KR20010052378A - 프로판 또는 이소부탄으로부터 아크릴로니트릴 또는메트아크릴로니트릴을 제조하는데 사용하기 위한 산화물촉매의 제조 방법 - Google Patents
프로판 또는 이소부탄으로부터 아크릴로니트릴 또는메트아크릴로니트릴을 제조하는데 사용하기 위한 산화물촉매의 제조 방법 Download PDFInfo
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- KR20010052378A KR20010052378A KR1020007013056A KR20007013056A KR20010052378A KR 20010052378 A KR20010052378 A KR 20010052378A KR 1020007013056 A KR1020007013056 A KR 1020007013056A KR 20007013056 A KR20007013056 A KR 20007013056A KR 20010052378 A KR20010052378 A KR 20010052378A
- Authority
- KR
- South Korea
- Prior art keywords
- oxide catalyst
- raw material
- solution
- material mixture
- catalyst
- Prior art date
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- 239000003054 catalyst Substances 0.000 title claims abstract description 212
- ATUOYWHBWRKTHZ-UHFFFAOYSA-N Propane Chemical compound CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 title claims abstract description 169
- 239000001294 propane Substances 0.000 title claims abstract description 84
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 title claims abstract description 72
- NNPPMTNAJDCUHE-UHFFFAOYSA-N isobutane Chemical compound CC(C)C NNPPMTNAJDCUHE-UHFFFAOYSA-N 0.000 title claims abstract description 40
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 36
- 239000001282 iso-butane Substances 0.000 title claims abstract description 20
- GYCMBHHDWRMZGG-UHFFFAOYSA-N Methylacrylonitrile Chemical compound CC(=C)C#N GYCMBHHDWRMZGG-UHFFFAOYSA-N 0.000 title claims description 25
- 239000000203 mixture Substances 0.000 claims abstract description 176
- 239000000243 solution Substances 0.000 claims abstract description 122
- 239000002994 raw material Substances 0.000 claims abstract description 117
- 238000007254 oxidation reaction Methods 0.000 claims abstract description 88
- 230000003647 oxidation Effects 0.000 claims abstract description 87
- 238000000034 method Methods 0.000 claims abstract description 84
- 150000001875 compounds Chemical class 0.000 claims abstract description 83
- 239000002002 slurry Substances 0.000 claims abstract description 78
- 239000007864 aqueous solution Substances 0.000 claims abstract description 68
- 238000011282 treatment Methods 0.000 claims abstract description 52
- 238000001354 calcination Methods 0.000 claims abstract description 50
- 230000001590 oxidative effect Effects 0.000 claims abstract description 46
- 229910052787 antimony Inorganic materials 0.000 claims abstract description 41
- 239000007789 gas Substances 0.000 claims abstract description 39
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 38
- 239000007788 liquid Substances 0.000 claims abstract description 35
- 229910052750 molybdenum Inorganic materials 0.000 claims abstract description 33
- 238000001035 drying Methods 0.000 claims abstract description 20
- 150000001298 alcohols Chemical class 0.000 claims abstract description 5
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 claims description 132
- 229910021529 ammonia Inorganic materials 0.000 claims description 58
- 239000010955 niobium Substances 0.000 claims description 50
- 239000003570 air Substances 0.000 claims description 45
- 239000002585 base Substances 0.000 claims description 42
- 229910052758 niobium Inorganic materials 0.000 claims description 29
- 239000012018 catalyst precursor Substances 0.000 claims description 28
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 27
- 239000001301 oxygen Substances 0.000 claims description 27
- 229910052760 oxygen Inorganic materials 0.000 claims description 27
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical group [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 claims description 26
- 238000010438 heat treatment Methods 0.000 claims description 25
