KR20040029988A - 자외선 및 진공 자외선에서 투명성을 요구하는 응용에서부분 플루오르화 중합체의 용도 - Google Patents
자외선 및 진공 자외선에서 투명성을 요구하는 응용에서부분 플루오르화 중합체의 용도 Download PDFInfo
- Publication number
- KR20040029988A KR20040029988A KR10-2003-7014718A KR20037014718A KR20040029988A KR 20040029988 A KR20040029988 A KR 20040029988A KR 20037014718 A KR20037014718 A KR 20037014718A KR 20040029988 A KR20040029988 A KR 20040029988A
- Authority
- KR
- South Korea
- Prior art keywords
- fluoropolymer
- copolymer
- vinylidene fluoride
- units derived
- ether oxygen
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
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- 229920002313 fluoropolymer Polymers 0.000 title claims abstract description 52
- 238000002835 absorbance Methods 0.000 claims description 70
- 239000000178 monomer Substances 0.000 claims description 58
- 229920001577 copolymer Polymers 0.000 claims description 53
- 230000003287 optical effect Effects 0.000 claims description 53
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 claims description 51
- 239000004811 fluoropolymer Substances 0.000 claims description 48
- 238000000034 method Methods 0.000 claims description 45
- BQCIDUSAKPWEOX-UHFFFAOYSA-N 1,1-Difluoroethene Chemical compound FC(F)=C BQCIDUSAKPWEOX-UHFFFAOYSA-N 0.000 claims description 38
- 239000000203 mixture Substances 0.000 claims description 38
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 35
- 229910052760 oxygen Inorganic materials 0.000 claims description 35
- 239000001301 oxygen Substances 0.000 claims description 35
- 229910052731 fluorine Inorganic materials 0.000 claims description 28
- 238000000576 coating method Methods 0.000 claims description 27
- 239000011737 fluorine Substances 0.000 claims description 26
- 229910052799 carbon Inorganic materials 0.000 claims description 25
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 23
- 239000011248 coating agent Substances 0.000 claims description 22
- 229910052739 hydrogen Inorganic materials 0.000 claims description 22
- 230000005670 electromagnetic radiation Effects 0.000 claims description 20
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 18
- 125000004432 carbon atom Chemical group C* 0.000 claims description 18
- 229920001519 homopolymer Polymers 0.000 claims description 16
- 239000001257 hydrogen Substances 0.000 claims description 12
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- XUCNUKMRBVNAPB-UHFFFAOYSA-N fluoroethene Chemical compound FC=C XUCNUKMRBVNAPB-UHFFFAOYSA-N 0.000 claims description 7
- 125000001033 ether group Chemical group 0.000 claims description 5
- PIYVNGWKHNMMAU-UHFFFAOYSA-N [O].O Chemical group [O].O PIYVNGWKHNMMAU-UHFFFAOYSA-N 0.000 claims description 4
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- 239000010408 film Substances 0.000 description 38
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- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 24
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- ZQBFAOFFOQMSGJ-UHFFFAOYSA-N hexafluorobenzene Chemical compound FC1=C(F)C(F)=C(F)C(F)=C1F ZQBFAOFFOQMSGJ-UHFFFAOYSA-N 0.000 description 12
- 238000000572 ellipsometry Methods 0.000 description 11
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- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 9
