JP2004536171A - 紫外線及び真空紫外線の透明性を必要とする適用での部分フッ素化ポリマーの使用 - Google Patents

紫外線及び真空紫外線の透明性を必要とする適用での部分フッ素化ポリマーの使用 Download PDF

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Publication number
JP2004536171A
JP2004536171A JP2002589879A JP2002589879A JP2004536171A JP 2004536171 A JP2004536171 A JP 2004536171A JP 2002589879 A JP2002589879 A JP 2002589879A JP 2002589879 A JP2002589879 A JP 2002589879A JP 2004536171 A JP2004536171 A JP 2004536171A
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JP
Japan
Prior art keywords
fluoropolymer
copolymer
group
vinylidene fluoride
hydrogen
Prior art date
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Pending
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JP2002589879A
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English (en)
Japanese (ja)
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JP2004536171A5 (https=
Inventor
フレンチ，ロジヤー・ハークエイル
ウエランド，ロバート・クレイトン
キウ，ウエイミング
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EIDP Inc
Original Assignee
EI Du Pont de Nemours and Co
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Publication date
Application filed by EI Du Pont de Nemours and Co filed Critical EI Du Pont de Nemours and Co
Publication of JP2004536171A publication Critical patent/JP2004536171A/ja
Publication of JP2004536171A5 publication Critical patent/JP2004536171A5/ja
Pending legal-status Critical Current

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0046—Photosensitive materials with perfluoro compounds, e.g. for dry lithography

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Treatments Of Macromolecular Shaped Articles (AREA)
  • Adhesives Or Adhesive Processes (AREA)
JP2002589879A 2001-05-14 2002-05-14 紫外線及び真空紫外線の透明性を必要とする適用での部分フッ素化ポリマーの使用 Pending JP2004536171A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US29070801P 2001-05-14 2001-05-14
PCT/US2002/018392 WO2002093261A1 (en) 2001-05-14 2002-05-14 Use of partially fluorinated polymers in applications requiring transparency in the ultraviolet and vacuum ultraviolet

Publications (2)

Publication Number Publication Date
JP2004536171A true JP2004536171A (ja) 2004-12-02
JP2004536171A5 JP2004536171A5 (https=) 2006-01-05

Family

ID=23117205

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2002589879A Pending JP2004536171A (ja) 2001-05-14 2002-05-14 紫外線及び真空紫外線の透明性を必要とする適用での部分フッ素化ポリマーの使用

Country Status (5)

Country Link
US (1) US7438995B2 (https=)
EP (1) EP1388026A1 (https=)
JP (1) JP2004536171A (https=)
KR (1) KR20040029988A (https=)
WO (1) WO2002093261A1 (https=)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007153970A (ja) * 2005-12-02 2007-06-21 Asahi Glass Co Ltd 非晶性含フッ素樹脂の製造方法
JP4930380B2 (ja) * 2006-01-27 2012-05-16 旭硝子株式会社 色収差補正レンズ用の含フッ素ポリマーおよび色収差補正レンズ
US9187589B2 (en) 2010-03-31 2015-11-17 Daikin Industries, Ltd. 2, 3, 3, 3-tetrafluoropropene copolymer
WO2016010043A1 (ja) * 2014-07-15 2016-01-21 旭硝子株式会社 紫外線発光装置用接着剤および紫外線発光装置
KR20180063188A (ko) * 2015-09-29 2018-06-11 메르크 파텐트 게엠베하 감광성 조성물 및 색 변환 필름

