WO2022124052A1 - 感光性樹脂組成物及び感光性樹脂組成物の製造方法 - Google Patents
感光性樹脂組成物及び感光性樹脂組成物の製造方法 Download PDFInfo
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- WO2022124052A1 WO2022124052A1 PCT/JP2021/042587 JP2021042587W WO2022124052A1 WO 2022124052 A1 WO2022124052 A1 WO 2022124052A1 JP 2021042587 W JP2021042587 W JP 2021042587W WO 2022124052 A1 WO2022124052 A1 WO 2022124052A1
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- 125000004432 carbon atom Chemical group C* 0.000 claims abstract description 18
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- 125000002947 alkylene group Chemical group 0.000 description 3
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 description 3
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- ILPVOWZUBFRIAX-UHFFFAOYSA-N propyl 2-oxopropanoate Chemical compound CCCOC(=O)C(C)=O ILPVOWZUBFRIAX-UHFFFAOYSA-N 0.000 description 1
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- 238000006467 substitution reaction Methods 0.000 description 1
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- 239000004094 surface-active agent Substances 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
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- 238000012360 testing method Methods 0.000 description 1
- XBFJAVXCNXDMBH-UHFFFAOYSA-N tetracyclo[6.2.1.1(3,6).0(2,7)]dodec-4-ene Chemical compound C1C(C23)C=CC1C3C1CC2CC1 XBFJAVXCNXDMBH-UHFFFAOYSA-N 0.000 description 1
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- 238000012719 thermal polymerization Methods 0.000 description 1
- YRHRIQCWCFGUEQ-UHFFFAOYSA-N thioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC=CC=C3SC2=C1 YRHRIQCWCFGUEQ-UHFFFAOYSA-N 0.000 description 1
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- DVKJHBMWWAPEIU-UHFFFAOYSA-N toluene 2,4-diisocyanate Chemical compound CC1=CC=C(N=C=O)C=C1N=C=O DVKJHBMWWAPEIU-UHFFFAOYSA-N 0.000 description 1
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical class CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 1
- KHPCPRHQVVSZAH-UHFFFAOYSA-N trans-cinnamyl beta-D-glucopyranoside Natural products OC1C(O)C(O)C(CO)OC1OCC=CC1=CC=CC=C1 KHPCPRHQVVSZAH-UHFFFAOYSA-N 0.000 description 1
- LDHQCZJRKDOVOX-UHFFFAOYSA-N trans-crotonic acid Natural products CC=CC(O)=O LDHQCZJRKDOVOX-UHFFFAOYSA-N 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- JLGLQAWTXXGVEM-UHFFFAOYSA-N triethylene glycol monomethyl ether Chemical compound COCCOCCOCCO JLGLQAWTXXGVEM-UHFFFAOYSA-N 0.000 description 1
- 125000002221 trityl group Chemical group [H]C1=C([H])C([H])=C([H])C([H])=C1C([*])(C1=C(C(=C(C(=C1[H])[H])[H])[H])[H])C1=C([H])C([H])=C([H])C([H])=C1[H] 0.000 description 1
- JOHIXGUTSXXADV-UHFFFAOYSA-N undec-2-ene Chemical compound CCCCCCCCC=CC JOHIXGUTSXXADV-UHFFFAOYSA-N 0.000 description 1
- SDTYFWAQLSIEBH-UHFFFAOYSA-N undec-3-ene Chemical compound CCCCCCCC=CCC SDTYFWAQLSIEBH-UHFFFAOYSA-N 0.000 description 1
- JABYJIQOLGWMQW-UHFFFAOYSA-N undec-4-ene Chemical compound CCCCCCC=CCCC JABYJIQOLGWMQW-UHFFFAOYSA-N 0.000 description 1
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Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/26—Esters containing oxygen in addition to the carboxy oxygen
- C08F220/30—Esters containing oxygen in addition to the carboxy oxygen containing aromatic rings in the alcohol moiety
- C08F220/301—Esters containing oxygen in addition to the carboxy oxygen containing aromatic rings in the alcohol moiety and one oxygen in the alcohol moiety
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/26—Esters containing oxygen in addition to the carboxy oxygen
- C08F220/32—Esters containing oxygen in addition to the carboxy oxygen containing epoxy radicals
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
Definitions
- the present invention relates to a photosensitive resin composition, an image display element, and a method for producing a photosensitive resin composition.
- photosensitive resin compositions that can be cured by active energy rays such as ultraviolet rays and electron beams have been widely used in various fields such as coatings, printing, paints, and adhesives.
- the photosensitive resin composition is used as a solder resist, a resist for a color filter, and the like in the field of electronic materials such as printed wiring boards.
- the color filter generally includes a transparent substrate such as a glass substrate, red (R), green (G) and blue (B) pixels formed on the transparent substrate, and a black matrix formed at the boundary between the pixels. It has a pixel and a protective film formed on a black matrix.
- the color filter is usually manufactured by sequentially forming a black matrix, each pixel, and a protective film on a transparent substrate.
- the photosensitive resin composition used in the photolithography method contains a resin, a reactive diluent, a photopolymerization initiator, a colorant and a solvent.
- the photosensitive resin composition used in the photolithography method needs to have developability.
- a resin used in a photosensitive resin composition an unsaturated carboxylic acid and / or an unsaturated carboxylic acid anhydride, a radically polymerizable compound having an epoxy group, and a resin which is a copolymer of another radically polymerizable compound have been used. It has been proposed (see, for example, Patent Document 1). Further, a copolymer synthesized by using glycidyl (meth) acrylate as the resin used in the photosensitive resin composition, having no acid group, and having a polystyrene-equivalent weight average molecular weight of 1000 to 50,000, and an acid group. A resin composition containing a copolymer having a polystyrene-equivalent weight average molecular weight of 1000 to 50,000 has been proposed (see, for example, Patent Document 2).
- liquid crystal display elements and each member forming the liquid crystal display element are required to have stricter dimensional accuracy. Therefore, a photosensitive resin composition used as a material for a black matrix, a color filter, and a black column spacer is required to have better developability. Further, in order to improve the display characteristics of the liquid crystal display element, the cured film obtained by curing the photosensitive resin composition used for the above application needs to have good colorant dispersibility. Further, in order to prevent deterioration of the liquid crystal display element, the cured film obtained by curing the photosensitive resin composition used for the above-mentioned applications is required to have a high elastic recovery rate.
- the present invention has been made to solve the above problems, and an object of the present invention is to provide a photosensitive resin composition having excellent colorant dispersibility, developability and elastic recovery rate.
- the present invention includes the following aspects.
- the first aspect of the present invention provides the following photosensitive resin compositions.
- the resin (A) is A structural unit (a) having an aromatic ring skeleton and The structural unit (b) having a carboxy group and Constituent unit (c) and A structural unit (d) having a bridging alicyclic hydrocarbon group having 7 to 20 carbon atoms, and Have,
- the structural unit (c) is at least one selected from the group consisting of a structural unit (c-1) having a (meth) acryloyloxy group and a structural unit (c-2) having a functional group that reacts with a carboxy group.
- a photosensitive resin composition characterized in that the content of the structural unit (a) having an aromatic ring skeleton is 5 to 50 mol% with respect to the total amount of the structural units of the resin (A).
- the photosensitive resin composition according to the first aspect of the present invention preferably has the characteristics described in the following [2] to [9]. It is also preferable to arbitrarily combine two or more of the features described in the following [2] to [9]. [2]
- the structural unit (b) having a carboxy group is derived from an unsaturated carboxylic acid-derived structural unit (b-1), a polybasic acid-derived structural unit (b-2), and a polybasic acid anhydride.
- the structural unit (a) having an aromatic ring skeleton is one or more selected from the group consisting of a structural unit derived from styrene and a structural unit derived from benzyl (meth) acrylate.
- the resin (A) contains the resin (A-1) and the resin (A-2).
- the resin (A-1) has a content of the structural unit (a) having the aromatic ring skeleton of 5 to 30 mol% with respect to the total amount of the structural units of the resin (A-1).
- the content of the structural unit (a) having the aromatic ring skeleton of the resin (A-2) is 35 mol% to 50 mol% with respect to the total amount of the structural units of the resin (A-2) [1]. ]
- the photosensitive resin composition according to any one of. [6]
- the resin (A-1) is contained in an amount of 10 to 90% by mass and the resin (A-2) is contained in an amount of 10 to 90% by mass based on the total amount of the resin (A).
- the resin (A-1) has a carboxy group-containing (meth) acrylic compound added to the epoxy group of the resin (A-1) precursor having an epoxy group, and further to the hydroxy group generated by the ring opening of the epoxy group.
- a resin to which a polybasic acid or a polybasic acid anhydride is added is added,
- the resin (A-2) is a resin in which an epoxy group-containing (meth) acrylate or an isocyanato group-containing (meth) acrylate is added to a part of the carboxy group of the resin (A-2) precursor having a carboxy group.
- the epoxy group-containing resin (A-1) precursor is polymerizable having an aromatic ring-containing polymerizable monomer, an epoxy group-containing (meth) acrylate, and a bridging alicyclic hydrocarbon group having 7 to 20 carbon atoms. It is a polymer of monomers and
- the resin (A-2) precursor having a carboxy group is a polymerizable monomer having an aromatic ring-containing polymerizable monomer, a carboxy group-containing polymerizable monomer, and a bridging alicyclic hydrocarbon group having 7 to 20 carbon atoms.
