KR20040049827A - 유기카르본산염 조성물, 그 제조방법 및 에폭시수지용첨가제 - Google Patents
유기카르본산염 조성물, 그 제조방법 및 에폭시수지용첨가제 Download PDFInfo
- Publication number
- KR20040049827A KR20040049827A KR10-2003-7009181A KR20037009181A KR20040049827A KR 20040049827 A KR20040049827 A KR 20040049827A KR 20037009181 A KR20037009181 A KR 20037009181A KR 20040049827 A KR20040049827 A KR 20040049827A
- Authority
- KR
- South Korea
- Prior art keywords
- silane coupling
- coupling agent
- group
- containing silane
- epoxy resin
- Prior art date
Links
- 239000000203 mixture Substances 0.000 title claims abstract description 55
- 239000003822 epoxy resin Substances 0.000 title claims abstract description 36
- 229920000647 polyepoxide Polymers 0.000 title claims abstract description 36
- 239000000654 additive Substances 0.000 title claims abstract description 11
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 8
- 230000000996 additive effect Effects 0.000 title claims description 9
- 150000007942 carboxylates Chemical class 0.000 title claims description 5
- 239000006087 Silane Coupling Agent Substances 0.000 claims abstract description 84
- 238000002844 melting Methods 0.000 claims abstract description 27
- 230000008018 melting Effects 0.000 claims abstract description 27
- 150000005677 organic carbonates Chemical class 0.000 claims abstract description 22
- -1 amine compound Chemical class 0.000 claims abstract description 21
- 150000001732 carboxylic acid derivatives Chemical class 0.000 claims abstract description 12
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical group C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 claims abstract description 9
- 125000003785 benzimidazolyl group Chemical group N1=C(NC2=C1C=CC=C2)* 0.000 claims abstract description 9
- 125000003354 benzotriazolyl group Chemical group N1N=NC2=C1C=CC=C2* 0.000 claims abstract description 9
- 125000003277 amino group Chemical group 0.000 claims abstract description 8
- 125000004663 dialkyl amino group Chemical group 0.000 claims abstract description 8
- 238000010438 heat treatment Methods 0.000 claims abstract description 5
- 238000002156 mixing Methods 0.000 claims abstract description 5
- 125000000217 alkyl group Chemical group 0.000 claims description 12
- 125000004432 carbon atom Chemical group C* 0.000 claims description 12
- 150000001875 compounds Chemical class 0.000 claims description 10
- 239000001257 hydrogen Substances 0.000 claims description 9
- 229910052739 hydrogen Inorganic materials 0.000 claims description 9
- 125000003118 aryl group Chemical group 0.000 claims description 6
- 239000003795 chemical substances by application Substances 0.000 claims description 6
- 150000002431 hydrogen Chemical class 0.000 claims description 6
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 claims description 6
- 238000000034 method Methods 0.000 claims description 4
- 125000003837 (C1-C20) alkyl group Chemical group 0.000 claims description 3
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 3
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 claims description 3