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- HCDGVLDPFQMKDK-UHFFFAOYSA-N hexafluoropropylene Chemical group FC(F)=C(F)C(F)(F)F HCDGVLDPFQMKDK-UHFFFAOYSA-N 0.000 description 8
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- FXRLMCRCYDHQFW-UHFFFAOYSA-N 2,3,3,3-tetrafluoropropene Chemical compound FC(=C)C(F)(F)F FXRLMCRCYDHQFW-UHFFFAOYSA-N 0.000 description 7
- 239000003365 glass fiber Substances 0.000 description 7
- 238000010438 heat treatment Methods 0.000 description 7
- 150000002430 hydrocarbons Chemical class 0.000 description 7
- QMIWYOZFFSLIAK-UHFFFAOYSA-N 3,3,3-trifluoro-2-(trifluoromethyl)prop-1-ene Chemical group FC(F)(F)C(=C)C(F)(F)F QMIWYOZFFSLIAK-UHFFFAOYSA-N 0.000 description 6
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 6
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 6
- 239000002253 acid Substances 0.000 description 6
- 230000005540 biological transmission Effects 0.000 description 6
- UUAGAQFQZIEFAH-UHFFFAOYSA-N chlorotrifluoroethylene Chemical group FC(F)=C(F)Cl UUAGAQFQZIEFAH-UHFFFAOYSA-N 0.000 description 6
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- UQSQSQZYBQSBJZ-UHFFFAOYSA-M fluorosulfate group Chemical group S(=O)(=O)([O-])F UQSQSQZYBQSBJZ-UHFFFAOYSA-M 0.000 description 6
- 229930195733 hydrocarbon Natural products 0.000 description 6
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- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 6
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- AQYSYJUIMQTRMV-UHFFFAOYSA-N hypofluorous acid Chemical group FO AQYSYJUIMQTRMV-UHFFFAOYSA-N 0.000 description 5
- 239000007788 liquid Substances 0.000 description 5
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 5
- WFDIJRYMOXRFFG-UHFFFAOYSA-N Acetic anhydride Chemical compound CC(=O)OC(C)=O WFDIJRYMOXRFFG-UHFFFAOYSA-N 0.000 description 4
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 4
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 4
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- 239000006117 anti-reflective coating Substances 0.000 description 4
- 239000002585 base Substances 0.000 description 4
- 235000011089 carbon dioxide Nutrition 0.000 description 4
- SBZXBUIDTXKZTM-UHFFFAOYSA-N diglyme Chemical compound COCCOCCOC SBZXBUIDTXKZTM-UHFFFAOYSA-N 0.000 description 4
- 239000011521 glass Substances 0.000 description 4
- 230000008018 melting Effects 0.000 description 4
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- 230000003595 spectral effect Effects 0.000 description 4
- 229910001220 stainless steel Inorganic materials 0.000 description 4
- 239000010935 stainless steel Substances 0.000 description 4
- WJMPJUSCTDDDAY-UHFFFAOYSA-N sulfurofluoridic acid;3,3,3-trifluoro-2-(trifluoromethyl)prop-1-ene Chemical group OS(F)(=O)=O.FC(F)(F)C(=C)C(F)(F)F WJMPJUSCTDDDAY-UHFFFAOYSA-N 0.000 description 4
- WGTYBPLFGIVFAS-UHFFFAOYSA-M tetramethylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)C WGTYBPLFGIVFAS-UHFFFAOYSA-M 0.000 description 4
- DPHBJYBPRULFHX-UHFFFAOYSA-N 1-(2,2-difluoroethenoxy)-1,1,2,2,2-pentafluoroethane Chemical compound FC(F)=COC(F)(F)C(F)(F)F DPHBJYBPRULFHX-UHFFFAOYSA-N 0.000 description 3
- BJQBIJIMBWRPMM-UHFFFAOYSA-N 1-(2,2-difluoroethenoxy)-1,1,2,2,3,3,4,4,4-nonafluorobutane Chemical compound FC(F)=COC(F)(F)C(F)(F)C(F)(F)C(F)(F)F BJQBIJIMBWRPMM-UHFFFAOYSA-N 0.000 description 3
