KR20000076503A - 내구성이 향상된 벤조트리아졸 uv 흡수제 - Google Patents

내구성이 향상된 벤조트리아졸 uv 흡수제 Download PDF

Info

Publication number
KR20000076503A
KR20000076503A KR1020000002854A KR20000002854A KR20000076503A KR 20000076503 A KR20000076503 A KR 20000076503A KR 1020000002854 A KR1020000002854 A KR 1020000002854A KR 20000002854 A KR20000002854 A KR 20000002854A KR 20000076503 A KR20000076503 A KR 20000076503A
Authority
KR
South Korea
Prior art keywords
carbon atoms
straight
phenyl
alkyl
tert
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
KR1020000002854A
Other languages
English (en)
Korean (ko)
Inventor
라비찬드란라마나탄
디벨리스안토니데이비드
이옌가레바티
수하돌닉조셉
볼프쟝-피에르
우드2세머빈게일
데틀리프센로버트에드워드
Original Assignee
에프. 아. 프라저, 에른스트 알테르 (에. 알테르), 한스 페터 비틀린 (하. 페. 비틀린), 피. 랍 보프, 브이. 스펜글러, 페. 아에글러
시바 스페셜티 케미칼스 홀딩 인크.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 에프. 아. 프라저, 에른스트 알테르 (에. 알테르), 한스 페터 비틀린 (하. 페. 비틀린), 피. 랍 보프, 브이. 스펜글러, 페. 아에글러, 시바 스페셜티 케미칼스 홀딩 인크. filed Critical 에프. 아. 프라저, 에른스트 알테르 (에. 알테르), 한스 페터 비틀린 (하. 페. 비틀린), 피. 랍 보프, 브이. 스펜글러, 페. 아에글러
Publication of KR20000076503A publication Critical patent/KR20000076503A/ko
Ceased legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07FACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F9/00Compounds containing elements of Groups 5 or 15 of the Periodic Table
    • C07F9/02Phosphorus compounds
    • C07F9/547Heterocyclic compounds, e.g. containing phosphorus as a ring hetero atom
    • C07F9/6515Heterocyclic compounds, e.g. containing phosphorus as a ring hetero atom having three nitrogen atoms as the only ring hetero atoms
    • C07F9/6518Five-membered rings
    • C07F9/65188Five-membered rings condensed with carbocyclic rings or carbocyclic ring systems
    • EFIXED CONSTRUCTIONS
    • E04BUILDING
    • E04BGENERAL BUILDING CONSTRUCTIONS; WALLS, e.g. PARTITIONS; ROOFS; FLOORS; CEILINGS; INSULATION OR OTHER PROTECTION OF BUILDINGS
    • E04B1/00Constructions in general; Structures which are not restricted either to walls, e.g. partitions, or floors or ceilings or roofs
    • E04B1/38Connections for building structures in general
    • E04B1/41Connecting devices specially adapted for embedding in concrete or masonry
    • E04B1/4114Elements with sockets
    • E04B1/4121Elements with sockets with internal threads or non-adjustable captive nuts
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D249/00Heterocyclic compounds containing five-membered rings having three nitrogen atoms as the only ring hetero atoms
    • C07D249/16Heterocyclic compounds containing five-membered rings having three nitrogen atoms as the only ring hetero atoms condensed with carbocyclic rings or ring systems
    • C07D249/18Benzotriazoles
    • C07D249/20Benzotriazoles with aryl radicals directly attached in position 2
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00Use of organic ingredients
    • C08K5/16Nitrogen-containing compounds
    • C08K5/34Heterocyclic compounds having nitrogen in the ring
    • C08K5/3467Heterocyclic compounds having nitrogen in the ring having more than two nitrogen atoms in the ring
    • C08K5/3472Five-membered rings
    • C08K5/3475Five-membered rings condensed with carbocyclic rings
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D7/00Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
    • C09D7/40Additives
    • C09D7/48Stabilisers against degradation by oxygen, light or heat
    • EFIXED CONSTRUCTIONS
    • E04BUILDING
    • E04BGENERAL BUILDING CONSTRUCTIONS; WALLS, e.g. PARTITIONS; ROOFS; FLOORS; CEILINGS; INSULATION OR OTHER PROTECTION OF BUILDINGS
    • E04B1/00Constructions in general; Structures which are not restricted either to walls, e.g. partitions, or floors or ceilings or roofs
    • E04B1/38Connections for building structures in general
    • E04B1/41Connecting devices specially adapted for embedding in concrete or masonry
    • E04B1/4114Elements with sockets
    • E04B1/415Elements with sockets with captive and extendable anchoring parts, e.g. spring-loaded bolts, hanging rings
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41MPRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M5/00Duplicating or marking methods; Sheet materials for use therein
    • B41M5/124Duplicating or marking methods; Sheet materials for use therein using pressure to make a masked colour visible, e.g. to make a coloured support visible, to create an opaque or transparent pattern, or to form colour by uniting colour-forming components
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41MPRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M5/00Duplicating or marking methods; Sheet materials for use therein
    • B41M5/26Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used
    • B41M5/30Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used using chemical colour formers
    • B41M5/337Additives; Binders
    • B41M5/3375Non-macromolecular compounds
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41MPRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M5/00Duplicating or marking methods; Sheet materials for use therein
    • B41M5/26Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used
    • B41M5/382Contact thermal transfer or sublimation processes
    • B41M5/392Additives, other than colour forming substances, dyes or pigments, e.g. sensitisers, transfer promoting agents
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/132Anti-ultraviolet fading

