KR20030019635A - 어드밴스드 프로세스 제어(apc) 프레임워크를 사용하여프로세싱 툴의 결함 검출 및 그 제어를 위한 방법 및 장치 - Google Patents
어드밴스드 프로세스 제어(apc) 프레임워크를 사용하여프로세싱 툴의 결함 검출 및 그 제어를 위한 방법 및 장치 Download PDFInfo
- Publication number
- KR20030019635A KR20030019635A KR10-2003-7001371A KR20037001371A KR20030019635A KR 20030019635 A KR20030019635 A KR 20030019635A KR 20037001371 A KR20037001371 A KR 20037001371A KR 20030019635 A KR20030019635 A KR 20030019635A
- Authority
- KR
- South Korea
- Prior art keywords
- tool
- data
- defect detection
- processing tool
- state data
- Prior art date
Links
- 238000012545 processing Methods 0.000 title claims abstract description 66
- 238000001514 detection method Methods 0.000 title claims abstract description 57
- 238000000034 method Methods 0.000 title claims abstract description 20
- 238000004886 process control Methods 0.000 title claims abstract description 6
- 230000007547 defect Effects 0.000 claims abstract description 77
- 238000004519 manufacturing process Methods 0.000 claims abstract description 23
- 230000009471 action Effects 0.000 claims abstract description 6
- 230000004044 response Effects 0.000 claims abstract description 6
- 238000013480 data collection Methods 0.000 claims description 20
- 238000004891 communication Methods 0.000 claims description 15
- 230000000881 depressing effect Effects 0.000 claims 1
- 235000012431 wafers Nutrition 0.000 abstract description 27
- 230000002950 deficient Effects 0.000 abstract description 4
- 230000036541 health Effects 0.000 description 16
- 230000008569 process Effects 0.000 description 9
- 239000004065 semiconductor Substances 0.000 description 7
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 5
- 229910052710 silicon Inorganic materials 0.000 description 5
- 239000010703 silicon Substances 0.000 description 5
- 238000004458 analytical method Methods 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- 238000012986 modification Methods 0.000 description 3
- 230000004048 modification Effects 0.000 description 3
- 238000013519 translation Methods 0.000 description 3
- 238000013396 workstream Methods 0.000 description 3
- 230000008901 benefit Effects 0.000 description 2
- 238000012544 monitoring process Methods 0.000 description 2
- 238000012935 Averaging Methods 0.000 description 1
- 230000004913 activation Effects 0.000 description 1
- 238000009529 body temperature measurement Methods 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 239000012467 final product Substances 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 238000007726 management method Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000000047 product Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
- G05B19/00—Programme-control systems
- G05B19/02—Programme-control systems electric
- G05B19/418—Total factory control, i.e. centrally controlling a plurality of machines, e.g. direct or distributed numerical control [DNC], flexible manufacturing systems [FMS], integrated manufacturing systems [IMS] or computer integrated manufacturing [CIM]
- G05B19/4184—Total factory control, i.e. centrally controlling a plurality of machines, e.g. direct or distributed numerical control [DNC], flexible manufacturing systems [FMS], integrated manufacturing systems [IMS] or computer integrated manufacturing [CIM] characterised by fault tolerance, reliability of production system
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