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 claims description 23
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 claims description 20
- LEONUFNNVUYDNQ-UHFFFAOYSA-N vanadium atom Chemical compound [V] LEONUFNNVUYDNQ-UHFFFAOYSA-N 0.000 claims description 20
- 239000011733 molybdenum Substances 0.000 claims description 19
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims description 18
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 claims description 18
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 claims description 17
- -1 alkaline earth metal carbonates Chemical class 0.000 claims description 17
- 229910001882 dioxygen Inorganic materials 0.000 claims description 16
- MWUXSHHQAYIFBG-UHFFFAOYSA-N nitrogen oxide Inorganic materials O=[N] MWUXSHHQAYIFBG-UHFFFAOYSA-N 0.000 claims description 14
- 239000002131 composite material Substances 0.000 claims description 12
- 239000010936 titanium Chemical group 0.000 claims description 12
- 229910052784 alkaline earth metal Inorganic materials 0.000 claims description 9
- 239000011261 inert gas Substances 0.000 claims description 9
- 229910052742 iron Inorganic materials 0.000 claims description 9
- 229910052719 titanium Inorganic materials 0.000 claims description 9
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 8
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 claims description 8
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical group [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 8
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims description 8
- 229910052714 tellurium Inorganic materials 0.000 claims description 8
- PORWMNRCUJJQNO-UHFFFAOYSA-N tellurium atom Chemical compound [Te] PORWMNRCUJJQNO-UHFFFAOYSA-N 0.000 claims description 8
- 239000007800 oxidant agent Substances 0.000 claims description 6
- 229910052709 silver Inorganic materials 0.000 claims description 6
- 239000004332 silver Substances 0.000 claims description 6
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims description 5
- 150000001342 alkaline earth metals Chemical class 0.000 claims description 5
- 229910052797 bismuth Inorganic materials 0.000 claims description 5
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 claims description 5
- 229910052718 tin Inorganic materials 0.000 claims description 5
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical group [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 claims description 5
- 229910052721 tungsten Inorganic materials 0.000 claims description 5
- 239000010937 tungsten Chemical group 0.000 claims description 5
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 claims description 4
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical group [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims description 4
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 4
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 claims description 4
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 claims description 4
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 claims description 4
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims description 4
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 claims description 4
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical group [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 claims description 4
- 229910052796 boron Inorganic materials 0.000 claims description 4
- 229910052804 chromium Inorganic materials 0.000 claims description 4
- 239000011651 chromium Chemical group 0.000 claims description 4
- 229910017052 cobalt Inorganic materials 0.000 claims description 4
- 239000010941 cobalt Substances 0.000 claims description 4