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Health & Medical Sciences (AREA)
  • Architecture (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Civil Engineering (AREA)
  • General Health & Medical Sciences (AREA)
  • Molecular Biology (AREA)
  • Wood Science & Technology (AREA)
  • Materials Engineering (AREA)
  • Electromagnetism (AREA)
  • Biochemistry (AREA)
  • Structural Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Paints Or Removers (AREA)
  • Dental Preparations (AREA)
KR1020000002854A 1999-01-21 2000-01-21 내구성이 향상된 벤조트리아졸 uv 흡수제 Ceased KR20000076503A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US09/234,880 US6166218A (en) 1996-11-07 1999-01-21 Benzotriazole UV absorbers having enhanced durability
US9/234,880 1999-01-21

Publications (1)

Publication Number Publication Date
KR20000076503A true KR20000076503A (ko) 2000-12-26

Family

ID=22883195

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020000002854A Ceased KR20000076503A (ko) 1999-01-21 2000-01-21 내구성이 향상된 벤조트리아졸 uv 흡수제

Country Status (13)

Country Link
US (5) US6166218A (enExample)
JP (1) JP2000212170A (enExample)
KR (1) KR20000076503A (enExample)
CN (1) CN1170824C (enExample)
BE (1) BE1013234A3 (enExample)
BR (1) BR0000124A (enExample)
CA (1) CA2296246A1 (enExample)
DE (1) DE10001832A1 (enExample)
ES (1) ES2160086B1 (enExample)
FR (1) FR2789388B1 (enExample)
GB (1) GB2346369B (enExample)
IT (1) IT1317727B1 (enExample)
NL (1) NL1014139C2 (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100470954B1 (ko) * 2002-07-06 2005-02-21 주식회사 엘지생활건강 자외선 흡수성 정발제
KR20220059912A (ko) * 2020-11-03 2022-05-10 한국화학연구원 자외선 흡수성 및 고분산성을 가지는 고분자 바인더 및 이를 포함하는 도료 조성물

