KR102830809B1 - 감광성 수지 조성물 및 감광성 수지 조성물의 제조 방법 - Google Patents

감광성 수지 조성물 및 감광성 수지 조성물의 제조 방법 Download PDF

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Publication number
KR102830809B1
KR102830809B1 KR1020237018481A KR20237018481A KR102830809B1 KR 102830809 B1 KR102830809 B1 KR 102830809B1 KR 1020237018481 A KR1020237018481 A KR 1020237018481A KR 20237018481 A KR20237018481 A KR 20237018481A KR 102830809 B1 KR102830809 B1 KR 102830809B1
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resin
structural unit
meth
group
acrylate
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KR20230098322A (ko
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슌스케 하야시
šœ스케 하야시
다케히로 기노시타
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가부시끼가이샤 레조낙
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    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/26—Esters containing oxygen in addition to the carboxy oxygen
    • C08F220/30—Esters containing oxygen in addition to the carboxy oxygen containing aromatic rings in the alcohol moiety
    • C08F220/301—Esters containing oxygen in addition to the carboxy oxygen containing aromatic rings in the alcohol moiety and one oxygen in the alcohol moiety
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/26—Esters containing oxygen in addition to the carboxy oxygen
    • C08F220/32—Esters containing oxygen in addition to the carboxy oxygen containing epoxy radicals
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Optics & Photonics (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Engineering & Computer Science (AREA)
  • Materials For Photolithography (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
KR1020237018481A 2020-12-11 2021-11-19 감광성 수지 조성물 및 감광성 수지 조성물의 제조 방법 Active KR102830809B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JPJP-P-2020-205539 2020-12-11
JP2020205539 2020-12-11
PCT/JP2021/042587 WO2022124052A1 (ja) 2020-12-11 2021-11-19 感光性樹脂組成物及び感光性樹脂組成物の製造方法

Publications (2)

Publication Number Publication Date
KR20230098322A KR20230098322A (ko) 2023-07-03
KR102830809B1 true KR102830809B1 (ko) 2025-07-04

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KR1020237018481A Active KR102830809B1 (ko) 2020-12-11 2021-11-19 감광성 수지 조성물 및 감광성 수지 조성물의 제조 방법

Country Status (5)

Country Link
JP (1) JPWO2022124052A1 (https=)
KR (1) KR102830809B1 (https=)
CN (1) CN116529670B (https=)
TW (1) TWI896819B (https=)
WO (1) WO2022124052A1 (https=)

Families Citing this family (1)

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Publication number Priority date Publication date Assignee Title
CN115677939A (zh) * 2022-11-25 2023-02-03 茂名清荷科技有限公司 一种感光性接枝聚合物以及含有其的感光性树脂组合物

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2015222279A (ja) * 2012-09-26 2015-12-10 昭和電工株式会社 樹脂組成物、感光性樹脂組成物、及びカラーフィルター

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JP3101986B2 (ja) * 1992-07-24 2000-10-23 ジェイエスアール株式会社 耐熱性感放射線性樹脂組成物
JPH11327127A (ja) * 1998-05-12 1999-11-26 Mitsubishi Chemical Corp 遮光性感光性樹脂組成物及びそれを用いたカラーフィルター
JP2004004531A (ja) * 2002-01-30 2004-01-08 Sumitomo Chem Co Ltd 感光性樹脂組成物
JP2006043643A (ja) 2004-08-06 2006-02-16 Hiroshima Univ ビスフェノール類縁化合物の除去方法
CN101178541B (zh) * 2006-10-31 2012-04-25 三洋化成工业株式会社 感光性树脂组合物
KR20120064191A (ko) * 2010-12-09 2012-06-19 동우 화인켐 주식회사 안료 분산 조성물, 착색 수지 조성물, 컬러 필터와 이를 구비한 화상 표시 장치
JP6078970B2 (ja) * 2012-03-30 2017-02-15 住友化学株式会社 着色感光性樹脂組成物
JP6157193B2 (ja) * 2013-04-22 2017-07-05 昭和電工株式会社 （メタ）アクリレート系ポリマー、該ポリマーを含む組成物及びその用途
JP2015017244A (ja) * 2013-06-12 2015-01-29 富士フイルム株式会社 硬化性組成物、硬化膜、近赤外線カットフィルタ、カメラモジュールおよびカメラモジュールの製造方法
KR101987107B1 (ko) * 2014-03-31 2019-06-10 동우 화인켐 주식회사 착색 감광성 수지 조성물 및 이로부터 제조되는 컬러 필터
JP6401529B2 (ja) * 2014-07-15 2018-10-10 東京応化工業株式会社 感光性組成物
JP2017181798A (ja) * 2016-03-30 2017-10-05 アーゼッド・エレクトロニック・マテリアルズ（ルクセンブルグ）ソシエテ・ア・レスポンサビリテ・リミテ 低温硬化可能なネガ型感光性組成物
JPWO2017204079A1 (ja) * 2016-05-27 2019-03-22 昭和電工株式会社 ブラックカラムスペーサ形成用感光性樹脂組成物、ブラックカラムスペーサ及び画像表示装置
JP2018145263A (ja) * 2017-03-02 2018-09-20 東京応化工業株式会社 硬化性組成物、硬化物、及び硬化物の製造方法
CN110997740B (zh) * 2017-08-03 2023-01-17 昭和电工株式会社 共聚物以及滤色器用感光性树脂组合物
KR102626467B1 (ko) * 2017-08-03 2024-01-17 가부시끼가이샤 레조낙 감광성 수지 조성물 및 그 제조 방법
JP6403357B1 (ja) * 2017-12-21 2018-10-10 昭和電工株式会社 樹脂組成物、感光性樹脂組成物、樹脂硬化膜、画像表示素子およびカラーフィルター

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2015222279A (ja) * 2012-09-26 2015-12-10 昭和電工株式会社 樹脂組成物、感光性樹脂組成物、及びカラーフィルター

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Publication number Publication date
CN116529670A (zh) 2023-08-01
CN116529670B (zh) 2026-03-31
WO2022124052A1 (ja) 2022-06-16
KR20230098322A (ko) 2023-07-03
TWI896819B (zh) 2025-09-11
TW202231674A (zh) 2022-08-16
JPWO2022124052A1 (https=) 2022-06-16

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