KR20040025609A - 도전성 페이스트 및 태양전지의 제조 방법 및 태양전지 - Google Patents
도전성 페이스트 및 태양전지의 제조 방법 및 태양전지 Download PDFInfo
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- KR20040025609A KR20040025609A KR1020030064436A KR20030064436A KR20040025609A KR 20040025609 A KR20040025609 A KR 20040025609A KR 1020030064436 A KR1020030064436 A KR 1020030064436A KR 20030064436 A KR20030064436 A KR 20030064436A KR 20040025609 A KR20040025609 A KR 20040025609A
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- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims abstract description 15
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- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 1
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- 230000003746 surface roughness Effects 0.000 description 1
- 229920003002 synthetic resin Polymers 0.000 description 1
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- 229940116411 terpineol Drugs 0.000 description 1
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- 229920001187 thermosetting polymer Polymers 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C8/00—Enamels; Glazes; Fusion seal compositions being frit compositions having non-frit additions
- C03C8/14—Glass frit mixtures having non-frit additions, e.g. opacifiers, colorants, mill-additions
- C03C8/18—Glass frit mixtures having non-frit additions, e.g. opacifiers, colorants, mill-additions containing free metals
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/04—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
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- C—CHEMISTRY; METALLURGY
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- C03C14/00—Glass compositions containing a non-glass component, e.g. compositions containing fibres, filaments, whiskers, platelets, or the like, dispersed in a glass matrix
- C03C14/006—Glass compositions containing a non-glass component, e.g. compositions containing fibres, filaments, whiskers, platelets, or the like, dispersed in a glass matrix the non-glass component being in the form of microcrystallites, e.g. of optically or electrically active material
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- C03C8/00—Enamels; Glazes; Fusion seal compositions being frit compositions having non-frit additions
- C03C8/02—Frit compositions, i.e. in a powdered or comminuted form
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- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C8/00—Enamels; Glazes; Fusion seal compositions being frit compositions having non-frit additions
- C03C8/14—Glass frit mixtures having non-frit additions, e.g. opacifiers, colorants, mill-additions
- C03C8/16—Glass frit mixtures having non-frit additions, e.g. opacifiers, colorants, mill-additions with vehicle or suspending agents, e.g. slip
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- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B1/00—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
- H01B1/14—Conductive material dispersed in non-conductive inorganic material
- H01B1/16—Conductive material dispersed in non-conductive inorganic material the conductive material comprising metals or alloys
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- H—ELECTRICITY
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- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B1/00—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
- H01B1/14—Conductive material dispersed in non-conductive inorganic material
- H01B1/18—Conductive material dispersed in non-conductive inorganic material the conductive material comprising carbon-silicon compounds, carbon or silicon
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- H01B1/00—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
- H01B1/20—Conductive material dispersed in non-conductive organic material
- H01B1/22—Conductive material dispersed in non-conductive organic material the conductive material comprising metals or alloys
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- H—ELECTRICITY
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- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
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- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
- H01L31/0224—Electrodes
- H01L31/022408—Electrodes for devices characterised by at least one potential jump barrier or surface barrier
- H01L31/022425—Electrodes for devices characterised by at least one potential jump barrier or surface barrier for solar cells
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
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- C03C2214/00—Nature of the non-vitreous component
- C03C2214/08—Metals
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- C03C2214/00—Nature of the non-vitreous component
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Abstract
Description
시료 | 입자의 재질 | 입자의 평균 입자직경(㎛) |
1 | 폴리에틸렌 | 5 |
2 | 아크릴 수지 | 5 |
3 | 탄소입자 | 5 |
4 | 테레프탈산 | 5 |
시료 | 휘어짐양(㎛) | 전극 표면 상태 |
1 | 30 | 기포, 크랙 등 없음 |
2 | 25 | 기포, 크랙 등 없음 |
3 | 35 | 기포, 크랙 등 없음 |
4 | 30 | 기포, 크랙 등 없음 |
*5 | 60 | 기포, 크랙 등 없음 |
시료 | 평균 입자직경(㎛) | 휘어짐양(㎛) | 전극 표면 상태 |
6 | 0.3 | 43 | 기포, 크랙 등 없음 |
7 | 0.5 | 35 | 기포, 크랙 등 없음 |
8 | 1.5 | 30 | 기포, 크랙 등 없음 |
9 | 5.0 | 25 | 기포, 크랙 등 없음 |
10 | 10 | 30 | 기포, 크랙 등 없음 |
*5 | - | 60 | 기포, 크랙 등 없음 |
시료 | 첨가량(중량부) | 휘어짐양(㎛) | 전극면 상태 |
11 | 0.5 | 45 | 기포, 크랙 등 없음 |
12 | 1.0 | 40 | 기포, 크랙 등 없음 |
13 | 2.5 | 30 | 기포, 크랙 등 없음 |
14 | 5.0 | 25 | 기포, 크랙 등 없음 |
15 | 7.5 | 22 | 기포, 크랙 등 없음 |
16 | 10 | 20 | 기포, 크랙 등 없음 |
*5 | - | 60 | 기포, 크랙 등 없음 |
Claims (8)
- Al분말, 유리프릿, 유기 비이클, 및 상기 유기 비이클에 난용해성 또는 불용해성인 입자를 함유하고, 상기 입자는 유기 화합물 입자 및 탄소 입자 중, 적어도 1종인 것을 특징으로 하는 Si 태양전지의 이면 전극 형성용 도전성 페이스트.