Families Citing this family (118)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0912531B1 (en) * 1996-07-18 2003-03-19 Ciba SC Holding AG Polyoxyalkylene substituted and bridged benzophenone derivatives as uv absorbers
EP1175467B1 (en) * 1999-05-03 2006-06-14 Ciba SC Holding AG Stabilized adhesive compositions containing highly soluble, red-shifted, photostable benzotriazole uv absorbers and laminated articles derived therefrom
US6221115B1 (en) * 2000-02-01 2001-04-24 Ciba Specialty Chemicals Corporation Candle wax stabilized by a combination of UV absorber plus a selected hindered amine
US6296674B1 (en) * 2000-02-01 2001-10-02 Ciba Specialty Chemicals Corporation Candle wax stabilized with red-shift benzotriazoles
US6380285B1 (en) * 2000-02-01 2002-04-30 Ciba Specialty Chemicals Corporation Bloom-resistant benzotriazole UV absorbers and compositions stabilized therewith
AU780351B2 (en) * 2000-02-01 2005-03-17 Ciba Specialty Chemicals Holding Inc. Method of content protection with durable UV absorbers
AU2001293708A1 (en) 2000-08-03 2002-02-18 Ciba Specialty Chemicals Holding Inc. Photostable, silylated benzotriazole uv absorbers and compositions stabilized therewith
US6451887B1 (en) * 2000-08-03 2002-09-17 Ciba Specialty Chemicals Corporation Benzotriazoles containing α-cumyl groups substituted by heteroatoms and compositions stabilized therewith
US6566507B2 (en) 2000-08-03 2003-05-20 Ciba Specialty Chemicals Corporation Processes for the preparation of benzotriazole UV absorbers
DE10041616A1 (de) * 2000-08-24 2002-03-14 Se Ma Ges Fuer Innovationen Mb Verfahren zur Herstellung von neuartigen und transparenten UV-Schutzformulierungen für technische Anwendungen
US6619329B2 (en) * 2000-10-03 2003-09-16 Tokai Rubber Industries, Ltd. Hose
US6846929B2 (en) 2001-04-02 2005-01-25 Ciba Specialty Chemicals Corporation Benzotriazole/hals molecular combinations and compositions stabilized therewith
JP2004523638A (ja) * 2001-04-02 2004-08-05 チバ スペシャルティ ケミカルズ ホールディング インコーポレーテッド 安定化したロウソクのロウ
US6562085B1 (en) * 2001-06-06 2003-05-13 Ciba Specialty Chemicals Corporation Candle wax compositions stabilized with UV absorber-metal combinations
JP4993421B2 (ja) * 2001-06-07 2012-08-08 株式会社Adeka 合成樹脂組成物
US6930136B2 (en) * 2001-09-28 2005-08-16 National Starch And Chemical Investment Holding Corporation Adhesion promoters containing benzotriazoles
MXPA04005410A (es) * 2001-12-05 2004-10-11 Ciba Sc Holding Ag Proceso, exento de solvente organico, para la preparacion de los 2-(2-nitrofenilazo)-fenoles.
WO2003070819A1 (en) * 2002-02-19 2003-08-28 Ciba Specialty Chemicals Holding Inc. Containers or films comprising hydroxyphenlbenzotriazole uv absorbers for protecting contents against the effects of uv radiation
CA2487430A1 (en) 2002-06-06 2003-12-18 Jonathan Rogers Electroluminescent device
ATE539058T1 (de) 2003-02-26 2012-01-15 Basf Se Wasserverträgliche sterisch gehinderte hydroxysubstitutierte alkoxyamine
US20040185269A1 (en) * 2003-03-18 2004-09-23 Loper Scott W. Scratch and mar resistant low VOC coating composition
US6790582B1 (en) * 2003-04-01 2004-09-14 Clariant Finance Bvi Limited Photoresist compositions
US6974850B2 (en) * 2003-05-30 2005-12-13 3M Innovative Properties Company Outdoor weatherable photopolymerizable coatings
US7153588B2 (en) * 2003-05-30 2006-12-26 3M Innovative Properties Company UV resistant naphthalate polyester articles
JP4163561B2 (ja) * 2003-06-17 2008-10-08 富士フイルム株式会社 色素化合物