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 claims description 3
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 3
- 229910000077 silane Inorganic materials 0.000 claims description 3
- 238000002360 preparation method Methods 0.000 claims description 2
- 125000002883 imidazolyl group Chemical group 0.000 abstract description 12
- 239000004480 active ingredient Substances 0.000 abstract 1
- ARCGXLSVLAOJQL-UHFFFAOYSA-N trimellitic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C(C(O)=O)=C1 ARCGXLSVLAOJQL-UHFFFAOYSA-N 0.000 description 28
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 23
- 230000000052 comparative effect Effects 0.000 description 18
- 238000011156 evaluation Methods 0.000 description 11
- 238000003860 storage Methods 0.000 description 10
- ZCUJYXPAKHMBAZ-UHFFFAOYSA-N 2-phenyl-1h-imidazole Chemical compound C1=CNC(C=2C=CC=CC=2)=N1 ZCUJYXPAKHMBAZ-UHFFFAOYSA-N 0.000 description 9
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 9
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 6
- 238000001723 curing Methods 0.000 description 6
- 239000007787 solid Substances 0.000 description 6
- ULKLGIFJWFIQFF-UHFFFAOYSA-N 5K8XI641G3 Chemical compound CCC1=NC=C(C)N1 ULKLGIFJWFIQFF-UHFFFAOYSA-N 0.000 description 5
- QGBSISYHAICWAH-UHFFFAOYSA-N dicyandiamide Chemical compound NC(N)=NC#N QGBSISYHAICWAH-UHFFFAOYSA-N 0.000 description 5
- 239000000463 material Substances 0.000 description 5
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 description 5
- KUBDPQJOLOUJRM-UHFFFAOYSA-N 2-(chloromethyl)oxirane;4-[2-(4-hydroxyphenyl)propan-2-yl]phenol Chemical compound ClCC1CO1.C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 KUBDPQJOLOUJRM-UHFFFAOYSA-N 0.000 description 3
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- 239000004593 Epoxy Substances 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- 239000000853 adhesive Substances 0.000 description 3
- 230000001070 adhesive effect Effects 0.000 description 3
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid Chemical compound OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 239000000843 powder Substances 0.000 description 3
- 239000007790 solid phase Substances 0.000 description 3
- SJECZPVISLOESU-UHFFFAOYSA-N 3-trimethoxysilylpropan-1-amine Chemical compound CO[Si](OC)(OC)CCCN SJECZPVISLOESU-UHFFFAOYSA-N 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 125000001931 aliphatic group Chemical group 0.000 description 2
- 238000005452 bending Methods 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 150000001735 carboxylic acids Chemical class 0.000 description 2
- NZNMSOFKMUBTKW-UHFFFAOYSA-N cyclohexanecarboxylic acid Chemical compound OC(=O)C1CCCCC1 NZNMSOFKMUBTKW-UHFFFAOYSA-N 0.000 description 2
- XBDQKXXYIPTUBI-UHFFFAOYSA-N dimethylselenoniopropionate Natural products CCC(O)=O XBDQKXXYIPTUBI-UHFFFAOYSA-N 0.000 description 2
- HHLFWLYXYJOTON-UHFFFAOYSA-N glyoxylic acid Chemical compound OC(=O)C=O HHLFWLYXYJOTON-UHFFFAOYSA-N 0.000 description 2
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 2