- the photosensitive resin composition according to any one of [1] to [5], which is a polymer.
- the resin (A) is contained in an amount of 2 to 20% by mass.
- the reactive diluent (B) is contained in an amount of 3 to 20% by mass.
- a second aspect of the present invention provides the following black column spacers.
- a black column spacer made of a cured product of the photosensitive resin composition according to any one of [1] to [9].
- a third aspect of the present invention provides the following image display element. [11] An image display element comprising the black column spacer according to [10].
- a fourth aspect of the present invention provides the following method for producing a photosensitive resin composition. [12] Step I: A step of mixing the resin (A1), the solvent (C1), the colorant (E), and the dispersant (F) of an arbitrary component. Step II: A step of mixing the resin (A2), the reactive diluent (B), the solvent (C2), the photopolymerization initiator (D), and the mixture obtained in the step I in this order.
- a method for producing a photosensitive resin composition which is a method for producing a photosensitive resin composition.
- the resin (A1) and the resin (A2) are each A structural unit (a) having an aromatic ring skeleton and The structural unit (b) having a carboxy group and Constituent unit (c) and It has a structural unit (d) having a bridging alicyclic hydrocarbon group having 7 to 20 carbon atoms, and the structural unit (c) is a structural unit (c-1) having a (meth) acryloyloxy group. It is at least one selected from the group consisting of structural units (c-2) having a functional group that reacts with a carboxy group.
- Each of the resin (A1) and the resin (A2) is characterized in that the content of the structural unit (a) having the aromatic ring skeleton is 5 to 60 mol% with respect to the total amount of the structural units.
- the resin (A1) is either the resin (A-1) or the resin (A-2).
- the resin (A2) is the other of the resin (A-1) and the resin (A-2), which is different from the resin (A1).
- the resin (A-1) has a content of the structural unit (a) having the aromatic ring skeleton of 5 to 30 mol% with respect to the total amount of the structural units of the resin (A-1).
- the content of the structural unit (a) having the aromatic ring skeleton of the resin (A-2) is 35 mol% to 50 mol% with respect to the total amount of the structural units of the resin (A-2) [12]. ].
- the present invention it is possible to provide a photosensitive resin composition having excellent colorant dispersibility, developability and elastic recovery rate.
- the cured resin film obtained by curing the photosensitive resin composition of the present invention is excellent in colorant dispersibility and elastic recovery rate.
- the “constituent unit” is a monomer unit constituting the resin (A).
- the “content of the constituent unit” is the content (mol%) with respect to the total number of moles of the constituent monomers.
- the “monomer-derived structural unit” is a structural unit derived from a specific monomer among the monomers constituting the resin (A).
- the photosensitive resin composition of the present embodiment contains a resin (A), a reactive diluent (B), a solvent (C), a photopolymerization initiator (D), and a colorant (E).
- the photosensitive resin composition of the present embodiment may contain a dispersant (F), if necessary.
- the resin (A) of the present embodiment has a structural unit (a) having an aromatic ring skeleton (hereinafter, also simply referred to as “constituent unit (a)”) and a structural unit (b) having a carboxy group (hereinafter, simply “”. (Also also referred to as “constituent unit (b)”), the structural unit (c), and the structural unit (d) having a bridging alicyclic hydrocarbon group having 7 to 20 carbon atoms (hereinafter, simply “constituent unit (d)). Also called), and has at least.
- the structural unit (c) has a structural unit (c-1) having a (meth) acryloyloxy group (hereinafter, also simply referred to as “constituent unit (c-1)”) and a functional group that reacts with a carboxy group. It is at least one selected from the group consisting of units (c-2) (hereinafter, also simply referred to as “constituent units (c-2)”).
- the structural unit (a) has an aromatic ring skeleton. Since the resin (A) has the structural unit (a), a photosensitive resin composition having more excellent dispersibility of the colorant (E) can be obtained. In particular, when a pigment is used as the colorant (E), the effect of improving the dispersibility due to the resin (A) having the structural unit (a) can be remarkably obtained.
- the structural unit (a) is introduced by using the aromatic ring-containing polymerizable monomer (m-1) as the polymerizable monomer used when the resin (A) is produced by copolymerization (derived from the aromatic ring-containing polymerizable monomer). ).
- aromatic ring-containing polymerizable monomer (m-1) examples include styrene, ⁇ -methylstyrene, o-vinyltorene, m-vinyltoluene, p-vinyltorene, o-chlorostyrene, m-chlorostyrene, and p-.
- Aromatic vinyl compounds such as chlorostyrene, o-methoxystyrene, m-methoxystyrene, p-methoxystyrene, p-nitrostyrene, p-cyanostyrene, p-acetylaminostyrene; benzyl (meth) acrylate, phenoxyethyl (meth).
- phenoxy-styrene glycol (meth) acrylate (trade name: light acrylate P-200A, manufactured by Kyoei Kagaku Co., Ltd.), o-phenoxybenzyl (meth) acrylate, m-phenoxybenzyl (meth) acrylate, p-phenoxybenzyl ( Meta) acrylate and the like can be mentioned.
- styrene and benzyl (meth) acrylate are preferable from the viewpoint of improving the developability of availability.
- aromatic ring-containing polymerizable monomers (m-1) may be used alone or in combination of two or more.
- the structural unit (a) having an aromatic ring skeleton is one or more selected from the group consisting of a structural unit derived from styrene and a structural unit derived from benzyl (meth) acrylate.
- Constant unit (b) The structural unit (b) does not have an aromatic ring skeleton and has a carboxy group.
- the carboxy group may have as an anhydrate.
- the structural unit (b) having a carboxy group is a structural unit derived from unsaturated carboxylic acid (b-1), a structural unit derived from polybasic acid (b-2), and a structural unit derived from polybasic acid anhydride (b). It is preferably one or more selected from the group consisting of -3).
- the structural unit (b) can be generally introduced into the resin (A) by the following two methods.
- the first method is a method of introducing by using a carboxy group-containing polymerizable monomer (derived from the carboxy group-containing polymerizable monomer) as the polymerizable monomer used when the resin (A) is produced by copolymerization.
- a carboxy group-containing polymerizable monomer derived from the carboxy group-containing polymerizable monomer
- Examples of the carboxy group-containing polymerizable monomer (m-2) include (meth) acrylic acid, 2- (meth) acryloyloxyethyl succinic acid, 2- (meth) acryloyloxyethyl hexahydrophthalic acid, and ⁇ -bromo (meth).
- Acrylic acid ⁇ -frill (meth) acrylic acid, crotonic acid, propiole acid, katsura acid, ⁇ -cyanoceric acid, monomethyl maleate, monoethyl maleate, monoisopropyl maleate, monomethyl fumarate, monoethyl itaconate, etc.
- examples include unsaturated carboxylic acid.
- These carboxy group-containing polymerizable monomers may be used alone or in combination of two or more.
- (meth) acrylic acid is preferable from the viewpoint of availability and reactivity.
- the second method uses an epoxy group-containing (meth) acrylate (m-3) as a polymerizable monomer used when producing a precursor of the resin (A) by copolymerization, and the epoxy group contains a carboxy group.
- An epoxy group is opened by subjecting the carboxy group of the compound to an addition reaction, and a polybasic acid (n-1) or a polybasic acid anhydride (n-2) is added to the hydroxyl group generated at that time to add a carboxy group. Is a method of introducing.
- Examples of the epoxy group-containing (meth) acrylate (m-3) include glycidyl (meth) acrylate, 2-glycidyloxyethyl (meth) acrylate, and 3,4-epoxycyclohexylmethyl (meth) acrylate having an alicyclic epoxy.
- the lactone adduct eg, Cyclomer® A200, M100 manufactured by Daicel Chemical Industry Co., Ltd.
- Examples thereof include acid esters, epoxidates of dicyclopentenyl (meth) acrylate, and epoxidates of dicyclopentenyloxyethyl (meth) acrylate.
- These epoxy group-containing (meth) acrylates (m-3) may be used alone or in combination of two or more.
- glycidyl (meth) acrylate is preferable from the viewpoint of availability and reactivity.
- the carboxy group-containing compound the unsaturated carboxylic acid mentioned in the above-mentioned first method can be used.
- (meth) acrylic acid is preferable from the viewpoint of reactivity.
- polybasic acid (n-1) examples include tetrahydrophthalic acid, hexahydrophthalic acid, 4-methylhexahydrophthalic acid, succinic acid and the like.
- polybasic acid anhydride (n-2) examples include the above-mentioned polybasic acid anhydride. These polybasic acids and polybasic acid anhydrides may be used alone or in combination of two or more. Among these, tetrahydrophthalic acid anhydride is preferable from the viewpoint of improving developability.
- the carboxy group of the carboxy group-containing compound when added to the epoxy group contained in the precursor, a part of the epoxy group of the precursor is left unreacted to react with the carboxy group. It can be left as a structural unit (c-2) having a functional group. Further, a carboxy group-containing compound having a (meth) acryloyloxy group may be subjected to an addition reaction with the epoxy group of the precursor to introduce a structural unit (c-1) having a (meth) acryloyloxy group.
