KR20020055291A - 진공증착장비용 서셉터 - Google Patents
진공증착장비용 서셉터 Download PDFInfo
- Publication number
- KR20020055291A KR20020055291A KR1020000084714A KR20000084714A KR20020055291A KR 20020055291 A KR20020055291 A KR 20020055291A KR 1020000084714 A KR1020000084714 A KR 1020000084714A KR 20000084714 A KR20000084714 A KR 20000084714A KR 20020055291 A KR20020055291 A KR 20020055291A
- Authority
- KR
- South Korea
- Prior art keywords
- susceptor
- glass substrate
- robot arm
- vacuum deposition
- deposition equipment
- Prior art date
Links
Classifications
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/001—General methods for coating; Devices therefor
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/458—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
- C23C16/4582—Rigid and flat substrates, e.g. plates or discs
- C23C16/4583—Rigid and flat substrates, e.g. plates or discs the substrate being supported substantially horizontally
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Physics & Mathematics (AREA)
- Mechanical Engineering (AREA)
- Life Sciences & Earth Sciences (AREA)
- Metallurgy (AREA)
- Geochemistry & Mineralogy (AREA)
- Nonlinear Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Chemical Vapour Deposition (AREA)
- Physical Vapour Deposition (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Abstract
Description
Claims (7)
- 진공증착장비에 있어서,유리기판을 가열함과 아울러 플라즈마를 발생시키기 위한 서셉터와,상기 유리기판을 지지하기 위한 리프트 핀과,상기 유리기판을 상기 서셉터에 이송 및 반송하기 위한 로보트 암과,상기 로보트 암의 이송 및 반송 안정을 위한 스토퍼 핀과,상기 서셉터의 슬라이드부에 형성되어 증착공정시 발생되는 성막물질이 삽입되는 적어도 하나의 홈을 구비하는 것을 특징으로 하는 진공증착장비용 서셉터.
- 제 1항에 있어서,상기 서셉터 상에 안착된 기판의 끝단과 상기 스토퍼 핀 사이의 간격이 적어도 3mm 이상인 것을 특징으로 하는 진공증착장비용 서셉터.
- 제 1항에 있어서,상기 간격이 10mm인 것을 특징으로 하는 진공증착장비용 서셉터.
- 제 1항에 있어서,상기 서셉터의 재료는 석영인 것을 특징으로 하는 진공증착장비용 서셉터.
- 제 1항에 있어서,상기 슬라이드부에 형성된 상기 홈의 단면이 다각형인 것을 특징으로 하는 진공증착장비용 서셉터.
- 제 1항에 있어서,상기 슬라이드부에 형성된 상기 홈의 저면이 곡면인 것을 특징으로 하는 진공증착장비용 서셉터.
- 제 1항에 있어서,상기 슬라이드부에 형성된 상기 홈의 저면이 경사면과 수직면을 포함하는 것을 특징으로 하는 진공증착장비용 서셉터.
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020000084714A KR100776515B1 (ko) | 2000-12-28 | 2000-12-28 | 진공증착장치 |
US10/029,035 US20020083896A1 (en) | 2000-12-28 | 2001-12-28 | Vacuum deposition apparatus |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020000084714A KR100776515B1 (ko) | 2000-12-28 | 2000-12-28 | 진공증착장치 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20020055291A true KR20020055291A (ko) | 2002-07-08 |
KR100776515B1 KR100776515B1 (ko) | 2007-11-16 |
Family
ID=19703819
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020000084714A KR100776515B1 (ko) | 2000-12-28 | 2000-12-28 | 진공증착장치 |
Country Status (2)
Country | Link |
---|---|
US (1) | US20020083896A1 (ko) |
KR (1) | KR100776515B1 (ko) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101296911B1 (ko) * | 2005-12-28 | 2013-08-14 | 엘지디스플레이 주식회사 | 평판표시소자의 제조장치 및 그의 정전기량 검출장치 및검출방법 |
KR20070069802A (ko) * | 2005-12-28 | 2007-07-03 | 엘지.필립스 엘시디 주식회사 | 평판표시소자의 제조장치 및 그를 이용한 기판파손방지방법 |
WO2022097456A1 (ja) * | 2020-11-09 | 2022-05-12 | 株式会社ニューフレアテクノロジー | 気相成長装置 |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS55121648A (en) * | 1979-03-14 | 1980-09-18 | Pioneer Electronic Corp | Cvd device |
JPS5828827A (ja) * | 1981-08-12 | 1983-02-19 | Matsushita Electric Ind Co Ltd | 化学気相堆積膜形成装置 |
JP2927857B2 (ja) * | 1990-01-19 | 1999-07-28 | 株式会社東芝 | 基板加熱装置 |
US5855687A (en) * | 1990-12-05 | 1999-01-05 | Applied Materials, Inc. | Substrate support shield in wafer processing reactors |
JPH05129242A (ja) * | 1991-11-05 | 1993-05-25 | Sharp Corp | ドライエツチング方法 |
US5589224A (en) * | 1992-09-30 | 1996-12-31 | Applied Materials, Inc. | Apparatus for full wafer deposition |
DE69404397T2 (de) * | 1993-07-13 | 1997-11-13 | Applied Materials Inc | Verbesserte Suszeptor Ausführung |
JPH0758041A (ja) * | 1993-08-20 | 1995-03-03 | Toshiba Ceramics Co Ltd | サセプタ |
JP3891636B2 (ja) * | 1997-04-22 | 2007-03-14 | 株式会社ルネサステクノロジ | 半導体製造装置および半導体ウェハの移載方法 |
-
2000
- 2000-12-28 KR KR1020000084714A patent/KR100776515B1/ko active IP Right Grant
-
2001
- 2001-12-28 US US10/029,035 patent/US20020083896A1/en not_active Abandoned
Also Published As
Publication number | Publication date |
---|---|
US20020083896A1 (en) | 2002-07-04 |
KR100776515B1 (ko) | 2007-11-16 |
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