- KQNPFQTWMSNSAP-UHFFFAOYSA-N isobutyric acid Chemical compound CC(C)C(O)=O KQNPFQTWMSNSAP-UHFFFAOYSA-N 0.000 description 2
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 2
- 239000004570 mortar (masonry) Substances 0.000 description 2
- DVYVMJLSUSGYMH-UHFFFAOYSA-N n-methyl-3-trimethoxysilylpropan-1-amine Chemical compound CNCCC[Si](OC)(OC)OC DVYVMJLSUSGYMH-UHFFFAOYSA-N 0.000 description 2
- XNGIFLGASWRNHJ-UHFFFAOYSA-N phthalic acid Chemical compound OC(=O)C1=CC=CC=C1C(O)=O XNGIFLGASWRNHJ-UHFFFAOYSA-N 0.000 description 2
- 229920000768 polyamine Polymers 0.000 description 2
- CYIDZMCFTVVTJO-UHFFFAOYSA-N pyromellitic acid Chemical compound OC(=O)C1=CC(C(O)=O)=C(C(O)=O)C=C1C(O)=O CYIDZMCFTVVTJO-UHFFFAOYSA-N 0.000 description 2
- YGSDEFSMJLZEOE-UHFFFAOYSA-N salicylic acid Chemical compound OC(=O)C1=CC=CC=C1O YGSDEFSMJLZEOE-UHFFFAOYSA-N 0.000 description 2
- 150000003839 salts Chemical class 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 238000003786 synthesis reaction Methods 0.000 description 2
- XHCGTVHIQUXPRM-SSIREWOPSA-N (2s)-n-[(2r,4s,7r)-7-acetamido-2-amino-4-[[(2s)-2-amino-6-[(5-amino-1h-1,2,4-triazol-3-yl)amino]hexanoyl]-[(2s)-2-[[(2r)-2-amino-6-[(5-amino-1h-1,2,4-triazol-3-yl)amino]hexanoyl]amino]-4-methylpentanoyl]carbamoyl]-1-(4-chlorophenyl)-8-naphthalen-2-yl-3,6- Chemical compound C([C@@H](N)C(=O)N[C@@H](CC(C)C)C(=O)N(C(=O)[C@@H](N)CCCCNC=1N=C(N)NN=1)C(=O)[C@@](CC(=O)[C@@H](CC=1C=C2C=CC=CC2=CC=1)NC(C)=O)(N(C(=O)[C@H](CO)NC(=O)[C@H](N)CC=1C=NC=CC=1)C(=O)[C@H]1N(CCC1)C(=O)[C@@H](N)CCCCNC(C)C)C(=O)[C@H](N)CC=1C=CC(Cl)=CC=1)CCCNC1=NNC(N)=N1 XHCGTVHIQUXPRM-SSIREWOPSA-N 0.000 description 1
- WYTZZXDRDKSJID-UHFFFAOYSA-N (3-aminopropyl)triethoxysilane Chemical compound CCO[Si](OCC)(OCC)CCCN WYTZZXDRDKSJID-UHFFFAOYSA-N 0.000 description 1
- FBHPRUXJQNWTEW-UHFFFAOYSA-N 1-benzyl-2-methylimidazole Chemical compound CC1=NC=CN1CC1=CC=CC=C1 FBHPRUXJQNWTEW-UHFFFAOYSA-N 0.000 description 1
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 1
- OQTIKANCBNPBKT-UHFFFAOYSA-N 2-(2-undecyl-1h-imidazol-5-yl)propanenitrile Chemical compound CCCCCCCCCCCC1=NC(C(C)C#N)=CN1 OQTIKANCBNPBKT-UHFFFAOYSA-N 0.000 description 1
- JAHNSTQSQJOJLO-UHFFFAOYSA-N 2-(3-fluorophenyl)-1h-imidazole Chemical compound FC1=CC=CC(C=2NC=CN=2)=C1 JAHNSTQSQJOJLO-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- YTWBFUCJVWKCCK-UHFFFAOYSA-N 2-heptadecyl-1h-imidazole Chemical compound CCCCCCCCCCCCCCCCCC1=NC=CN1 YTWBFUCJVWKCCK-UHFFFAOYSA-N 0.000 description 1
- LXBGSDVWAMZHDD-UHFFFAOYSA-N 2-methyl-1h-imidazole Chemical compound CC1=NC=CN1 LXBGSDVWAMZHDD-UHFFFAOYSA-N 0.000 description 1
- WLJVXDMOQOGPHL-PPJXEINESA-N 2-phenylacetic acid Chemical compound O[14C](=O)CC1=CC=CC=C1 WLJVXDMOQOGPHL-PPJXEINESA-N 0.000 description 1
- LLEASVZEQBICSN-UHFFFAOYSA-N 2-undecyl-1h-imidazole Chemical compound CCCCCCCCCCCC1=NC=CN1 LLEASVZEQBICSN-UHFFFAOYSA-N 0.000 description 1
- UIDDPPKZYZTEGS-UHFFFAOYSA-N 3-(2-ethyl-4-methylimidazol-1-yl)propanenitrile Chemical compound CCC1=NC(C)=CN1CCC#N UIDDPPKZYZTEGS-UHFFFAOYSA-N 0.000 description 1
- SESYNEDUKZDRJL-UHFFFAOYSA-N 3-(2-methylimidazol-1-yl)propanenitrile Chemical compound CC1=NC=CN1CCC#N SESYNEDUKZDRJL-UHFFFAOYSA-N 0.000 description 1