- Constant unit (c) "Constituent unit (c-1)”
- the structural unit (c-1) does not have an aromatic ring skeleton and a carboxy group, but has a (meth) acryloyloxy group.
- the structural unit (c-1) can be generally introduced into the resin (A) by the following two methods.
- the first method uses an epoxy group-containing (meth) acrylate (m-3) as a polymerizable monomer used when producing a precursor of the resin (A) by copolymerization, and the epoxy group contains a carboxy group.
- This is a method of introducing by adding a (meth) acrylic compound.
- the epoxy group-containing (meth) acrylate (m-3) the above-mentioned ones can be used.
- the carboxy group-containing (meth) acrylic compound (m-2) include (meth) acrylic acid, 2- (meth) acryloyloxyethyl succinic acid, 2- (meth) acryloyloxyethyl hexahydrophthalic acid, and ⁇ -bromo.
- Examples thereof include (meth) acrylic acid and ⁇ -frill (meth) acrylic acid.
- (meth) acrylic acid is preferable from the viewpoint of reactivity and availability when synthesizing the resin (A).
- carboxy group-containing (meth) acrylic compounds may be used alone or in combination of two or more.
- a carboxy group-containing monomer is used as the polymerizable monomer used when producing the precursor of the resin (A) by copolymerization, and the carboxy group contains an epoxy group (meth) acrylate (m-3).
- an isocyanato group-containing (meth) acrylate (m-4) As the carboxy group-containing monomer, an unsaturated carboxylic acid listed as the above-mentioned carboxy group-containing polymerizable monomer can be used.
- the epoxy group-containing (meth) acrylate (m-3) the above-mentioned ones can be used.
- the isocyanato group-containing (meth) acrylate (m-4) include 2-isocyanatoethyl (meth) acrylate.
- the structural unit (c-2) does not have an aromatic ring skeleton, a carboxy group, and a (meth) acryloyloxy group, and has a functional group that reacts with the carboxy group.
- the functional group that reacts with the carboxy group of the structural unit (c-2) is not particularly limited, but usually includes an epoxy group, an oxetanyl group, an isocyanato group and the like, and an epoxy group is particularly preferable.
- the structural unit (c-2) is introduced by using a functional group-containing polymerizable monomer that reacts with a carboxy group as the polymerizable monomer used when the resin (A) is produced by copolymerization (reaction with a carboxy group).
- a functional group-containing polymerizable monomer (Derived from a functional group-containing polymerizable monomer).
- the functional group-containing polymerizable monomer that reacts with the carboxy group include oxetanyl (meth) acrylate and (meth) acrylic acid (3-methyloxetan-3) in addition to the above-mentioned epoxy group-containing (meth) acrylate (m-3).
- the resin (A) comprises a structural unit (b) having a carboxy group, a structural unit (c-1) having a (meth) acryloyloxy group, and a structural unit (c-2) having a functional group that reacts with the carboxy group.
- a structural unit (b) having a carboxy group a structural unit having a carboxy group
- a structural unit (c-1) having a (meth) acryloyloxy group and a structural unit (c-2) having a functional group that reacts with the carboxy group.
- a structural unit (c-1) having a (meth) acryloyloxy group
- c-2 having a functional group that reacts with the carboxy group.
- a preferred method is to use an epoxy group-containing (meth) acrylate (m-3) as a polymerizable monomer used when producing a precursor of the resin (A) by copolymerization, and a carboxy group as a part of the epoxy group.
- the epoxy group may be opened by adding the contained (meth) acrylic compound, and the polybasic acid anhydride may be added to a part of the hydroxyl groups generated at that time. That is, as the structural unit introduced into the resin (A), a structural unit (b) having a carboxy group (a structural unit derived from a polybasic acid anhydride) and a structural unit having a (meth) acryloyloxy group (c-1).
- Epoxide group-containing (meth) acrylate or isocyanato group-containing (meth) acrylate may be added. That is, examples of the structural unit introduced into the resin (A) include a structural unit (b) having a carboxy group and a structural unit (c-1) having a (meth) acryloyloxy group.
- the structural unit (d) does not have an aromatic ring skeleton, a carboxy group, a (meth) acryloyloxy group, and a functional group that reacts with the carboxy group, and is a crosslinked alicyclic hydrocarbon group having 7 to 20 carbon atoms.
- the structural unit (d) is a polymerizable monomer (m-5) having a bridging alicyclic hydrocarbon group having 7 to 20 carbon atoms as a polymerizable monomer used for producing the resin (A) by copolymerization.
- a polymerizable monomer having a cross-linked alicyclic hydrocarbon group having 7 to 20 carbon atoms examples include dicyclopentadiene (meth) acrylate, tricyclodecanyl (meth) acrylate, and isobornyl (meth).
- the polymerizable monomer (m-5) having a bridging alicyclic hydrocarbon group having 7 to 20 carbon atoms include dicyclopentadiene (meth) acrylate, tricyclodecanyl (meth) acrylate, and isobornyl (meth).
- the resin (A) of the present embodiment has, if necessary, a structural unit (e) derived from a radically polymerizable monomer (m-6) having an ethylenic carbon-carbon double bond other than the above-mentioned structural unit. You may.
- Examples of the radically polymerizable monomer (m-6) having an ethylenic carbon-carbon double bond include diene compounds such as butadiene, isoprene and chloroprene; methyl (meth) acrylate, ethyl (meth) acrylate and n-propyl ( Meta) acrylate, iso-propyl (meth) acrylate, n-butyl (meth) acrylic rate, sec-butyl (meth) acrylate, iso-butyl (meth) acrylate, tert-butyl (meth) acrylic rate, benzyl (meth) Acrylate, cyclopentyl (meth) acrylate, cyclohexyl (meth) acrylate, methylcyclohexyl (meth) acrylate, ethylcyclohexyl (meth) acrylate, 1,4-cyclohexanedimethanol mono (meth) acrylate,
- the resin (A) used in the present embodiment contains 5 to 50 mol% of the constituent unit (a) having an aromatic ring skeleton with respect to the total amount of the constituent units (total number of moles of the constituent monomers).
- the content of the structural unit (a) is 5 mol% or more, the photosensitive resin composition has good colorant dispersibility and good developability.
- the contents of the structural unit (b), the structural unit (c), and the structural unit (d) can be sufficiently secured, so that the photosensitive resin composition can be sufficiently secured.
- a photosensitive resin composition having a good balance of necessary properties such as photocurability, developability, and elastic recovery rate as a cured product can be obtained.
- the content of the structural unit (a) is 5 to 10 mol%, 10 to 20 mol%, 20 to 30 mol%, 30 to 40 mol%, or 40 to 50 mol%. There may be.
- the resin (A) used in the present embodiment is obtained by using two kinds of resins (A-1) and resins (A-2) having different contents of the structural unit (a) having an aromatic ring skeleton in combination. It is possible to obtain a photosensitive resin composition which exerts a synergistic effect, gives a cured film having a further improved elastic recovery rate, and has a further improved colorant dispersibility and developability.
- the content of the structural unit (a) having the aromatic ring skeleton of the resin (A-1) is preferably 5 to 30 mol% with respect to the total amount of the structural units of the resin (A-1). It is preferably 5 to 25 mol%.
- the content is preferably 5 to 8 mol%, 5 to 10 mol%, 5 to 15 mol%, or 10 to 20 mol%, if necessary.
- the content of the structural unit (a) having the aromatic ring skeleton of the resin (A-2) is preferably 35 mol% to 50 mol% with respect to the total amount of the structural units of the resin (A-2). , More preferably 40 to 50 mol%.
- the content is preferably 38 to 50 mol% or 42 to 45 mol%, if necessary.
- the ratio of the resin (A-1) to the resin (A) is 10 to 90% by mass. Is more preferable, 30 to 70% by mass is more preferable, and 45 to 65% by mass is further preferable.
- the ratio may be 48 to 60% by mass, 50 to 58% by mass, or the like.
- the ratio of the resin (A-2) to the resin (A) is preferably 10 to 90% by mass, more preferably 30 to 70% by mass, and even more preferably 35 to 55% by mass.
- the ratio may be 38 to 53% by mass, 40 to 50% by mass, or the like.
- Preferred configurations of the resin (A-1) include an aromatic ring-containing polymerizable monomer (m-1), an epoxy group-containing (meth) acrylate (m-3), and a bridging alicyclic type having 7 to 20 carbon atoms.
- a carboxy group-containing (meth) acrylic compound (m-2) is added to the epoxy group of the resin (A) precursor, which is a polymer of the polymerizable monomer (m-5) having a hydrocarbon group, and the epoxy group is further added.
- This is a resin in which a polybasic acid (n-2) or a polybasic acid anhydride (n-3) is added to a hydroxy group generated by the ring opening of the above.
- the resin (A-1) By forming the resin (A-1) in such a configuration, it is possible to control the content of the structural unit (a) having the aromatic ring skeleton while balancing the contents of the other structural units. A photosensitive resin composition having excellent colorant dispersibility and developability can be obtained, and a cured film having an excellent elastic recovery rate can be obtained.