- 제1항에 있어서, 상기 유기 비이클에 난용해성 또는 불용해성인 입자의 크기는, 평균 입자직경 0.5∼10㎛인 것을 특징으로 하는 도전성 페이스트.
- 제1항에 있어서, 상기 유기 비이클에 난용해성 또는 불용해성인 입자의 함유량은, 상기 Al분말 100중량부에 대하여 1∼10중량부인 것을 특징으로 하는 도전성 페이스트.
- 제2항에 있어서, 상기 유기 비이클에 난용해성 또는 불용해성인 입자의 함유량은, 상기 Al분말 100중량부에 대하여 1∼10중량부인 것을 특징으로 하는 도전성 페이스트.
- p-Si층 및 n-Si층을 갖는 Si 웨이퍼와, 상기 Si 웨이퍼의 상기 n-Si층 측에 형성된 수광면 전극과, 상기 Si 웨이퍼의 상기 p-Si층 측에 형성된 이면 전극을 구비하는 태양전지를 제조할 때,상기 이면 전극을 Al분말, 유리프릿, 유기 비이클, 및 유기 화합물 입자 및 탄소 입자 중, 적어도 1종으로 상기 유기 비이클에 난용해성 또는 불용해성인 입자를 함유하는 도전성 페이스트를 도포하고, 소성함으로써 형성하는 것을 특징으로 하는 태양전지의 제조 방법.
- 제5항에 있어서, 상기 이면 전극은 평균 직경 0.5∼10㎛의 빈구멍(空孔)을 갖는 것을 특징으로 하는 태양전지의 제조 방법.
- 제6항에 있어서, 상기 빈구멍은 상기 이면 전극의 1∼20체적%를 차지하는 것을 특징으로 하는 태양전지의 제조 방법.
- p-Si층 및 n-Si층을 갖는 Si 웨이퍼와, 상기 Si 웨이퍼의 상기 n-Si층 측에 형성된 수광면 전극과, 상기 Si 웨이퍼의 상기 p-Si층 측에 형성된 이면 전극을 구비하는 태양전지로서,상기 이면 전극은 상기 이면 전극의 1∼20체적%를 차지하는 평균 직경 0.5∼10㎛의 빈구멍을 갖는 것을 특징으로 하는 태양전지.
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JPJP-P-2002-00273151 | 2002-09-19 | ||
JP2002273151 | 2002-09-19 |
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KR20040025609A true KR20040025609A (ko) | 2004-03-24 |
KR100660726B1 KR100660726B1 (ko) | 2006-12-21 |
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US (1) | US20040055635A1 (ko) |
EP (1) | EP1400987A3 (ko) |
JP (1) | JP2004134775A (ko) |
KR (1) | KR100660726B1 (ko) |
CN (1) | CN1263162C (ko) |
TW (1) | TWI254322B (ko) |
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JP3895254B2 (ja) * | 2002-10-07 | 2007-03-22 | シャープ株式会社 | 太陽電池セルの製造方法 |
JP3974860B2 (ja) * | 2003-01-28 | 2007-09-12 | 京セラ株式会社 | 太陽電池素子 |
JP2005317898A (ja) * | 2004-03-31 | 2005-11-10 | Toyo Aluminium Kk | ペースト組成物およびそれを用いた太陽電池素子 |
WO2006003830A1 (ja) * | 2004-07-01 | 2006-01-12 | Toyo Aluminium Kabushiki Kaisha | ペースト組成物およびそれを用いた太陽電池素子 |
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JP3374194B2 (ja) * | 1992-04-20 | 2003-02-04 | 奥野製薬工業株式会社 | 導電性アルミニウムペースト用組成物 |
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JPH09186044A (ja) * | 1995-12-28 | 1997-07-15 | Taiyo Yuden Co Ltd | 積層電子部品用内部電極材料ペースト、積層電子部品及びその製造方法 |
JP2000090733A (ja) * | 1998-09-14 | 2000-03-31 | Murata Mfg Co Ltd | 導電性ペースト及びそれを用いた太陽電池 |
JP2000090734A (ja) * | 1998-09-16 | 2000-03-31 | Murata Mfg Co Ltd | 導電性ペースト及びそれを用いた太陽電池 |
JP2001202822A (ja) * | 2000-01-21 | 2001-07-27 | Murata Mfg Co Ltd | 導電性ペースト |
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2003
- 2003-08-28 US US10/649,946 patent/US20040055635A1/en not_active Abandoned
- 2003-09-02 TW TW092124208A patent/TWI254322B/zh not_active IP Right Cessation
- 2003-09-04 EP EP03020066A patent/EP1400987A3/en not_active Withdrawn
- 2003-09-04 CN CNB031580564A patent/CN1263162C/zh not_active Expired - Lifetime
- 2003-09-12 JP JP2003321428A patent/JP2004134775A/ja not_active Abandoned
- 2003-09-17 KR KR1020030064436A patent/KR100660726B1/ko active IP Right Grant
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CN1487531A (zh) | 2004-04-07 |
TWI254322B (en) | 2006-05-01 |
US20040055635A1 (en) | 2004-03-25 |
EP1400987A3 (en) | 2004-04-07 |
EP1400987A2 (en) | 2004-03-24 |
KR100660726B1 (ko) | 2006-12-21 |
TW200409146A (en) | 2004-06-01 |
JP2004134775A (ja) | 2004-04-30 |
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