US7412338B2 (en) * 2004-03-18 2008-08-12 Power Measurement Ltd. Radio frequency device within an energy sensor system
JPWO2005076058A1 (ja) 2004-02-09 2007-10-18 株式会社クラレ 液晶ディスプレイ用バックライト装置
US7595011B2 (en) 2004-07-12 2009-09-29 Ciba Specialty Chemicals Corporation Stabilized electrochromic media
JP2006113175A (ja) * 2004-10-13 2006-04-27 Konica Minolta Opto Inc 光学フィルム、偏光板及び表示装置
US20060122293A1 (en) * 2004-12-03 2006-06-08 Rick Wilk Ultraviolet light absorber stabilizer combination
US7695643B2 (en) 2005-02-02 2010-04-13 Ciba Specialty Chemicals Corporation Long wavelength shifted benzotriazole UV-absorbers and their use
DE102005012056A1 (de) * 2005-03-16 2006-09-28 Basf Coatings Ag Mehrschichtlackierungen, Verfahren zu ihrer Herstellung und deren Verwendung im Automobilbau
US20070238814A1 (en) * 2006-04-10 2007-10-11 Basf Corporation Method of making coating compositions
JP5301434B2 (ja) * 2006-06-27 2013-09-25 チバ ホールディング インコーポレーテッド 長波長シフトしたベンゾトリアゾール紫外線吸収剤およびその使用
EP2081612B1 (en) * 2006-10-13 2012-11-21 Novartis AG Intraocular lenses with unique blue-violet cutoff and blue light transmission characteristics
DE602006017124D1 (de) * 2006-12-18 2010-11-04 3M Innovative Properties Co (meth)acrylharzzusammensetzung und folien daraus
TW200829637A (en) * 2007-01-03 2008-07-16 Double Bond Chemical Ind Co Ltd Liquid containing 2-(-hydroxyl-3-α-cumylphenyl-5-tertiery-octylphenyl) -2-hydrogen-benzotriazole
JP4988383B2 (ja) * 2007-03-02 2012-08-01 スリーエム イノベイティブ プロパティズ カンパニー (メタ)アクリル系着色フィルム、マーキングフィルム、レセプターシート、及びその製造方法
DE602008002426D1 (de) * 2007-04-30 2010-10-14 Alcon Inc Uv-absorber für brillenglasmaterial
TW200916531A (en) * 2007-08-09 2009-04-16 Alcon Inc Ophthalmic lens materials containing chromophores that absorb both UV and short wavelength visible light
TWI435915B (zh) * 2007-08-09 2014-05-01 Alcon Inc 含有吸收紫外光(uv)及短波長可見光二者的發色團之眼科鏡體材料(一)
JP5307378B2 (ja) * 2007-10-26 2013-10-02 スリーエム イノベイティブ プロパティズ カンパニー (メタ)アクリル系フィルムおよびこれを用いたマーキングフィルム
JP5428412B2 (ja) * 2008-03-18 2014-02-26 株式会社リコー 耐熱性向上剤及び可逆性感熱記録媒体
US7884228B1 (en) * 2008-05-06 2011-02-08 Alcon, Inc. UV-absorbers for ophthalmic lens materials
US7803359B1 (en) 2008-05-06 2010-09-28 Alcon, Inc. UV-absorbers for ophthalmic lens materials
US8043607B2 (en) 2008-07-15 2011-10-25 Novartis Ag UV-absorbers for ophthalmic lens materials
US7847103B2 (en) * 2008-10-04 2010-12-07 Chia-Hu Chang Ultraviolet light absorbing ketones of 2-(2-hydroxyphenyl) benzotriazole
US8236053B1 (en) 2008-10-08 2012-08-07 Novartis Ag 2-amino benzophenone UV-absorbers for ophthalmic lens materials
US8937244B2 (en) * 2008-10-23 2015-01-20 Alta Devices, Inc. Photovoltaic device
US20120104460A1 (en) 2010-11-03 2012-05-03 Alta Devices, Inc. Optoelectronic devices including heterojunction
TW201031006A (en) * 2008-10-23 2010-08-16 Alta Devices Inc Photovoltaic device with increased light trapping
US8674214B2 (en) * 2008-10-23 2014-03-18 Alta Devices, Inc. Thin absorber layer of a photovoltaic device
TWI453199B (zh) 2008-11-04 2014-09-21 Alcon Inc 用於眼用鏡片材料之紫外光/可見光吸收劑
BRPI0923420A2 (pt) 2008-12-22 2018-10-16 Basf Se uso, ou método de uso, ou processo de uso de um agente de redução de fricção em combinação com um polímero enxertado , em adição a uma amida de acido graxo.
CN102471090B (zh) 2009-07-07 2015-11-25 巴斯夫欧洲公司 钾铯钨青铜颗粒
US9691921B2 (en) 2009-10-14 2017-06-27 Alta Devices, Inc. Textured metallic back reflector
US11271128B2 (en) 2009-10-23 2022-03-08 Utica Leaseco, Llc Multi-junction optoelectronic device