- SQXQZZQPMKRMEE-UHFFFAOYSA-N 1-(2,2-difluoroethenoxy)-1,1,2,2-tetrafluoroethane Chemical compound FC(F)C(F)(F)OC=C(F)F SQXQZZQPMKRMEE-UHFFFAOYSA-N 0.000 description 3
- UKZKBKJEWDDXBJ-UHFFFAOYSA-N 1-(2-chloro-2,2-difluoroethoxy)-1,1,2,2-tetrafluoroethane Chemical compound FC(F)C(F)(F)OCC(F)(F)Cl UKZKBKJEWDDXBJ-UHFFFAOYSA-N 0.000 description 3
- JDQSSIORVLOESA-UHFFFAOYSA-N 2,2-difluoro-4,5-bis(trifluoromethyl)-1,3-dioxole Chemical compound FC(F)(F)C1=C(C(F)(F)F)OC(F)(F)O1 JDQSSIORVLOESA-UHFFFAOYSA-N 0.000 description 3
- KWSLNKPYNZTHLJ-UHFFFAOYSA-N 2-chloro-2,2-difluoroethanol Chemical compound OCC(F)(F)Cl KWSLNKPYNZTHLJ-UHFFFAOYSA-N 0.000 description 3
- HHBBIOLEJRWIGU-UHFFFAOYSA-N 4-ethoxy-1,1,1,2,2,3,3,4,5,6,6,6-dodecafluoro-5-(trifluoromethyl)hexane Chemical compound CCOC(F)(C(F)(C(F)(F)F)C(F)(F)F)C(F)(F)C(F)(F)C(F)(F)F HHBBIOLEJRWIGU-UHFFFAOYSA-N 0.000 description 3
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- 230000004075 alteration Effects 0.000 description 3
- BJQHLKABXJIVAM-UHFFFAOYSA-N bis(2-ethylhexyl) phthalate Chemical compound CCCCC(CC)COC(=O)C1=CC=CC=C1C(=O)OCC(CC)CCCC BJQHLKABXJIVAM-UHFFFAOYSA-N 0.000 description 3
- NBVXSUQYWXRMNV-UHFFFAOYSA-N fluoromethane Chemical class FC NBVXSUQYWXRMNV-UHFFFAOYSA-N 0.000 description 3
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- KPPDJJMKTLMGLQ-UHFFFAOYSA-N (2-chloro-2,2-difluoroethyl) 2,2,2-trifluoroacetate Chemical compound FC(F)(F)C(=O)OCC(F)(F)Cl KPPDJJMKTLMGLQ-UHFFFAOYSA-N 0.000 description 2
- WLXFKCBELSMGJY-UHFFFAOYSA-N 1-(2-chloro-2,2-difluoroethoxy)-1,1,2,2,2-pentafluoroethane Chemical compound FC(F)(Cl)COC(F)(F)C(F)(F)F WLXFKCBELSMGJY-UHFFFAOYSA-N 0.000 description 2
- LRBLIWOJIZOVDB-UHFFFAOYSA-N 1-(2-chloro-2,2-difluoroethoxy)-1,1,2,2,3,3,4,4,4-nonafluorobutane Chemical compound FC(F)(Cl)COC(F)(F)C(F)(F)C(F)(F)C(F)(F)F LRBLIWOJIZOVDB-UHFFFAOYSA-N 0.000 description 2
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- 230000008025 crystallization Effects 0.000 description 1
- 125000004122 cyclic group Chemical group 0.000 description 1
- 238000010908 decantation Methods 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000007872 degassing Methods 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- 238000007033 dehydrochlorination reaction Methods 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000010511 deprotection reaction Methods 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 239000012933 diacyl peroxide Substances 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000000839 emulsion Substances 0.000 description 1
- 239000003623 enhancer Substances 0.000 description 1
- 238000011067 equilibration Methods 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 238000003682 fluorination reaction Methods 0.000 description 1
- 125000001153 fluoro group Chemical group F* 0.000 description 1
- 239000003517 fume Substances 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical group 0.000 description 1
- VBZWSGALLODQNC-UHFFFAOYSA-N hexafluoroacetone Chemical compound FC(F)(F)C(=O)C(F)(F)F VBZWSGALLODQNC-UHFFFAOYSA-N 0.000 description 1
- PGFXOWRDDHCDTE-UHFFFAOYSA-N hexafluoropropylene oxide Chemical class FC(F)(F)C1(F)OC1(F)F PGFXOWRDDHCDTE-UHFFFAOYSA-N 0.000 description 1
- 229920006158 high molecular weight polymer Polymers 0.000 description 1
