KR20160011578A - 임프린트 방법, 임프린트 장치, 및 물품 제조 방법 - Google Patents

임프린트 방법, 임프린트 장치, 및 물품 제조 방법 Download PDF

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Publication number
KR20160011578A
KR20160011578A KR1020150099558A KR20150099558A KR20160011578A KR 20160011578 A KR20160011578 A KR 20160011578A KR 1020150099558 A KR1020150099558 A KR 1020150099558A KR 20150099558 A KR20150099558 A KR 20150099558A KR 20160011578 A KR20160011578 A KR 20160011578A
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KR
South Korea
Prior art keywords
substrate
pattern
imprint
strength reduction
bonding strength
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
KR1020150099558A
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English (en)
Korean (ko)
Inventor
요오스케 곤도
Original Assignee
캐논 가부시끼가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 캐논 가부시끼가이샤 filed Critical 캐논 가부시끼가이샤
Publication of KR20160011578A publication Critical patent/KR20160011578A/ko
Withdrawn legal-status Critical Current

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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C43/00—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor
    • B29C43/32—Component parts, details or accessories; Auxiliary operations
    • B29C43/58—Measuring, controlling or regulating
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29K—INDEXING SCHEME ASSOCIATED WITH SUBCLASSES B29B, B29C OR B29D, RELATING TO MOULDING MATERIALS OR TO MATERIALS FOR MOULDS, REINFORCEMENTS, FILLERS OR PREFORMED PARTS, e.g. INSERTS
    • B29K2105/00—Condition, form or state of moulded material or of the material to be shaped
    • B29K2105/0005—Condition, form or state of moulded material or of the material to be shaped containing compounding ingredients

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
KR1020150099558A 2014-07-22 2015-07-14 임프린트 방법, 임프린트 장치, 및 물품 제조 방법 Withdrawn KR20160011578A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2014148752A JP2016025230A (ja) 2014-07-22 2014-07-22 インプリント方法、インプリント装置、および物品の製造方法
JPJP-P-2014-148752 2014-07-22

Publications (1)

Publication Number Publication Date
KR20160011578A true KR20160011578A (ko) 2016-02-01

Family

ID=55165995

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020150099558A Withdrawn KR20160011578A (ko) 2014-07-22 2015-07-14 임프린트 방법, 임프린트 장치, 및 물품 제조 방법

Country Status (3)

Country Link
US (1) US20160023380A1 (https=)
JP (1) JP2016025230A (https=)
KR (1) KR20160011578A (https=)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6541518B2 (ja) * 2015-09-04 2019-07-10 キヤノン株式会社 インプリント装置、インプリント方法、および物品の製造方法
JP6821414B2 (ja) * 2016-12-13 2021-01-27 キヤノン株式会社 インプリント装置、及び物品の製造方法
JP7023744B2 (ja) * 2018-02-28 2022-02-22 キヤノン株式会社 インプリント方法及び製造方法
JP7149870B2 (ja) * 2019-02-08 2022-10-07 キヤノン株式会社 インプリント装置および物品製造方法

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004071831A (ja) * 2002-08-06 2004-03-04 Canon Inc 微細加工装置およびこれを用いたデバイス
US7307118B2 (en) * 2004-11-24 2007-12-11 Molecular Imprints, Inc. Composition to reduce adhesion between a conformable region and a mold
JP5632633B2 (ja) * 2010-03-26 2014-11-26 キヤノン株式会社 インプリント装置、インプリント方法及び物品の製造方法
JP5306404B2 (ja) * 2011-03-25 2013-10-02 株式会社東芝 パターン形成方法
JP5653864B2 (ja) * 2011-08-18 2015-01-14 富士フイルム株式会社 ナノインプリント用のモールドの離型処理方法およびそれを用いた製造方法並びにモールド、ナノインプリント方法およびパターン化基板の製造方法
JP6019953B2 (ja) * 2012-09-04 2016-11-02 大日本印刷株式会社 凸状構造体の製造方法及び製造システム

Also Published As

Publication number Publication date
JP2016025230A (ja) 2016-02-08
US20160023380A1 (en) 2016-01-28

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