US20170141256A1 (en) 2009-10-23 2017-05-18 Alta Devices, Inc. Multi-junction optoelectronic device with group iv semiconductor as a bottom junction
US9768329B1 (en) 2009-10-23 2017-09-19 Alta Devices, Inc. Multi-junction optoelectronic device
US20150380576A1 (en) 2010-10-13 2015-12-31 Alta Devices, Inc. Optoelectronic device with dielectric layer and method of manufacture
US9502594B2 (en) 2012-01-19 2016-11-22 Alta Devices, Inc. Thin-film semiconductor optoelectronic device with textured front and/or back surface prepared from template layer and etching
JP5704530B2 (ja) * 2009-12-16 2015-04-22 東レ・オペロンテックス株式会社 ポリウレタン弾性糸およびその製造方法
JP5787415B2 (ja) 2010-01-15 2015-09-30 ディーエスエム アイピー アセッツ ビー.ブイ. 紫外線吸収のための2−フェニル−1,2,3−ベンゾトリアゾール
US11038080B2 (en) 2012-01-19 2021-06-15 Utica Leaseco, Llc Thin-film semiconductor optoelectronic device with textured front and/or back surface prepared from etching
EP2912017A4 (en) 2012-10-23 2016-07-20 Basf Se ETHYLENICALLY UNSATURATED OLIGOMERS WITH POLYMER STABILIZATION GROUPS
CA2923723C (en) * 2012-12-28 2016-07-26 Chromatic Technologies Inc. Stabilizing additives for thermochromic pigments
US8669281B1 (en) 2013-03-14 2014-03-11 Alkermes Pharma Ireland Limited Prodrugs of fumarates and their use in treating various diseases
FI2970101T4 (fi) 2013-03-14 2025-11-24 Alkermes Pharma Ireland Limited Fumaraattien aihiolääkkeitä ja niiden käyttö erilaisten sairauksien hoidossa
WO2015030864A1 (en) * 2013-08-30 2015-03-05 Sdc Technologies, Inc. Formable aminoplast resin-based coating compositions
EP3049464B1 (en) 2013-09-27 2020-04-01 Basf Se Polyolefin compositions for building materials
CA2901817A1 (en) * 2013-11-14 2015-05-21 Novartis Ag Uv-absorbers for ophthalmic lens materials
TWI685524B (zh) 2013-12-17 2020-02-21 美商畢克美國股份有限公司 預先脫層之層狀材料
US9604922B2 (en) 2014-02-24 2017-03-28 Alkermes Pharma Ireland Limited Sulfonamide and sulfinamide prodrugs of fumarates and their use in treating various diseases
CN106687550B (zh) 2014-08-05 2020-08-21 三吉油脂株式会社 用于向基体赋予紫外线吸收能力和/或高折射率的添加剂及使用该添加剂的树脂部件
ES2805322T3 (es) 2014-12-15 2021-02-11 Borealis Ag Estructura en capas con pasivante de cobre
US11401400B2 (en) 2015-04-30 2022-08-02 Tokai Optical Co., Ltd. Plastic lens
US20170002177A1 (en) * 2015-06-30 2017-01-05 Sabic Global Technologies B.V. Uv-stabilized polysulfones-v4
EP3564299B1 (en) 2015-07-20 2023-09-06 Basf Se Flame retardant polyolefin articles
EP3236296B1 (en) * 2016-04-21 2019-03-06 Essilor International Optical material comprising a red-shifted benzotriazole uv absorber
EP3630693A1 (en) 2017-06-02 2020-04-08 DSM IP Assets B.V. Thermally resistant radiation curable coatings for optical fiber
US10752720B2 (en) * 2017-06-26 2020-08-25 Johnson & Johnson Vision Care, Inc. Polymerizable blockers of high energy light
US10723732B2 (en) 2017-06-30 2020-07-28 Johnson & Johnson Vision Care, Inc. Hydroxyphenyl phenanthrolines as polymerizable blockers of high energy light
US10526296B2 (en) 2017-06-30 2020-01-07 Johnson & Johnson Vision Care, Inc. Hydroxyphenyl naphthotriazoles as polymerizable blockers of high energy light
WO2019090218A1 (en) 2017-11-03 2019-05-09 Dsm Ip Assets, B.V. Water-blocking systems including fibers coated with liquid radiation curable sap compositions
US11543683B2 (en) 2019-08-30 2023-01-03 Johnson & Johnson Vision Care, Inc. Multifocal contact lens displaying improved vision attributes
US12486348B2 (en) 2019-08-30 2025-12-02 Johnson & Johnson Vision Care, Inc. Contact lens displaying improved vision attributes
