KR20080024062A - 엑시머 광 조사 장치 - Google Patents

엑시머 광 조사 장치 Download PDF

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Publication number
KR20080024062A
KR20080024062A KR1020070079459A KR20070079459A KR20080024062A KR 20080024062 A KR20080024062 A KR 20080024062A KR 1020070079459 A KR1020070079459 A KR 1020070079459A KR 20070079459 A KR20070079459 A KR 20070079459A KR 20080024062 A KR20080024062 A KR 20080024062A
Authority
KR
South Korea
Prior art keywords
space
excimer
gas
substrate
substitution
Prior art date
Application number
KR1020070079459A
Other languages
English (en)
Korean (ko)
Inventor
신이치 엔도
히로시 고야나기
Original Assignee
우시오덴키 가부시키가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 우시오덴키 가부시키가이샤 filed Critical 우시오덴키 가부시키가이샤
Publication of KR20080024062A publication Critical patent/KR20080024062A/ko

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/67034—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for drying
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B7/00—Cleaning by methods not provided for in a single other subclass or a single group in this subclass
    • B08B7/0035—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by radiant energy, e.g. UV, laser, light beam or the like
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67703—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
    • H01L21/67706—Mechanical details, e.g. roller, belt

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Optics & Photonics (AREA)
  • Cleaning In General (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
KR1020070079459A 2006-09-12 2007-08-08 엑시머 광 조사 장치 KR20080024062A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2006246405A JP2008068155A (ja) 2006-09-12 2006-09-12 エキシマ光照射装置
JPJP-P-2006-00246405 2006-09-12

Publications (1)

Publication Number Publication Date
KR20080024062A true KR20080024062A (ko) 2008-03-17

Family

ID=39290225

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020070079459A KR20080024062A (ko) 2006-09-12 2007-08-08 엑시머 광 조사 장치

Country Status (4)

Country Link
JP (1) JP2008068155A (zh)
KR (1) KR20080024062A (zh)
CN (1) CN101199923B (zh)
TW (1) TW200814185A (zh)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20180048791A (ko) * 2015-08-27 2018-05-10 서스 마이크로텍 포토마스크 이큅먼트 게엠베하 운트 코. 카게 기판 상에 uv 방사로 조사된 액체 매체를 도포하기 위한 장치

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5195111B2 (ja) * 2008-07-17 2013-05-08 ウシオ電機株式会社 エキシマランプ装置
JP5083184B2 (ja) * 2008-11-26 2012-11-28 ウシオ電機株式会社 エキシマランプ装置
JP5051160B2 (ja) * 2009-03-17 2012-10-17 ウシオ電機株式会社 紫外線照射装置
DE102017203351B4 (de) * 2017-03-01 2021-08-05 Süss Microtec Photomask Equipment Gmbh & Co. Kg Vorrichtung zum Aufbringen eines mit UV-Strahlung beaufschlagten flüssigen Mediums auf ein Substrat
JP6984206B2 (ja) * 2017-07-19 2021-12-17 ウシオ電機株式会社 光照射装置
CN110787978B (zh) * 2019-11-04 2024-01-02 广东瀚秋智能装备股份有限公司 超哑光哑光机

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001300451A (ja) * 2000-04-25 2001-10-30 Hoya Schott Kk 紫外光照射装置
TWI251506B (en) * 2000-11-01 2006-03-21 Shinetsu Eng Co Ltd Excimer UV photo reactor
CN1353029A (zh) * 2000-11-09 2002-06-12 财团法人工业技术研究院 用准分子激光制造微球面与非球面高分子结构阵列的方法
CN1290154C (zh) * 2003-07-16 2006-12-13 友达光电股份有限公司 激光结晶系统和控制准分子激光退火制程能量密度的方法

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20180048791A (ko) * 2015-08-27 2018-05-10 서스 마이크로텍 포토마스크 이큅먼트 게엠베하 운트 코. 카게 기판 상에 uv 방사로 조사된 액체 매체를 도포하기 위한 장치
CN108348964A (zh) * 2015-08-27 2018-07-31 聚斯微技术光掩模设备两合公司 用于将利用uv辐射辐照的液体介质施加到基板上的装置
CN108348964B (zh) * 2015-08-27 2021-07-27 聚斯微技术光掩模设备两合公司 用于将利用uv辐射辐照的液体介质施加到基板上的装置

Also Published As

Publication number Publication date
JP2008068155A (ja) 2008-03-27
CN101199923B (zh) 2011-08-17
TW200814185A (en) 2008-03-16
CN101199923A (zh) 2008-06-18

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Date Code Title Description
A201 Request for examination
E902 Notification of reason for refusal
E601 Decision to refuse application