- G05B19/00—Programme-control systems
- G05B19/02—Programme-control systems electric
- G05B19/418—Total factory control, i.e. centrally controlling a plurality of machines, e.g. direct or distributed numerical control [DNC], flexible manufacturing systems [FMS], integrated manufacturing systems [IMS] or computer integrated manufacturing [CIM]
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
- G05B19/00—Programme-control systems
- G05B19/02—Programme-control systems electric
- G05B19/418—Total factory control, i.e. centrally controlling a plurality of machines, e.g. direct or distributed numerical control [DNC], flexible manufacturing systems [FMS], integrated manufacturing systems [IMS] or computer integrated manufacturing [CIM]
- G05B19/41875—Total factory control, i.e. centrally controlling a plurality of machines, e.g. direct or distributed numerical control [DNC], flexible manufacturing systems [FMS], integrated manufacturing systems [IMS] or computer integrated manufacturing [CIM] characterised by quality surveillance of production
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
- G05B2219/00—Program-control systems
- G05B2219/30—Nc systems
- G05B2219/32—Operator till task planning
- G05B2219/32209—Stop production line
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
- G05B2219/00—Program-control systems
- G05B2219/30—Nc systems
- G05B2219/32—Operator till task planning
- G05B2219/32221—Correlation between defect and measured parameters to find origin of defect
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P90/00—Enabling technologies with a potential contribution to greenhouse gas [GHG] emissions mitigation
- Y02P90/02—Total factory control, e.g. smart factories, flexible manufacturing systems [FMS] or integrated manufacturing systems [IMS]
Landscapes
- Engineering & Computer Science (AREA)
- General Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Quality & Reliability (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Automation & Control Theory (AREA)
- General Factory Administration (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
- Testing And Monitoring For Control Systems (AREA)
- Measuring Fluid Pressure (AREA)
- Devices For Checking Fares Or Tickets At Control Points (AREA)
Abstract
Description
Claims (10)
- 프로세싱 피스(processing piece)의 제조와 관련된 프로세싱 툴(105)의 동작 상태 데이터(operational state data)를 제1 인터페이스(110)에서 수신하는 단계;상기 상태 데이터를 상기 제1 인터페이스(110)로부터 결함 검출 유닛(120)으로 전송하는 단계;상기 상태 데이터에 기초해서 상기 프로세싱 툴(105)에 결함 상태(fault condition)가 존재하는지를 결정하는 단계; 및그 결함 상태의 존재에 응답해서 상기 프로세싱 툴(105) 상에서 미리 결정된 동작을 실행하는 단계를 포함하는 것을 특징으로 하는 방법.
- 제1항에 있어서, 상기 상태 데이터를 상기 제1 인터페이스(110)로부터 결함 검출 유닛(120)으로 전송하는 단계는,상기 제1 인터페이스(110)로부터 데이터 수집 유닛(130)으로 상기 상태 데이터를 전송하는 단계;상기 데이터 수집 유닛(130)에서 상기 상태 데이터를 누하시키는 단계;상기 상태 데이터를 제1 통신 프로토콜로부터 상기 결함 검출 유닛(120)과 호환가능한 제2 통신 프로토콜로 번역하는 단계;상기 번역된 상태 데이터를 상기 데이터 수집 유닛(130)으로부터 상기 결함 검출 유닛(120)으로 전송하는 단계를 포함하는 것을 특징으로 하는 방법.
- 제2항에 있어서, 상기 프로세싱 툴(105)의 결함 상태가 상기 결함 검출 유닛(120)에 의해 결정되면 상기 결함 상태를 나타내는 경고 신호를 상기 결함 검출 유닛(120)으로부터 어드밴스드 프로세스 제어 프레임워크(135)로 전송하는 단계를 더 포함하는 것을 특징으로 하는 방법.
- 제3항에 있어서, 상기 미리 결정된 동작을 실행하는 단계는 상기 프레임워크(135)에 의해 상기 미리 결정된 동작을 반영하는 신호를 상기 제1 인터페이스(110)로 전송하는 단계를 더 포함하는 것을 특징으로 하는 방법.
- 제2항에 있어서, 상기 누적된 상태 데이터를 상기 데이터 수집 유닛(130)으로부터 상기 결함 검출 유닛(120)으로 전송하는 단계는 상기 툴(105)에 의해 프로세싱 피스가 처리되는 동안 상기 누적된 상태 데이터를 상기 데이터 수집 유닛(130)으로부터 상기 결함 검출 유닛(120)으로 전송하는 단계를 더 포함하는 것을 특징으로 하는 방법.