US12486403B2 (en) 2018-03-02 2025-12-02 Johnson & Johnson Vision Care, Inc. Polymerizable absorbers of UV and high energy visible light
US10935695B2 (en) 2018-03-02 2021-03-02 Johnson & Johnson Vision Care, Inc. Polymerizable absorbers of UV and high energy visible light
US11993037B1 (en) 2018-03-02 2024-05-28 Johnson & Johnson Vision Care, Inc. Contact lens displaying improved vision attributes
EP3802452A1 (en) 2018-06-01 2021-04-14 DSM IP Assets B.V. Radiation curable compositions for coating optical fiber via alternative oligomers and the coatings produced therefrom
CN110563661B (zh) * 2018-06-05 2021-08-27 台湾永光化学工业股份有限公司 具红移效应的苯并三唑紫外线吸收剂及其用途
US10889901B2 (en) 2018-07-25 2021-01-12 International Business Machines Corporation Ultraviolet-stabilized corrosion inhibitors
EP3841166B2 (en) 2018-08-22 2025-05-07 Basf Se Stabilized rotomolded polyolefin
WO2020046865A1 (en) 2018-08-30 2020-03-05 Dsm Ip Assets, B.V. Radiation curable compositions for coating optical fiber
EP3867207A1 (en) 2018-12-03 2021-08-25 Ms Holding B.V. Filled radiation curable compositions for coating optical fiber and the coatings produced therefrom
US12384785B2 (en) 2018-12-06 2025-08-12 Basf Se Procedure for the formation of 2H-benzotriazole bodies and congeners
CN109749432A (zh) * 2018-12-25 2019-05-14 浙江普利特新材料有限公司 一种高耐候、高外观表现、高性能用于汽车的玻纤增强尼龙材料及其制备方法
CN111384438B (zh) * 2018-12-29 2022-10-18 深圳新宙邦科技股份有限公司 一种锂离子电池非水电解液及锂离子电池
EP3932981A4 (en) * 2019-02-26 2022-04-13 Teijin Limited POLYCARBONATE RESIN COMPOSITION
WO2020190833A1 (en) 2019-03-18 2020-09-24 Basf Se Uv curable compositions for dirt pick-up resistance
CN113728070B (zh) * 2019-04-26 2024-03-08 三吉油脂株式会社 耐热性优异和长波长吸收优异的紫外线吸收剂
JP7703455B2 (ja) 2019-05-24 2025-07-07 コベストロ (ネザーランズ) ビー.ヴィー. 強化された高速加工性を備えた光ファイバーをコーティングするための放射線硬化性組成物
WO2020239563A1 (en) 2019-05-24 2020-12-03 Dsm Ip Assets B.V. Radiation curable compositions for coating optical fiber with enhanced high-speed processability
WO2020243747A1 (en) 2019-05-31 2020-12-03 The Procter & Gamble Company Method of making a deflection member
US11958824B2 (en) 2019-06-28 2024-04-16 Johnson & Johnson Vision Care, Inc. Photostable mimics of macular pigment
US20220282064A1 (en) 2019-07-30 2022-09-08 Basf Se Stabilizer composition
WO2021021971A1 (en) 2019-07-31 2021-02-04 Dsm Ip Assets B.V. Radiation curable compositions with multi-functional long-armed oligomers for coating optical fibers
KR20220164527A (ko) 2020-04-03 2022-12-13 코베스트로 (네덜란드) 비.브이. 다층 광학 디바이스
JP7744922B2 (ja) 2020-04-03 2025-09-26 コベストロ (ネザーランズ) ビー.ヴィー. 自己修復型光ファイバとその製造に使用される組成物
KR102866440B1 (ko) 2020-07-28 2025-10-01 삼성디스플레이 주식회사 표시 장치 및 표시 장치용 광 흡수제
JP7635919B2 (ja) * 2021-01-28 2025-02-26 御国色素株式会社 紫外線吸収剤水性組成物
JP7679006B2 (ja) * 2021-01-28 2025-05-19 御国色素株式会社 紫外線吸収剤水性組成物
KR20220125824A (ko) 2021-03-03 2022-09-15 삼성디스플레이 주식회사 수지 조성물 및 이를 포함하는 표시 장치
CN119053565A (zh) 2022-04-21 2024-11-29 科思创(荷兰)有限公司 用于涂覆光纤的可辐射固化组合物
WO2023209004A1 (en) 2022-04-29 2023-11-02 Ineos Styrolution Group Gmbh Acrylonitrile styrene acrylate copolymer composition with improved uv resistance
EP4514892A1 (en) 2022-04-29 2025-03-05 INEOS Styrolution Group GmbH Acrylonitrile styrene acrylate (asa) copolymer composition having good uv resistance with reduced uv absorber content
USD1085320S1 (en) * 2022-08-17 2025-07-22 Bushnell Inc. Rangefinder display screen
CN115521315A (zh) * 2022-08-19 2022-12-27 古道尔工程塑胶(深圳)有限公司 光稳定剂及其制备方法和应用的艳红色耐候性复合材料