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 claims description 4
- 229910052802 copper Inorganic materials 0.000 claims description 4
- 239000010949 copper Substances 0.000 claims description 4
- 229910052733 gallium Inorganic materials 0.000 claims description 4
- 229910052732 germanium Inorganic materials 0.000 claims description 4
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 claims description 4
- 229910052735 hafnium Inorganic materials 0.000 claims description 4
- VBJZVLUMGGDVMO-UHFFFAOYSA-N hafnium atom Chemical group [Hf] VBJZVLUMGGDVMO-UHFFFAOYSA-N 0.000 claims description 4
- 229910052738 indium Inorganic materials 0.000 claims description 4
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 claims description 4
- WPBNNNQJVZRUHP-UHFFFAOYSA-L manganese(2+);methyl n-[[2-(methoxycarbonylcarbamothioylamino)phenyl]carbamothioyl]carbamate;n-[2-(sulfidocarbothioylamino)ethyl]carbamodithioate Chemical group [Mn+2].[S-]C(=S)NCCNC([S-])=S.COC(=O)NC(=S)NC1=CC=CC=C1NC(=S)NC(=O)OC WPBNNNQJVZRUHP-UHFFFAOYSA-L 0.000 claims description 4
- 229910052759 nickel Inorganic materials 0.000 claims description 4
- 150000007524 organic acids Chemical class 0.000 claims description 4
- 235000005985 organic acids Nutrition 0.000 claims description 4
- 229910052763 palladium Inorganic materials 0.000 claims description 4
- 229910052698 phosphorus Inorganic materials 0.000 claims description 4
- 239000011574 phosphorus Substances 0.000 claims description 4
- 229910052697 platinum Inorganic materials 0.000 claims description 4
- 229910052761 rare earth metal Inorganic materials 0.000 claims description 4
- 229910052702 rhenium Inorganic materials 0.000 claims description 4
- WUAPFZMCVAUBPE-UHFFFAOYSA-N rhenium atom Chemical compound [Re] WUAPFZMCVAUBPE-UHFFFAOYSA-N 0.000 claims description 4
- 229910052703 rhodium Inorganic materials 0.000 claims description 4
- 239000010948 rhodium Substances 0.000 claims description 4
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 claims description 4
- 229910052707 ruthenium Inorganic materials 0.000 claims description 4
- 229910052715 tantalum Inorganic materials 0.000 claims description 4
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical group [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 claims description 4
- 229910052725 zinc Inorganic materials 0.000 claims description 4
- 239000011701 zinc Substances 0.000 claims description 4
- 229910052726 zirconium Inorganic materials 0.000 claims description 4
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 claims description 3
- 229910052783 alkali metal Inorganic materials 0.000 claims description 3
- 150000001412 amines Chemical class 0.000 claims description 3
- QWPPOHNGKGFGJK-UHFFFAOYSA-N hypochlorous acid Chemical compound ClO QWPPOHNGKGFGJK-UHFFFAOYSA-N 0.000 claims description 3
- 229910017604 nitric acid Inorganic materials 0.000 claims description 3
- 229910000288 alkali metal carbonate Inorganic materials 0.000 claims description 2
- 150000008041 alkali metal carbonates Chemical class 0.000 claims description 2
- 150000008044 alkali metal hydroxides Chemical class 0.000 claims description 2
- 229910001860 alkaline earth metal hydroxide Inorganic materials 0.000 claims description 2
- DIMMBYOINZRKMD-UHFFFAOYSA-N vanadium(5+) Chemical class [V+5] DIMMBYOINZRKMD-UHFFFAOYSA-N 0.000 claims 1
- 229910052720 vanadium Inorganic materials 0.000 abstract description 25
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 45
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 41
- 238000006243 chemical reaction Methods 0.000 description 29
- 229910001873 dinitrogen Inorganic materials 0.000 description 25
- 239000000725 suspension Substances 0.000 description 21
