KR20060095522A - 그레이톤 마스크의 제조 방법, 그레이톤 마스크 및,그레이톤 마스크 블랭크 - Google Patents

그레이톤 마스크의 제조 방법, 그레이톤 마스크 및,그레이톤 마스크 블랭크 Download PDF

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Publication number
KR20060095522A
KR20060095522A KR1020060019440A KR20060019440A KR20060095522A KR 20060095522 A KR20060095522 A KR 20060095522A KR 1020060019440 A KR1020060019440 A KR 1020060019440A KR 20060019440 A KR20060019440 A KR 20060019440A KR 20060095522 A KR20060095522 A KR 20060095522A
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KR
South Korea
Prior art keywords
film
etching
light shielding
pattern
semi
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
KR1020060019440A
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English (en)
Korean (ko)
Inventor
마사루 미추이
미치아키 사노
Original Assignee
호야 가부시키가이샤
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Publication date
Application filed by 호야 가부시키가이샤 filed Critical 호야 가부시키가이샤
Publication of KR20060095522A publication Critical patent/KR20060095522A/ko
Ceased legal-status Critical Current

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/36—Masks having proximity correction features; Preparation thereof, e.g. optical proximity correction [OPC] design processes

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
KR1020060019440A 2005-02-28 2006-02-28 그레이톤 마스크의 제조 방법, 그레이톤 마스크 및,그레이톤 마스크 블랭크 Ceased KR20060095522A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2005054352 2005-02-28
JPJP-P-2005-00054352 2005-02-28

Related Child Applications (1)

Application Number Title Priority Date Filing Date
KR1020090101062A Division KR20090128354A (ko) 2005-02-28 2009-10-23 그레이톤 마스크의 제조 방법, 그레이톤 마스크 및, 그레이톤 마스크 블랭크

Publications (1)

Publication Number Publication Date
KR20060095522A true KR20060095522A (ko) 2006-08-31

Family

ID=37625148

Family Applications (3)

Application Number Title Priority Date Filing Date
KR1020060019440A Ceased KR20060095522A (ko) 2005-02-28 2006-02-28 그레이톤 마스크의 제조 방법, 그레이톤 마스크 및,그레이톤 마스크 블랭크
KR1020090101062A Ceased KR20090128354A (ko) 2005-02-28 2009-10-23 그레이톤 마스크의 제조 방법, 그레이톤 마스크 및, 그레이톤 마스크 블랭크
KR1020120030420A Active KR101269364B1 (ko) 2005-02-28 2012-03-26 그레이톤 마스크의 제조 방법, 그레이톤 마스크 및, 그레이톤 마스크 블랭크

Family Applications After (2)

Application Number Title Priority Date Filing Date
KR1020090101062A Ceased KR20090128354A (ko) 2005-02-28 2009-10-23 그레이톤 마스크의 제조 방법, 그레이톤 마스크 및, 그레이톤 마스크 블랭크
KR1020120030420A Active KR101269364B1 (ko) 2005-02-28 2012-03-26 그레이톤 마스크의 제조 방법, 그레이톤 마스크 및, 그레이톤 마스크 블랭크

Country Status (3)

Country Link
JP (1) JP5201762B2 (https=)
KR (3) KR20060095522A (https=)
TW (2) TW200639576A (https=)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101216242B1 (ko) * 2010-03-05 2013-01-18 주식회사 피케이엘 슬릿형 하프톤 패턴을 이용한 포토 마스크 제조 방법 및 이를 이용하여 제조된 포토 마스크
KR101306433B1 (ko) * 2007-05-30 2013-09-09 호야 가부시키가이샤 포토마스크의 검사 방법, 포토마스크의 제조 방법, 전자 부품의 제조 방법, 테스트 마스크 및 테스트 마스크 세트
KR101329525B1 (ko) * 2006-10-04 2013-11-14 주식회사 에스앤에스텍 그레이톤 블랭크 마스크와 그레이톤 포토마스크 및 그제조방법
KR101357324B1 (ko) * 2007-07-19 2014-02-03 호야 가부시키가이샤 표시 장치 제조용 포토마스크 및 표시 장치의 제조 방법