Family Cites Families (38)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE116230C (enExample) *
JPS4715210B1 (enExample) * 1967-06-29 1972-05-08
DE1670951A1 (de) * 1967-11-21 1971-02-18 Bayer Ag Alkylen-bis-(benztriazolyl-phenole)
GB1287770A (en) * 1969-12-24 1972-09-06 Konishiroku Photo Ind Benzotriazole derivatives as ultra-violet ray absorbing agents
CA956178A (en) * 1971-01-04 1974-10-15 Alan F. Blake Duplicating stencils
JPS516540B2 (enExample) * 1973-12-03 1976-02-28
JPS6021187B2 (ja) * 1976-10-12 1985-05-25 旭化成株式会社 安定化されたポリウレタン組成物
US4082679A (en) * 1977-03-10 1978-04-04 Witco Chemical Corporation Light stabilized textile mineral oil
US4275004A (en) * 1978-06-26 1981-06-23 Ciba-Geigy Corporation High caustic coupling process for preparing substituted 2-nitro-2'-hydroxyazobenzenes
US4278589A (en) * 1978-06-26 1981-07-14 Ciba-Geigy Corporation 2-[2-Hydroxy-3,5-di-(α,α-dimethylbenzyl)phenyl]-2H-benzotriazole and stabilized compositions
US4226763A (en) * 1978-06-26 1980-10-07 Ciba-Geigy Corporation 2-[2-Hydroxy-3,5-di-(.alpha.,α-dimethylbenzyl)-phenyl]-2H-benzotriazole and stabilized compositions
US4315848A (en) * 1979-05-10 1982-02-16 Ciba-Geigy Corporation 2-[2-Hydroxy-3,5-di-(α,α-dimethylbenzyl)-phenyl]-2H-benzotriazole and stabilized compositions
US4347180A (en) * 1979-05-16 1982-08-31 Ciba-Geigy Corporation High caustic coupling process for preparing substituted 2-nitro-2'-hydroxyazobenzenes
JPS61113667A (ja) * 1984-11-07 1986-05-31 Adeka Argus Chem Co Ltd 耐光性の改善された熱硬化性合成樹脂塗料組成物
JPS61113649A (ja) * 1984-11-07 1986-05-31 Adeka Argus Chem Co Ltd 耐光性の改善された高分子材料組成物
JPH0670163B2 (ja) * 1985-01-14 1994-09-07 旭電化工業株式会社 ポリアセタ−ル樹脂組成物
US4868246A (en) * 1987-08-12 1989-09-19 Pennwalt Corporation Polymer bound UV stabilizers
DE3739765A1 (de) * 1987-11-24 1989-06-08 Bayer Ag Beschichtete formkoerper und ein verfahren zu ihrer herstellung
JPH0357690A (ja) * 1989-07-26 1991-03-13 Fuji Photo Film Co Ltd 記録材料用顕色剤シート
ES2081458T3 (es) * 1990-03-30 1996-03-16 Ciba Geigy Ag Composicion de pintura.
US5166355A (en) * 1991-02-04 1992-11-24 Fairmount Chemical Co., Inc. Process for preparing substituted 2,2'-methylene-bis-[6-(2H-benzotriazol-2-yl)-4-hydrocarbyl-phenols]
US5278314A (en) * 1991-02-12 1994-01-11 Ciba-Geigy Corporation 5-thio-substituted benzotriazole UV-absorbers
US5280124A (en) * 1991-02-12 1994-01-18 Ciba-Geigy Corporation 5-sulfonyl-substituted benzotriazole UV-absorbers
US5250698A (en) * 1992-08-05 1993-10-05 Ciba-Geigy Corporation 2-(2-hydroxy-3-perfluoroalkyl thiomethyl-5-alkylphenyl)2H-benzotriazoles and stabilized compositions thereof
CA2099154A1 (en) * 1992-09-24 1994-03-25 Ronald E. Mac Leay N-[2-hydroxy-3-(2h-benzotriazol-2-yl)benzyl]oxamides
US5292890A (en) * 1993-05-05 1994-03-08 Fairmount Chemical Company, Inc. Asymmetrical benzotriazolylphenols
FR2712287B1 (fr) * 1993-11-10 1996-01-19 Oreal Nouveaux filtres solaires fluorés hydrocarbonés, leur procédé de préparation et leur utilisation dans des compositions cosmétiques.
EP0698637A3 (en) * 1994-08-22 1996-07-10 Ciba Geigy Ag Polyurethanes stabilized with selected UV absorbers of 5-substituted benzotriazole
US5646088A (en) * 1995-02-16 1997-07-08 Ricoh Co., Ltd. Thermosensitive recording material and production process thereof
US5574166A (en) * 1995-04-19 1996-11-12 Ciba-Geigy Corporation Crystalline form of 2-(2-hydroxy-3-α-cumyl-5-tert-octylphenyl)-2H-benzotriazole
GB2311143B (en) * 1995-04-19 1997-11-05 Ciba Geigy Ag Recording materials stabilized with benzotriazole uv absorbers
EP0750224A3 (en) * 1995-06-19 1997-01-08 Eastman Kodak Company 2'-Hydroxyphenyl benzotriazole based UV absorbing polymers with particular substituents and photographic elements containing them
JP3277820B2 (ja) * 1996-08-29 2002-04-22 王子製紙株式会社 感熱記録体
DE19748658B4 (de) 1996-11-07 2015-08-20 Ciba Holding Inc. Benzotriazol-UV-Absorptionsmittel mit erhöhter Haltbarkeit
IT1295933B1 (it) * 1997-10-30 1999-05-28 Great Lakes Chemical Italia 2-(2'-idrossifenil)benzotriazoli e procedimento per la loro preparazione
AU2230599A (en) * 1998-01-27 1999-08-09 Minnesota Mining And Manufacturing Company Fluorochemical benzotriazoles
JP4149068B2 (ja) * 1999-03-02 2008-09-10 株式会社メニコン 眼用レンズ材料
US6344505B1 (en) * 1999-11-11 2002-02-05 Cytec Industries Inc. Mono- and bis-benzotriazolyldihydroxybiaryl UV absorbers