- 프로세싱 피스를 제조하는 프로세싱 툴(105);상기 프로세싱 툴(105)에 결합되어, 상기 프로세싱 피스의 제조와 관련된 상기 프로세싱 툴(105)의 동작 상태 데이터를 수신하는 제1 인터페이스(110);상기 동작 상태 데이터에 기초하여 상기 프로세싱 툴(105)에 결함 상태가 존재하는지를 결정하는 결함 검출 유닛(120); 및그 결함 상태의 존재에 응답해서 상기 프로세싱 툴(105) 상에서 미리 결정된 동작을 수행하는 프레임워크(135)를 포함하는 것을 특징으로 하는 시스템.
- 제6항에 있어서, 상기 제1 인터페이스(110)는,상기 상태 데이터가 상기 제1 인터페이스(110)에 의해 수신되면 그 상태 데이터를 수신하여 누적하고, 상기 상태 데이터를 제1 통신 프로토콜로부터 상기 결함 검출 유닛(120)과 호환가능한 제2 통신 프로토콜로 번역하며, 그 번역된 상태 데이터를 상기 데이터 수집 유닛(130)으로부터 상기 결함 검출 유닛(120)으로 전송하는 데이터 수집 유닛(130)을 포함하는 것을 특징으로 하는 시스템.
- 제6항에 있어서, 상기 프로세싱 툴(105)에 결합되어, 상기 프로세싱 툴(105)로부터 부가의 상태 데이터를 수신하고 그 데이터를 상기 결함 검출 유닛(120)으로 전송하는 센서(115)를 더 포함하는 것을 특징으로 하는 시스템.
- 제6항에 있어서, 상기 결함 검출 유닛(120)은 또한 상기 프로세싱 툴(105)의 상기 상태 데이터와 미리 결정된 상태 데이터와 비교하여 상기 결함 상태의 존재를 결정하는 것을 특징으로 하는 시스템.
- 제7항에 있어서, 상기 데이터 수집 유닛(130)은 또한 상기 툴(105)에 의해프로세싱 피스가 처리되는 동안 상기 누적된 상태 데이터를 상기 결함 검출 유닛(120)으로 전송하는 것을 특징으로 하는 시스템.
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US09/629,073 | 2000-07-31 | ||
US09/629,073 US6725402B1 (en) | 2000-07-31 | 2000-07-31 | Method and apparatus for fault detection of a processing tool and control thereof using an advanced process control (APC) framework |
PCT/US2001/021159 WO2002010873A2 (en) | 2000-07-31 | 2001-07-03 | Method and apparatus for fault detection of a processing tool and control thereof using an advanced process control (apc) framework |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20030019635A true KR20030019635A (ko) | 2003-03-06 |
KR100819190B1 KR100819190B1 (ko) | 2008-04-04 |
Family
ID=24521470
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020037001371A KR100819190B1 (ko) | 2000-07-31 | 2001-07-03 | 어드밴스드 프로세스 제어(apc) 프레임워크를 사용하여 프로세싱 툴의 결함 검출 및 이의 제어를 위한 방법 및 시스템 |
Country Status (9)
Country | Link |
---|---|
US (1) | US6725402B1 (ko) |
EP (1) | EP1305681B1 (ko) |
JP (1) | JP4977303B2 (ko) |
KR (1) | KR100819190B1 (ko) |
CN (1) | CN100520651C (ko) |
AU (1) | AU2001271800A1 (ko) |
DE (1) | DE60127267T2 (ko) |
TW (1) | TW589691B (ko) |
WO (1) | WO2002010873A2 (ko) |
Families Citing this family (34)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7069101B1 (en) * | 1999-07-29 | 2006-06-27 | Applied Materials, Inc. | Computer integrated manufacturing techniques |
US7188142B2 (en) | 2000-11-30 | 2007-03-06 | Applied Materials, Inc. | Dynamic subject information generation in message services of distributed object systems in a semiconductor assembly line facility |
US6910947B2 (en) * | 2001-06-19 | 2005-06-28 | Applied Materials, Inc. | Control of chemical mechanical polishing pad conditioner directional velocity to improve pad life |
US7047099B2 (en) * | 2001-06-19 | 2006-05-16 | Applied Materials Inc. | Integrating tool, module, and fab level control |
US7082345B2 (en) * | 2001-06-19 | 2006-07-25 | Applied Materials, Inc. | Method, system and medium for process control for the matching of tools, chambers and/or other semiconductor-related entities |
US7160739B2 (en) | 2001-06-19 | 2007-01-09 | Applied Materials, Inc. | Feedback control of a chemical mechanical polishing device providing manipulation of removal rate profiles |
