KR20050021280A - 트랜지스터 회로 및 승압 회로 - Google Patents
트랜지스터 회로 및 승압 회로 Download PDFInfo
- Publication number
- KR20050021280A KR20050021280A KR1020040067226A KR20040067226A KR20050021280A KR 20050021280 A KR20050021280 A KR 20050021280A KR 1020040067226 A KR1020040067226 A KR 1020040067226A KR 20040067226 A KR20040067226 A KR 20040067226A KR 20050021280 A KR20050021280 A KR 20050021280A
- Authority
- KR
- South Korea
- Prior art keywords
- well
- source
- mos transistor
- capacitor
- drain
- Prior art date
Links
- 239000003990 capacitor Substances 0.000 claims abstract description 33
- 238000000034 method Methods 0.000 claims description 4
- 230000003071 parasitic effect Effects 0.000 description 13
- 238000010586 diagram Methods 0.000 description 10
- 238000001514 detection method Methods 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 230000001629 suppression Effects 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
- H02M—APPARATUS FOR CONVERSION BETWEEN AC AND AC, BETWEEN AC AND DC, OR BETWEEN DC AND DC, AND FOR USE WITH MAINS OR SIMILAR POWER SUPPLY SYSTEMS; CONVERSION OF DC OR AC INPUT POWER INTO SURGE OUTPUT POWER; CONTROL OR REGULATION THEREOF
- H02M3/00—Conversion of dc power input into dc power output
- H02M3/02—Conversion of dc power input into dc power output without intermediate conversion into ac
- H02M3/04—Conversion of dc power input into dc power output without intermediate conversion into ac by static converters
- H02M3/06—Conversion of dc power input into dc power output without intermediate conversion into ac by static converters using resistors or capacitors, e.g. potential divider
- H02M3/07—Conversion of dc power input into dc power output without intermediate conversion into ac by static converters using resistors or capacitors, e.g. potential divider using capacitors charged and discharged alternately by semiconductor devices with control electrode, e.g. charge pumps
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/04—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body
- H01L27/08—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including only semiconductor components of a single kind
- H01L27/085—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including only semiconductor components of a single kind including field-effect components only
- H01L27/088—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including only semiconductor components of a single kind including field-effect components only the components being field-effect transistors with insulated gate
- H01L27/092—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including only semiconductor components of a single kind including field-effect components only the components being field-effect transistors with insulated gate complementary MIS field-effect transistors
- H01L27/0928—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including only semiconductor components of a single kind including field-effect components only the components being field-effect transistors with insulated gate complementary MIS field-effect transistors comprising both N- and P- wells in the substrate, e.g. twin-tub
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/0203—Particular design considerations for integrated circuits
- H01L27/0214—Particular design considerations for integrated circuits for internal polarisation, e.g. I2L
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/04—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body
- H01L27/06—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration
- H01L27/0611—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration integrated circuits having a two-dimensional layout of components without a common active region
- H01L27/0617—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration integrated circuits having a two-dimensional layout of components without a common active region comprising components of the field-effect type
- H01L27/0629—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration integrated circuits having a two-dimensional layout of components without a common active region comprising components of the field-effect type in combination with diodes, or resistors, or capacitors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/04—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body
- H01L27/10—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a repetitive configuration
-
- H—ELECTRICITY
- H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
- H02M—APPARATUS FOR CONVERSION BETWEEN AC AND AC, BETWEEN AC AND DC, OR BETWEEN DC AND DC, AND FOR USE WITH MAINS OR SIMILAR POWER SUPPLY SYSTEMS; CONVERSION OF DC OR AC INPUT POWER INTO SURGE OUTPUT POWER; CONTROL OR REGULATION THEREOF
- H02M3/00—Conversion of dc power input into dc power output
- H02M3/02—Conversion of dc power input into dc power output without intermediate conversion into ac
- H02M3/04—Conversion of dc power input into dc power output without intermediate conversion into ac by static converters
- H02M3/06—Conversion of dc power input into dc power output without intermediate conversion into ac by static converters using resistors or capacitors, e.g. potential divider
- H02M3/07—Conversion of dc power input into dc power output without intermediate conversion into ac by static converters using resistors or capacitors, e.g. potential divider using capacitors charged and discharged alternately by semiconductor devices with control electrode, e.g. charge pumps
- H02M3/073—Charge pumps of the Schenkel-type
Landscapes
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Semiconductor Integrated Circuits (AREA)
- Dc-Dc Converters (AREA)
- Manipulation Of Pulses (AREA)
- Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
Abstract
Description
Claims (6)
- P웰 내에 한쌍의 N 영역을 형성하여 소스 전극이 접속된 소스 영역 및 드레인 전극이 접속된 드레인 영역으로 하며, 소스, 드레인 영역 사이의 채널 영역에 절연막을 개재하여 대향하는 게이트 전극을 형성한 NMOS 트랜지스터를 갖는 트랜지스터 회로로서,상기 소스 전극을 전원에 접속함과 함께, 상기 P웰은 전기적 저항 소자를 통하여 전원에 접속하는 것을 특징으로 하는 트랜지스터 회로.