- BVYPJEBKDLFIDL-UHFFFAOYSA-N 3-(2-phenylimidazol-1-yl)propanenitrile Chemical compound N#CCCN1C=CN=C1C1=CC=CC=C1 BVYPJEBKDLFIDL-UHFFFAOYSA-N 0.000 description 1
- HXLAEGYMDGUSBD-UHFFFAOYSA-N 3-[diethoxy(methyl)silyl]propan-1-amine Chemical compound CCO[Si](C)(OCC)CCCN HXLAEGYMDGUSBD-UHFFFAOYSA-N 0.000 description 1
- ZYAASQNKCWTPKI-UHFFFAOYSA-N 3-[dimethoxy(methyl)silyl]propan-1-amine Chemical compound CO[Si](C)(OC)CCCN ZYAASQNKCWTPKI-UHFFFAOYSA-N 0.000 description 1
- XDLMVUHYZWKMMD-UHFFFAOYSA-N 3-trimethoxysilylpropyl 2-methylprop-2-enoate Chemical compound CO[Si](OC)(OC)CCCOC(=O)C(C)=C XDLMVUHYZWKMMD-UHFFFAOYSA-N 0.000 description 1
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 description 1
- TYOXIFXYEIILLY-UHFFFAOYSA-N 5-methyl-2-phenyl-1h-imidazole Chemical compound N1C(C)=CN=C1C1=CC=CC=C1 TYOXIFXYEIILLY-UHFFFAOYSA-N 0.000 description 1
- ALEBYBVYXQTORU-UHFFFAOYSA-N 6-hydrazinyl-6-oxohexanoic acid Chemical compound NNC(=O)CCCCC(O)=O ALEBYBVYXQTORU-UHFFFAOYSA-N 0.000 description 1
- 239000005711 Benzoic acid Substances 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 1
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 1
- 208000034189 Sclerosis Diseases 0.000 description 1
- 235000011054 acetic acid Nutrition 0.000 description 1
- 239000012300 argon atmosphere Substances 0.000 description 1
- 150000004982 aromatic amines Chemical class 0.000 description 1
- 108700022499 azaline Proteins 0.000 description 1
- 235000010233 benzoic acid Nutrition 0.000 description 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 150000004696 coordination complex Chemical class 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 239000011889 copper foil Substances 0.000 description 1
- 239000007822 coupling agent Substances 0.000 description 1
- LDHQCZJRKDOVOX-NSCUHMNNSA-N crotonic acid Chemical compound C\C=C\C(O)=O LDHQCZJRKDOVOX-NSCUHMNNSA-N 0.000 description 1
- VZFUCHSFHOYXIS-UHFFFAOYSA-N cycloheptane carboxylic acid Natural products OC(=O)C1CCCCCC1 VZFUCHSFHOYXIS-UHFFFAOYSA-N 0.000 description 1
- 239000008367 deionised water Substances 0.000 description 1
- 229910021641 deionized water Inorganic materials 0.000 description 1
- KEIQPMUPONZJJH-UHFFFAOYSA-N dicyclohexylmethanediamine Chemical compound C1CCCCC1C(N)(N)C1CCCCC1 KEIQPMUPONZJJH-UHFFFAOYSA-N 0.000 description 1
- ZBCBWPMODOFKDW-UHFFFAOYSA-N diethanolamine Chemical compound OCCNCCO ZBCBWPMODOFKDW-UHFFFAOYSA-N 0.000 description 1
- 125000002147 dimethylamino group Chemical group [H]C([H])([H])N(*)C([H])([H])[H] 0.000 description 1
- AWFPGKLDLMAPMK-UHFFFAOYSA-N dimethylaminosilicon Chemical compound CN(C)[Si] AWFPGKLDLMAPMK-UHFFFAOYSA-N 0.000 description 1
- ZZTCPWRAHWXWCH-UHFFFAOYSA-N diphenylmethanediamine Chemical compound C=1C=CC=CC=1C(N)(N)C1=CC=CC=C1 ZZTCPWRAHWXWCH-UHFFFAOYSA-N 0.000 description 1
- 239000003623 enhancer Substances 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 235000019253 formic acid Nutrition 0.000 description 1