- 150000002432 hydroperoxides Chemical class 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 238000005286 illumination Methods 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- 239000003112 inhibitor Substances 0.000 description 1
- 238000000608 laser ablation Methods 0.000 description 1
- 238000003698 laser cutting Methods 0.000 description 1
- 238000010330 laser marking Methods 0.000 description 1
- 230000005389 magnetism Effects 0.000 description 1
- 229910001507 metal halide Inorganic materials 0.000 description 1
- 150000005309 metal halides Chemical class 0.000 description 1
- 238000000386 microscopy Methods 0.000 description 1
- 238000013508 migration Methods 0.000 description 1
- 230000005012 migration Effects 0.000 description 1
- 239000003595 mist Substances 0.000 description 1
- 239000003607 modifier Substances 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- UJMWVICAENGCRF-UHFFFAOYSA-N oxygen difluoride Chemical compound FOF UJMWVICAENGCRF-UHFFFAOYSA-N 0.000 description 1
- 125000005010 perfluoroalkyl group Chemical group 0.000 description 1
- YVBBRRALBYAZBM-UHFFFAOYSA-N perfluorooctane Chemical compound FC(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F YVBBRRALBYAZBM-UHFFFAOYSA-N 0.000 description 1
- RVZRBWKZFJCCIB-UHFFFAOYSA-N perfluorotributylamine Chemical compound FC(F)(F)C(F)(F)C(F)(F)C(F)(F)N(C(F)(F)C(F)(F)C(F)(F)C(F)(F)F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F RVZRBWKZFJCCIB-UHFFFAOYSA-N 0.000 description 1
- 150000002978 peroxides Chemical class 0.000 description 1
- 238000006303 photolysis reaction Methods 0.000 description 1
- 230000015843 photosynthesis, light reaction Effects 0.000 description 1
- 238000009832 plasma treatment Methods 0.000 description 1
- 239000004014 plasticizer Substances 0.000 description 1
- 229920005597 polymer membrane Polymers 0.000 description 1
- USHAGKDGDHPEEY-UHFFFAOYSA-L potassium persulfate Chemical compound [K+].[K+].[O-]S(=O)(=O)OOS([O-])(=O)=O USHAGKDGDHPEEY-UHFFFAOYSA-L 0.000 description 1
- 239000002243 precursor Substances 0.000 description 1
- 230000002035 prolonged effect Effects 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 238000010926 purge Methods 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 239000002151 riboflavin Substances 0.000 description 1
- 238000005389 semiconductor device fabrication Methods 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 229920005573 silicon-containing polymer Polymers 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- 238000000391 spectroscopic ellipsometry Methods 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 238000010561 standard procedure Methods 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- HXJUTPCZVOIRIF-UHFFFAOYSA-N sulfolane Chemical compound O=S1(=O)CCCC1 HXJUTPCZVOIRIF-UHFFFAOYSA-N 0.000 description 1
- 238000010189 synthetic method Methods 0.000 description 1
- TXEYQDLBPFQVAA-UHFFFAOYSA-N tetrafluoromethane Chemical group FC(F)(F)F TXEYQDLBPFQVAA-UHFFFAOYSA-N 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- 238000000411 transmission spectrum Methods 0.000 description 1
- IMFACGCPASFAPR-UHFFFAOYSA-N tributylamine Chemical compound CCCCN(CCCC)CCCC IMFACGCPASFAPR-UHFFFAOYSA-N 0.000 description 1
