KR20080065940A - 위치검출장치 및 노광장치 - Google Patents

위치검출장치 및 노광장치 Download PDF

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Publication number
KR20080065940A
KR20080065940A KR1020080002834A KR20080002834A KR20080065940A KR 20080065940 A KR20080065940 A KR 20080065940A KR 1020080002834 A KR1020080002834 A KR 1020080002834A KR 20080002834 A KR20080002834 A KR 20080002834A KR 20080065940 A KR20080065940 A KR 20080065940A
Authority
KR
South Korea
Prior art keywords
substrate
light
optical system
light receiving
lens
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
KR1020080002834A
Other languages
English (en)
Korean (ko)
Inventor
타카히로 마츠모토
Original Assignee
캐논 가부시끼가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 캐논 가부시끼가이샤 filed Critical 캐논 가부시끼가이샤
Publication of KR20080065940A publication Critical patent/KR20080065940A/ko
Abandoned legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7023—Aligning or positioning in direction perpendicular to substrate surface
    • G03F9/7026—Focusing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7088—Alignment mark detection, e.g. TTR, TTL, off-axis detection, array detector, video detection

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Multimedia (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Length Measuring Devices By Optical Means (AREA)
KR1020080002834A 2007-01-10 2008-01-10 위치검출장치 및 노광장치 Abandoned KR20080065940A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007002877A JP2008171960A (ja) 2007-01-10 2007-01-10 位置検出装置及び露光装置
JPJP-P-2007-00002877 2007-01-10

Publications (1)

Publication Number Publication Date
KR20080065940A true KR20080065940A (ko) 2008-07-15

Family

ID=39593981

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020080002834A Abandoned KR20080065940A (ko) 2007-01-10 2008-01-10 위치검출장치 및 노광장치

Country Status (4)

Country Link
US (1) US7528966B2 (enExample)
JP (1) JP2008171960A (enExample)
KR (1) KR20080065940A (enExample)
TW (1) TW200842511A (enExample)

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7907792B2 (en) * 2006-06-16 2011-03-15 Hewlett-Packard Development Company, L.P. Blend maps for rendering an image frame
NL1036559A1 (nl) * 2008-03-12 2009-09-15 Asml Netherlands Bv Lithographic Apparatus and Method.
JP5111225B2 (ja) * 2008-05-01 2013-01-09 キヤノン株式会社 計測装置、計測方法、露光装置及びデバイス製造方法
CN102498441B (zh) * 2009-07-31 2015-09-16 Asml荷兰有限公司 量测方法和设备、光刻系统以及光刻处理单元
NL2005975A (en) 2010-03-03 2011-09-06 Asml Netherlands Bv Imprint lithography.
TWI418914B (zh) * 2010-03-31 2013-12-11 Pixart Imaging Inc 適用於光感測系統之失焦校正模組及其方法
EP2699967B1 (en) 2011-04-22 2023-09-13 ASML Netherlands B.V. Position determination in a lithography system using a substrate having a partially reflective position mark
TW201248336A (en) 2011-04-22 2012-12-01 Mapper Lithography Ip Bv Lithography system for processing a target, such as a wafer, and a method for operating a lithography system for processing a target, such as a wafer
US9383662B2 (en) 2011-05-13 2016-07-05 Mapper Lithography Ip B.V. Lithography system for processing at least a part of a target
KR101278391B1 (ko) * 2012-02-21 2013-06-27 삼성전기주식회사 레이저 스캔 장치 및 레이저 스캔 방법
CN103529650B (zh) * 2012-07-02 2016-01-20 上海微电子装备有限公司 一种高度测量装置及其测量方法
JP6298674B2 (ja) * 2014-03-24 2018-03-20 株式会社ディスコ 切削装置
CN107290937B (zh) * 2016-03-31 2018-10-16 上海微电子装备（集团）股份有限公司 一种投影曝光装置及方法
JP2018049127A (ja) * 2016-09-21 2018-03-29 ルネサスエレクトロニクス株式会社 露光装置、露光方法、およびデバイス製造方法
NL2018857B1 (en) 2017-05-05 2018-11-09 Illumina Inc Systems and methods for improved focus tracking using a light source configuration
NL2018853B1 (en) 2017-05-05 2018-11-14 Illumina Inc Systems and methods for improved focus tracking using a hybrid mode light source
NL2018854B1 (en) * 2017-05-05 2018-11-14 Illumina Inc Systems and methodes for improved focus tracking using blocking structures
US10725292B2 (en) * 2018-02-01 2020-07-28 Varjo Technologies Oy Gaze-tracking system and aperture device
WO2019181457A1 (ja) * 2018-03-19 2019-09-26 ソニーセミコンダクタソリューションズ株式会社 光源システム、光学回折素子製造方法、および測距システム、ならびに光学回折素子
JP7193304B2 (ja) * 2018-03-19 2022-12-20 ソニーセミコンダクタソリューションズ株式会社 光源システム、光学回折素子製造方法、および測距システム、ならびに光学回折素子
TWI776339B (zh) * 2020-12-30 2022-09-01 致茂電子股份有限公司 半導體製程中的光學檢測設備

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2501015C2 (de) * 1975-01-13 1976-08-19 Siemens Ag Beruehrungsfreies Dickenmessverfahren
US4643569A (en) * 1985-06-18 1987-02-17 Lincoln Laser Company Dual beam laser inspection apparatus
JPH07105327B2 (ja) * 1986-06-27 1995-11-13 キヤノン株式会社 面位置検知装置
US5325176A (en) * 1988-02-16 1994-06-28 Canon Kabushiki Kaisha Position detecting method and apparatus including Fraunhofer diffraction detector
US5124562A (en) * 1989-01-27 1992-06-23 Canon Kabushiki Kaisha Surface position detecting method at a predetermined and plurality of adjacent points
JPH05257058A (ja) 1991-12-27 1993-10-08 Nec Corp 焦点ズレ検出装置
DE69329611T2 (de) * 1992-08-19 2001-05-03 Canon K.K., Tokio/Tokyo Verfahren zur Registrierung mittels eines projizierenden optischen System, Belichtungsapparat zu dessen Durchführung und sowie Halbleiter-Herstellungsverfahren das diesen Belichtungsapparat verwendet
JP3428829B2 (ja) 1996-08-27 2003-07-22 キヤノン株式会社 位置合わせ方法及びそれを用いた投影露光装置
JPH1116827A (ja) 1997-06-23 1999-01-22 Canon Inc 面情報検出装置及びそれを用いた投影露光装置
DE10317958B4 (de) * 2003-04-17 2005-09-08 Hilti Ag Vorrichtung zum Erzeugen und Projizieren von Lichtmarken

Also Published As

Publication number Publication date
US7528966B2 (en) 2009-05-05
JP2008171960A (ja) 2008-07-24
US20080165368A1 (en) 2008-07-10
TW200842511A (en) 2008-11-01

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A201 Request for examination
PA0109 Patent application

Patent event code: PA01091R01D

Comment text: Patent Application

Patent event date: 20080110

PA0201 Request for examination
PG1501 Laying open of application
E701 Decision to grant or registration of patent right
PE0701 Decision of registration

Patent event code: PE07011S01D

Comment text: Decision to Grant Registration

Patent event date: 20090731

NORF Unpaid initial registration fee
PC1904 Unpaid initial registration fee