- Preferred configurations of the resin (A-2) include an aromatic ring-containing polymerizable monomer (m-1), a carboxy group-containing polymerizable monomer (m-2), and a bridging alicyclic hydrocarbon having 7 to 20 carbon atoms.
- Epoxide group-containing (meth) acrylate (m-3) or isocyanato group-containing (meth) acrylate is part of the carboxy group of the resin (A) precursor, which is a polymer of the polymerizable monomer (m-5) having a group. It is a resin to which (m-4) is added.
- the resin (A-2) By making the resin (A-2) have such a constitution, it is possible to control the content of the constituent unit (a) having the aromatic ring skeleton while balancing the contents of the other constituent units. , A photosensitive resin composition having excellent colorant dispersibility and developability can be obtained, and a cured film having an excellent elastic recovery rate can be obtained.
- the content of the structural unit (b) having a carboxy group is preferably 5 to 50 mol%, preferably 8 to 40 mol%, based on the total amount of the structural units (total number of moles of the constituent monomers). More preferably, it is more preferably 10 to 30 mol%, and particularly preferably 13 to 25 mol%. The amount is preferably 15 to 23 mol% or 18 to 20 mol%.
- the content of the structural unit (b) is 5 mol% or more, a photosensitive resin composition having good developability can be obtained.
- the content of the structural unit (b) is 50 mol% or less, it is possible to prevent the exposed portion from being washed away during development and the residual film ratio from decreasing.
- the content of the structural unit (c-1) having the (meth) acryloyloxy group is preferably 5 to 50 mol% with respect to the total amount of the structural unit (total number of moles of the constituent monomers), and is preferably 10 to 40. It is more preferably mol%, still more preferably 12-30 mol%. The amount is preferably 15 to 28 mol% or 18 to 25 mol%.
- a photosensitive resin composition having good photocurability, solvent resistance, and developability can be obtained.
- the content of the structural unit (c-1) is 50 mol% or less, the photocurability can be suppressed to an appropriate range, and it is possible to prevent the generation of residues in the unexposed portion during development.
- the content of the structural unit (c-1) is particularly preferably 20 to 30 mol% in the case of the resin (A-1), and 10 to 20 mol% in the case of the resin (A-2). It is particularly preferable to have.
- the content of the structural unit (c-2) having a functional group that reacts with the carboxy group is preferably 0 to 20 mol%, preferably 0 to 20 mol%, based on the total amount of the structural units (total number of moles of the constituent monomers). It is more preferably 15 mol%, further preferably 0 to 10 mol%, and particularly preferably 0 to 5 mol%.
- the content of the structural unit (c-1) is particularly preferably 0.1 to 5 mol% in the case of the resin (A-1), and 0 mol% in the case of the resin (A-2). It is particularly preferable to have.
- the content of the structural unit (d) having a bridging alicyclic hydrocarbon group having 7 to 20 carbon atoms is 1 to 40 mol% with respect to the total amount of the structural units (total number of moles of the constituent monomers). It is preferably 3 to 35 mol%, more preferably 5 to 30 mol%. The amount may be 8 to 25 mol%, 10 to 20 mol%, 15 to 18 mol%, or the like, if necessary.
- the content of the structural unit (d) is 1 mol% or more, a cured film having an excellent elastic recovery rate can be obtained.
- the content of the structural unit (d) is 40 mol% or less, a photosensitive resin composition having excellent curability can be obtained.
- the content of the structural unit (d) is particularly preferably 10 to 30 mol% in the case of the resin (A-1) and 5 to 10 mol% in the case of the resin (A-2). Is particularly preferable.
- a constituent unit (e) other than the constituent unit (a), the constituent unit (b), the constituent unit (c), and the constituent unit (d) can be introduced into the resin (A), if necessary.
- the total amount of the structural units is compared with respect to the total amount of the structural units (total number of moles of the constituent monomers). It is preferably more than 0 mol% to 60 mol%, more preferably more than 0 mol% to 50 mol%.
- the following introduction examples can be mentioned.
- a carboxy group-containing (meth) acrylic compound is added to the epoxy group of the resin (A) precursor, which is a polymer containing an epoxy group-containing (meth) acrylate.
- the structural unit derived from the epoxy group-containing (meth) acrylate in which the unreacted epoxy group remains is counted as the structural unit (c-2) having a functional group that reacts with the carboxy group.
- the structural unit derived from the epoxy group-containing (meth) acrylate to which the carboxy group-containing (meth) acrylic compound is added and the epoxy group disappears the structural unit (a), the structural unit (b), and the structural unit (c) are used. , It is counted as a structural unit (e) other than the structural unit (d).
- the reaction conditions in the copolymerization reaction for obtaining the resin (A) used in the present embodiment or the copolymerization reaction for obtaining the resin (A) precursor before the addition reaction may be appropriately set according to a conventional method. ..
- the copolymerization reaction is carried out, for example, at 50 to 150 ° C., more preferably 60 to 140 ° C. for about 1 to 12 hours while dropping a polymerizable monomer for copolymerization in a solvent and a polymerization initiator. You just have to react.
- a monomer for the addition reaction with the resin (A) precursor is added to the solvent, and an addition reaction catalyst is further added, preferably 50 to 150 ° C., more preferably.
- the reaction may be carried out at 80 to 130 ° C. for about 3 to 12 hours. In this addition reaction, there is no problem even if the solvent used in the copolymerization reaction for obtaining the resin (A) precursor is contained. Therefore, after the copolymerization reaction for obtaining the resin (A) precursor is completed, the addition reaction can be continuously carried out without removing the solvent.
- the solvent that can be used for the copolymerization reaction is not particularly limited, and known ones can be appropriately used.
- Specific examples of the solvent include ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol mono-n-propyl ether, diethylene glycol mono-n-butyl ether, triethylene glycol monomethyl ether, and triethylene.
- Glycol monoethyl ether propylene glycol monomethyl ether, propylene glycol monoethyl ether, dipropylene glycol monomethyl ether, dipropylene glycol monoethyl ether, dipropylene glycol mono-n-propyl ether, dipropylene glycol mono-n-butyl ether, tripropylene (Poly) alkylene glycol monoalkyl ethers such as glycol monomethyl ether and tripropylene glycol monoethyl ether; (poly) such as ethylene glycol monomethyl ether acetate, ethylene glycol monoethyl ether acetate, propylene glycol monomethyl ether acetate and propylene glycol monoethyl ether acetate.
- Alkylene glycol monoalkyl ether acetate Alkylene glycol monoalkyl ether acetate; other ether compounds such as diethylene glycol dimethyl ether, diethylene glycol methyl ethyl ether, diethylene glycol diethyl ether, tetrahydrofuran; ketone compounds such as methyl ethyl ketone, cyclohexanone, 2-heptanone, 3-heptanone; methyl 2-hydroxypropionate , 2-Hydroxypropionate, methyl 2-hydroxy-2-methylpropionate, ethyl 2-hydroxy-2-methylpropionate, methyl 3-methoxypropionate, ethyl 3-methoxypropionate, methyl 3-ethoxypropionate , 3-ethoxypropionate , 3-ethoxypropionate ethyl, ethoxyacetate ethyl, hydroxyacetate ethyl, 2-hydroxy-3-methylbutyrate methyl, 3-methyl-3-meth
- (poly) alkylene glycol monoalkyl ether such as propylene glycol monomethyl ether
- (poly) alkylene glycol monoalkyl ether acetate such as propylene glycol monomethyl ether acetate, that is, glycol ether-based solvents are preferable.
- the amount of the solvent used for the copolymerization reaction is not particularly limited, but is generally 30 to 1000 parts by mass, preferably 50 to 800 parts by mass when the total amount of the monomers charged is 100 parts by mass. ..
- the amount of the solvent used is 1000 parts by mass or less, the decrease in the molecular weight of the resin (A) due to the chain transfer action can be efficiently suppressed, and the viscosity of the resin (A) can be controlled within an appropriate range. preferable.
- the amount of the solvent used is 30 parts by mass or more, it is preferable because it is possible to prevent an abnormality from occurring in the copolymerization reaction and to stably carry out the copolymerization reaction. In addition, coloring and gelation of the resin (A) can be prevented.
- the polymerization initiator that can be used in the copolymerization reaction is not particularly limited, and known ones can be appropriately used.
- Specific examples of the polymerization initiator include azobisisobutyronitrile, azobisisovaleronitrile, benzoyl peroxide, t-butylperoxy-2-ethylhexanoate and the like. These polymerization initiators may be used alone or in combination of two or more.
- the amount of the polymerization initiator used is not particularly limited, but is generally 0.5 to 20 parts by mass, preferably 0.7 to 15 parts by mass, when the total amount of the monomers charged is 100 parts by mass. It is more preferably 1 to 10 parts by mass.
- the type of the addition reaction catalyst used for the addition reaction of the monomer to the resin (A) precursor is not particularly limited, and is selected as necessary.
- the addition reaction catalyst include tertiary amines such as triethylamine, quaternary ammonium salts such as triethylbenzylammonium chloride, phosphorus compounds such as triphenylphosphine, and chromium chelating compounds. These addition reaction catalysts may be used alone or in combination of two or more.