- 238000001879 gelation Methods 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- 238000013007 heat curing Methods 0.000 description 1
- 150000002460 imidazoles Chemical class 0.000 description 1
- 239000002648 laminated material Substances 0.000 description 1
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 1
- 239000011976 maleic acid Substances 0.000 description 1
- 125000000250 methylamino group Chemical group [H]N(*)C([H])([H])[H] 0.000 description 1
- LVHBHZANLOWSRM-UHFFFAOYSA-N methylenebutanedioic acid Natural products OC(=O)CC(=C)C(O)=O LVHBHZANLOWSRM-UHFFFAOYSA-N 0.000 description 1
- 239000012778 molding material Substances 0.000 description 1
- 239000002808 molecular sieve Substances 0.000 description 1
- PHQOGHDTIVQXHL-UHFFFAOYSA-N n'-(3-trimethoxysilylpropyl)ethane-1,2-diamine Chemical compound CO[Si](OC)(OC)CCCNCCN PHQOGHDTIVQXHL-UHFFFAOYSA-N 0.000 description 1
- DTPZJXALAREFEY-UHFFFAOYSA-N n-methyl-3-triethoxysilylpropan-1-amine Chemical compound CCO[Si](OCC)(OCC)CCCNC DTPZJXALAREFEY-UHFFFAOYSA-N 0.000 description 1
- ZWLPBLYKEWSWPD-UHFFFAOYSA-N o-toluic acid Chemical compound CC1=CC=CC=C1C(O)=O ZWLPBLYKEWSWPD-UHFFFAOYSA-N 0.000 description 1
- WWZKQHOCKIZLMA-UHFFFAOYSA-N octanoic acid Chemical compound CCCCCCCC(O)=O WWZKQHOCKIZLMA-UHFFFAOYSA-N 0.000 description 1
- 150000007524 organic acids Chemical class 0.000 description 1
- 239000003973 paint Substances 0.000 description 1
- FJKROLUGYXJWQN-UHFFFAOYSA-N papa-hydroxy-benzoic acid Natural products OC(=O)C1=CC=C(O)C=C1 FJKROLUGYXJWQN-UHFFFAOYSA-N 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 238000004321 preservation Methods 0.000 description 1
- 235000019260 propionic acid Nutrition 0.000 description 1
- IUVKMZGDUIUOCP-BTNSXGMBSA-N quinbolone Chemical compound O([C@H]1CC[C@H]2[C@H]3[C@@H]([C@]4(C=CC(=O)C=C4CC3)C)CC[C@@]21C)C1=CCCC1 IUVKMZGDUIUOCP-BTNSXGMBSA-N 0.000 description 1
- 229960004889 salicylic acid Drugs 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- URGAHOPLAPQHLN-UHFFFAOYSA-N sodium aluminosilicate Chemical compound [Na+].[Al+3].[O-][Si]([O-])=O.[O-][Si]([O-])=O URGAHOPLAPQHLN-UHFFFAOYSA-N 0.000 description 1
- 229910000679 solder Inorganic materials 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 150000000000 tetracarboxylic acids Chemical class 0.000 description 1
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 1
- LDHQCZJRKDOVOX-UHFFFAOYSA-N trans-crotonic acid Natural products CC=CC(O)=O LDHQCZJRKDOVOX-UHFFFAOYSA-N 0.000 description 1
- SRPWOOOHEPICQU-UHFFFAOYSA-N trimellitic anhydride Chemical compound OC(=O)C1=CC=C2C(=O)OC(=O)C2=C1 SRPWOOOHEPICQU-UHFFFAOYSA-N 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/18—Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/40—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the curing agents used
- C08G59/50—Amines
- C08G59/56—Amines together with other curing agents
- C08G59/58—Amines together with other curing agents with polycarboxylic acids or with anhydrides, halides, or low-molecular-weight esters thereof
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/18—Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages
