KR20060119691A - 금도금액 - Google Patents
금도금액 Download PDFInfo
- Publication number
- KR20060119691A KR20060119691A KR1020050123911A KR20050123911A KR20060119691A KR 20060119691 A KR20060119691 A KR 20060119691A KR 1020050123911 A KR1020050123911 A KR 1020050123911A KR 20050123911 A KR20050123911 A KR 20050123911A KR 20060119691 A KR20060119691 A KR 20060119691A
- Authority
- KR
- South Korea
- Prior art keywords
- gold plating
- gold
- plating solution
- concentration
- sulfite
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D21/00—Processes for servicing or operating cells for electrolytic coating
- C25D21/12—Process control or regulation
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/48—Electroplating: Baths therefor from solutions of gold
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Electroplating And Plating Baths Therefor (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Automation & Control Theory (AREA)
- Electrodes Of Semiconductors (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
Abstract
Description
Au (g/L) | 아황산 나트륨(g/L) | 탈륨 (㎎/L) | 아황상 칼륨(g/L) | pH | 형상 관찰 | 경도 Hv | 박리 평가 | |
실시예 1 | 10 | 50 | 30 | 1.0 | 7.0 | ○ | 45 | 없음 |
실시예 2 | 14 | 50 | 10 | 10.0 | 8.0 | ○ | 40 | 없음 |
실시예 3 | 16 | 50 | 20 | 2.0 | 8.0 | ○ | 40 | 없음 |
실시예 4 | 18 | 50 | 10 | 6.0 | 8.0 | ○ | 50 | 없음 |
Au (g/L) | 아황산 나트륨(g/L) | 탈륨 (㎎/L) | 폴리에틸렌 이민(㎎/L) | pH | 형상 관찰 | 경도 Hv | 박리 평가 | |
비교예 1-1 | 10 | 50 | 10 | - | 7.8 | △ | 60 | 없음 |
비교예 1-2 | 13 | 80 | 20 | - | 7.8 | X | 70 | 없음 |
비교예 2-1 | 10 | 50 | 1 | 1.0 | 7.8 | △ | 45 | 일부 있음 |
3D비교예 2-2 | 13 | 80 | 5 | 5.0 | 7.8 | ○ | 40 | 있음 |
Claims (3)
- 금 농도 5~20g/L의 아황산금나트륨 또는 그의 에틸렌디아민 착체와, 10~100g/L의 아황산나트륨과, 탈륨 농도 1~50ppm의 탈륨 화합물을 함유하는 금도금액에 있어서,아황산칼륨을 0.1~50g/L 함유하는 것을 특징으로 하는 금도금액.
- 제1항에 있어서, pH6.0~10.0이고, 액비중 10~30°Be'(보오메 도)인 금도금액.
- 제1항 또는 제2항에 기재된 전해 금도금액을 이용하는 금도금 방법으로서,전류밀도 0.1~2.0A/dm2, 액온 40~70℃의 조건에서 전해 도금을 하는 금도금 방법.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JPJP-P-2005-00145767 | 2005-05-18 | ||
JP2005145767A JP2006322037A (ja) | 2005-05-18 | 2005-05-18 | 金めっき液 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20060119691A true KR20060119691A (ko) | 2006-11-24 |
KR100755378B1 KR100755378B1 (ko) | 2007-09-04 |
Family
ID=37541928
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR20050123911A KR100755378B1 (ko) | 2005-05-18 | 2005-12-15 | 금도금액 |
Country Status (2)
Country | Link |
---|---|
JP (1) | JP2006322037A (ko) |
KR (1) | KR100755378B1 (ko) |
Families Citing this family (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5336785B2 (ja) * | 2007-08-07 | 2013-11-06 | メタローテクノロジーズジャパン株式会社 | バンプ形成用非シアン系電解金めっき浴及びバンプ形成方法 |
JP4758470B2 (ja) * | 2008-12-18 | 2011-08-31 | シャープ株式会社 | 突起電極の形成方法及び置換金めっき液 |
JP5442400B2 (ja) | 2009-11-13 | 2014-03-12 | ルネサスエレクトロニクス株式会社 | 半導体集積回路装置の製造方法 |
JP5394953B2 (ja) * | 2010-03-08 | 2014-01-22 | 日本エレクトロプレイテイング・エンジニヤース株式会社 | 亜硫酸金めっき液を用いた金めっき方法 |
JP2012126966A (ja) * | 2010-12-16 | 2012-07-05 | Mitomo Semicon Engineering Kk | カップ型めっき装置及びめっき方法 |
CN102517614B (zh) * | 2011-12-20 | 2014-11-19 | 安徽华东光电技术研究所 | 一种在铝硅合金上电镀金的镀液配方及其电镀方法 |
KR20170001748A (ko) * | 2012-10-04 | 2017-01-04 | 니혼 엘렉트로플레이팅 엔지니어스 가부시키가이샤 | 비시안계 전해 금도금액 |
JP6392617B2 (ja) * | 2013-10-02 | 2018-09-19 | 積水化学工業株式会社 | 導電性粒子、導電材料及び接続構造体 |
US11380602B2 (en) | 2018-03-07 | 2022-07-05 | Sumitomo Electric Industries, Ltd. | Plating film and plated member |
CN111501073A (zh) * | 2020-04-24 | 2020-08-07 | 深圳市黄金谷金业有限公司 | 一种延长无氰亚硫酸金钠—乙二胺电镀溶液使用寿命的方法 |
CN113832508B (zh) * | 2021-09-30 | 2022-06-03 | 深圳市联合蓝海黄金材料科技股份有限公司 | 无氰电镀金镀液及其应用和电镀制金凸块的方法以及金凸块和电子部件 |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3990954A (en) * | 1973-12-17 | 1976-11-09 | Oxy Metal Industries Corporation | Sulfite gold plating bath and process |
JP3030113B2 (ja) * | 1991-04-12 | 2000-04-10 | エヌ・イーケムキャット株式会社 | 置換無電解金めつき液 |
-
2005
- 2005-05-18 JP JP2005145767A patent/JP2006322037A/ja active Pending
- 2005-12-15 KR KR20050123911A patent/KR100755378B1/ko active IP Right Grant
Also Published As
Publication number | Publication date |
---|---|
JP2006322037A (ja) | 2006-11-30 |
KR100755378B1 (ko) | 2007-09-04 |
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