- PNQBEPDZQUOCNY-UHFFFAOYSA-N trifluoroacetyl chloride Chemical compound FC(F)(F)C(Cl)=O PNQBEPDZQUOCNY-UHFFFAOYSA-N 0.000 description 1
- 238000000870 ultraviolet spectroscopy Methods 0.000 description 1
- 238000003828 vacuum filtration Methods 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0046—Photosensitive materials with perfluoro compounds, e.g. for dry lithography
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Treatments Of Macromolecular Shaped Articles (AREA)
- Adhesives Or Adhesive Processes (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US29070801P | 2001-05-14 | 2001-05-14 | |
| US60/290,708 | 2001-05-14 | ||
| PCT/US2002/018392 WO2002093261A1 (en) | 2001-05-14 | 2002-05-14 | Use of partially fluorinated polymers in applications requiring transparency in the ultraviolet and vacuum ultraviolet |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| KR20040029988A true KR20040029988A (ko) | 2004-04-08 |
Family
ID=23117205
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR10-2003-7014718A Withdrawn KR20040029988A (ko) | 2001-05-14 | 2002-05-14 | 자외선 및 진공 자외선에서 투명성을 요구하는 응용에서부분 플루오르화 중합체의 용도 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US7438995B2 (https=) |
| EP (1) | EP1388026A1 (https=) |
| JP (1) | JP2004536171A (https=) |
| KR (1) | KR20040029988A (https=) |
| WO (1) | WO2002093261A1 (https=) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100625360B1 (ko) * | 2004-10-12 | 2006-09-18 | 에스케이씨 주식회사 | 광학적 특성이 개선된 폴리에스터 필름 |
| KR101378721B1 (ko) * | 2005-10-11 | 2014-03-27 | 메드웨스트바코 코포레이션 | 방향제 제품, 디스펜서 및 디스펜서 어셈블리 |
| US8852528B2 (en) | 2005-10-11 | 2014-10-07 | Meadwestvaco Corporation | Fragrance product, dispenser, and dispenser assembly |
Families Citing this family (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7276624B2 (en) | 2002-05-14 | 2007-10-02 | E. I. Du Pont De Nemours And Company | Fluorosulfates of hexafluoroisobutylene and its higher homologs |
| US7022437B2 (en) * | 2003-01-15 | 2006-04-04 | Asml Netherlands B.V. | Perfluoropolyether liquid pellicle and methods of cleaning masks using perfluoropolyether liquid |
| US20050053777A1 (en) * | 2003-09-06 | 2005-03-10 | Hilliard Donald Bennett | Pellicle |
| KR101141570B1 (ko) | 2003-12-03 | 2012-05-03 | 아사히 가라스 가부시키가이샤 | 펠리클 및 신규 함불소 중합체 |
| DE102004030861A1 (de) * | 2004-06-25 | 2006-01-19 | Infineon Technologies Ag | Verfahren zum Strukturieren eines Halbleitersubstrats unter Verwendung einer Schutzschicht, die das Ausgasen während der Belichtung verringert oder verhindert |
| CN101090767A (zh) * | 2004-12-22 | 2007-12-19 | 纳幕尔杜邦公司 | 用于光化学反应的末端官能化全氟(烷基乙烯基醚)的官能化共聚物的反应器壁、增加烃和卤代烃的氟含量的方法和烯烃的制备 |
| EP2377611A3 (en) * | 2004-12-22 | 2012-01-18 | E. I. du Pont de Nemours and Company | Process for producing an olefinic compound by photochemical reactions |
| JP4747815B2 (ja) * | 2005-12-02 | 2011-08-17 | 旭硝子株式会社 | 非晶性含フッ素樹脂の製造方法 |
| JP4930380B2 (ja) * | 2006-01-27 | 2012-05-16 | 旭硝子株式会社 | 色収差補正レンズ用の含フッ素ポリマーおよび色収差補正レンズ |
| US8481661B2 (en) | 2009-03-05 | 2013-07-09 | Daikin Industries, Ltd. | Fluoroelastomer, curable composition and cured rubber article |
| WO2011125740A1 (ja) | 2010-03-31 | 2011-10-13 | ダイキン工業株式会社 | ２，３，３，３－テトラフルオロプロペン共重合体 |
| US8558152B2 (en) * | 2010-07-22 | 2013-10-15 | Raytheon Company | Lens concentrator system for semi-active laser target designation |