- C07F7/1804—Compounds having Si-O-C linkages
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/40—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the curing agents used
- C08G59/42—Polycarboxylic acids; Anhydrides, halides or low molecular weight esters thereof
- C08G59/4238—Polycarboxylic acids; Anhydrides, halides or low molecular weight esters thereof heterocyclic
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
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Abstract
Description
첨가제 | 전단접착강도(KN/cm2) | |
실시예 3 | 샘플#1 | 1.38 |
샘플#2 | 1.36 | |
비교예 1 | 미첨가 | 1.02 |
비교예 2 | (3-글리시독시프로필)트리메톡시실란 | 1.11 |
첨가제 | 구부림강도(N/mm2) | |
실시예 4 | 샘플#1 | 99.1 |
샘플#2 | 98.2 | |
비교예 3 | 미첨가 | 84.1 |
비교예 4 | (3-글리시독시프로필)트리메톡시실란 | 90.2 |
첨가제 | 저장안정성(점도변화) | 경화촉진성(겔타임) | |
실시예 5 | 샘플#1 | 10일후 점도변화없음 | 10분 23초 |
샘플#2 | 10일후 점도변화없음 | 7분 54초 | |
비교예 5 | 2-에틸-4-메틸이미다졸 | 10일후 고화 | 2분 11초 |
비교예 6 | 미첨가 | 10일후 점도변화없음 | 20분 28초 |
샘플# | 열연화온도(℃) |
1 | 110℃ |
2 | 90℃ |
샘플# | |
3 | (3-아미노프로필)트리메톡시실란: 0.04mol2-페닐이미다졸(융점: 137∼147℃): 0.06mol트리멜리트산: 0.1mol |
4 | N-메틸아미노프로필트리메톡시실란: 0.04mol2-페닐이미다졸(융점: 137∼147℃): 0.06mol트리멜리트산: 0.1mol |
5 | 일본 특개평 6-279463 실시예 1에서 합성한 벤조트리아졸기함유 실란 커플링제: 0.04mol2-페닐이미다졸(융점: 137∼147℃): 0.06mol트리멜리트산: 0.1mol |
6 | 일본 특개평 9-296135 참고예 1에서 합성한 디메틸아미노실란: 0.04mol2-페닐이미다졸(융점: 137∼147℃): 0.06mol트리멜리트산: 0.1mol |
7 | 일본 특개평 6-279458 실시예 1에서 합성한 벤즈이미다졸기함유 실란 커플링제: 0.04mol2-페닐이미다졸(융점: 137∼147℃): 0.06mol트리멜리트산: 0.1mol |
8 | 일본 특개평 9-295991 실시예 1에서 합성한 피리딘환함유 실란 커플링제: 0.04mol2-페닐이미다졸(융점: 137∼147℃): 0.06mol트리멜리트산: 0.1mol |
9 | 실시예 1과 마찬가지로 하여 합성한 이미다졸기함유 실란 커플링제: 0.04mol디아미노디페닐메탄(융점: 89℃): 0.06mol트리멜리트산: 0.1mol |
10 | 실시예 1과 마찬가지로 하여 합성한 이미다졸기함유 실란 커플링제: 0.04mol디아미노디시클로헥실메탄(융점: 40℃): 0.06mol트리멜리트산: 0.1mol |
11 | 실시예 1과 마찬가지로 하여 합성한 이미다졸기함유 실란 커플링제: 0.04mol디시안디아미드(융점: 207∼210℃): 0.06mol트리멜리트산: 0.1mol |
12 | 실시예 1과 마찬가지로 하여 합성한 이미다졸기함유 실란 커플링제: 0.04mol아디핀산히드라지드(융점: 178℃): 0.06mol트리멜리트산: 0.1mol |
13 | 실시예 1과 마찬가지로 하여 합성한 이미다졸기함유 실란 커플링제: 0.04mol변성폴리아민(테트라카르본산으로부터 얻은 폴리아미노이미드, ATI-2)(융점: 270℃): 10g트리멜리트산: 0.1mol |
첨가제 | 전단접착강도(kN/cm2) | |
실시예 7 | 샘플#3 | 1.24 |
실시예 8 | 샘플#4 | 1.26 |
실시예 9 | 샘플#5 | 1.20 |
실시예 10 | 샘플#6 | 1.42 |
실시예 11 | 샘플#7 | 1.40 |
실시예 12 | 샘플#8 | 1.32 |
실시예 13 | 샘플#9 | 1.37 |
실시예 14 | 샘플#10 | 1.30 |
실시예 15 | 샘플#11 | 1.44 |
실시예 16 | 샘플#12 | 1.33 |
실시예 17 | 샘플#13 | 1.28 |
Claims (6)
- 염기성 실란 커플링제와, 연화점 또는 융점이 40℃ 이상인 아민화합물을, 유기카르본산과 함께 가열 혼합함으로써 얻어지는 유기카르본산염 조성물.
- 염기성 실란 커플링제와, 연화점 또는 융점이 40℃ 이상인 아민화합물을, 유기카르본산과 함께 가열 혼합하는 것을 포함하여 이루어지는 유기카르본산염 조성물의 제조방법.
- 제 1 항에 있어서, 염기성 실란 커플링제가 하기 일반식(1)∼(4)로 나타내는 화합물로 이루어지는 군에서 선택된 1종 또는 2종 이상의 혼합물, 또는 아미노기함유 실란 커플링제, 디알킬아미노기함유 실란 커플링제, 모노메틸아미노기함유 실란 커플링제, 벤즈이미다졸기함유 실란 커플링제, 벤조트리아졸기함유 실란 커플링제, 및 피리딘환함유 실란 커플링제로 이루어지는 군에서 선택된 적어도 1종인 것을 특징으로 하는 유기카르본산염 조성물.(단, 식(1)∼(3)에 있어서, R1, R2, R3은 각각 수소, 비닐기, 또는 탄소수 1∼2O의 알킬기로서, R2와 R3으로 방향환(aromatic ring)을 형성하고 있어도 좋고; R4, R5는 각각 탄소수 1∼5의 알킬기를 나타내고; m은 1∼10, n은 1∼3의 정수를 나타내고;식(4)에 있어서, R6, R7, R8은 각각 수소, 탄소수 1∼20의 알킬기, 비닐기,페닐기, 또는 벤질기이고, R7과 R8은 결합하여 방향환을 형성하여도 좋고; R9는 수소 또는 탄소수 1∼3의 알킬기를 나타내고; R10, R11은 각각 탄소수 1∼5의 알킬기를 나타내고; o는 1∼10, p는 1∼3의 정수를 나타낸다.)
