AU2001293708A1 - Photostable, silylated benzotriazole uv absorbers and compositions stabilized therewith - Google Patents

Photostable, silylated benzotriazole uv absorbers and compositions stabilized therewith

Info

Publication number
AU2001293708A1
AU2001293708A1 AU2001293708A AU9370801A AU2001293708A1 AU 2001293708 A1 AU2001293708 A1 AU 2001293708A1 AU 2001293708 A AU2001293708 A AU 2001293708A AU 9370801 A AU9370801 A AU 9370801A AU 2001293708 A1 AU2001293708 A1 AU 2001293708A1
Authority
AU
Australia
Prior art keywords
photostable
absorbers
silylated
compositions stabilized
stabilized therewith
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2001293708A
Inventor
Ramanathan Ravichandran
Joseph Suhadolnik
Mervin Gale Wood
Rong Xiong
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
BASF Schweiz AG
Original Assignee
Ciba Spezialitaetenchemie Holding AG
Ciba SC Holding AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ciba Spezialitaetenchemie Holding AG, Ciba SC Holding AG filed Critical Ciba Spezialitaetenchemie Holding AG
Publication of AU2001293708A1 publication Critical patent/AU2001293708A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
    • C07F7/02—Silicon compounds
    • C07F7/08—Compounds having one or more C—Si linkages
    • C07F7/18—Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
    • C07F7/02—Silicon compounds
    • C07F7/08—Compounds having one or more C—Si linkages
    • C07F7/0803—Compounds with Si-C or Si-Si linkages
    • C07F7/081—Compounds with Si-C or Si-Si linkages comprising at least one atom selected from the elements N, O, halogen, S, Se or Te
    • C07F7/0812—Compounds with Si-C or Si-Si linkages comprising at least one atom selected from the elements N, O, halogen, S, Se or Te comprising a heterocyclic ring
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D249/00—Heterocyclic compounds containing five-membered rings having three nitrogen atoms as the only ring hetero atoms
    • C07D249/16—Heterocyclic compounds containing five-membered rings having three nitrogen atoms as the only ring hetero atoms condensed with carbocyclic rings or ring systems
    • C07D249/18—Benzotriazoles
    • C07D249/20—Benzotriazoles with aryl radicals directly attached in position 2
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
    • C07F7/02—Silicon compounds
    • C07F7/08—Compounds having one or more C—Si linkages
    • C07F7/18—Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages
    • C07F7/1804—Compounds having Si-O-C linkages
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/16—Nitrogen-containing compounds
    • C08K5/34—Heterocyclic compounds having nitrogen in the ring
    • C08K5/3467—Heterocyclic compounds having nitrogen in the ring having more than two nitrogen atoms in the ring
    • C08K5/3472—Five-membered rings
    • C08K5/3475—Five-membered rings condensed with carbocyclic rings
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/54—Silicon-containing compounds
    • C08K5/544—Silicon-containing compounds containing nitrogen
    • C08K5/5477—Silicon-containing compounds containing nitrogen containing nitrogen in a heterocyclic ring

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Paints Or Removers (AREA)
  • Paper (AREA)

Abstract

Photostable, silylated benzotriazole compounds of formula (I) or (II)where at least one of E1, E2, E5, E8, E9, G2 and G7 is a silylated group; and G2 and/or G7 is an electron withdrawing moiety or E1 is alpha-cumyl, are both photostable and particularly compatible in high performance coatings such as organopolysiloxanes.
AU2001293708A 2000-08-03 2001-07-26 Photostable, silylated benzotriazole uv absorbers and compositions stabilized therewith Abandoned AU2001293708A1 (en)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US22278300P 2000-08-03 2000-08-03
US60222783 2000-08-03
US30304801P 2001-07-05 2001-07-05
US60303048 2001-07-05
PCT/EP2001/008663 WO2002012252A1 (en) 2000-08-03 2001-07-26 Photostable, silylated benzotriazole uv absorbers and compositions stabilized therewith

Publications (1)

Publication Number Publication Date
AU2001293708A1 true AU2001293708A1 (en) 2002-02-18

Family

ID=26917137

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2001293708A Abandoned AU2001293708A1 (en) 2000-08-03 2001-07-26 Photostable, silylated benzotriazole uv absorbers and compositions stabilized therewith

Country Status (9)

Country Link
US (1) US6677392B2 (en)
EP (1) EP1305320B1 (en)
JP (1) JP4912561B2 (en)
KR (1) KR20030022347A (en)
AT (1) ATE327997T1 (en)
AU (1) AU2001293708A1 (en)
DE (1) DE60120178T2 (en)
TW (1) TW548303B (en)
WO (1) WO2002012252A1 (en)