| KR101699635B1 (ko) * | 2012-08-02 | 2017-01-24 | 미쓰이 가가쿠 가부시키가이샤 | 펠리클 |
| JP6465113B2 (ja) * | 2014-07-15 | 2019-02-06 | Ａｇｃ株式会社 | 紫外線発光装置用接着剤および紫外線発光装置 |
| US10678134B2 (en) * | 2015-09-29 | 2020-06-09 | Merck Patent Gmbh | Photosensitive composition and color converting film |
| KR102374272B1 (ko) * | 2016-05-09 | 2022-03-15 | 쓰리엠 이노베이티브 프로퍼티즈 컴파니 | 하이드로플루오로올레핀 및 이의 사용 방법 |
| KR102417180B1 (ko) | 2017-09-29 | 2022-07-05 | 삼성전자주식회사 | Duv용 포토레지스트 조성물, 패턴 형성 방법 및 반도체 소자의 제조 방법 |
| DE102019200208A1 (de) | 2019-01-10 | 2020-07-16 | Carl Zeiss Smt Gmbh | Verfahren zum in situ dynamischen Schutz einer Oberfläche und optische Anordnung |
Family Cites Families (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5948766A (ja) * | 1982-09-14 | 1984-03-21 | Mitsui Toatsu Chem Inc | フオトマスク |
| JPH01241557A (ja) | 1988-03-22 | 1989-09-26 | Bando Chem Ind Ltd | ペリクル膜 |
| ATE122477T1 (de) * | 1989-09-06 | 1995-05-15 | Du Pont | Nichtreflektierende filmabdeckung. |
| US5061024C1 (en) | 1989-09-06 | 2002-02-26 | Dupont Photomasks Inc | Amorphous fluoropolymer pellicle films |
| JPH07295207A (ja) | 1994-04-28 | 1995-11-10 | Shin Etsu Chem Co Ltd | 高強度フッ素系膜ペリクル |
| TW337002B (en) | 1996-11-19 | 1998-07-21 | Mitsui Kagaku Kk | Pellicle |
| EP0907106A4 (en) | 1997-02-13 | 2000-04-05 | Mitsui Chemicals Inc | FILM MEMBRANE FOR ULTRAVIOLET RAYS AND FILM |
| ITMI981506A1 (it) * | 1998-06-30 | 1999-12-30 | Ausimont Spa | Manufatti di fluoropolimeri amorfi |
| US6280885B1 (en) * | 1999-08-11 | 2001-08-28 | Dupont Photomasks, Inc. | Dust cover comprising anti-reflective coating |
| EP1238310A1 (en) | 1999-11-17 | 2002-09-11 | E.I. Du Pont De Nemours And Company | Ultraviolet and vacuum ultraviolet transparent polymer compositions and their uses |
| US6548129B2 (en) * | 2000-03-15 | 2003-04-15 | Asahi Glass Company, Limited | Pellicle |
| US7129009B2 (en) * | 2002-05-14 | 2006-10-31 | E. I. Du Pont De Nemours And Company | Polymer-liquid compositions useful in ultraviolet and vacuum ultraviolet uses |
-
2002
- 2002-05-14 WO PCT/US2002/018392 patent/WO2002093261A1/en not_active Ceased
- 2002-05-14 US US10/475,245 patent/US7438995B2/en not_active Expired - Fee Related
- 2002-05-14 JP JP2002589879A patent/JP2004536171A/ja active Pending
- 2002-05-14 KR KR10-2003-7014718A patent/KR20040029988A/ko not_active Withdrawn
- 2002-05-14 EP EP02749576A patent/EP1388026A1/en not_active Withdrawn
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100625360B1 (ko) * | 2004-10-12 | 2006-09-18 | 에스케이씨 주식회사 | 광학적 특성이 개선된 폴리에스터 필름 |
| KR101378721B1 (ko) * | 2005-10-11 | 2014-03-27 | 메드웨스트바코 코포레이션 | 방향제 제품, 디스펜서 및 디스펜서 어셈블리 |
| US8852528B2 (en) | 2005-10-11 | 2014-10-07 | Meadwestvaco Corporation | Fragrance product, dispenser, and dispenser assembly |
Also Published As
| Publication number | Publication date |
|---|---|
| US20040142286A1 (en) | 2004-07-22 |
| US7438995B2 (en) | 2008-10-21 |
| WO2002093261A1 (en) | 2002-11-21 |
| EP1388026A1 (en) | 2004-02-11 |
| JP2004536171A (ja) | 2004-12-02 |
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| PA0105 | International application |
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| PC1203 | Withdrawal of no request for examination | ||
| WITN | Application deemed withdrawn, e.g. because no request for examination was filed or no examination fee was paid |