KR20140071910A - 포트리소그래피용 수지의 정제 방법 - Google Patents

포트리소그래피용 수지의 정제 방법 Download PDF

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Publication number
KR20140071910A
KR20140071910A KR1020130147225A KR20130147225A KR20140071910A KR 20140071910 A KR20140071910 A KR 20140071910A KR 1020130147225 A KR1020130147225 A KR 1020130147225A KR 20130147225 A KR20130147225 A KR 20130147225A KR 20140071910 A KR20140071910 A KR 20140071910A
Authority
KR
South Korea
Prior art keywords
resin
poor solvent
solvent
polymerization
solution
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
KR1020130147225A
Other languages
English (en)
Korean (ko)
Inventor
토모 오이카와
Original Assignee
마루젠 세끼유가가꾸 가부시키가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 마루젠 세끼유가가꾸 가부시키가이샤 filed Critical 마루젠 세끼유가가꾸 가부시키가이샤
Publication of KR20140071910A publication Critical patent/KR20140071910A/ko
Ceased legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F232/00—Copolymers of cyclic compounds containing no unsaturated aliphatic radicals in a side chain, and having one or more carbon-to-carbon double bonds in a carbocyclic ring system
    • C08F232/08—Copolymers of cyclic compounds containing no unsaturated aliphatic radicals in a side chain, and having one or more carbon-to-carbon double bonds in a carbocyclic ring system having condensed rings
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J3/00—Processes of treating or compounding macromolecular substances
    • C08J3/12—Powdering or granulating
    • C08J3/14—Powdering or granulating by precipitation from solutions
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F6/00—Post-polymerisation treatments
    • C08F6/26—Treatment of polymers prepared in bulk also solid polymers or polymer melts
    • C08F6/28—Purification

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
KR1020130147225A 2012-12-04 2013-11-29 포트리소그래피용 수지의 정제 방법 Ceased KR20140071910A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JPJP-P-2012-265529 2012-12-04
JP2012265529A JP2014109022A (ja) 2012-12-04 2012-12-04 フォトリソグラフィー用樹脂の精製方法

Publications (1)

Publication Number Publication Date
KR20140071910A true KR20140071910A (ko) 2014-06-12

Family

ID=50826058

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020130147225A Ceased KR20140071910A (ko) 2012-12-04 2013-11-29 포트리소그래피용 수지의 정제 방법

Country Status (4)

Country Link
US (1) US9023982B2 (enExample)
JP (1) JP2014109022A (enExample)
KR (1) KR20140071910A (enExample)
TW (1) TWI583712B (enExample)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6467270B2 (ja) * 2015-04-03 2019-02-06 昭和電工株式会社 ノルボルネン系付加共重合体の製造方法
US11746169B2 (en) 2020-07-06 2023-09-05 Asahi Kasei Kabushiki Kaisha Polymer composition and ion-exchange membrane
CN116046941B (zh) * 2022-12-30 2024-06-25 徐州博康信息化学品有限公司 一种光刻胶树脂中残余单体含量的测试方法

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4510304A (en) * 1982-09-30 1985-04-09 General Technology Applications, Inc. Polymer fractionation
JPH04120133A (ja) * 1990-09-12 1992-04-21 Asahi Glass Co Ltd 重合体溶液から重合体を分離する方法
JP2002097282A (ja) * 2000-09-26 2002-04-02 Nippon Kayaku Co Ltd ポリアミド樹脂微粉末の製造方法
JP2003292526A (ja) * 2002-04-08 2003-10-15 Sumitomo Chem Co Ltd 固体樹脂の製造法

Also Published As

Publication number Publication date
TWI583712B (zh) 2017-05-21
TW201425363A (zh) 2014-07-01
US20140155564A1 (en) 2014-06-05
JP2014109022A (ja) 2014-06-12
US9023982B2 (en) 2015-05-05

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