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WO2003044600A1 (en) * 2001-11-15 2003-05-30 Honeywell International Inc. Spin-on anti-reflective coatings for photolithography
JP3829933B2 (en) * 2002-05-16 2006-10-04 信越化学工業株式会社 Flame retardant silicone composition
US20040185269A1 (en) * 2003-03-18 2004-09-23 Loper Scott W. Scratch and mar resistant low VOC coating composition
EP1620500B1 (en) * 2003-05-06 2012-07-11 Basf Se Photo-cured and stabilized coatings
US8053159B2 (en) * 2003-11-18 2011-11-08 Honeywell International Inc. Antireflective coatings for via fill and photolithography applications and methods of preparation thereof
JP2005343969A (en) * 2004-06-01 2005-12-15 Showa Techno Coat Kk Ultraviolet light-shading coating
US7642303B2 (en) * 2004-10-15 2010-01-05 Shakely Thomas L Thermoplastic articles for packaging UV sensitive materials, processes for the articles production and use and novel UV absorbers
US7364672B2 (en) * 2004-12-06 2008-04-29 Arlon, Inc. Low loss prepregs, compositions useful for the preparation thereof and uses therefor
JP4595061B2 (en) * 2005-03-24 2010-12-08 東レ・モノフィラメント株式会社 Polyamide staples for industrial fabrics and industrial fabrics
JP4595060B2 (en) * 2005-03-24 2010-12-08 東レ・モノフィラメント株式会社 Polyamide monofilament for industrial fabric and industrial fabric
JP2007231099A (en) * 2006-02-28 2007-09-13 Fujifilm Corp Dispersion product
US20080009211A1 (en) * 2006-07-07 2008-01-10 Matthew Raymond Himes Assemblies useful for the preparation of electronic components and methods for making same
WO2008010421A1 (en) * 2006-07-21 2008-01-24 Konica Minolta Opto, Inc. Optical film, process for producing the same, polarizing plate and liquid crystal display device
JP5190650B2 (en) * 2007-02-14 2013-04-24 シプロ化成株式会社 Benzotriazole derivative compounds
US8642246B2 (en) * 2007-02-26 2014-02-04 Honeywell International Inc. Compositions, coatings and films for tri-layer patterning applications and methods of preparation thereof
US7772355B2 (en) 2008-01-28 2010-08-10 The United States Of America As Represented By The Secretary Of The Navy Divinylsilane-terminated aromatic ether-aromatic ketone-containing compounds
US8557877B2 (en) 2009-06-10 2013-10-15 Honeywell International Inc. Anti-reflective coatings for optically transparent substrates
JP5907588B2 (en) * 2011-04-04 2016-04-26 関西ペイント株式会社 Silsesquioxane compound and coating composition containing the same
US8864898B2 (en) 2011-05-31 2014-10-21 Honeywell International Inc. Coating formulations for optical elements
US9530571B2 (en) * 2011-11-18 2016-12-27 Adeka Corporation Compound and support material supporting this novel compound
JP5910478B2 (en) * 2012-12-07 2016-04-27 信越化学工業株式会社 Coating composition for resin
WO2015130652A1 (en) 2014-02-25 2015-09-03 The Government Of The United States Of America, As Represented By The Secretary Of The Navy Synthesis of oligomeric divinyldialkylsilane containing compositions
TWI813049B (en) 2014-11-20 2023-08-21 美商塞特工業公司 Stabilizer compositions and methods for using same for protecting organic materials from uv light and thermal degradation
WO2016167892A1 (en) 2015-04-13 2016-10-20 Honeywell International Inc. Polysiloxane formulations and coatings for optoelectronic applications
JP6975705B2 (en) 2015-07-07 2021-12-01 スリーエム イノベイティブ プロパティズ カンパニー Substituted benzotriazole phenol
KR102117177B1 (en) 2016-01-12 2020-06-02 후지필름 가부시키가이샤 Compositions, membranes, glass articles, compounds, high purity compositions, methods of making compounds and methods of making membranes
EP3578599A1 (en) 2018-06-08 2019-12-11 Cytec Industries Inc. Granular stabilizer compositions for use in polymer resins and methods of making same
US20220162174A1 (en) * 2019-04-26 2022-05-26 Miyoshi Oil & Fat Co., Ltd. Ultraviolet absorber having excellent heat resistance and long-wavelength absorption
CN111548659A (en) * 2020-06-01 2020-08-18 烟台布莱特光电材料有限公司 Novel UV cured substance and MINI LED fluorescent film prepared from same
WO2024083872A1 (en) 2022-10-18 2024-04-25 Cytec Industries Inc. Synergistic stabilizer compositions and methods for using same for protecting organic materials from uv light and thermal degradation

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US4316033A (en) * 1980-05-30 1982-02-16 General Electric Company Alkoxysilylbenzotriazoles
US4373060A (en) * 1980-05-30 1983-02-08 General Electric Company Silicone coating for unprimed plastic substrate and coated articles
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US4322455A (en) 1980-09-15 1982-03-30 General Electric Company Process for producing an ultraviolet radiation stabilized polymeric article
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JPH0730251B2 (en) * 1987-10-09 1995-04-05 旭電化工業株式会社 Polymer material composition with improved light resistance
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IT1243409B (en) 1990-12-17 1994-06-10 Ciba Geigy Spa PIPERIDINE COMPOUNDS CONTAINING SILENIC GROUPS SUITABLE FOR USE AS STABILIZERS FOR ORGANIC MATERIALS
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Also Published As

Publication number Publication date
JP4912561B2 (en) 2012-04-11
DE60120178D1 (en) 2006-07-06
EP1305320A1 (en) 2003-05-02
TW548303B (en) 2003-08-21
ATE327997T1 (en) 2006-06-15
WO2002012252A1 (en) 2002-02-14
US20020115753A1 (en) 2002-08-22
DE60120178T2 (en) 2007-04-26
JP2004505984A (en) 2004-02-26
US6677392B2 (en) 2004-01-13
KR20030022347A (en) 2003-03-15
EP1305320B1 (en) 2006-05-31

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