JP2014109022A - フォトリソグラフィー用樹脂の精製方法 - Google Patents

フォトリソグラフィー用樹脂の精製方法 Download PDF

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Publication number
JP2014109022A
JP2014109022A JP2012265529A JP2012265529A JP2014109022A JP 2014109022 A JP2014109022 A JP 2014109022A JP 2012265529 A JP2012265529 A JP 2012265529A JP 2012265529 A JP2012265529 A JP 2012265529A JP 2014109022 A JP2014109022 A JP 2014109022A
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JP
Japan
Prior art keywords
resin
poor solvent
solvent
polymerization
purification
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2012265529A
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English (en)
Japanese (ja)
Other versions
JP2014109022A5 (enExample
Inventor
Tomo Oikawa
川 知 及
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Maruzen Petrochemical Co Ltd
Original Assignee
Maruzen Petrochemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Maruzen Petrochemical Co Ltd filed Critical Maruzen Petrochemical Co Ltd
Priority to JP2012265529A priority Critical patent/JP2014109022A/ja
Priority to US14/071,977 priority patent/US9023982B2/en
Priority to TW102141265A priority patent/TWI583712B/zh
Priority to KR1020130147225A priority patent/KR20140071910A/ko
Publication of JP2014109022A publication Critical patent/JP2014109022A/ja
Publication of JP2014109022A5 publication Critical patent/JP2014109022A5/ja
Pending legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F232/00—Copolymers of cyclic compounds containing no unsaturated aliphatic radicals in a side chain, and having one or more carbon-to-carbon double bonds in a carbocyclic ring system
    • C08F232/08—Copolymers of cyclic compounds containing no unsaturated aliphatic radicals in a side chain, and having one or more carbon-to-carbon double bonds in a carbocyclic ring system having condensed rings
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J3/00—Processes of treating or compounding macromolecular substances
    • C08J3/12—Powdering or granulating
    • C08J3/14—Powdering or granulating by precipitation from solutions
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F6/00—Post-polymerisation treatments
    • C08F6/26—Treatment of polymers prepared in bulk also solid polymers or polymer melts
    • C08F6/28—Purification

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
JP2012265529A 2012-12-04 2012-12-04 フォトリソグラフィー用樹脂の精製方法 Pending JP2014109022A (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2012265529A JP2014109022A (ja) 2012-12-04 2012-12-04 フォトリソグラフィー用樹脂の精製方法
US14/071,977 US9023982B2 (en) 2012-12-04 2013-11-05 Method for purifying resin for photolithography
TW102141265A TWI583712B (zh) 2012-12-04 2013-11-13 光微影術用樹脂之精製方法
KR1020130147225A KR20140071910A (ko) 2012-12-04 2013-11-29 포트리소그래피용 수지의 정제 방법

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2012265529A JP2014109022A (ja) 2012-12-04 2012-12-04 フォトリソグラフィー用樹脂の精製方法

Publications (2)

Publication Number Publication Date
JP2014109022A true JP2014109022A (ja) 2014-06-12
JP2014109022A5 JP2014109022A5 (enExample) 2015-12-03

Family

ID=50826058

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2012265529A Pending JP2014109022A (ja) 2012-12-04 2012-12-04 フォトリソグラフィー用樹脂の精製方法

Country Status (4)

Country Link
US (1) US9023982B2 (enExample)
JP (1) JP2014109022A (enExample)
KR (1) KR20140071910A (enExample)
TW (1) TWI583712B (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2016196552A (ja) * 2015-04-03 2016-11-24 昭和電工株式会社 ノルボルネン系付加共重合体の製造方法
US11746169B2 (en) 2020-07-06 2023-09-05 Asahi Kasei Kabushiki Kaisha Polymer composition and ion-exchange membrane

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN116046941B (zh) * 2022-12-30 2024-06-25 徐州博康信息化学品有限公司 一种光刻胶树脂中残余单体含量的测试方法

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04120133A (ja) * 1990-09-12 1992-04-21 Asahi Glass Co Ltd 重合体溶液から重合体を分離する方法
JP2002097282A (ja) * 2000-09-26 2002-04-02 Nippon Kayaku Co Ltd ポリアミド樹脂微粉末の製造方法
JP2003292526A (ja) * 2002-04-08 2003-10-15 Sumitomo Chem Co Ltd 固体樹脂の製造法

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4510304A (en) * 1982-09-30 1985-04-09 General Technology Applications, Inc. Polymer fractionation

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04120133A (ja) * 1990-09-12 1992-04-21 Asahi Glass Co Ltd 重合体溶液から重合体を分離する方法
JP2002097282A (ja) * 2000-09-26 2002-04-02 Nippon Kayaku Co Ltd ポリアミド樹脂微粉末の製造方法
JP2003292526A (ja) * 2002-04-08 2003-10-15 Sumitomo Chem Co Ltd 固体樹脂の製造法

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2016196552A (ja) * 2015-04-03 2016-11-24 昭和電工株式会社 ノルボルネン系付加共重合体の製造方法
US11746169B2 (en) 2020-07-06 2023-09-05 Asahi Kasei Kabushiki Kaisha Polymer composition and ion-exchange membrane

Also Published As

Publication number Publication date
TWI583712B (zh) 2017-05-21
TW201425363A (zh) 2014-07-01
KR20140071910A (ko) 2014-06-12
US20140155564A1 (en) 2014-06-05
US9023982B2 (en) 2015-05-05

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