- the amount of the addition reaction catalyst used is not particularly limited, but is generally 0.01 to 5 parts by mass, preferably 0.1 to 5 parts by mass, when the amount of the resin (A) precursor is 100 parts by mass. It is 2 parts by mass, more preferably 0.2 to 1 part by mass.
- the type of the polymerization inhibitor is not particularly limited and is selected as needed.
- examples of the polymerization inhibitor include hydroquinone, methylhydroquinone, hydroquinone monomethyl ether, butylhydroxytoluene and the like. These polymerization inhibitors may be used alone or in combination of two or more.
- the amount of the polymerization inhibitor used is not particularly limited, but is generally 0.01 to 5 parts by mass, preferably 0.1 to 5 parts by mass when the amount of the resin (A) precursor is 100 parts by mass. It is 2 parts by mass, more preferably 0.2 to 1 part by mass.
- the resin (A) used in the present invention preferably has a weight average molecular weight of 1000 to 50,000, more preferably 3000 to 40,000, obtained by gel permeation chromatography (GPC) in terms of polystyrene. It is more preferably 20000.
- GPC gel permeation chromatography
- the weight average molecular weight is 1000 or more, pattern chipping does not occur after alkaline development, which is preferable.
- the weight average molecular weight is 50,000 or less, the developing time is appropriate and it is practical for use, which is preferable.
- the acid value (JIS K6901 5.3) of the resin (A) used in the present invention is not limited as long as the desired effect of the present invention is obtained, but is usually 20 to 300 KOH mg / g, preferably 30 to 200 KOH mg / g. ..
- the acid value is 20 KOH mg / g or more, the developability is good, which is preferable.
- the acid value is 300 KOHmg / g or less, the exposed portion (photo-curing portion) is less likely to dissolve in the alkaline developer, which is preferable.
- the unsaturated group equivalent of the resin (A) used in the present invention is not limited as long as the desired effect of the present invention is obtained, but is usually 100 to 4000 g / mol, preferably 200 to 2000 g / mol, more preferably. Is 300-500 g / mol.
- the unsaturated group equivalent is 100 g / mol or more, it is preferable because it is effective in improving the physical characteristics of the coating film and the alkali developability.
- the unsaturated group equivalent is 4000 g / mol or less, it is preferable because it is effective in further increasing the sensitivity.
- the unsaturated group equivalent is the mass of the resin (A) per mol of the unsaturated bond (ethylenic carbon-carbon double bond) in the resin (A).
- the unsaturated group equivalent can be determined by dividing the mass of the resin (A) by the number of unsaturated groups in the resin (A) (g / mol).
- the unsaturated group equivalent is a theoretical value calculated from the amount of the raw material charged for introducing the unsaturated group.
- the epoxy equivalent of the resin (A) used in the present invention is not limited as long as the desired effect of the present invention is obtained, but is usually 100 to 4000 g / mol, preferably 200 to 2000 g / mol, and more preferably 300. ⁇ 500 g / mol.
- the epoxy equivalent is 100 g / mol or more, it is effective and preferable for improving the physical characteristics of the coating film and the storage stability.
- the epoxy equivalent is 4000 g / mol or less, it is effective in further improving the solvent resistance.
- the epoxy equivalent is the mass of the polymer per mole of the epoxy group of the polymer. This value can be determined by dividing the mass of the polymer by the amount of epoxy groups in the polymer (g / mol).
- the "epoxy equivalent" is a theoretical value calculated from the charged amount of the raw material used for introducing the epoxy group.
- the blending amount of the resin (A) is not particularly limited, but is preferably 5 to 40 parts by mass, preferably 10 to 30 parts by mass, based on 100 parts by mass of the total amount of the photosensitive resin composition excluding the solvent (C). It is more preferable to have.
- the blending amount of the resin (A) is 5% by mass or more, it is preferable because it has good curability.
- the blending amount of the resin (A) is 40 parts by mass or less, it is preferable because it has good coatability.
- the reactive diluent (B) used in this embodiment is a compound having at least one ethylenically unsaturated group in the molecule. Of these, a compound having a plurality of ethylenically unsaturated groups is preferable. By using the reactive diluent (B), the strength of the cured film and the adhesion to the substrate can be improved.
- Examples of the monofunctional monomer used as the reactive diluent (B) include (meth) acrylamide, methylol (meth) acrylamide, methoxymethyl (meth) acrylamide, ethoxymethyl (meth) acrylamide, and propoxymethyl (meth) acrylamide.
- Examples of the polyfunctional monomer used as the reactive diluent (B) include ethylene glycol di (meth) acrylate, diethylene glycol di (meth) acrylate, tetraethylene glycol di (meth) acrylate, and propylene glycol di (meth) acrylate.
- Aromatic vinyl compounds such as diallylbenzenephosphonate; Dicarboxylic acid ester compounds such as divinyl adipate; Triallyl cyanurate, methylenebis (meth) acrylamide, (meth) acrylamide methylene ether, polyhydric alcohol and N-methylol (meth) acrylamide.
- These polyfunctional monomers may be used alone or in combination of two or more.
- dipentaerythritol hexa (meth) acrylate is preferable from the viewpoint of adhesion.
- the blending amount of the reactive diluent (B) is not particularly limited, but is preferably 10 to 50 parts by mass, preferably 20 to 40 parts by mass, based on 100 parts by mass of the total amount of the photosensitive resin composition excluding the solvent (C). It is more preferably by mass.
- the blending amount of the reactive diluent (B) is 10 parts by mass or more, it is preferable because the photosensitive resin composition has good photocurability.
- the blending amount of the reactive diluent (B) is 40 parts by mass or less, it is preferable because the residue of the unexposed part is less likely to be generated after the coating film of the photosensitive resin composition is exposed and developed.
- the solvent (C) used in the present embodiment is not particularly limited as long as it is an inert solvent that can dissolve the resin (A) and does not react with the resin (A), and can be arbitrarily selected. Further, the solvent (C) is preferably compatible with the above-mentioned reactive diluent (B). As the solvent (C), the same solvent that can be used when producing the resin (A) can be used. As the solvent (C), (poly) alkylene glycol monoalkyl ether such as propylene glycol monomethyl ether and (poly) alkylene glycol monoalkyl ether acetate such as propylene glycol monomethyl ether acetate are preferable.
- the target resin (A) can be isolated from the solution of the resin (A) that has completed the copolymerization reaction, and can be appropriately added to the isolated resin (A). However, it is not always necessary to isolate the target resin (A) from the resin solution. It is also possible to use the solvent as it is as the solvent (C) without separating the solvent contained at the end of the copolymerization reaction from the resin (A) solution. If necessary, another solvent may be added to the resin (A) solution. Further, the solvent contained in the other components used when preparing the photosensitive resin composition may be used as it is as the solvent (C).
- the blending amount of the solvent (C) is not particularly limited, but is preferably 150 to 300 parts by mass, preferably 200 to 250 parts by mass with respect to 100 parts by mass of the total amount of the photosensitive resin composition excluding the solvent (C). It is more preferable to have.
- the blending amount of the solvent (C) is 150 parts by mass or more, the photosensitive resin composition has good coatability, which is preferable.
- the blending amount of the solvent (C) is 300 parts by mass or less, it is preferable because the coating film can have a sufficient film thickness.
- the photopolymerization initiator (D) used in the present embodiment is not particularly limited, and is, for example, a benzophenone compound such as benzophenone, benzoinmethyl ether, benzoin ethyl ether, benzoin butyl ether; acetophenone, 2,2-dimethoxy-2-phenyl.
- a benzophenone compound such as benzophenone, benzoinmethyl ether, benzoin ethyl ether, benzoin butyl ether; acetophenone, 2,2-dimethoxy-2-phenyl.
- Xantone compounds such as xanthone, thioxanthone, 2,4-dimethylthioxanthone, 2,4-diisopropylthioxanthone, 2-chlorothioxanthone; quetal compounds such as acetophenone dimethyl ketal and benzyl dimethyl ketal; benzophenone, 4- (1-t-butyldioxy) Benzophenone compounds such as -1-methylethyl) benzophenone, 3,3', 4,4'-tetrakis (t-butyldioxycarbonyl) benzophenone; acylphosphine oxide compounds and the like can be mentioned.
- These photopolymerization initiators may be used alone or in combination of two or more.
- the blending amount of the photopolymerization initiator (D) is not particularly limited, but is preferably 0.03 to 15 parts by mass, preferably 0.03 to 15 parts by mass, based on 100 parts by mass of the total amount of the photosensitive resin composition excluding the solvent (C). .1 to 10 parts by mass is more preferable, and 0.3 to 6 parts by mass is further preferable.
- the amount may be 0.5 to 8 parts by mass, 1 to 5 parts by mass, or the like, if necessary.
- the blending amount of the photopolymerization initiator (D) is 0.03 part by mass or more, it is preferable because the photosensitive resin composition has sufficient photocurability.
- the blending amount of the photopolymerization initiator (D) is 15 parts by mass or less, a residue in the unexposed portion after development is unlikely to occur, which is preferable.
- the colorant (E) may be any as long as it dissolves or disperses in the solvent (C), and is not particularly limited.
