KR20050057034A - 소프트웨어로 리프레쉬되는 메모리 장치 및 방법 - Google Patents
소프트웨어로 리프레쉬되는 메모리 장치 및 방법 Download PDFInfo
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- KR20050057034A KR20050057034A KR1020057003454A KR20057003454A KR20050057034A KR 20050057034 A KR20050057034 A KR 20050057034A KR 1020057003454 A KR1020057003454 A KR 1020057003454A KR 20057003454 A KR20057003454 A KR 20057003454A KR 20050057034 A KR20050057034 A KR 20050057034A
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- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C11/00—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
- G11C11/21—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements
- G11C11/34—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices
- G11C11/40—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices using transistors
- G11C11/401—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices using transistors forming cells needing refreshing or charge regeneration, i.e. dynamic cells
- G11C11/406—Management or control of the refreshing or charge-regeneration cycles
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- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C11/00—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
- G11C11/21—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements
- G11C11/34—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices
- G11C11/40—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices using transistors
- G11C11/401—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices using transistors forming cells needing refreshing or charge regeneration, i.e. dynamic cells
- G11C11/406—Management or control of the refreshing or charge-regeneration cycles
- G11C11/40603—Arbitration, priority and concurrent access to memory cells for read/write or refresh operations
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- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C11/00—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
- G11C11/21—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements
- G11C11/34—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices
- G11C11/40—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices using transistors
- G11C11/401—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices using transistors forming cells needing refreshing or charge regeneration, i.e. dynamic cells
- G11C11/406—Management or control of the refreshing or charge-regeneration cycles
- G11C11/40622—Partial refresh of memory arrays
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- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C11/00—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
- G11C11/21—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements
- G11C11/34—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices
- G11C11/40—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices using transistors
- G11C11/401—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices using transistors forming cells needing refreshing or charge regeneration, i.e. dynamic cells
- G11C11/4063—Auxiliary circuits, e.g. for addressing, decoding, driving, writing, sensing or timing
- G11C11/407—Auxiliary circuits, e.g. for addressing, decoding, driving, writing, sensing or timing for memory cells of the field-effect type
- G11C11/408—Address circuits
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- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C13/00—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00
- G11C13/0002—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00 using resistive RAM [RRAM] elements
- G11C13/0004—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00 using resistive RAM [RRAM] elements comprising amorphous/crystalline phase transition cells
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- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C13/00—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00
- G11C13/0002—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00 using resistive RAM [RRAM] elements
- G11C13/0009—RRAM elements whose operation depends upon chemical change
- G11C13/0011—RRAM elements whose operation depends upon chemical change comprising conductive bridging RAM [CBRAM] or programming metallization cells [PMCs]
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- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C13/00—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00
- G11C13/0002—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00 using resistive RAM [RRAM] elements
- G11C13/0021—Auxiliary circuits
- G11C13/0033—Disturbance prevention or evaluation; Refreshing of disturbed memory data
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- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C13/00—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00
- G11C13/0002—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00 using resistive RAM [RRAM] elements
- G11C13/0021—Auxiliary circuits
- G11C13/0069—Writing or programming circuits or methods
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- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C16/00—Erasable programmable read-only memories
- G11C16/02—Erasable programmable read-only memories electrically programmable
- G11C16/06—Auxiliary circuits, e.g. for writing into memory
- G11C16/34—Determination of programming status, e.g. threshold voltage, overprogramming or underprogramming, retention
- G11C16/3418—Disturbance prevention or evaluation; Refreshing of disturbed memory data
- G11C16/3431—Circuits or methods to detect disturbed nonvolatile memory cells, e.g. which still read as programmed but with threshold less than the program verify threshold or read as erased but with threshold greater than the erase verify threshold, and to reverse the disturbance via a refreshing programming or erasing step
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- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C5/00—Details of stores covered by group G11C11/00
- G11C5/005—Circuit means for protection against loss of information of semiconductor storage devices
Abstract
Description
Claims (23)
- 메모리 장치 내의 셀을 리프레쉬하는 방법으로서,상기 셀이 쓰기 상태인지 또는 소거 상태인지를 판단하는 단계; 및상기 셀이 쓰기 상태인 경우, 상기 셀에 리프레쉬 쓰기 명령을 내려 상기 셀을 리프레쉬하는 단계를 포함하는 것을 특징으로 하는 방법.
- 제 1 항에 있어서, 상기 셀이 소거 상태인 경우, 상기 셀에 리프레쉬 소거 명령을 내려 상기 셀을 리프레쉬하는 단계를 더 포함하는 것을 특징으로 하는 방법.
- 복수의 셀을 갖는 휘발성 메모리 장치에 저장된 데이터를 보전하는 방법으로서,각각의 복수의 셀에 대하여 상기 셀을 리프레쉬할 필요가 있는지 여부를 판단하는 단계; 및상기 셀을 리프레쉬할 필요가 있는 경우, 상기 셀을 리프레쉬하는 단계를 포함하는 것을 특징으로 하는 방법.