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100470954B1 (ko) * 2002-07-06 2005-02-21 주식회사 엘지생활건강 자외선 흡수성 정발제
KR20220059912A (ko) * 2020-11-03 2022-05-10 한국화학연구원 자외선 흡수성 및 고분산성을 가지는 고분자 바인더 및 이를 포함하는 도료 조성물

Also Published As

Publication number Publication date
ES2160086A1 (es) 2001-10-16
ITMI20000046A0 (it) 2000-01-17
US20020065341A1 (en) 2002-05-30
BR0000124A (pt) 2000-09-26
ITMI20000046A1 (it) 2001-07-17
CA2296246A1 (en) 2000-07-21
ES2160086B1 (es) 2002-06-16
US6458872B1 (en) 2002-10-01
IT1317727B1 (it) 2003-07-15
NL1014139C2 (nl) 2001-05-15
US20010007886A1 (en) 2001-07-12
DE10001832A1 (de) 2000-07-27
US6515051B2 (en) 2003-02-04
CN1170824C (zh) 2004-10-13
GB2346369B (en) 2002-04-17
CN1265395A (zh) 2000-09-06
FR2789388A1 (fr) 2000-08-11
GB0000610D0 (en) 2000-03-01
BE1013234A3 (fr) 2001-11-06
JP2000212170A (ja) 2000-08-02
NL1014139A1 (nl) 2000-07-24
US6262151B1 (en) 2001-07-17
GB2346369A (en) 2000-08-09
US6166218A (en) 2000-12-26
US20020099221A1 (en) 2002-07-25
FR2789388B1 (fr) 2005-11-18

Similar Documents

Publication Publication Date Title
KR20000076503A (ko) 내구성이 향상된 벤조트리아졸 uv 흡수제
KR100488744B1 (ko) 내구성이강화된벤조트리아졸uv흡수제
US5977219A (en) Benzotriazole UV absorbers having enhanced durability
US6451887B1 (en) Benzotriazoles containing α-cumyl groups substituted by heteroatoms and compositions stabilized therewith
EP1305320B1 (en) Photostable, silylated benzotriazole uv absorbers and compositions stabilized therewith
US6392056B1 (en) 2H-benzotriazole UV absorders substituted with 1,1-diphenylalkyl groups and compositions stabilized therewith
US7419513B2 (en) Benzotriazole/HALS molecular combinations and compositions stabilized therewith
US6245915B1 (en) Asymmetrical bisbenzotriazoles substituted by a perfluoroalkyl moiety
US7166659B2 (en) Substituted 5-aryl-2-(2-hydroxyphenyl)-2H-benzotriazole UV absorbers, compositions stabilized therewith and process for preparation thereof
US6579328B2 (en) Transition-metal-catalyzed process for the preparation of sterically hindered N-substituted aryloxyamines
US6387992B1 (en) Substituted 5-heteroaryl-2-(2-hydroxyphenyl)-2h-benzotriazole UV absorbers, a process for preparation thereof and compositions stabilized therewith
MXPA00000732A (en) Benzotriazole uv absorbers having enhanced durability
MXPA97008572A (en) High durabili uv benzotriazolicos absorbers

Legal Events

Date Code Title Description
PA0109 Patent application

Patent event code: PA01091R01D

Comment text: Patent Application

Patent event date: 20000121

PG1501 Laying open of application
A201 Request for examination
PA0201 Request for examination

Patent event code: PA02012R01D

Patent event date: 20050120

Comment text: Request for Examination of Application

Patent event code: PA02011R01I

Patent event date: 20000121

Comment text: Patent Application

E902 Notification of reason for refusal
PE0902 Notice of grounds for rejection

Comment text: Notification of reason for refusal

Patent event date: 20060328

Patent event code: PE09021S01D

E601 Decision to refuse application
PE0601 Decision on rejection of patent

Patent event date: 20060530

Comment text: Decision to Refuse Application

Patent event code: PE06012S01D

Patent event date: 20060328

Comment text: Notification of reason for refusal

Patent event code: PE06011S01I