- N웰 내에 P웰을 형성하고, 상기 P웰 내에 한쌍의 N 영역을 형성하여 소스 전극이 접속된 소스 영역 및 드레인 전극이 접속된 드레인 영역으로 하며, 소스, 드레인 영역 사이의 채널 영역에 절연막을 개재하여 대향하는 게이트 전극을 형성한 NMOS 트랜지스터를 갖는 트랜지스터 회로로서,상기 N웰을 전기적 저항 소자를 통하여 회로 출력에 접속하는 것을 특징으로 하는 트랜지스터 회로.
- 제1항 또는 제2항에 있어서,상기 전기적 저항 소자는 온 상태의 PMOS인 것을 특징으로 하는 트랜지스터 회로.
- 제1항 또는 제2항에 있어서,상기 전기적 저항 소자는 저항 소자인 것을 특징으로 하는 트랜지스터 회로.
- 일단이 입력 전원에 접속된 제1 MOS 트랜지스터와,상기 제1 MOS 트랜지스터의 타단에 일단이 접속된 제2 MOS 트랜지스터와,상기 제1 및 제2 MOS 트랜지스터의 접속점에 제1 컨덴서를 통하여 접속된 펄스 신호 공급 수단과,상기 제2 MOS 트랜지스터의 타단에 접속되며, 전압을 보유하는 제2 컨덴서를 가지며,제1 MOS 트랜지스터를 온하여 입력 전원의 전압을 제1 컨덴서에 보유하고, 제1 MOS 트랜지스터를 오프하여 펄스 신호에 따라, 제1 및 제2 MOS 트랜지스터의 접속점의 전위를 시프트시키며, 그 상태에서 제2 MOS 트랜지스터를 온하여 시프트한 전압을 제2 컨덴서에 보유하여 출력하는 승압 회로로서,상기 제1 MOS 트랜지스터는 P웰을 형성하고, 상기 P웰 내에 한쌍의 N 영역을 형성하여 소스 전극이 접속된 소스 영역 및 드레인 전극이 접속된 드레인 영역으로 하며, 소스, 드레인 영역 사이의 채널 영역에 절연막을 개재하여 대향하는 게이트 전극을 형성한 NMOS 트랜지스터로서, 상기 소스 전극을 전원에 접속함과 함께, 상기 P웰은 전기적 저항 소자를 통하여 전원에 접속하는 것을 특징으로 하는 승압 회로.
- 일단이 입력 전원에 접속된 제1 MOS 트랜지스터와,상기 제1 MOS 트랜지스터의 타단에 일단이 접속된 제2 MOS 트랜지스터와,상기 제1 및 제2 MOS 트랜지스터의 접속점에 제1 컨덴서를 통하여 접속된 펄스 신호 공급 수단과,상기 제2 MOS 트랜지스터의 타단에 접속되며, 전압을 보유하는 제2 컨덴서를 가지며,제1 MOS 트랜지스터를 온하여 입력 전원의 전압을 제1 컨덴서에 보유하고, 제1 MOS 트랜지스터를 오프하여 펄스 신호에 따라, 제1 및 제2 MOS 트랜지스터의 접속점의 전위를 시프트시키며, 그 상태에서 제2 MOS 트랜지스터를 온하여 시프트한 전압을 제2 컨덴서에 보유하여 출력하는 승압 회로로서,상기 제1 MOS 트랜지스터는 N웰 내에 P웰을 형성하고, 상기 P웰 내에 한쌍의 N 영역을 형성하여 소스 전극이 접속된 소스 영역 및 드레인 전극이 접속된 드레인 영역으로 하며, 소스, 드레인 영역 사이의 채널 영역에 절연막을 개재하여 대향하는 게이트 전극을 형성한 NMOS 트랜지스터이며,상기 N웰을 전기적 저항 소자를 통하여 상기 제2 MOS 트랜지스터의 제2 컨덴서가 접속된 출력단에 접속하는 것을 특징으로 하는 승압 회로.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2003301499A JP4318511B2 (ja) | 2003-08-26 | 2003-08-26 | 昇圧回路 |
JPJP-P-2003-00301499 | 2003-08-26 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20050021280A true KR20050021280A (ko) | 2005-03-07 |
KR100611296B1 KR100611296B1 (ko) | 2006-08-10 |
Family
ID=34213898
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020040067226A KR100611296B1 (ko) | 2003-08-26 | 2004-08-25 | 트랜지스터 회로 및 승압 회로 |
Country Status (5)
Country | Link |
---|---|
US (1) | US7323753B2 (ko) |
JP (1) | JP4318511B2 (ko) |
KR (1) | KR100611296B1 (ko) |
CN (1) | CN100350728C (ko) |
TW (1) | TWI255092B (ko) |
Families Citing this family (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4387119B2 (ja) * | 2003-03-27 | 2009-12-16 | 三菱電機株式会社 | 半導体装置 |
US7825473B2 (en) * | 2005-07-21 | 2010-11-02 | Industrial Technology Research Institute | Initial-on SCR device for on-chip ESD protection |
JP4832841B2 (ja) * | 2005-09-22 | 2011-12-07 | 三菱電機株式会社 | 半導体装置 |
JP5211355B2 (ja) | 2007-11-01 | 2013-06-12 | セミコンダクター・コンポーネンツ・インダストリーズ・リミテッド・ライアビリティ・カンパニー | 電源回路及び携帯機器 |