- 238000003756 stirring Methods 0.000 description 17
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 16
- 239000000377 silicon dioxide Substances 0.000 description 16
- 238000002360 preparation method Methods 0.000 description 13
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 12
- UNTBPXHCXVWYOI-UHFFFAOYSA-O azanium;oxido(dioxo)vanadium Chemical compound [NH4+].[O-][V](=O)=O UNTBPXHCXVWYOI-UHFFFAOYSA-O 0.000 description 12
- 239000005078 molybdenum compound Substances 0.000 description 12
- 150000002752 molybdenum compounds Chemical class 0.000 description 12
- 150000003682 vanadium compounds Chemical class 0.000 description 12
- 150000001463 antimony compounds Chemical class 0.000 description 11
- 229910052757 nitrogen Inorganic materials 0.000 description 10
- XUGISPSHIFXEHZ-GPJXBBLFSA-N [(3r,8s,9s,10r,13r,14s,17r)-10,13-dimethyl-17-[(2r)-6-methylheptan-2-yl]-2,3,4,7,8,9,11,12,14,15,16,17-dodecahydro-1h-cyclopenta[a]phenanthren-3-yl] acetate Chemical compound C1C=C2C[C@H](OC(C)=O)CC[C@]2(C)[C@@H]2[C@@H]1[C@@H]1CC[C@H]([C@H](C)CCCC(C)C)[C@@]1(C)CC2 XUGISPSHIFXEHZ-GPJXBBLFSA-N 0.000 description 9
- QGAVSDVURUSLQK-UHFFFAOYSA-N ammonium heptamolybdate Chemical compound N.N.N.N.N.N.O.O.O.O.O.O.O.O.O.O.O.O.O.O.O.O.O.O.O.O.O.O.O.O.[Mo].[Mo].[Mo].[Mo].[Mo].[Mo].[Mo] QGAVSDVURUSLQK-UHFFFAOYSA-N 0.000 description 9
- ADCOVFLJGNWWNZ-UHFFFAOYSA-N antimony trioxide Inorganic materials O=[Sb]O[Sb]=O ADCOVFLJGNWWNZ-UHFFFAOYSA-N 0.000 description 9
- 230000000052 comparative effect Effects 0.000 description 9
- 239000001307 helium Substances 0.000 description 9
- 229910052734 helium Inorganic materials 0.000 description 9
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 9
- 239000010453 quartz Substances 0.000 description 9
- 238000000354 decomposition reaction Methods 0.000 description 8
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- 230000000694 effects Effects 0.000 description 7
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- 239000011541 reaction mixture Substances 0.000 description 7
- 239000002253 acid Substances 0.000 description 6
- 238000005507 spraying Methods 0.000 description 6
- OFOBLEOULBTSOW-UHFFFAOYSA-N Malonic acid Chemical compound OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 5
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 5
- 239000004809 Teflon Substances 0.000 description 5
- 229920006362 Teflon® Polymers 0.000 description 5
- 238000004817 gas chromatography Methods 0.000 description 5
- QOSATHPSBFQAML-UHFFFAOYSA-N hydrogen peroxide;hydrate Chemical compound O.OO QOSATHPSBFQAML-UHFFFAOYSA-N 0.000 description 5
- 238000010992 reflux Methods 0.000 description 5
- 238000001694 spray drying Methods 0.000 description 5
- 150000004703 alkoxides Chemical class 0.000 description 4
- FAWGZAFXDJGWBB-UHFFFAOYSA-N antimony(3+) Chemical compound [Sb+3] FAWGZAFXDJGWBB-UHFFFAOYSA-N 0.000 description 4
- 239000008246 gaseous mixture Substances 0.000 description 4
- 238000005259 measurement Methods 0.000 description 4
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- 238000012360 testing method Methods 0.000 description 4
- 229910001935 vanadium oxide Inorganic materials 0.000 description 4
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 3
- WVDDGKGOMKODPV-UHFFFAOYSA-N Benzyl alcohol Chemical compound OCC1=CC=CC=C1 WVDDGKGOMKODPV-UHFFFAOYSA-N 0.000 description 3
- 229910004298 SiO 2 Inorganic materials 0.000 description 3
- 150000004649 carbonic acid derivatives Chemical class 0.000 description 3
- 238000001816 cooling Methods 0.000 description 3
- 150000004679 hydroxides Chemical class 0.000 description 3
- 150000002822 niobium compounds Chemical class 0.000 description 3
- GEVPUGOOGXGPIO-UHFFFAOYSA-N oxalic acid;dihydrate Chemical compound O.O.OC(=O)C(O)=O GEVPUGOOGXGPIO-UHFFFAOYSA-N 0.000 description 3