- 복수의 셀을 갖는 휘발성 메모리 장치에 저장된 데이터를 보전하는 방법으로서,복수의 셀을 리프레쉬하는 단계; 및약 64밀리초 이상 지속하는 소정 시간동안 대기하는 단계(여기에서, 상기 소정 시간 동안에는 상기 복수의 셀 중 어느 것도 리프레쉬되지 않는다)를 포함하는 것을 특징으로 하는 방법.
- 제 4 항에 있어서, 상기 소정 시간은 약 1초 이상 지속되는 것을 특징으로 하는 방법.
- 제 4 항에 있어서, 상기 소정 시간은 약 1주 이상 지속되는 것을 특징으로 하는 방법.
- 복수의 메모리 셀을 갖는 휘발성 메모리 장치에 저장된 데이터를 보전하는 방법으로서,제1메모리 셀을 어드레스하는 단계;상기 제1메모리 셀을 어드레스한 이후에 제1시간 간격동안 대기하는 단계;상기 제1메모리 셀을 리프레쉬할 필요가 있는지 여부를 판단하는 단계;상기 제1메모리 셀을 리프레쉬할 필요가 있는 경우, 상기 제1메모리 셀을 리프레쉬하는데 상기 시스템 자원이 이용가능한지 여부를 판단하는 단계;상기 제1메모리 셀을 리프레쉬할 필요가 있고, 상기 시스템 자원은 이용가능하지 않은 경우, 상기 제1메모리 셀이 어드레스 된 이후 제2시간 간격 내에 상기 시스템 자원이 상기 제1메모리 셀을 리프레쉬하는데 이용가능해지는지 여부를 모니터링하는 단계;상기 제1메모리 셀을 리프레쉬할 필요가 있고, 상기 제2시간 간격 내에 상기 시스템 자원이 이용가능해지지 않은 경우, 상기 제1메모리 셀을 리프레쉬하는데 상기 자원이 이용가능해지도록 상기 자원의 포기를 강제하는 단계;상기 제1메모리 셀을 리프레쉬할 필요가 있는 경우, 상기 이용가능한 시스템 자원을 사용하여 상기 제1메모리 셀을 리프레쉬하는 단계; 및제2메모리 셀을 어드레스하는 단계를 포함하는 것을 특징으로 하는 방법.
- 제 6 항에 있어서, 상기 제1시간 간격은 약 1초 내지 약 1주의 범위 내인 것을 특징으로 하는 방법.
- 제 6 항에 있어서, 상기 제2시간 간격은 약 1주 내지 약 2개월의 범위 내인 것을 특징으로 하는 방법.
- 휘발성 메모리 장치 내의 데이터의 손실을 피하는 방법으로서,휘발성 메모리 장치가 리프레쉬되어야 하는 기한을 설정하는 단계;상기 휘발성 메모리 장치를 리프레쉬하는데 자원이 이용가능한지 여부를 모니터링하는 단계;상기 기한 이전에 제1소정 시간 간격 내에 자원이 상기 휘발성 메모리 장치를 리프레쉬하는데 이용가능해지지 않은 경우, 상기 휘발성 메모리 장치를 리프레쉬하는데 상기 자원이 이용가능해지도록 상기 자원의 포기를 강제하는 단계;상기 기한 전에 상기 휘발성 메모리 장치를 리프레쉬하기 위하여 상기 이용가능한 자원을 사용하는 단계를 포함하는 것을 특징으로 하는 방법.
- 프로세서;상기 프로세서와 연결되고, 주기적으로 리프레쉬되어야 하는 복수의 셀을 포함하는 메모리 장치; 및상기 프로세서에 의하여 실행되는 경우, 상기 복수의 셀을 리프레쉬하는 소프트웨어 모듈을 포함하는 것을 특징으로 하는 컴퓨터 시스템.
- 제 11 항에 있어서,상기 프로세서를 실행하도록 구성되는 운영 체제를 더 포함하되,상기 운영 체제는 상기 소프트웨어 모듈을 포함하는 것을 특징으로 하는 컴퓨터 시스템.
- 제 11 항에 있어서, 상기 메모리 장치는 프로그램가능한 전도체 랜덤 액세스 메모리(programmable conductor random access memory)를 포함하는 것을 특징으로 하는 컴퓨터 시스템.
- 제 11 항에 있어서, 상기 복수의 셀 각각은 프로그램가능한 금속화 셀(programmable metallization cell)을 포함하는 것을 특징으로 하는 컴퓨터 시스템.
- 제 14 항에 있어서, 상기 프로그램가능한 금속화 셀은,상부 표면을 가지며, 칼코게나이드-금속 이온 유리(chalcogenide-metal ion glass)를 포함하는 셀 본체; 및상기 상부 표면에 배치되며, 서로 이격되어 있는 두 개의 전극을 포함하는 것을 특징으로 하는 컴퓨터 시스템.
