KR20110096059A - Uv 경화성 무기-유기 하이브리드 레진 및 그 제조 방법 - Google Patents
Uv 경화성 무기-유기 하이브리드 레진 및 그 제조 방법 Download PDFInfo
- Publication number
- KR20110096059A KR20110096059A KR1020117015210A KR20117015210A KR20110096059A KR 20110096059 A KR20110096059 A KR 20110096059A KR 1020117015210 A KR1020117015210 A KR 1020117015210A KR 20117015210 A KR20117015210 A KR 20117015210A KR 20110096059 A KR20110096059 A KR 20110096059A
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- South Korea
- Prior art keywords
- monomer
- mixture
- less
- organic hybrid
- hybrid resin
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/48—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule in which at least two but not all the silicon atoms are connected by linkages other than oxygen atoms
- C08G77/58—Metal-containing linkages
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/04—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0037—Production of three-dimensional images
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0042—Photosensitive materials with inorganic or organometallic light-sensitive compounds not otherwise provided for, e.g. inorganic resists
- G03F7/0043—Chalcogenides; Silicon, germanium, arsenic or derivatives thereof; Metals, oxides or alloys thereof
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/075—Silicon-containing compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/075—Silicon-containing compounds
- G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/28—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
- H01L23/29—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the material, e.g. carbon
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/28—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
- H01L23/29—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the material, e.g. carbon
- H01L23/293—Organic, e.g. plastic
- H01L23/296—Organo-silicon compounds
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Medicinal Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Polymers & Plastics (AREA)
- Power Engineering (AREA)
- Computer Hardware Design (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Optics & Photonics (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Metallurgy (AREA)
- Polymerisation Methods In General (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US11945908P | 2008-12-03 | 2008-12-03 | |
US61/119,459 | 2008-12-03 |
Publications (1)
Publication Number | Publication Date |
---|---|
KR20110096059A true KR20110096059A (ko) | 2011-08-26 |
Family
ID=41625220
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020117015210A KR20110096059A (ko) | 2008-12-03 | 2009-12-03 | Uv 경화성 무기-유기 하이브리드 레진 및 그 제조 방법 |
Country Status (7)
Country | Link |
---|---|
US (1) | US8969219B2 (ja) |
EP (1) | EP2370502A1 (ja) |
JP (1) | JP2012510554A (ja) |
KR (1) | KR20110096059A (ja) |
CN (1) | CN102264802A (ja) |
CA (1) | CA2745075A1 (ja) |
WO (1) | WO2010064240A1 (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR102223131B1 (ko) | 2020-05-18 | 2021-03-05 | 주식회사 마이크로원 | 여과집진기의 여과효율 향상을 위한 재봉부 무용제 심실링 적용 필터 및 이의 제조 공법 |
Families Citing this family (19)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI452068B (zh) * | 2008-03-26 | 2014-09-11 | Lintec Corp | A silane compound polymer, and a light element sealing body |
DE102009019370A1 (de) * | 2009-04-29 | 2011-01-27 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Verfahren zum Verkapseln von flüssigen oder pastösen Substanzen in einem vernetzten Verkapselungsmaterial |
KR101611999B1 (ko) * | 2010-02-04 | 2016-04-14 | 삼성디스플레이 주식회사 | 접착제, 접착제를 갖는 표시 장치, 표시 장치의 제조 방법 및 본딩 장치 |
US8858025B2 (en) * | 2012-03-07 | 2014-10-14 | Lg Innotek Co., Ltd. | Lighting device |
US9627595B2 (en) * | 2012-06-27 | 2017-04-18 | Lg Innotek Co., Ltd. | Lighting device |
EP2935493B1 (en) * | 2012-12-21 | 2016-09-21 | 3M Innovative Properties Company | Curable silsesquioxane polymers, compositions, articles, and methods |
US20140178698A1 (en) * | 2012-12-21 | 2014-06-26 | 3M Innovative Properties Company | Curable silsesquioxane polymers, compositions, articles, and methods |
US9963786B2 (en) | 2013-03-15 | 2018-05-08 | Henkel Ag & Co. Kgaa | Inorganic composite coatings comprising novel functionalized acrylics |
US9957440B2 (en) | 2013-09-27 | 2018-05-01 | Halliburton Energy Services, Inc. | Expandable particulates and methods of use and preparation |
US20180251645A1 (en) * | 2015-08-19 | 2018-09-06 | Yissum Research Development Company Of The Hebrew University Of Jerusalem Ltd | 3d polymerizable ceramic inks |