- 239000007921 spray Substances 0.000 description 3
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 description 2
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 2
- KRKNYBCHXYNGOX-UHFFFAOYSA-K Citrate Chemical compound [O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O KRKNYBCHXYNGOX-UHFFFAOYSA-K 0.000 description 2
- QUSNBJAOOMFDIB-UHFFFAOYSA-N Ethylamine Chemical compound CCN QUSNBJAOOMFDIB-UHFFFAOYSA-N 0.000 description 2
- BAVYZALUXZFZLV-UHFFFAOYSA-N Methylamine Chemical compound NC BAVYZALUXZFZLV-UHFFFAOYSA-N 0.000 description 2
- GQPLMRYTRLFLPF-UHFFFAOYSA-N Nitrous Oxide Chemical compound [O-][N+]#N GQPLMRYTRLFLPF-UHFFFAOYSA-N 0.000 description 2
- 241000220259 Raphanus Species 0.000 description 2
- XHCLAFWTIXFWPH-UHFFFAOYSA-N [O-2].[O-2].[O-2].[O-2].[O-2].[V+5].[V+5] Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[V+5].[V+5] XHCLAFWTIXFWPH-UHFFFAOYSA-N 0.000 description 2
- 229910000410 antimony oxide Inorganic materials 0.000 description 2
- 230000015556 catabolic process Effects 0.000 description 2
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- 238000005119 centrifugation Methods 0.000 description 2
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- 239000012530 fluid Substances 0.000 description 2
- LELOWRISYMNNSU-UHFFFAOYSA-N hydrogen cyanide Chemical compound N#C LELOWRISYMNNSU-UHFFFAOYSA-N 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- 229910000476 molybdenum oxide Inorganic materials 0.000 description 2
- VTRUBDSFZJNXHI-UHFFFAOYSA-N oxoantimony Chemical compound [Sb]=O VTRUBDSFZJNXHI-UHFFFAOYSA-N 0.000 description 2
- PQQKPALAQIIWST-UHFFFAOYSA-N oxomolybdenum Chemical compound [Mo]=O PQQKPALAQIIWST-UHFFFAOYSA-N 0.000 description 2
- 239000011148 porous material Substances 0.000 description 2
- 239000002244 precipitate Substances 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- MGWGWNFMUOTEHG-UHFFFAOYSA-N 4-(3,5-dimethylphenyl)-1,3-thiazol-2-amine Chemical compound CC1=CC(C)=CC(C=2N=C(N)SC=2)=C1 MGWGWNFMUOTEHG-UHFFFAOYSA-N 0.000 description 1
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- VQTUBCCKSQIDNK-UHFFFAOYSA-N Isobutene Chemical group CC(C)=C VQTUBCCKSQIDNK-UHFFFAOYSA-N 0.000 description 1
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 1
- 150000001242 acetic acid derivatives Chemical class 0.000 description 1
- 230000032683 aging Effects 0.000 description 1
- 150000001340 alkali metals Chemical class 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 150000003863 ammonium salts Chemical class 0.000 description 1
- 229940058905 antimony compound for treatment of leishmaniasis and trypanosomiasis Drugs 0.000 description 1
- FAPDDOBMIUGHIN-UHFFFAOYSA-K antimony trichloride Chemical compound Cl[Sb](Cl)Cl FAPDDOBMIUGHIN-UHFFFAOYSA-K 0.000 description 1
- SZXAQBAUDGBVLT-UHFFFAOYSA-H antimony(3+);2,3-dihydroxybutanedioate Chemical compound [Sb+3].[Sb+3].[O-]C(=O)C(O)C(O)C([O-])=O.[O-]C(=O)C(O)C(O)C([O-])=O.[O-]C(=O)C(O)C(O)C([O-])=O SZXAQBAUDGBVLT-UHFFFAOYSA-H 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- IBKBIJITWRZZBB-UHFFFAOYSA-N azanylidynestibane Chemical compound [Sb]#N IBKBIJITWRZZBB-UHFFFAOYSA-N 0.000 description 1
- 229910052788 barium Inorganic materials 0.000 description 1
- DSAJWYNOEDNPEQ-UHFFFAOYSA-N barium atom Chemical compound [Ba] DSAJWYNOEDNPEQ-UHFFFAOYSA-N 0.000 description 1
- 239000003637 basic solution Substances 0.000 description 1
- 235000019445 benzyl alcohol Nutrition 0.000 description 1
- 229910052790 beryllium Inorganic materials 0.000 description 1
- ATBAMAFKBVZNFJ-UHFFFAOYSA-N beryllium atom Chemical compound [Be] ATBAMAFKBVZNFJ-UHFFFAOYSA-N 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 239000006227 byproduct Substances 0.000 description 1