- 제 15 항에 있어서, 상기 칼코게나이드-금속 이온 유리는 그 안에 용해되는 IV족 금속을 갖는 게르마늄 셀레나이드를 포함하는 것을 특징으로 하는 컴퓨터 시스템.
- 제 16 항에 있어서, 상기 칼코게나이드-금속 이온 유리는 Ag/Ge3Se7을 포함하는 것을 특징으로 하는 컴퓨터 시스템.
- 주기적으로 리프레쉬되어야 하는 복수의 셀을 포함하는 메모리 장치로서,상기 복수의 셀은 프로세서에 의하여 수신되는 쓰기 명령 또는 소거 명령에 응답하여 리프레쉬되도록 구성되고,상기 메모리 장치는 상기 쓰기 명령 또는 소거 명령과 상이한 리프레쉬 제어 신호를 생성하거나 수신하지 않도록 구성되는 것을 특징으로 하는 메모리 장치.
- 제 18 항에 있어서, 상기 메모리 장치는 프로그램가능한 전도체 랜덤 액세스 메모리를 포함하는 것을 특징으로 하는 메모리 장치.
- 제 18 항에 있어서, 상기 복수의 셀 각각은 프로그램가능한 금속화 셀인 것을 특징으로 하는 메모리 장치.
- 제 20 항에 있어서, 상기 프로그램가능한 금속화 셀은,상부 표면을 가지며, 칼코게나이드-금속 이온 유리를 포함하는 셀 본체; 및상기 상부 표면에 배치되며, 서로 이격되어 있는 두 개의 전극을 포함하는 것을 특징으로 하는 메모리 장치.
- 제 21 항에 있어서, 상기 칼코게나이드-금속 이온 유리는 그 안에 용해되는 IV족 금속을 갖는 게르마늄 셀레나이드를 포함하는 것을 특징으로 하는 메모리 장치.
- 제 22 항에 있어서, 상기 칼코게나이드-금속 이온 유리는 Ag/Ge3Se7을 포함하는 것을 특징으로 하는 메모리 장치.
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US10/234,001 | 2002-08-29 | ||
US10/234,001 US7010644B2 (en) | 2002-08-29 | 2002-08-29 | Software refreshed memory device and method |
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KR20050057034A true KR20050057034A (ko) | 2005-06-16 |
KR100626933B1 KR100626933B1 (ko) | 2006-09-20 |
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US (5) | US7010644B2 (ko) |
EP (2) | EP1540657B1 (ko) |
JP (1) | JP4891544B2 (ko) |
KR (1) | KR100626933B1 (ko) |
CN (1) | CN100483546C (ko) |
AT (2) | ATE517417T1 (ko) |
AU (1) | AU2003268251A1 (ko) |
TW (1) | TWI263221B (ko) |
WO (1) | WO2004021359A2 (ko) |
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Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
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US8174864B2 (en) | 2007-09-21 | 2012-05-08 | Kabushiki Kaisha Toshiba | Resistance-changing memory device |
KR101158991B1 (ko) * | 2007-09-21 | 2012-06-21 | 가부시끼가이샤 도시바 | 저항 변화 메모리 장치 |
US8315082B2 (en) | 2007-09-21 | 2012-11-20 | Kabushiki Kaisha Toshiba | Resistance-changing memory device |
Also Published As
Publication number | Publication date |
---|---|
AU2003268251A1 (en) | 2004-03-19 |
TW200416735A (en) | 2004-09-01 |
US20090257299A1 (en) | 2009-10-15 |
US20100262791A1 (en) | 2010-10-14 |
US20060104142A1 (en) | 2006-05-18 |
WO2004021359A2 (en) | 2004-03-11 |
EP1540657A2 (en) | 2005-06-15 |
US7564731B2 (en) | 2009-07-21 |
ATE557398T1 (de) | 2012-05-15 |
WO2004021359A3 (en) | 2005-02-24 |
US20070258308A1 (en) | 2007-11-08 |
CN100483546C (zh) | 2009-04-29 |
US7944768B2 (en) | 2011-05-17 |
TWI263221B (en) | 2006-10-01 |
US7768861B2 (en) | 2010-08-03 |
KR100626933B1 (ko) | 2006-09-20 |
JP4891544B2 (ja) | 2012-03-07 |
US20040044841A1 (en) | 2004-03-04 |
ATE517417T1 (de) | 2011-08-15 |
JP2005537598A (ja) | 2005-12-08 |
CN1689111A (zh) | 2005-10-26 |
US7307908B2 (en) | 2007-12-11 |
US7010644B2 (en) | 2006-03-07 |
EP2293305A1 (en) | 2011-03-09 |
EP2293305B1 (en) | 2012-05-09 |
EP1540657B1 (en) | 2011-07-20 |
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