- Examples of the colorant (E) include dyes and pigments.
- the colorant (E) only the dye may be used, only the pigment may be used, or the dye and the pigment may be used in combination.
- the above-mentioned colorant (E) is used for the purpose of a member formed of the cured resin film. Depending on the situation, it can be used alone or in combination of two or more.
- a black colorant (E) is used, the cured resin film of the photosensitive resin composition is suitable as a black matrix and a black column spacer.
- dyes include, for example, acidalizarin violet N; acidblack1, 2, 24, 48; acidblue1, 7, 9, 25, 29, 40, 45, 62, 70, 74, 80, 83, 90, 92. , 112, 113, 120, 129, 147; acid chrome violet K; acid Fuchsin; acid green 1, 3, 5, 25, 27, 50; acid orange 6, 7, 8, 10, 12, 50, 51, 52, 56.
- dyes it is preferable to use azo-based, xanthene-based, anthraquinone-based or phthalocyanine-based acid dyes. These dyes may be used alone or in combination of two or more.
- pigments include, for example, C.I. I. Pigment Yellow 1, 3, 12, 13, 14, 15, 16, 17, 20, 24, 31, 53, 83, 86, 93, 94, 109, 110, 117, 125, 128, 137, 138, 139, Yellow pigments such as 147, 148, 150, 153, 154, 166, 173, 194, 214; C.I. I. Pigment Orange 13, 31, 36, 38, 40, 42, 43, 51, 55, 59, 61, 64, 65, 71, 73 and other orange pigments; I.
- pigments may be used alone or in combination of two or more.
- an organic black pigment is preferable, and a lactam-based organic black is more preferable, from the viewpoint of the optical density of the image display element provided with the resin cured film of the photosensitive resin composition of the present embodiment.
- the blending amount of the colorant (E) is not particularly limited, but is preferably 10 to 50 parts by mass, preferably 15 to 45 parts by mass, based on 100 parts by mass of the total amount of the photosensitive resin composition excluding the solvent (C). Is more preferable, and 20 to 40 parts by mass is further preferable. The amount may be 25 to 45 parts by mass, 30 to 35 parts by mass, or the like, if necessary.
- the blending amount of the colorant (E) is 10 parts by mass or more, the cured film has sufficient color reproducibility, and when a black pigment is used as the colorant (E), it has sufficient light-shielding property. preferable.
- the blending amount of the colorant (E) is 50 parts by mass or less, the residue of the unexposed part is less likely to be generated after development, which is preferable.
- the photosensitive resin composition of the present embodiment may contain a dispersant (F).
- a dispersant a known dispersant can be used without particular limitation.
- the dispersant (F) the dispersibility of the colorant is improved, especially when the pigment is used as the colorant (E).
- the dispersant (F) it is preferable to use a polymer dispersant because it is excellent in dispersion stability over time.
- the polymer dispersant can be arbitrarily selected, and for example, a urethane dispersant, a polyethyleneimine dispersant, a polyoxyethylene alkyl ether dispersant, a polyoxyethylene glycol diester dispersant, a sorbitan aliphatic ester dispersant, etc. Examples thereof include an aliphatic modified ester-based dispersant. Examples of such polymer dispersants include EFKA (registered trademark, manufactured by BASF Japan), Disperbyk (registered trademark, manufactured by Big Chemie), Disparon (registered trademark, manufactured by Kusumoto Kasei Co., Ltd.), and SOLSERSE (registered trademark, manufactured by Geneca). ) And other commercially available products may be used. The blending amount of the dispersant may be appropriately set according to the type of pigment or the like to be used.
- the blending amount of the dispersant (F) is not particularly limited, but is preferably 0.03 to 15 parts by mass, preferably 0.1 part by mass, based on 100 parts by mass of the total amount of the photosensitive resin composition excluding the solvent (C). It is more preferably to 10 parts by mass, and further preferably 0.3 to 6 parts by mass. The amount may be 1 to 8 parts by mass, 2 to 5 parts by mass, or the like, if necessary.
- the blending amount of the dispersant (F) is 0.03 parts by mass or more, it is preferable because the dispersibility is further enhanced.
- the blending amount of the dispersant (F) is 15 parts by mass or less, the residue of the unexposed part is less likely to be generated after development, which is preferable.
- the photosensitive resin composition of the present embodiment may contain known additives such as a coupling agent, a leveling agent, and a thermal polymerization inhibitor, as long as the effects of the present invention are not impaired.
- the blending amount of these additives is not particularly limited as long as the effect of the present invention is not impaired.
- the photosensitive resin composition of the present embodiment can be produced by mixing each of the above-mentioned components using a known mixing device.
- Examples of the method for producing the photosensitive resin composition in one embodiment include a production method having the following steps I and II in this order.
- Step I A step of mixing the resin (A1), the solvent (C1), the colorant (E), and the dispersant (F) of an arbitrary component.
- Step II A step of mixing the resin (A2), the reactive diluent (B), the solvent (C2), the photopolymerization initiator (D), and the mixture obtained in Step I.
- the solvent (C1) in step I and the solvent (C2) in step II mixed as the solvent (C) in the photosensitive resin composition may be the same type of solvent or different types of solvents. Further, as the solvent (C1) or the solvent (C2) used in each step, the above-mentioned solvent (C) may be used alone, or two or more kinds may be used.
- the resin (A1) in step I and the resin (A2) in step II which are mixed as the resin (A) in the photosensitive resin composition, may use the same type of resin but different types of resin. Is also good. Further, as the resin (A1) or the resin (A2) used in each step, the above-mentioned resin (A) may be used alone, or two or more kinds may be used.
- the resin (A1) of the step I and the resin (A2) of the step II have a viewpoint of further improving all the characteristics of the colorant dispersibility as the photosensitive resin composition, the development time, and the elastic recovery rate as the cured product in a well-balanced manner. Therefore, it is preferable to use different types of resin (A).
- the combination of the different types of resin (A) used for the resin (A1) and the resin (A2) is not particularly limited, but the colorant dispersibility as a photosensitive resin composition, the development time, and the elastic recovery rate as a cured product are not particularly limited.
- a synergistic effect is exhibited by using two types of resins (A-1) and resins (A-2) having different contents of the constituent unit (a) having the aromatic ring skeleton in combination from the viewpoint of improving the balance. do.
- the content of the structural unit (a) having the aromatic ring skeleton of the resin (A-1) is preferably 5 to 30 mol% with respect to the total amount of the structural units of the resin (A-1). It is more preferably 5 to 25 mol%.
- the content of the structural unit (a) having the aromatic ring skeleton of the resin (A-2) is preferably 35 mol% to 50 mol% with respect to the total amount of the structural units of the resin (A-2). , More preferably 40 to 50 mol%.
- the cured resin film of the present embodiment is a cured resin film obtained by photo-curing the photosensitive resin composition of the present embodiment. Since the resin cured film of the present embodiment has good colorant dispersibility, solvent resistance, and elastic recovery rate, it is suitable as a black matrix, a color filter, a black column spacer, and a BPDL, which are members of an image display element.
- the cured resin film of the present embodiment can be produced, for example, by the method shown below.
- the photosensitive resin composition is applied onto the surface to be formed of the cured resin film to form a resin layer (coating film).
- the resin layer is exposed through a mask having a predetermined pattern, and the exposed portion is photocured.
- the unexposed portion of the resin layer is developed with a developing solution to obtain a cured resin film having a predetermined pattern.
- post-baking heat treatment
- a halftone mask having a predetermined pattern may be used. In this case, the unexposed portion and the semi-exposed portion are developed with a developing solution to obtain a resin cured film having a predetermined pattern.
- the material of the substrate is not particularly limited, and examples thereof include a glass substrate, a silicon substrate, a polycarbonate substrate, a polyester substrate, a polyamide substrate, a polyamide-imide substrate, a polyimide substrate, an aluminum substrate, a printed wiring board, and an array substrate.
- the method for applying the photosensitive resin composition is not particularly limited, and examples thereof include a screen printing method, a roll coating method, a curtain coating method, a spray coating method, and a spin coating method.
- the solvent (C) contained in the resin layer is volatilized by heating using a heating means such as a circulating oven, an infrared heater, or a hot plate, if necessary. May be good.
- the heating conditions after coating are not particularly limited and may be appropriately set according to the composition of the photosensitive resin composition.
- the heating temperature after coating can be 50 ° C. to 120 ° C.
- the heating time can be 30 seconds to 30 minutes.
- the exposure method of the resin layer is not particularly limited, and examples thereof include irradiation with active energy rays such as ultraviolet rays and excimer laser light.
- the energy dose to be irradiated may be appropriately set according to the composition of the photosensitive resin composition. For example, it is preferably 30 to 2000 mJ / cm 2 , but is not limited to this range.
- the light source used for exposure is not particularly limited, but a low-pressure mercury lamp, a medium-pressure mercury lamp, a high-pressure mercury lamp, a xenon lamp, a metal halide lamp, or the like can be arbitrarily selected and used.
- the alkaline developing solution used for development is not particularly limited, and is, for example, an aqueous solution of sodium carbonate, potassium carbonate, calcium carbonate, sodium hydroxide, potassium hydroxide or the like; an aqueous solution of an amine compound such as ethylamine, diethylamine or dimethylethanolamine.