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6076593B2 (ja) * 2011-09-30 2017-02-08 Hoya株式会社 表示装置製造用多階調フォトマスク、表示装置製造用多階調フォトマスクの製造方法、パターン転写方法及び薄膜トランジスタの製造方法
KR101414335B1 (ko) * 2012-06-25 2014-07-02 주식회사 피케이엘 해상도 및 초점심도가 우수한 하프톤 위상반전마스크 및 그 제조 방법
JP5686216B1 (ja) * 2013-08-20 2015-03-18 大日本印刷株式会社 マスクブランクス、位相シフトマスク及びその製造方法
JP6322607B2 (ja) * 2015-07-30 2018-05-09 Hoya株式会社 表示デバイス製造用多階調フォトマスク、表示デバイス製造用多階調フォトマスクの製造方法、及び薄膜トランジスタの製造方法
JP6761255B2 (ja) * 2016-02-15 2020-09-23 関東化学株式会社 エッチング液およびエッチング液により加工されたフォトマスク
JP6322682B2 (ja) * 2016-10-26 2018-05-09 Hoya株式会社 パターン転写方法、表示装置の製造方法、及び、多階調フォトマスク
JP6463536B1 (ja) * 2018-05-09 2019-02-06 株式会社エスケーエレクトロニクス プロキシミティ露光用フォトマスクとその製造方法
CN111367142A (zh) * 2018-12-26 2020-07-03 聚灿光电科技（宿迁）有限公司 一种包含不同透光性的新型光学掩膜版
KR102697809B1 (ko) * 2019-01-16 2024-08-23 엘지이노텍 주식회사 포토 마스크

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3262302B2 (ja) * 1993-04-09 2002-03-04 大日本印刷株式会社 位相シフトフォトマスク、位相シフトフォトマスク用ブランクス及びそれらの製造方法
KR100295385B1 (ko) * 1993-04-09 2001-09-17 기타지마 요시토시 하프톤위상쉬프트포토마스크,하프톤위상쉬프트포토마스크용블랭크스및이들의제조방법
JP3289992B2 (ja) * 1993-05-11 2002-06-10 株式会社長谷工コーポレーション 建物の共用縦管収納部の構築方法とその方法に用いる収納部構成用の区画壁
JP3453435B2 (ja) * 1993-10-08 2003-10-06 大日本印刷株式会社 位相シフトマスクおよびその製造方法
JP2878143B2 (ja) * 1994-02-22 1999-04-05 インターナショナル・ビジネス・マシーンズ・コーポレイション 減衰位相シフト・マスク作成用の薄膜材料及びその作成方法
TW312820B (en) * 1996-09-26 1997-08-11 Winbond Electronics Corp Contact defined photomask and method of applying to etching
JP4290386B2 (ja) * 2002-04-26 2009-07-01 Ｈｏｙａ株式会社 ハーフトーン型位相シフトマスクブランク及びハーフトーン型位相シフトマスク
JP2004177683A (ja) * 2002-11-27 2004-06-24 Clariant (Japan) Kk 超高耐熱ポジ型感光性組成物を用いたパターン形成方法
JP4393290B2 (ja) * 2003-06-30 2010-01-06 Ｈｏｙａ株式会社 グレートーンマスクの製造方法及び薄膜トランジスタ基板の製造方法
TWI286663B (en) * 2003-06-30 2007-09-11 Hoya Corp Method for manufacturing gray tone mask, and gray tone mask
JP4521694B2 (ja) * 2004-03-09 2010-08-11 Ｈｏｙａ株式会社 グレートーンマスク及び薄膜トランジスタの製造方法
JP5161419B2 (ja) * 2004-06-22 2013-03-13 Ｈｏｙａ株式会社 グレートーンマスクブランク及びグレートーンマスクの製造方法

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101329525B1 (ko) * 2006-10-04 2013-11-14 주식회사 에스앤에스텍 그레이톤 블랭크 마스크와 그레이톤 포토마스크 및 그제조방법
KR101306433B1 (ko) * 2007-05-30 2013-09-09 호야 가부시키가이샤 포토마스크의 검사 방법, 포토마스크의 제조 방법, 전자 부품의 제조 방법, 테스트 마스크 및 테스트 마스크 세트
KR101357324B1 (ko) * 2007-07-19 2014-02-03 호야 가부시키가이샤 표시 장치 제조용 포토마스크 및 표시 장치의 제조 방법
KR101216242B1 (ko) * 2010-03-05 2013-01-18 주식회사 피케이엘 슬릿형 하프톤 패턴을 이용한 포토 마스크 제조 방법 및 이를 이용하여 제조된 포토 마스크

Also Published As

Publication number Publication date
TW201027235A (en) 2010-07-16
KR20120042809A (ko) 2012-05-03
JP2011090344A (ja) 2011-05-06
KR101269364B1 (ko) 2013-05-29
KR20090128354A (ko) 2009-12-15
TWI395053B (zh) 2013-05-01
JP5201762B2 (ja) 2013-06-05
TW200639576A (en) 2006-11-16

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