- 제 2 항에 있어서, 염기성 실란 커플링제가 하기 일반식(1)∼(4)로 나타내는 화합물로 이루어지는 군에서 선택된 1종 또는 2종 이상의 혼합물, 또는 아미노기함유 실란 커플링제, 디알킬아미노기함유 실란 커플링제, 모노메틸아미노기함유 실란 커플링제, 벤즈이미다졸기함유 실란 커플링제, 벤조트리아졸기함유 실란 커플링제, 및 피리딘환함유 실란 커플링제로 이루어지는 군에서 선택된 적어도 1종인 것을 특징으로 하는 유기카르본산염 조성물의 제조방법.(단, 식(1)∼(3)에 있어서, R1, R2, R3은 각각 수소, 비닐기, 또는 탄소수 1∼2O의 알킬기로서, R2와 R3으로 방향환을 형성하고 있어도 좋고; R4, R5는 각각 탄소수 1∼5의 알킬기를 나타내고; m은 1∼10, n은 1∼3의 정수를 나타내고;식(4)에 있어서, R6, R7, R8은 각각 수소, 탄소수 1∼20의 알킬기, 비닐기, 페닐기, 또는 벤질기이고, R7과 R8은 결합하여 방향환을 형성하여도 좋고; R9는 수소 또는 탄소수 1∼3의 알킬기를 나타내고; R10, R11은 각각 탄소수 1∼5의 알킬기를 나타내고; o는 1∼10, p는 1∼3의 정수를 나타낸다.)
- 제 1 항 또는 제 3 항에 기재된 유기카르본산염 조성물을 포함하는 에폭시수지 조성물.
- 제 1 항 또는 제 3 항에 기재된 유기카르본산염 조성물을 포함하는 에폭시수지용 첨가제.
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JPJP-P-2002-00146195 | 2002-05-21 | ||
JP2002146195A JP2003231734A (ja) | 2001-12-06 | 2002-05-21 | 有機カルボン酸塩組成物及びその製造方法並びにエポキシ樹脂用添加剤 |
PCT/JP2002/008621 WO2003048171A1 (fr) | 2001-12-06 | 2002-08-27 | Composition realisee a partir d'un sel d'acide carboxylique, elaboration de cette composition, et additifs pour resines epoxy |
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US (1) | US6916865B2 (ko) |
EP (1) | EP1452536B1 (ko) |
JP (1) | JP2003231734A (ko) |
KR (1) | KR100544408B1 (ko) |
CN (1) | CN1300152C (ko) |
CA (1) | CA2432296C (ko) |
DE (1) | DE60233966D1 (ko) |
ES (1) | ES2334116T3 (ko) |
TW (1) | TWI266767B (ko) |
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US7259230B2 (en) * | 2004-06-07 | 2007-08-21 | Battelle Energy Alliance, Llc | Polybenzimidazole compounds, polymeric media, and methods of post-polymerization modifications |
DE102004057996A1 (de) * | 2004-12-01 | 2006-06-08 | Wacker Polymer Systems Gmbh & Co. Kg | Hydrophobierendes Additiv |
FR2911341B1 (fr) * | 2007-01-11 | 2013-01-11 | Ascotec | Inhibiteur de corrosion |
CN102618164A (zh) * | 2010-08-03 | 2012-08-01 | 东莞市仁吉电子材料有限公司 | 印刷电路板基板中,增加导电体与非导电高分子介电层之间结合力的方法 |
KR101505720B1 (ko) * | 2012-03-30 | 2015-03-25 | 주식회사 엘지화학 | 실록산계 화합물, 이를 포함하는 감광성 조성물 및 감광재 |
WO2013147411A1 (ko) * | 2012-03-30 | 2013-10-03 | 주식회사 엘지화학 | 실록산계 화합물, 이를 포함하는 감광성 조성물 및 감광재 |
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JPH0768256B2 (ja) | 1991-08-01 | 1995-07-26 | 株式会社ジャパンエナジー | 新規イミダゾールシラン化合物及びその製造方法並びにそれを用いる金属表面処理剤 |
JP3202827B2 (ja) | 1993-03-29 | 2001-08-27 | 株式会社ジャパンエナジー | 新規アゾール系シラン化合物及びその製造方法並びにそれを用いる金属表面処理剤 |
JPH06279463A (ja) | 1993-03-29 | 1994-10-04 | Japan Energy Corp | 新規ベンゾトリアゾールシラン化合物及びその製造方法並びにそれを用いる金属表面処理剤 |
