellulose fibers or nanofibers 2000.
- the thin layer 3 is deposited on the faces 200a and 200b of the sheet 200.
- the side edges perpendicular to the faces 200a, 200b can be functionalized by the thin layer 3, or be free of it, for example following cutting 15 of the sheet 200 after the deposition 11.
- the oxygen permeation (in cm 3 .m 2 .day 1 ) of a closed paper of cellulose nanofibers (NFC) non-functionalized, and functionalized by a 40 nm deposit of Al 2 0 3 are summarized in the table below according to the relative humidity (% RH) of the environment, in comparison with a film of 50 ⁇ m of polyethylene terephthalate (PET).
- % RH relative humidity
- FIG. 6B An open paper and a functionalized airgel can be illustrated by Figure 6B.
- the thin layer 3 is deposited on the cellulose fibers or nanofibers 2000, and the schematic outline of the sheet is shown in dotted lines.
- a paper of cellulose fibers covered by ALD with a layer of Al 2 0 3 of 40 nm, for example of basis weight 5 gm 3 has a Young's modulus 15% higher than Young's modulus of unfunctionalized paper.
- This paper also has an internal cohesion 60% greater than the internal cohesion of the non-functionalized paper.
- This paper can be hydrophobic, with a contact angle with water of 120°. This paper can further exhibit flame retardant properties and water resistance.
- an airgel of cellulose nanofibers covered by ALD with a 40 nm layer of Al 2 0 3 has a Young's modulus 25% higher than the Young's modulus of the unfunctionalized airgel.
- the thermal conductivity of the functionalized airgel can be substantially 30 mW.m 1 .K 1 at atmospheric pressure.
- This airgel after calcination 14, can have very good thermal insulation properties.
- the functionalized airgel placed on a face in contact with a hot source at 1600°C can make it possible to obtain a temperature of 30°C on its face opposite to the face in contact with the hot source, the two faces being spaced 2cm.
- the present invention provides an improved method of chemical vapor deposition compatible with a functionalization of a substrate compatible with an application on an industrial scale.
- the process allows functionalization of a biosourced substrate, by chemical deposition of a thin layer, compatible with an application on an industrial scale.
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Abstract
Description
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Priority Applications (5)
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CN202180059276.5A CN116194617A (zh) | 2020-07-21 | 2021-07-20 | 通过化学沉积薄层使聚合物基的基材功能化的方法 |
KR1020237005942A KR20230042324A (ko) | 2020-07-21 | 2021-07-20 | 박층의 화학적 증착에 의해 폴리머-기반 기재를 관능화하는 방법 |
US18/006,335 US20230272522A1 (en) | 2020-07-21 | 2021-07-20 | Method for functionalizing a polymer-based substrate by chemical deposition of a thin layer |
JP2023504396A JP2023535419A (ja) | 2020-07-21 | 2021-07-20 | 薄膜の化学的堆積によりポリマー系基材を機能化するための方法 |
EP21748562.2A EP4185733A1 (fr) | 2020-07-21 | 2021-07-20 | Procédé de fonctionnalisation d'un substrat à base d'un polymère par dépôt chimique d'une couche mince |
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FR2007668A FR3112796B1 (fr) | 2020-07-21 | 2020-07-21 | Procédé de fonctionnalisation d’un substrat à base d’un polymère par dépôt chimique d’une couche mince |
FRFR2007668 | 2020-07-21 |
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EP (1) | EP4185733A1 (fr) |
JP (1) | JP2023535419A (fr) |
KR (1) | KR20230042324A (fr) |
CN (1) | CN116194617A (fr) |
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US3087233A (en) * | 1960-11-16 | 1963-04-30 | Fram Corp | Pervious metal fiber material and method of making the same |
JP6231483B2 (ja) * | 2011-10-31 | 2017-11-15 | スリーエム イノベイティブ プロパティズ カンパニー | ロール形態の基材にコーティングを適用する方法 |
-
2020
- 2020-07-21 FR FR2007668A patent/FR3112796B1/fr active Active
-
2021
- 2021-07-20 CN CN202180059276.5A patent/CN116194617A/zh active Pending
- 2021-07-20 US US18/006,335 patent/US20230272522A1/en active Pending
- 2021-07-20 JP JP2023504396A patent/JP2023535419A/ja active Pending
- 2021-07-20 KR KR1020237005942A patent/KR20230042324A/ko unknown
- 2021-07-20 EP EP21748562.2A patent/EP4185733A1/fr active Pending
- 2021-07-20 WO PCT/EP2021/070300 patent/WO2022018100A1/fr unknown
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FR3112796B1 (fr) | 2022-11-25 |
JP2023535419A (ja) | 2023-08-17 |
KR20230042324A (ko) | 2023-03-28 |
US20230272522A1 (en) | 2023-08-31 |
EP4185733A1 (fr) | 2023-05-31 |
FR3112796A1 (fr) | 2022-01-28 |
CN116194617A (zh) | 2023-05-30 |
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