- Tetramethylammonium 3-methyl-4-amino-N, N-diethylaniline, 3-methyl-4-amino-N-ethyl-N- ⁇ -hydroxyethylaniline, 3-methyl-4-amino-N- Ethyl-N- ⁇ -methanesulfonamide ethylaniline, 3-methyl-4-amino-N-ethyl-N- ⁇ -methoxyethylaniline and p-such as sulfates, hydrochlorides or p-toluenesulfonates thereof.
- Examples thereof include an aqueous solution of a phenylenediamine-based compound.
- a defoaming agent, a surfactant, or the like may be added to these alkaline developers. Further, it is preferable to wash with water and dry after developing with an alkaline developer.
- the post-baking conditions are not particularly limited and can be arbitrarily selected.
- the heat treatment may be performed by selecting preferable conditions according to the composition of the photosensitive resin composition. For example, heating may be performed at a temperature of 130 ° C. to 250 ° C., preferably for 10 minutes to 4 hours, more preferably for 20 minutes to 2 hours.
- the resin cured film produced in this way is excellent in colorant dispersibility and elastic recovery rate.
- Image display element Specific examples of the image display element include a liquid crystal display element, an organic EL display element, and the like. There are no restrictions on the manufacture of the image display element, and the image display element can be manufactured according to a conventional method.
- a monomer mixture consisting of 68.0 g (molar ratio 0.3) of tricyclodecanyl methacrylate, 11.0 g (molar ratio 0.1) of styrene and 88.0 g (molar ratio 0.6) of glycidyl methacrylate was added to t-.
- a separately prepared product supplemented with 18.4 g of butylperoxy-2-ethylhexanoate (polymerization initiator, manufactured by Nichiyu Co., Ltd., Perbutyl (registered trademark) O).
- the mixture of the monomer and the polymerization initiator was added dropwise to the flask over 2 hours from the dropping funnel.
- the copolymerization reaction was carried out by further stirring at 120 ° C. for 2 hours to generate a precursor of the resin (A-1). Then, the inside of the flask was replaced with air, and 43.4 g (molar ratio 0.58) of acrylic acid, 1.1 g of triphenylphosphine (catalyst), and 0.1 g of methylhydroquinone (polymerization inhibitor) were added to the above resin ( A-1) It was put into a precursor solution. Then, the reaction was continued at 110 ° C. for 10 hours. Next, 61.0 g (molar ratio 0.39) of tetrahydrophthalic anhydride was added to the flask, and the reaction was continued at 110 ° C.
- the acid value of the resin (A-1) contained in this resin solution was 79 KOHmg / g, the weight average molecular weight was 8300, and the unsaturated group equivalent was 480.
- Propylene glycol monomethyl ether acetate was further added to this resin solution to prepare a resin (A-1) solution (solid content concentration 44% by mass) of Synthesis Example 1.
- the solid content means a residual amount of heating when the resin solution is heated at 130 ° C. for 2 hours, and the resin (A-1) and the polymerization initiator are the main components.
- the acid value, unsaturated group equivalent and weight average molecular weight described in the synthetic example are values obtained by the methods described below.
- Acid value The acid value of the resin (A) measured using a mixed indicator of bromothymol blue and phenol let according to JIS K6901 5.3.2. It means the number of mg of potassium hydroxide required to neutralize the acidic component contained in 1 g of the resin (A).
- Unsaturated group equivalent The mass of the polymer per number of moles of the polymerizable unsaturated bond, which is a calculated value calculated based on the amount of the monomer used.
- Weight average molecular weight means the weight average molecular weight converted to standard polystyrene measured under the following conditions using gel permeation chromatography (GPC).
- GPC gel permeation chromatography
- Developing solvent Tetrahydrofuran Detector: Differential refractometer (SHODEX (registered trademark) RI-71S) (manufactured by Showa Denko KK)
- Flow velocity 1 mL / min
- Examples of the photosensitive resin composition in which the resin (A2), the reactive diluent (B), the solvent (C2), the photopolymerization initiator (D), and the mill base of the above-mentioned preparation example are mixed are shown below.
- Example 1 As the resin (A2), the resin (A-1) (resin sample No. p1) of Synthesis Example 1 was 9.3 parts by mass in terms of solid content, and the reactive diluent (B) was dipentaerythritol hexaacrylate (DPHA, Product name: A-DPH, manufactured by Shin-Nakamura Kogyo Co., Ltd.) 37 parts by mass, propylene glycol monomethyl ether acetate 33 parts by mass as solvent (C2), etanone as photopolymerization initiator (D), 1- [9-ethyl-6 -(2-Methylbenzoyl) -9H-carbazole-3-yl]-, 1- (o-acetyloxime) (OXE 02, product name: IRGACURE OXE 02, manufactured by BASF) 3.7 parts by mass, and production example 1 mill base (mill base sample No.
- DPHA dipentaerythritol hexaacrylate
- resin (A-1) of Synthesis Example 1 (resin sample No. 1) is 10.7 parts by mass in terms of solid content
- PGMEA is 200 parts by mass
- IBS0100CF is 35.7 parts by mass
- Table 3 10.7 parts by mass of the resin (A1) contained in the mill base (in Table 3, "* 1" is added.
- "* 1" is the resin contained in the mill base.
- 9.3 parts by mass of the newly added resin (A2) (resin sample No. p1) are described as the resin (A) component in terms of solid content.
- the amount of the solvent contained in the resin (A-1) solution of Synthesis Example 1 is added up in the solvent (C) as a compounding component. Further, 200 parts by mass of the solvent (C1) contained in the mill base and 33 parts by mass of the newly added solvent (C2) are described in total as the solvent (C) component.
- Examples 2 to 17, Comparative Examples 1 to 8 The photosensitive resin compositions of Examples 2 to 17 and Comparative Examples 1 to 8 were prepared in the same manner as in Example 1 except that the formulations shown in Tables 3 to 5 were used.
- the colorant dispersibility of the photosensitive resin composition was evaluated by the method shown below. First, the photosensitive resin compositions of Examples 1 to 17 and Comparative Examples 1 to 8 were spin-coated on a 10 cm ⁇ 10 cm IZO substrate so that the thickness of the coating film was 1.5 ⁇ m. After that, the solvent was volatilized by heating at 90 ° C. for 3 minutes. Next, the entire surface of the coating film was exposed (exposure amount 50 mJ / cm 2 ) using a multi-light ML-251D / B manufactured by Ushio, Inc. and an irradiation optical unit PM25C-100, and photocured.
- the optical density (OD) of the cured coating film having a thickness of 1 ⁇ m was measured by using a transmission densitometer (361T, X-lite). The results are shown in Tables 6-8. It can be said that the higher the optical density, the better the dispersibility of the colorant.
- the elastic recovery rate means the ratio of the distance recovered after the lapse of 10 minutes recovery time to the distance compressed when a constant force is applied (compressive displacement), which is expressed by the following equation.
- Elastic recovery rate (%) [(recovery distance / compression displacement) x 100] The results are shown in 6-8.
- the developed form includes a peeled form in which the unexposed portion is washed away while being peeled off, and a dissolved form in which the unexposed portion is washed away while being melted.
- Powder dissolution refers to a form in which an unexposed portion is slightly dissolved as powder. The results are shown in 6-8.
- the photosensitive resin compositions of Examples 1 to 17 are excellent in colorant dispersibility, developability and elastic recovery rate.
- the photosensitive resin compositions of Comparative Examples 1 to 8 were inferior in evaluation of colorant dispersibility, developability and elastic recovery rate.
- the present invention provides a photosensitive resin composition having excellent colorant dispersibility, developability and elastic recovery rate. Since the photosensitive resin composition of the present invention is excellent in colorant dispersibility, developability and elastic recovery rate, the cured resin film obtained by curing the photosensitive resin composition of the present invention has colorant dispersibility and elastic recovery. Excellent rate.
- a resin cured film is suitable as a black matrix, a color filter, a black column spacer, and a BPDL, which are members of an image display element.