US7698012B2 (en) | 2001-06-19 | 2010-04-13 | Applied Materials, Inc. | Dynamic metrology schemes and sampling schemes for advanced process control in semiconductor processing |
US20020192966A1 (en) * | 2001-06-19 | 2002-12-19 | Shanmugasundram Arulkumar P. | In situ sensor based control of semiconductor processing procedure |
US7337019B2 (en) * | 2001-07-16 | 2008-02-26 | Applied Materials, Inc. | Integration of fault detection with run-to-run control |
US6950716B2 (en) * | 2001-08-13 | 2005-09-27 | Applied Materials, Inc. | Dynamic control of wafer processing paths in semiconductor manufacturing processes |
US20030037090A1 (en) * | 2001-08-14 | 2003-02-20 | Koh Horne L. | Tool services layer for providing tool service functions in conjunction with tool functions |
US6984198B2 (en) * | 2001-08-14 | 2006-01-10 | Applied Materials, Inc. | Experiment management system, method and medium |
US8180587B2 (en) * | 2002-03-08 | 2012-05-15 | Globalfoundries Inc. | System for brokering fault detection data |
TWI328164B (en) * | 2002-05-29 | 2010-08-01 | Tokyo Electron Ltd | Method and apparatus for monitoring tool performance |
US7668702B2 (en) * | 2002-07-19 | 2010-02-23 | Applied Materials, Inc. | Method, system and medium for controlling manufacturing process using adaptive models based on empirical data |
US6999836B2 (en) * | 2002-08-01 | 2006-02-14 | Applied Materials, Inc. | Method, system, and medium for handling misrepresentative metrology data within an advanced process control system |
US20040063224A1 (en) * | 2002-09-18 | 2004-04-01 | Applied Materials, Inc. | Feedback control of a chemical mechanical polishing process for multi-layered films |
JP4694843B2 (ja) * | 2002-09-30 | 2011-06-08 | 東京エレクトロン株式会社 | 半導体製作プロセスの監視とコンロトールのための装置 |
CN1720490B (zh) * | 2002-11-15 | 2010-12-08 | 应用材料有限公司 | 用于控制具有多变量输入参数的制造工艺的方法和系统 |
US8359494B2 (en) | 2002-12-18 | 2013-01-22 | Globalfoundries Inc. | Parallel fault detection |
US6912433B1 (en) * | 2002-12-18 | 2005-06-28 | Advanced Mirco Devices, Inc. | Determining a next tool state based on fault detection information |
US7205228B2 (en) * | 2003-06-03 | 2007-04-17 | Applied Materials, Inc. | Selective metal encapsulation schemes |
WO2005013016A2 (en) * | 2003-08-05 | 2005-02-10 | Arie Melul | Method and system for real time diagnosis of machine operation |
US7437404B2 (en) * | 2004-05-20 | 2008-10-14 | Taiwan Semiconductor Manufacturing Company, Ltd. | System and method for improving equipment communication in semiconductor manufacturing equipment |
US7363195B2 (en) * | 2004-07-07 | 2008-04-22 | Sensarray Corporation | Methods of configuring a sensor network |
US7680556B2 (en) * | 2004-11-15 | 2010-03-16 | Tech Semiconductor Singapore Pte. Ltd. | Method for data collection during manufacturing processes |
US7277824B1 (en) * | 2005-07-13 | 2007-10-02 | Advanced Micro Devices, Inc. | Method and apparatus for classifying faults based on wafer state data and sensor tool trace data |