DE102008047850B4 (de) * | 2008-09-18 | 2015-08-20 | Austriamicrosystems Ag | Halbleiterkörper mit einer Schutzstruktur und Verfahren zum Herstellen derselben |
US8378422B2 (en) * | 2009-02-06 | 2013-02-19 | Taiwan Semiconductor Manufacturing Company, Ltd. | Electrostatic discharge protection device comprising a plurality of highly doped areas within a well |
EP3317967B1 (de) * | 2015-06-30 | 2020-04-22 | Fronius International GmbH | Schaltungsanordnung zur ansteuerung eines transistors |
TWI666859B (zh) | 2017-12-29 | 2019-07-21 | 新唐科技股份有限公司 | 電壓保持電路及使用其之電子裝置 |
US11558019B2 (en) * | 2018-11-15 | 2023-01-17 | Taiwan Semiconductor Manufacturing Co., Ltd. | Method and circuit to isolate body capacitance in semiconductor devices |
CN111193478A (zh) * | 2018-11-15 | 2020-05-22 | 台湾积体电路制造股份有限公司 | 放大电路 |
CN110676323B (zh) * | 2019-09-17 | 2023-04-28 | 长江存储科技有限责任公司 | Nmos晶体管及其形成方法、电荷泵电路 |
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JP3074003B2 (ja) * | 1990-08-21 | 2000-08-07 | 株式会社日立製作所 | 半導体集積回路装置 |
JP3184298B2 (ja) * | 1992-05-28 | 2001-07-09 | 沖電気工業株式会社 | Cmos出力回路 |
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US5594611A (en) * | 1994-01-12 | 1997-01-14 | Lsi Logic Corporation | Integrated circuit input/output ESD protection circuit with gate voltage regulation and parasitic zener and junction diode |
US5477413A (en) * | 1994-01-26 | 1995-12-19 | Cypress Semiconductor Corp. | ESD protection structure for P-well technology |
JP3354709B2 (ja) * | 1994-04-20 | 2002-12-09 | 新日本製鐵株式会社 | 半導体昇圧回路 |
JP2976903B2 (ja) * | 1996-10-08 | 1999-11-10 | 日本電気株式会社 | 半導体記憶装置 |
JP4014708B2 (ja) * | 1997-08-21 | 2007-11-28 | 株式会社ルネサステクノロジ | 半導体集積回路装置の設計方法 |
JP3196714B2 (ja) * | 1998-03-05 | 2001-08-06 | 日本電気株式会社 | トリプルウェル構造の半導体集積回路の製造方法 |
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-
2003
- 2003-08-26 JP JP2003301499A patent/JP4318511B2/ja not_active Expired - Fee Related
-
2004
- 2004-04-30 TW TW093112150A patent/TWI255092B/zh not_active IP Right Cessation
- 2004-05-20 CN CNB200410045850XA patent/CN100350728C/zh not_active Expired - Fee Related
- 2004-08-24 US US10/924,507 patent/US7323753B2/en active Active
- 2004-08-25 KR KR1020040067226A patent/KR100611296B1/ko active IP Right Grant
Also Published As
Publication number | Publication date |
---|---|
JP4318511B2 (ja) | 2009-08-26 |
TWI255092B (en) | 2006-05-11 |
JP2005072353A (ja) | 2005-03-17 |
TW200509506A (en) | 2005-03-01 |
KR100611296B1 (ko) | 2006-08-10 |
CN1592055A (zh) | 2005-03-09 |
CN100350728C (zh) | 2007-11-21 |
US20050045964A1 (en) | 2005-03-03 |
US7323753B2 (en) | 2008-01-29 |
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