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7276624B2 (en) 2002-05-14 2007-10-02 E. I. Du Pont De Nemours And Company Fluorosulfates of hexafluoroisobutylene and its higher homologs
US7022437B2 (en) * 2003-01-15 2006-04-04 Asml Netherlands B.V. Perfluoropolyether liquid pellicle and methods of cleaning masks using perfluoropolyether liquid
US20050053777A1 (en) * 2003-09-06 2005-03-10 Hilliard Donald Bennett Pellicle
KR101141570B1 (ko) 2003-12-03 2012-05-03 아사히 가라스 가부시키가이샤 펠리클 및 신규 함불소 중합체
DE102004030861A1 (de) * 2004-06-25 2006-01-19 Infineon Technologies Ag Verfahren zum Strukturieren eines Halbleitersubstrats unter Verwendung einer Schutzschicht, die das Ausgasen während der Belichtung verringert oder verhindert
KR100625360B1 (ko) * 2004-10-12 2006-09-18 에스케이씨 주식회사 광학적 특성이 개선된 폴리에스터 필름
CN101090767A (zh) * 2004-12-22 2007-12-19 纳幕尔杜邦公司 用于光化学反应的末端官能化全氟(烷基乙烯基醚)的官能化共聚物的反应器壁、增加烃和卤代烃的氟含量的方法和烯烃的制备
EP2377611A3 (en) * 2004-12-22 2012-01-18 E. I. du Pont de Nemours and Company Process for producing an olefinic compound by photochemical reactions
US7722819B2 (en) * 2005-10-11 2010-05-25 Meadwestvaco Calmar, Inc. Fragrance product, dispenser, and dispenser assembly
KR101378721B1 (ko) * 2005-10-11 2014-03-27 메드웨스트바코 코포레이션 방향제 제품, 디스펜서 및 디스펜서 어셈블리
US8481661B2 (en) 2009-03-05 2013-07-09 Daikin Industries, Ltd. Fluoroelastomer, curable composition and cured rubber article
US8558152B2 (en) * 2010-07-22 2013-10-15 Raytheon Company Lens concentrator system for semi-active laser target designation
KR101699635B1 (ko) * 2012-08-02 2017-01-24 미쓰이 가가쿠 가부시키가이샤 펠리클
KR102374272B1 (ko) * 2016-05-09 2022-03-15 쓰리엠 이노베이티브 프로퍼티즈 컴파니 하이드로플루오로올레핀 및 이의 사용 방법
KR102417180B1 (ko) 2017-09-29 2022-07-05 삼성전자주식회사 Duv용 포토레지스트 조성물, 패턴 형성 방법 및 반도체 소자의 제조 방법
DE102019200208A1 (de) 2019-01-10 2020-07-16 Carl Zeiss Smt Gmbh Verfahren zum in situ dynamischen Schutz einer Oberfläche und optische Anordnung

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5948766A (ja) * 1982-09-14 1984-03-21 Mitsui Toatsu Chem Inc フオトマスク
JPH01241557A (ja) 1988-03-22 1989-09-26 Bando Chem Ind Ltd ペリクル膜
ATE122477T1 (de) * 1989-09-06 1995-05-15 Du Pont Nichtreflektierende filmabdeckung.
US5061024C1 (en) 1989-09-06 2002-02-26 Dupont Photomasks Inc Amorphous fluoropolymer pellicle films
JPH07295207A (ja) 1994-04-28 1995-11-10 Shin Etsu Chem Co Ltd 高強度フッ素系膜ペリクル
TW337002B (en) 1996-11-19 1998-07-21 Mitsui Kagaku Kk Pellicle
EP0907106A4 (en) 1997-02-13 2000-04-05 Mitsui Chemicals Inc FILM MEMBRANE FOR ULTRAVIOLET RAYS AND FILM
ITMI981506A1 (it) * 1998-06-30 1999-12-30 Ausimont Spa Manufatti di fluoropolimeri amorfi
US6280885B1 (en) * 1999-08-11 2001-08-28 Dupont Photomasks, Inc. Dust cover comprising anti-reflective coating
EP1238310A1 (en) 1999-11-17 2002-09-11 E.I. Du Pont De Nemours And Company Ultraviolet and vacuum ultraviolet transparent polymer compositions and their uses
US6548129B2 (en) * 2000-03-15 2003-04-15 Asahi Glass Company, Limited Pellicle
US7129009B2 (en) * 2002-05-14 2006-10-31 E. I. Du Pont De Nemours And Company Polymer-liquid compositions useful in ultraviolet and vacuum ultraviolet uses

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007153970A (ja) * 2005-12-02 2007-06-21 Asahi Glass Co Ltd 非晶性含フッ素樹脂の製造方法
JP4930380B2 (ja) * 2006-01-27 2012-05-16 旭硝子株式会社 色収差補正レンズ用の含フッ素ポリマーおよび色収差補正レンズ
US9187589B2 (en) 2010-03-31 2015-11-17 Daikin Industries, Ltd. 2, 3, 3, 3-tetrafluoropropene copolymer
WO2016010043A1 (ja) * 2014-07-15 2016-01-21 旭硝子株式会社 紫外線発光装置用接着剤および紫外線発光装置
KR20170033292A (ko) 2014-07-15 2017-03-24 아사히 가라스 가부시키가이샤 자외선 발광 장치용 접착제 및 자외선 발광 장치
US10246615B2 (en) 2014-07-15 2019-04-02 Agc, Inc. Ultraviolet-light-emitting device with adhesive having low glass transition temperature
KR20180063188A (ko) * 2015-09-29 2018-06-11 메르크 파텐트 게엠베하 감광성 조성물 및 색 변환 필름
KR102583352B1 (ko) 2015-09-29 2023-09-26 메르크 파텐트 게엠베하 감광성 조성물 및 색 변환 필름

Also Published As

Publication number Publication date
US20040142286A1 (en) 2004-07-22
US7438995B2 (en) 2008-10-21
WO2002093261A1 (en) 2002-11-21
EP1388026A1 (en) 2004-02-11
KR20040029988A (ko) 2004-04-08

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