- 229910052792 caesium Inorganic materials 0.000 description 1
- TVFDJXOCXUVLDH-UHFFFAOYSA-N caesium atom Chemical compound [Cs] TVFDJXOCXUVLDH-UHFFFAOYSA-N 0.000 description 1
- 229910052791 calcium Inorganic materials 0.000 description 1
- 239000011575 calcium Substances 0.000 description 1
- 229910002092 carbon dioxide Inorganic materials 0.000 description 1
- 239000001569 carbon dioxide Substances 0.000 description 1
- 238000006555 catalytic reaction Methods 0.000 description 1
- CNRRZWMERIANGJ-UHFFFAOYSA-N chloro hypochlorite;molybdenum Chemical compound [Mo].ClOCl CNRRZWMERIANGJ-UHFFFAOYSA-N 0.000 description 1
- ZHXZNKNQUHUIGN-UHFFFAOYSA-N chloro hypochlorite;vanadium Chemical compound [V].ClOCl ZHXZNKNQUHUIGN-UHFFFAOYSA-N 0.000 description 1
- 238000002485 combustion reaction Methods 0.000 description 1
- 125000004122 cyclic group Chemical group 0.000 description 1
- 238000010908 decantation Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 230000018109 developmental process Effects 0.000 description 1
- MRSOZKFBMQILFT-UHFFFAOYSA-L diazanium;oxalate;titanium(2+) Chemical compound [NH4+].[NH4+].[Ti+2].[O-]C(=O)C([O-])=O.[O-]C(=O)C([O-])=O MRSOZKFBMQILFT-UHFFFAOYSA-L 0.000 description 1
- 238000001879 gelation Methods 0.000 description 1
- 229910052744 lithium Inorganic materials 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- 235000012054 meals Nutrition 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 229910000484 niobium oxide Inorganic materials 0.000 description 1
- WPCMRGJTLPITMF-UHFFFAOYSA-I niobium(5+);pentahydroxide Chemical compound [OH-].[OH-].[OH-].[OH-].[OH-].[Nb+5] WPCMRGJTLPITMF-UHFFFAOYSA-I 0.000 description 1
- 150000002823 nitrates Chemical class 0.000 description 1
- JCXJVPUVTGWSNB-UHFFFAOYSA-N nitrogen dioxide Inorganic materials O=[N]=O JCXJVPUVTGWSNB-UHFFFAOYSA-N 0.000 description 1
- 239000001272 nitrous oxide Substances 0.000 description 1
- 235000006408 oxalic acid Nutrition 0.000 description 1
- LIYKJALVRPGQTR-UHFFFAOYSA-M oxostibanylium;chloride Chemical compound [Cl-].[Sb+]=O LIYKJALVRPGQTR-UHFFFAOYSA-M 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 230000001737 promoting effect Effects 0.000 description 1
- QQONPFPTGQHPMA-UHFFFAOYSA-N propylene Natural products CC=C QQONPFPTGQHPMA-UHFFFAOYSA-N 0.000 description 1
- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 description 1
- 229910052701 rubidium Inorganic materials 0.000 description 1
- IGLNJRXAVVLDKE-UHFFFAOYSA-N rubidium atom Chemical compound [Rb] IGLNJRXAVVLDKE-UHFFFAOYSA-N 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- 229910052712 strontium Inorganic materials 0.000 description 1
- CIOAGBVUUVVLOB-UHFFFAOYSA-N strontium atom Chemical compound [Sr] CIOAGBVUUVVLOB-UHFFFAOYSA-N 0.000 description 1
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- B01J23/00—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00
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- B—PERFORMING OPERATIONS; TRANSPORTING
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- B01J23/20—Vanadium, niobium or tantalum
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- B—PERFORMING OPERATIONS; TRANSPORTING
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- B01J23/00—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00
- B01J23/16—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00 of arsenic, antimony, bismuth, vanadium, niobium, tantalum, polonium, chromium, molybdenum, tungsten, manganese, technetium or rhenium
- B01J23/20—Vanadium, niobium or tantalum
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- B—PERFORMING OPERATIONS; TRANSPORTING
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- B01J23/00—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00