US8397173B2 (en) * | 2006-01-31 | 2013-03-12 | Advantest (Singapore) Pte Ltd | Methods and apparatus using a service to launch and/or monitor data formatting processes |
US8572472B2 (en) * | 2006-09-28 | 2013-10-29 | Mitsubishi Electric Corporation | Fault detection apparatus, fault detection method, and fault detection program |
CN101536002B (zh) * | 2006-11-03 | 2015-02-04 | 气体产品与化学公司 | 用于工艺监控的系统和方法 |
JP4975605B2 (ja) * | 2007-12-26 | 2012-07-11 | 東京エレクトロン株式会社 | 処理システム、処理システムの制御方法およびソフトウェアのバージョンアップ方法 |
JP2010034180A (ja) * | 2008-07-28 | 2010-02-12 | Toshiba Corp | 半導体製造装置の制御方法および半導体装置の製造方法 |
US9720393B2 (en) * | 2012-08-31 | 2017-08-01 | P.C. Automax Inc. | Automation system and method of manufacturing product using automated equipment |
EP3055842B1 (en) * | 2013-10-07 | 2020-01-22 | Google LLC | Smart-home hazard detector providing non-alarm status signals at opportune moments |
Family Cites Families (30)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62157762A (ja) * | 1985-12-28 | 1987-07-13 | Toshiba Corp | 設備診断装置 |
JPS63307755A (ja) * | 1987-06-09 | 1988-12-15 | Matsushita Electric Ind Co Ltd | 半導体製造装置 |
JP2648871B2 (ja) * | 1988-06-27 | 1997-09-03 | 東京エレクトロン株式会社 | 熱処理装置 |
JPH02205019A (ja) * | 1989-02-02 | 1990-08-14 | Hitachi Ltd | プラズマ処理装置およびその診断方法 |
JPH0795869B2 (ja) * | 1990-08-17 | 1995-10-11 | 新日本製鐵株式会社 | プロセス制御設備診断装置 |
JPH0757681A (ja) * | 1993-08-12 | 1995-03-03 | Nissin Electric Co Ltd | イオン注入装置 |
US5526293A (en) | 1993-12-17 | 1996-06-11 | Texas Instruments Inc. | System and method for controlling semiconductor wafer processing |
US5563798A (en) | 1994-04-05 | 1996-10-08 | Applied Materials, Inc. | Wafer positioning system |
US5661408A (en) * | 1995-03-01 | 1997-08-26 | Qc Solutions, Inc. | Real-time in-line testing of semiconductor wafers |
JPH0911092A (ja) * | 1995-06-20 | 1997-01-14 | Hitachi Ltd | 生産支援システムおよび生産設備用インテリジェントインタフェース |
JP3265969B2 (ja) * | 1995-07-07 | 2002-03-18 | 日新電機株式会社 | イオン注入制御装置 |
JPH09244733A (ja) * | 1996-03-05 | 1997-09-19 | Fuji Electric Co Ltd | 点検ロボットにおけるロボット制御と自動診断の並行処理化方法 |
US5859964A (en) | 1996-10-25 | 1999-01-12 | Advanced Micro Devices, Inc. | System and method for performing real time data acquisition, process modeling and fault detection of wafer fabrication processes |
JP3576335B2 (ja) * | 1996-10-31 | 2004-10-13 | 松下電器産業株式会社 | プロセス加工工程の異常抽出方法及び装置 |
US6161054A (en) * | 1997-09-22 | 2000-12-12 | On-Line Technologies, Inc. | Cell control method and apparatus |
JP3744661B2 (ja) * | 1997-10-17 | 2006-02-15 | 中村留精密工業株式会社 | Nc工作機械の故障診断方法及び装置 |
JPH11145979A (ja) * | 1997-11-12 | 1999-05-28 | Nikon Corp | 半導体製造装置の支援装置 |
KR19990065483A (ko) * | 1998-01-14 | 1999-08-05 | 윤종용 | 반도체 제조설비 관리시스템의 설비 유닛상태 관리방법 |
KR100269942B1 (ko) * | 1998-02-03 | 2000-10-16 | 윤종용 | 반도체제조설비관리방법 |
US6115643A (en) * | 1998-02-03 | 2000-09-05 | Mcms | Real-time manufacturing process control monitoring method |
JPH11296444A (ja) * | 1998-04-06 | 1999-10-29 | Toshiba Corp | 監視装置 |