PT3246175T (pt) * | 2016-05-20 | 2018-10-22 | Flooring Technologies Ltd | Processo para a produção de uma placa de derivados de madeira resistente à abrasão e linha de produção para a mesma |
ES2803757T3 (es) | 2017-11-06 | 2021-01-29 | Flooring Technologies Ltd | Procedimiento para fabricar un tablero de material derivado de la madera resistente a la abrasión y línea de producción para ello |
CN109991813B (zh) * | 2017-12-29 | 2022-06-21 | 财团法人工业技术研究院 | 感光型复合材料及使用其形成复合薄膜的方法 |
CN111868142B (zh) * | 2018-12-28 | 2022-08-16 | 浙江三时纪新材科技有限公司 | 一种球形硅树脂粉体或其接团体的制备方法以及由此得到的球形硅树脂粉体或其接团体 |
PT3686028T (pt) | 2019-01-22 | 2021-05-05 | Flooring Technologies Ltd | Processo para o fabrico de um painel de derivados de madeira resistente à abrasão |
DE102020112268A1 (de) * | 2020-05-06 | 2021-11-11 | EXXERGY GmbH | Verbesserung der Glasfestigkeit und Bruchzähigkeit durch eine nicht spröde, abriebfeste Beschichtung |
CN112831002A (zh) * | 2021-02-05 | 2021-05-25 | 珠海格力电器股份有限公司 | 光敏树脂及其合成方法 |
CN113125310B (zh) * | 2021-04-19 | 2022-08-16 | 安徽农业大学 | 一种监测塑料包装中光起始剂-907渗透行为的方法 |
WO2023170438A1 (en) * | 2022-03-10 | 2023-09-14 | Totalenergies One Tech | Photoactivable hybrid organic-inorganic sol-gel resin for 3d printing |
Family Cites Families (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4880851A (en) * | 1987-02-26 | 1989-11-14 | Tohru Yamamoto | Aromatic composition and method for the production of the same |
US5204381A (en) * | 1990-02-13 | 1993-04-20 | The United States Of America As Represented By The United States Department Of Energy | Hybrid sol-gel optical materials |
JPH07331173A (ja) * | 1995-02-21 | 1995-12-19 | Toray Ind Inc | 光学材料形成用塗液組成物および光学材料 |
US5776565A (en) * | 1996-12-04 | 1998-07-07 | International Paper Company | Hybrid sol-gel barrier coatings |
WO2002088221A1 (en) | 2001-04-27 | 2002-11-07 | The University Of Sydney | Materials for optical applications |
DE10148894A1 (de) * | 2001-10-04 | 2003-04-30 | Fraunhofer Ges Forschung | Photochemisch und/oder thermisch strukturierbare Harze auf Silanbasis, einstufiges Verfahren zu deren Herstellung, dabei einzetzbare Ausgangsverbindungen und Herstellungsverfahren für diese |
DE10200760A1 (de) * | 2002-01-10 | 2003-07-24 | Clariant Gmbh | Nanokompositmaterial zur Herstellung von Brechzahlgradientenfolien |
US6727337B2 (en) * | 2002-05-16 | 2004-04-27 | The Australian National University | Low loss optical material |
JP2004307659A (ja) * | 2003-04-08 | 2004-11-04 | Olympus Corp | 光学素子および光学素子形成用の有機無機複合材料 |
CN1616523B (zh) * | 2003-09-29 | 2010-12-08 | 三洋电机株式会社 | 有机金属聚合物材料及其制造方法 |
KR100614976B1 (ko) * | 2004-04-12 | 2006-08-25 | 한국과학기술원 | 광소자 또는 디스플레이에 이용되는 무기/유기혼성올리고머, 나노혼성고분자 및 그 제조방법 |
TW200700510A (en) * | 2005-02-25 | 2007-01-01 | Optimax Tech Corp | Inorganic-organic hybrid nanocomposite antiglare and antireflection coatings |
EP2067824A1 (en) * | 2006-09-29 | 2009-06-10 | Nippon Shokubai Co., Ltd. | Curable resin composition, optical material, and method of regulating optical material |
WO2008041630A1 (fr) * | 2006-09-29 | 2008-04-10 | Asahi Kasei Emd Corporation | Composition de polyorganosiloxane |
DE102006052303B4 (de) * | 2006-11-03 | 2012-07-12 | Eads Deutschland Gmbh | Schutz von erosionsbelasteten Luftfahrtstrukturen durch nanopartikelverstärkte anorganisch-organische Hybridbeschichtungen |
JP5321456B2 (ja) * | 2007-06-26 | 2013-10-23 | コニカミノルタ株式会社 | クリアーハードコートフィルム、これを用いた反射防止フィルム、偏光板、及び表示装置 |
KR100980270B1 (ko) * | 2008-07-31 | 2010-09-07 | 한국과학기술원 | Led 봉지용 실록산 수지 |
-
2009
- 2009-12-03 WO PCT/IL2009/001138 patent/WO2010064240A1/en active Application Filing
- 2009-12-03 EP EP09796099A patent/EP2370502A1/en not_active Ceased
- 2009-12-03 US US13/132,635 patent/US8969219B2/en active Active
- 2009-12-03 JP JP2011539173A patent/JP2012510554A/ja active Pending
- 2009-12-03 KR KR1020117015210A patent/KR20110096059A/ko not_active Application Discontinuation
- 2009-12-03 CN CN200980148720XA patent/CN102264802A/zh active Pending
- 2009-12-03 CA CA2745075A patent/CA2745075A1/en not_active Abandoned
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR102223131B1 (ko) | 2020-05-18 | 2021-03-05 | 주식회사 마이크로원 | 여과집진기의 여과효율 향상을 위한 재봉부 무용제 심실링 적용 필터 및 이의 제조 공법 |
Also Published As
Publication number | Publication date |
---|---|
US20110244695A1 (en) | 2011-10-06 |
EP2370502A1 (en) | 2011-10-05 |
JP2012510554A (ja) | 2012-05-10 |
CN102264802A (zh) | 2011-11-30 |
CA2745075A1 (en) | 2010-06-10 |
WO2010064240A1 (en) | 2010-06-10 |
US8969219B2 (en) | 2015-03-03 |
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