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Abstract
Description
산화 처리 조건 | 접촉 시간 (gㆍ초/ml) | 프로판의 암모산화의 결과 | |||||
원료 혼합물 용액 온도 (℃) | 가열 및 교반 시간 (시간) | 프로판의 전환도 (%) | 아크릴로니트릴에 대한 선택도 (%) | 아크릴로니트릴의 수율 (%) | 아크릴로니트릴의 공시수율 [μmol/{(gㆍ초/ml)ㆍg}] | ||
실시예 1 | 85 | 4 | 1.17 | 79.3 | 58.7 | 46.6 | 0.374 |
실시예 2 | 100 | 6 | 1.17 | 78.3 | 57.0 | 44.6 | 0.358 |
실시예 3 | 75 | 8 | 1.50 | 86.4 | 50.7 | 43.8 | 0.274 |
실시예 4 | 95 | 10 | 1.17 | 83.4 | 51.9 | 43.5 | 0.349 |
실시예 5 | 150 | 2 | 1.40 | 85.0 | 51.3 | 43.6 | 0.292 |
산화 처리 조건 | 접촉 시간 (gㆍ초/ml) | 프로판의 암모산화의 결과 | |||||
[H2O2:Sb] 몰 비 | H2O2-첨가된 원료 혼합물 용액 온도, 및 교반 온도 | 프로판의 전환도 (%) | 아크릴로니트릴에 대한 선택도 (%) | 아크릴로니트릴의 수율 (%) | 아크릴로니트릴의 공시수율 [μmol/{(gㆍ초/ml)ㆍg}] | ||
실시예 6 | 0.12 | 30 ℃, 30 분 | 1.17 | 77.3 | 56.2 | 43.4 | 0.348 |
실시예 7 | 0.52 | 30 ℃, 1 시간 | 1.17 | 78.5 | 55.7 | 43.7 | 0.350 |
실시예 8 | 0.30 | 20 ℃, 2 시간 | 1.17 | 79.9 | 54.6 | 43.6 | 0.350 |
실시예 9 | 0.83 | 25 ℃, 45 분 | 1.17 | 83.2 | 53.9 | 44.8 | 0.359 |
실시예 10 | 2.3 | 30 ℃, 30 분 | 1.29 | 80.4 | 57.2 | 45.9 | 0.373 |
실시예 11 | 0.42 | 30 ℃, 30 분 | 1.67 | 87.1 | 46.8 | 40.8 | 0.226 |
비교예 1 | 0 | 30 ℃, 30 분 | 2.33 | 70.0 | 30.0 | 21.0 | 0.084 |
비교예 2 | 0 | 30 ℃, 40 분 | 1.29 | 32.4 | 38.1 | 12.3 | 0.100 |
비교예 3 | 0 | 30 ℃, 40 분 | 1.67 | 68.0 | 39.7 | 27.0 | 0.150 |
촉매의 염기성 수용액 처리 | 프로판의 암모산화의 결과 | ||||||||
염기성 수용액의 형태 (농도) | 처리 조건 | 처리 빈도 | 접촉 시간 (gㆍ초/ml | 프로판의 전환도 (%) | 아크릴로니트릴에 대한 선택도 (%) | 아크릴로니트릴의 수율 (%) | 아크릴로니트릴의 공시수율[μmol/{(gㆍ초/ml)ㆍg}] | 암모니아 분해율 (%) | |
실시예 12 | 무 | 무 | 무 | 1.17 | 79.2 | 58.7 | 46.6 | 0.374 | 45.6 |
실시예 13 | 수성 암모니아 (5 중량 %) | 25 ℃, 8 시간 | 1 | 1.17 | 91.5 | 57.2 | 52.3 | 0.420 | 32.1 |
실시예 14 | 수성 암모니아 (5 중량 %) | 25 ℃, 15 시간 | 1 | 1.10 | 87.9 | 59.2 | 52.1 | 0.445 | 38.0 |
실시예 15 | 무 | 무 | 무 | 1.17 | 79.1 | 55.5 | 43.9 | 0.304 | 50.2 |
실시예 16 | 수성 암모니아 10 중량 %) | 25 ℃, 6 시간 | 1 | 1.17 | 89.8 | 57.3 | 51.4 | 0.412 | 32.8 |
실시예 17 | 수성 암모니아 (2 중량 %) | 25 ℃, 6 시간 | 1 | 1.17 | 91.0 | 56.3 | 51.2 | 0.410 | 33.5 |
실시예 18 | 수성 암모니아 (5 중량 %) | 25 ℃, 8 시간 | 2 | 0.58 | 89.3 | 58.5 | 52.2 | 0.729 | 38.4 |
Claims (15)
- 기체상에서 암모산화에 의해 프로판 또는 이소부탄으로부터 아크릴로니트릴 또는 메트아크릴로니트릴을 제조하는데 사용하기 위한, 하기 화학식에 의해 제시되는 복합 산화물을 포함하는 산화물 촉매의 제조 방법으로서:[화학식 I]Mo1.0VaSbbXcOn(상기 식에서,X 는 니오브, 텅스텐, 크롬, 티탄, 탄탈, 지르코늄, 하프늄, 망간, 레늄, 철, 루테늄, 코발트, 로듐, 니켈, 팔라듐, 백금, 구리, 은, 아연, 붕소, 갈륨, 인듐, 게르마늄, 주석, 텔루르, 인, 납, 비스무스, 희토류 원소, 및 알칼리 토금속으로 이루어진 군으로부터 선택되는 하나 이상의 원소를 나타내고; a, b, c 및 n 은 각각 몰리브덴 (Mo) 에 대한, 바나듐 (V), 안티몬 (Sb), X 및 산소 (O) 의 원자비이고,여기서,0.1 ≤a ≤1.00.01 ≤b ≤0.60 ≤c ≤1.0 이고,n 은 화학식 I 의 복합 산화물 내에 존재하는 다른 원소의 원자가 조건에 의해 결정되고, 그것과 일치하는 수임),하기 단계 (1) 내지 (5) 를 포함하는 방법:(1) 물 및 알코올로 이루어진 군으로부터 선택되는 하나 이상의 액체 매질 중의 원료 혼합물의 용액 또는 슬러리를 제공하고 (원료 혼합물은 몰리브덴 (Mo) 화합물, 바나듐 (V) 화합물, 안티몬 (Sb) 화합물, 선택적으로는 화학식 I 에 X 로서 정의된 원소의 화합물들로 이루어진 군으로부터 선택되는 하나 이상의 X 화합물을 포함함),(2) 원료 혼합물 용액 또는 슬러리를 하기로 이루어진 군으로부터 선택되는 한 가지 이상으로 산화 처리함으로써:(2-a) 산화성 기체의 존재 하에서 1 시간 이상 50 내지 300 ℃ 에서 가열 처리,및(2-b) 산화성 액체로 처리,산화 원료 혼합물 용액 또는 슬러리를 수득하고,(3) 선택적으로, 화학식 I 에 X 로서 정의된 원소의 화합물들로 이루어진 군으로부터 선택되는 하나 이상의 X 화합물을, 단계 (2) 에서 수득한 산화 원료 혼합물 용액 또는 슬러리에 첨가하고,(4) 단계 (2) 에서 수득한 산화 원료 혼합물 용액 또는 슬러리, 또는 거기에 단계 (3) 에서 수득한 X 화합물을 첨가한 산화 원료 혼합물 용액 또는 슬러리를 건조시킴으로써, 건조 촉매 전구체를 수득하고,(5) 건조 촉매 전구체를 하소함으로써, 화학식 I 의 복합 산화물을 포함하는 산화물 촉매를 수득함.
- 제 1 항에 있어서, 상기 산화성 기체가 산소, 공기 및 질소 산화물로 이루어진 군으로부터 선택되는 하나 이상의 기체인 방법.
- 제 1 항 또는 제 2 항에 있어서, 상기 산화성 액체가 과산화수소, 질산 및 하이포아염소산으로 이루어진 군으로부터 선택되는 하나 이상의 산화제 화합물의 수용액인 방법.
- 제 3 항에 있어서, 상기 산화성 액체의 양이, 단계 (1) 에서 제공되는 원료 혼합물 용액 또는 슬러리에 포함된 안티몬에 대한 하나 이상의 상기 산화제 화합물의 몰 비로 0.01 내지 2 의 범위인 방법.
- 제 3 항 또는 제 4 항에 있어서, 상기 산화성 액체가 과산화수소의 수용액인 방법.
- 제 1 항 내지 제 5 항 중 어느 한 항에 있어서, 단계 (5) 에서의 하소가 실질적으로 분자 산소가 없는 불활성 기체 대기 내에서 수행되는 방법.
- 제 1 항 내지 제 6 항 중 어느 한 항에 있어서, 단계 (5) 에서의 하소가 400 내지 700 ℃ 에서 수행되는 방법.
