KR20070102623A - 이중 주파수 ｒｆ 신호들을 이용한 플라즈마 생성 및 제어 - Google Patents

이중 주파수 ｒｆ 신호들을 이용한 플라즈마 생성 및 제어 Download PDF

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Publication number
KR20070102623A
KR20070102623A KR1020077021009A KR20077021009A KR20070102623A KR 20070102623 A KR20070102623 A KR 20070102623A KR 1020077021009 A KR1020077021009 A KR 1020077021009A KR 20077021009 A KR20077021009 A KR 20077021009A KR 20070102623 A KR20070102623 A KR 20070102623A
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KR
South Korea
Prior art keywords
frequency
plasma
mhz
processing chamber
frequencies
Prior art date
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Ceased
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KR1020077021009A
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English (en)
Korean (ko)
Inventor
스티븐 샤논
알렉산더 파터슨
테오도로스 파나고폴로스
존 홀랜드
데니스 그리마드
다니엘 호프만
Original Assignee
어플라이드 머티어리얼스, 인코포레이티드
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Application filed by 어플라이드 머티어리얼스, 인코포레이티드 filed Critical 어플라이드 머티어리얼스, 인코포레이티드
Publication of KR20070102623A publication Critical patent/KR20070102623A/ko
Ceased legal-status Critical Current

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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/32137—Radio frequency generated discharge controlling of the discharge by modulation of energy
    • H01J37/32155—Frequency modulation
    • H01J37/32165—Plural frequencies
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67063—Apparatus for fluid treatment for etching
    • H01L21/67069—Apparatus for fluid treatment for etching for drying etching

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Plasma Technology (AREA)
  • Chemical Vapour Deposition (AREA)
  • Drying Of Semiconductors (AREA)
KR1020077021009A 2005-05-09 2006-05-04 이중 주파수 ｒｆ 신호들을 이용한 플라즈마 생성 및 제어 Ceased KR20070102623A (ko)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US67904205P 2005-05-09 2005-05-09
US60/679,042 2005-05-09
US11/416,468 US7510665B2 (en) 2003-08-15 2006-05-02 Plasma generation and control using dual frequency RF signals
US11/416,468 2006-05-02

Publications (1)

Publication Number Publication Date
KR20070102623A true KR20070102623A (ko) 2007-10-18

Family

ID=37396865

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020077021009A Ceased KR20070102623A (ko) 2005-05-09 2006-05-04 이중 주파수 ｒｆ 신호들을 이용한 플라즈마 생성 및 제어

Country Status (5)

Country Link
US (1) US7510665B2 (enExample)
JP (1) JP2008544480A (enExample)
KR (1) KR20070102623A (enExample)
TW (1) TWI344321B (enExample)
WO (1) WO2006121744A1 (enExample)

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US12437968B2 (en) 2020-09-02 2025-10-07 Hitachi High-Tech Corporation Plasma processing apparatus and plasma processing method

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EP2297377B1 (en) 2008-05-30 2017-12-27 Colorado State University Research Foundation Plasma-based chemical source device and method of use thereof
US8994270B2 (en) 2008-05-30 2015-03-31 Colorado State University Research Foundation System and methods for plasma application
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US9532826B2 (en) 2013-03-06 2017-01-03 Covidien Lp System and method for sinus surgery
US9555145B2 (en) 2013-03-13 2017-01-31 Covidien Lp System and method for biofilm remediation
US9284210B2 (en) * 2014-03-31 2016-03-15 Corning Incorporated Methods and apparatus for material processing using dual source cyclonic plasma reactor
US10312048B2 (en) * 2016-12-12 2019-06-04 Applied Materials, Inc. Creating ion energy distribution functions (IEDF)
US10395896B2 (en) 2017-03-03 2019-08-27 Applied Materials, Inc. Method and apparatus for ion energy distribution manipulation for plasma processing chambers that allows ion energy boosting through amplitude modulation
CA3191050A1 (en) * 2020-08-28 2022-03-03 Nikolay Suslov Systems, methods, and devices for generating predominantly radially expanded plasma flow

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US12437968B2 (en) 2020-09-02 2025-10-07 Hitachi High-Tech Corporation Plasma processing apparatus and plasma processing method

Also Published As

Publication number Publication date
US20060266735A1 (en) 2006-11-30
WO2006121744A1 (en) 2006-11-16
JP2008544480A (ja) 2008-12-04
US7510665B2 (en) 2009-03-31
TW200704289A (en) 2007-01-16
TWI344321B (en) 2011-06-21

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