JP3396562B2 (ja) | 1995-07-04 | 2003-04-14 | 株式会社ジャパンエナジー | エポキシ樹脂組成物およびそのための硬化剤 |
JP3555800B2 (ja) | 1996-04-30 | 2004-08-18 | 株式会社日鉱マテリアルズ | 新規有機ケイ素化合物およびその製造方法並びにそれを用いる表面処理剤および樹脂添加剤 |
JPH09295990A (ja) | 1996-04-30 | 1997-11-18 | Japan Energy Corp | 新規有機ケイ素化合物およびその製造方法並びにそれを用いる表面処理剤および添加剤 |
JP3555801B2 (ja) | 1996-04-30 | 2004-08-18 | 株式会社日鉱マテリアルズ | 新規有機ケイ素化合物およびその製造方法並びにそれを用いる表面処理剤および樹脂添加剤 |
JP3436634B2 (ja) | 1996-04-30 | 2003-08-11 | 株式会社ジャパンエナジー | 表面処理剤および樹脂添加剤 |
JPH09295991A (ja) | 1996-04-30 | 1997-11-18 | Japan Energy Corp | 新規有機ケイ素化合物およびその製造方法並びにそれを用いる表面処理剤および樹脂添加剤 |
JPH09310043A (ja) * | 1996-05-21 | 1997-12-02 | Kanegafuchi Chem Ind Co Ltd | 上塗り塗料用硬化性樹脂組成物 |
JP3545900B2 (ja) * | 1997-03-28 | 2004-07-21 | 株式会社日鉱マテリアルズ | イミダゾール有機カルボン酸塩誘導体反応生成物及びその製造方法、並びにそれを用いるエポキシ樹脂硬化剤 |
JP3523804B2 (ja) | 1999-04-15 | 2004-04-26 | 株式会社日鉱マテリアルズ | 新規有機ケイ素化合物およびその製造方法並びにそれを用いる表面処理剤および樹脂添加剤 |
JP3536014B2 (ja) | 2000-04-07 | 2004-06-07 | 株式会社日鉱マテリアルズ | イミダゾール有機モノカルボン酸塩誘導体反応生成物及びその製造方法、並びにそれを用いる表面処理剤、樹脂添加剤および樹脂組成物 |
JP4883842B2 (ja) * | 2001-02-16 | 2012-02-22 | Jx日鉱日石金属株式会社 | エポキシ樹脂組成物用添加剤およびそのエポキシ樹脂組成物 |
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2002
- 2002-05-21 JP JP2002146195A patent/JP2003231734A/ja active Pending
- 2002-08-27 CA CA002432296A patent/CA2432296C/en not_active Expired - Fee Related
- 2002-08-27 KR KR1020037009181A patent/KR100544408B1/ko not_active IP Right Cessation
- 2002-08-27 WO PCT/JP2002/008621 patent/WO2003048171A1/ja active IP Right Grant
- 2002-08-27 DE DE60233966T patent/DE60233966D1/de not_active Expired - Lifetime
- 2002-08-27 CN CNB028046072A patent/CN1300152C/zh not_active Expired - Fee Related
- 2002-08-27 US US10/451,977 patent/US6916865B2/en not_active Expired - Lifetime
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Also Published As
Publication number | Publication date |
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TW200300763A (en) | 2003-06-16 |
JP2003231734A (ja) | 2003-08-19 |
WO2003048171A1 (fr) | 2003-06-12 |
TWI266767B (en) | 2006-11-21 |
EP1452536A4 (en) | 2006-02-01 |
ES2334116T3 (es) | 2010-03-05 |
EP1452536A1 (en) | 2004-09-01 |
CN1300152C (zh) | 2007-02-14 |
US20040077751A1 (en) | 2004-04-22 |
KR100544408B1 (ko) | 2006-01-23 |
DE60233966D1 (de) | 2009-11-19 |
EP1452536B1 (en) | 2009-10-07 |
CA2432296A1 (en) | 2003-06-12 |
CA2432296C (en) | 2008-03-18 |
CN1599742A (zh) | 2005-03-23 |
US6916865B2 (en) | 2005-07-12 |
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