- 제 1 항 내지 제 7 항 중 어느 한 항에 있어서, 염기성 수용액과 단계 (5) 에서 수득한 산화물 촉매를 접촉시켜, 염기-처리 산화물 촉매를 포함하는 접촉 혼합물을 수득하는 단계 (6), 및 그 접촉 혼합물로부터 염기-처리 산화물 촉매를 분리 및 회수하는 단계 (7) 을 더 포함하는 방법.
- 제 8 항에 있어서, 상기 염기성 수용액이 암모니아, 알칼리 금속 수산화물, 알칼리 토금속 수산화물, 알칼리 금속 카르보네이트, 알칼리 토금속 카르보네이트, 유기산의 알칼리 금속염, 유기산의 알칼리 토금속염 및 아민으로 이루어진 군으로부터 선택되는 하나 이상의 화합물의 수용액인 방법.
- 제 9 항에 있어서, 상기 염기성 수용액이 암모니아의 수용액인 방법.
- 제 8 항 내지 제 10 항 중 어느 한 항에 있어서, 접촉 혼합물로부터 단계 (7) 에서 회수되는 염기-처리 산화물 촉매를 하소시키는 단계 (8) 을 더 포함하는 방법.
- 제 11 항에 있어서, 단계 (8) 의 하소가 실질적으로 분자 산소가 없는 불활성 기체 대기 내에서 수행되는 방법.
- 제 11 항 또는 제 12 항에 있어서, 단계 (8) 의 하소가 400 내지 700 ℃ 에서 수행되는 방법.
- 제 1 항 내지 제 13 항 중 어느 한 항의 방법에 의해 제조되는 것과 실질적으로 동일한, 기체상에서 암모산화에 의해 프로판 또는 이소부탄으로부터 아크릴로니트릴 또는 메트아크릴로니트릴을 제조하는데 사용하기 위한 산화물 촉매.
- 제 14 항의 산화물 촉매의 존재 하에 기체상에서 분자 산소 및 암모니아와 프로판 또는 이소부탄을 반응시키는 것을 포함하는, 아크릴로니트릴 또는 메트아크릴로니트릴의 제조 방법.
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
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JP98-243739 | 1998-08-28 | ||
JP24373998A JP4187837B2 (ja) | 1998-08-28 | 1998-08-28 | 不飽和ニトリル製造用触媒の製造方法 |
JP26795898A JP4187839B2 (ja) | 1998-09-22 | 1998-09-22 | 酸化物触媒の製造方法およびその触媒を用いた不飽和ニトリルの製造方法 |
JP98-267958 | 1998-09-22 |
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KR20010052378A true KR20010052378A (ko) | 2001-06-25 |
KR100373895B1 KR100373895B1 (ko) | 2003-02-26 |
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KR10-2000-7013056A KR100373895B1 (ko) | 1998-08-28 | 1999-08-30 | 프로판 또는 이소부탄으로부터 아크릴로니트릴 또는메트아크릴로니트릴을 제조하는데 사용하기 위한 산화물촉매의 제조 방법 |
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US (1) | US6514902B1 (ko) |
KR (1) | KR100373895B1 (ko) |
CN (1) | CN1166452C (ko) |
AU (1) | AU5445599A (ko) |
DE (1) | DE19983250T1 (ko) |
ID (1) | ID28876A (ko) |
SA (1) | SA99200710B1 (ko) |
WO (1) | WO2000012209A1 (ko) |
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1999
- 1999-08-30 US US09/674,736 patent/US6514902B1/en not_active Expired - Lifetime
- 1999-08-30 WO PCT/JP1999/004686 patent/WO2000012209A1/ja active IP Right Grant
- 1999-08-30 AU AU54455/99A patent/AU5445599A/en not_active Abandoned
- 1999-08-30 DE DE19983250T patent/DE19983250T1/de not_active Ceased
- 1999-08-30 ID IDW20002422A patent/ID28876A/id unknown
- 1999-08-30 CN CNB998065382A patent/CN1166452C/zh not_active Expired - Lifetime
- 1999-08-30 KR KR10-2000-7013056A patent/KR100373895B1/ko active IP Right Grant
- 1999-10-30 SA SA99200710A patent/SA99200710B1/ar unknown
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DE19983250T1 (de) | 2001-08-09 |
ID28876A (id) | 2001-07-12 |
WO2000012209A1 (fr) | 2000-03-09 |
SA99200710B1 (ar) | 2005-07-02 |
AU5445599A (en) | 2000-03-21 |
US6514902B1 (en) | 2003-02-04 |
CN1302227A (zh) | 2001-07-04 |
CN1166452C (zh) | 2004-09-15 |
KR100373895B1 (ko) | 2003-02-26 |
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