US6263255B1 (en) * | 1998-05-18 | 2001-07-17 | Advanced Micro Devices, Inc. | Advanced process control for semiconductor manufacturing |
JP3492527B2 (ja) * | 1998-08-31 | 2004-02-03 | 東光電気株式会社 | ビル群の監視制御システム |
US6408399B1 (en) * | 1999-02-24 | 2002-06-18 | Lucent Technologies Inc. | High reliability multiple processing and control system utilizing shared components |
US6556881B1 (en) | 1999-09-09 | 2003-04-29 | Advanced Micro Devices, Inc. | Method and apparatus for integrating near real-time fault detection in an APC framework |
US6560503B1 (en) | 1999-10-05 | 2003-05-06 | Advanced Micro Devices, Inc. | Method and apparatus for monitoring controller performance using statistical process control |
US6546508B1 (en) * | 1999-10-29 | 2003-04-08 | Advanced Micro Devices, Inc. | Method and apparatus for fault detection of a processing tool in an advanced process control (APC) framework |
US6532555B1 (en) * | 1999-10-29 | 2003-03-11 | Advanced Micro Devices, Inc. | Method and apparatus for integration of real-time tool data and in-line metrology for fault detection in an advanced process control (APC) framework |
US6232134B1 (en) * | 2000-01-24 | 2001-05-15 | Motorola Inc. | Method and apparatus for monitoring wafer characteristics and/or semiconductor processing consistency using wafer charge distribution measurements |
US6606582B1 (en) * | 2000-03-27 | 2003-08-12 | Seh America, Inc. | Universal system, method and computer program product for collecting and processing process data including particle measurement data |
-
2000
- 2000-07-31 US US09/629,073 patent/US6725402B1/en not_active Expired - Lifetime
-
2001
- 2001-07-03 CN CNB018145221A patent/CN100520651C/zh not_active Expired - Lifetime
- 2001-07-03 AU AU2001271800A patent/AU2001271800A1/en not_active Abandoned
- 2001-07-03 KR KR1020037001371A patent/KR100819190B1/ko active IP Right Grant
- 2001-07-03 JP JP2002515536A patent/JP4977303B2/ja not_active Expired - Lifetime
- 2001-07-03 WO PCT/US2001/021159 patent/WO2002010873A2/en active IP Right Grant
- 2001-07-03 DE DE60127267T patent/DE60127267T2/de not_active Expired - Lifetime
- 2001-07-03 EP EP01950842A patent/EP1305681B1/en not_active Expired - Lifetime
- 2001-07-18 TW TW090117506A patent/TW589691B/zh not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
WO2002010873A2 (en) | 2002-02-07 |
AU2001271800A1 (en) | 2002-02-13 |
CN100520651C (zh) | 2009-07-29 |
EP1305681B1 (en) | 2007-03-14 |
CN1447933A (zh) | 2003-10-08 |
WO2002010873A3 (en) | 2002-08-29 |
DE60127267T2 (de) | 2007-12-20 |
DE60127267D1 (de) | 2007-04-26 |
KR100819190B1 (ko) | 2008-04-04 |
JP2004505366A (ja) | 2004-02-19 |
US6725402B1 (en) | 2004-04-20 |
TW589691B (en) | 2004-06-01 |
JP4977303B2 (ja) | 2012-07-18 |
EP1305681A2 (en) | 2003-05-02 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
KR100819190B1 (ko) | 어드밴스드 프로세스 제어(apc) 프레임워크를 사용하여 프로세싱 툴의 결함 검출 및 이의 제어를 위한 방법 및 시스템 | |
US6556881B1 (en) | Method and apparatus for integrating near real-time fault detection in an APC framework | |
US6535783B1 (en) | Method and apparatus for the integration of sensor data from a process tool in an advanced process control (APC) framework | |
US6546508B1 (en) | Method and apparatus for fault detection of a processing tool in an advanced process control (APC) framework | |
US6532555B1 (en) | Method and apparatus for integration of real-time tool data and in-line metrology for fault detection in an advanced process control (APC) framework | |
US7200779B1 (en) | Fault notification based on a severity level | |
US6828165B2 (en) | Semiconductor plasma processing apparatus with first and second processing state monitoring units | |
US6831555B1 (en) | Method and apparatus for dynamically monitoring system components in an advanced process control (APC) framework | |
US6871112B1 (en) | Method for requesting trace data reports from FDC semiconductor fabrication processes | |
US20030014145A1 (en) | Integration of fault detection with run-to-run control | |
KR20040094831A (ko) | 프로세스 도구 데이터 마이닝을 이용한 엔드-오브-라인데이터 마이닝의 상관 | |
JP4261190B2 (ja) | ベースライン制御スクリプトを用いてツールを制御するための方法および装置 | |
US6850811B1 (en) | Analyzing error signals based on fault detection | |
US6821792B1 (en) | Method and apparatus for determining a sampling plan based on process and equipment state information | |
US6790680B1 (en) | Determining a possible cause of a fault in a semiconductor fabrication process | |
JP2004531794A (ja) | 複数のプロセスコントローラを統合するための方法および装置 | |
US6697691B1 (en) | Method and apparatus for fault model analysis in manufacturing tools | |
US6556882B1 (en) | Method and apparatus for generating real-time data from static files | |
US6697696B1 (en) | Fault detection control system using dual bus architecture, and methods of using same | |
US6999897B2 (en) | Method and related system for semiconductor equipment early warning management | |
US6763278B1 (en) | Operating a processing tool in a degraded mode upon detecting a fault | |
US6766258B1 (en) | Method and apparatus for dynamically enabling trace data collection | |
Kim et al. | Introduction of equipment level FDC system for semiconductor wet-cleaning equipment optimization and real-time fault detection | |
US7098048B1 (en) | Method and apparatus for capturing fault state data | |
US20090112346A1 (en) | Method and System for Adaptive Equipment Notifications |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A201 | Request for examination | ||
E902 | Notification of reason for refusal | ||
E701 | Decision to grant or registration of patent right | ||
GRNT | Written decision to grant | ||
FPAY | Annual fee payment |
Payment date: 20130227 Year of fee payment: 6 |
|
FPAY | Annual fee payment |
Payment date: 20140228 Year of fee payment: 7 |
|
FPAY | Annual fee payment |
Payment date: 20150302 Year of fee payment: 8 |
|
FPAY | Annual fee payment |
Payment date: 20160303 Year of fee payment: 9 |
|
FPAY | Annual fee payment |
Payment date: 20170302 Year of fee payment: 10 |
|
FPAY | Annual fee payment |
Payment date: 20190227 Year of fee payment: 12 |
|
FPAY | Annual fee payment |
Payment date: 20200227 Year of fee payment: 13 |