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Abstract
Description
本願は、2020年12月11日に、日本に出願された特願2020-205539号に基づき優先権を主張し、その内容をここに援用する。
また、感光性樹脂組成物に用いられる樹脂として、グリシジル(メタ)アクリレートを用いて合成され、酸基を有さず、ポリスチレン換算の重量平均分子量が1000~50000である共重合体、および酸基を有し、ポリスチレン換算の重量平均分子量が1000~50000である共重合体を含む、樹脂組成物が提案されている(例えば、特許文献2参照)。
本発明の第一の態様は、以下の感光性樹脂組成物を提供する。[1] 樹脂(A)と、
反応性希釈剤(B)と、
溶剤(C)と、
光重合開始剤(D)と、
着色剤(E)と、
を含有する感光性樹脂組成物であって、
前記樹脂(A)が、
芳香環骨格を有する構成単位(a)と、
カルボキシ基を有する構成単位(b)と、
構成単位(c)と、
炭素原子数7~20の橋かけ脂環式炭化水素基を有する構成単位(d)と、
を有し、
前記構成単位(c)は、(メタ)アクリロイルオキシ基を有する構成単位(c-1)及びカルボキシ基と反応する官能基を有する構成単位(c-2)からなる群から選択される少なくとも一種であり、
前記樹脂(A)の構成単位の総量に対し、前記芳香環骨格を有する構成単位(a)の含有量が5~50モル%であることを特徴とする感光性樹脂組成物。
本発明の第一の態様の前記感光性樹脂組成物は、以下の[2]~[9]に記載される特徴を有することが好ましい。以下の[2]~[9]に記載される特徴は、2つ以上を任意に組み合わせることも好ましい。
[2] 前記カルボキシ基を有する構成単位(b)が、不飽和カルボン酸由来の構成単位(b-1)、多塩基酸由来の構成単位(b-2)、及び多塩基酸無水物由来の構成単位(b-3)からなる群から選択される一種以上である[1]に記載の感光性樹脂組成物。
[3] 前記樹脂(A)が、(メタ)アクリロイルオキシ基を有する構成単位(c-1)を有する[1]又は[2]に記載の感光性樹脂組成物。
[4] 前記芳香環骨格を有する構成単位(a)が、スチレン由来の構成単位及びベンジル(メタ)アクリレート由来の構成単位からなる群から選択される一種以上である[1]~[3]のいずれかに記載の感光性樹脂組成物。
[5] 前記樹脂(A)が、樹脂(A-1)と樹脂(A-2)とを含有し、
前記樹脂(A-1)は、前記芳香環骨格を有する構成単位(a)の含有量が、樹脂(A-1)の構成単位の総量に対し、5~30モル%であり、
前記樹脂(A-2)は、前記芳香環骨格を有する構成単位(a)の含有量が、樹脂(A-2)の構成単位の総量に対し、35モル%~50モル%である[1]~[4]のいずれかに記載の感光性樹脂組成物。
[6] 前記樹脂(A)の総量に対し、前記樹脂(A-1)を10~90質量%含有し、前記樹脂(A-2)を10~90質量%含有し、
前記樹脂(A-1)が、エポキシ基を有する樹脂(A-1)前駆体のエポキシ基にカルボキシ基含有(メタ)アクリル化合物が付加し、さらに前記エポキシ基の開環により生じたヒドロキシ基に多塩基酸または多塩基酸無水物が付加した樹脂であり、
前記樹脂(A-2)が、カルボキシ基を有する樹脂(A-2)前駆体のカルボキシ基の一部にエポキシ基含有(メタ)アクリレート又はイソシアナト基含有(メタ)アクリレートが付加した樹脂であり、
前記エポキシ基を有する樹脂(A-1)前駆体は、芳香環含有重合性モノマー、エポキシ基含有(メタ)アクリレート、及び炭素原子数7~20の橋かけ脂環式炭化水素基を有する重合性モノマーの重合体であり、
前記カルボキシ基を有する樹脂(A-2)前駆体は、芳香環含有重合性モノマー、カルボキシ基含有重合性モノマー、炭素原子数7~20の橋かけ脂環式炭化水素基を有する重合性モノマーの重合体である[1]~[5]のいずれかに記載の感光性樹脂組成物。
[7] 前記着色剤(E)が、有機黒色顔料である[1]~[8]のいずれかに記載の感光性樹脂組成物。
[8] 分散剤(F)をさらに含有する[1]~[7]のいずれかに記載の感光性樹脂組成物。
[9] 前記樹脂(A)を2~20質量%を含有し、
前記反応性希釈剤(B)を3~20質量%を含有し、
前記溶剤(C)を50~90質量%を含有し、かつ
前記着色剤(E)を3~30質量%を含有する[1]~[8]のいずれかに記載の感光性樹脂組成物。
本発明の第二の態様は、以下のブラックカラムスペーサを提供する。
[10] [1]~[9]のいずれか1項に記載の感光性樹脂組成物の硬化物からなるブラックカラムスペーサ。
本発明の第三の態様は、以下の画像表示素子を提供する。
[11] [10]に記載のブラックカラムスペーサを備えることを特徴とする画像表示素子。
本発明の第四の態様は、以下の感光性樹脂組成物の製造方法を提供する。
[12] 工程I:樹脂(A1)と、溶剤(C1)と、着色剤(E)と、任意成分の分散剤(F)とを混合する工程と、
工程II:樹脂(A2)と、反応性希釈剤(B)と、溶剤(C2)と、光重合開始剤と(D)、及び工程Iで得られた混合物を混合する工程と
をこの順に有する感光性樹脂組成物の製造方法であって、
前記樹脂(A1)および前記樹脂(A2)が、それぞれ、
芳香環骨格を有する構成単位(a)と、
カルボキシ基を有する構成単位(b)と、
構成単位(c)と、
炭素原子数7~20の橋かけ脂環式炭化水素基を有する構成単位(d)と
を有し、前記構成単位(c)は(メタ)アクリロイルオキシ基を有する構成単位(c-1)及びカルボキシ基と反応する官能基を有する構成単位(c-2)からなる群から選択される少なくとも一種であり、
前記樹脂(A1)および前記樹脂(A2)はそれぞれ、前記芳香環骨格を有する構成単位(a)の含有量が、構成単位の総量に対し、5~60モル%であることを特徴とする感光性樹脂組成物の製造方法。
本発明の第四の態様は、以下の特徴を有することも好ましい。
[13] 前記樹脂(A1)が、樹脂(A-1)および樹脂(A-2)のうちのいずれか一方であり、
前記樹脂(A2)が、前記樹脂(A-1)および前記樹脂(A-2)のうちの前記樹脂(A1)と異なるもう一方であり、
前記樹脂(A-1)は、前記芳香環骨格を有する構成単位(a)の含有量が、前記樹脂(A-1)の構成単位の総量に対し、5~30モル%であり、
前記樹脂(A-2)は、前記芳香環骨格を有する構成単位(a)の含有量が、樹脂(A-2)の構成単位の総量に対し、35モル%~50モル%である[12]に記載の感光性樹脂組成物の製造方法。
なお、本明細書において、「(メタ)アクリロイルオキシ基」とは、アクリロイルオキシ基及びメタクリロイルオキシ基から選択される少なくとも1種を意味し、「(メタ)アクリル酸」とは、アクリル酸及びメタクリル酸から選択される少なくとも1種を意味し、「(メタ)アクリレート」とは、アクリレート及びメタクリレートから選択される少なくとも1種を意味する。
「構成単位」とは、樹脂(A)を構成するモノマー単位である。
「構成単位の含有量」とは、構成モノマーの総モル数に対する含有量(モル%)である。
「モノマー由来構成単位」とは、樹脂(A)を構成するモノマーのうち特定のモノマーに由来する構成単位である。
以下、本発明の感光性樹脂組成物について詳細に説明する。
本実施形態の感光性樹脂組成物は、樹脂(A)、反応性希釈剤(B)、溶剤(C)、光重合開始剤(D)、及び着色剤(E)を含有する。本実施形態の感光性樹脂組成物は、必要に応じて分散剤(F)を含有しても良い。
本実施形態の樹脂(A)は、芳香環骨格を有する構成単位(a)(以下、単に「構成単位(a)」とも言う)と、カルボキシ基を有する構成単位(b)(以下、単に「構成単位(b)」とも言う)と、構成単位(c)と、炭素原子数7~20の橋かけ脂環式炭化水素基を有する構成単位(d)(以下、単に「構成単位(d)」とも言う)と、を少なくとも有する。前記構成単位(c)は、(メタ)アクリロイルオキシ基を有する構成単位(c-1)(以下、単に「構成単位(c-1)」とも言う)及びカルボキシ基と反応する官能基を有する構成単位(c-2)(以下、単に「構成単位(c-2)」とも言う)からなる群から選択される少なくとも一種である。
構成単位(a)は芳香環骨格を有する。樹脂(A)が構成単位(a)を有することにより、着色剤(E)の分散性がより優れた感光性樹脂組成物が得られる。特に、着色剤(E)として顔料を用いた場合に、樹脂(A)が構成単位(a)を有することによる分散性向上の効果が顕著に得られる。構成単位(a)は、共重合により樹脂(A)を製造するときに用いる重合性モノマーとして、芳香環含有重合性モノマー(m-1)を用いることにより導入する(芳香環含有重合性モノマー由来とする)。芳香環含有重合性モノマー(m-1)としては、例えば、スチレン、α-メチルスチレン、o-ビニルトルエン、m-ビニルトルエン、p-ビニルトルエン、o-クロロスチレン、m-クロロスチレン、p-クロロスチレン、o-メトキシスチレン、m-メトキシスチレン、p-メトキシスチレン、p-ニトロスチレン、p-シアノスチレン、p-アセチルアミノスチレン等の芳香族ビニル化合物;ベンジル(メタ)アクリレート、フェノキシエチル(メタ)アクリレート、フェノキシ-ポリエチレングリコール(メタ)アクリレート(商品名:ライトアクリレートP-200A、共栄化学社製)、o-フェノキシベンジル(メタ)アクリレート、m-フェノキシベンジル(メタ)アクリレート、p-フェノキシベンジル(メタ)アクリレート等が挙げられる。中でも、入手のし易さの現像性を向上させる観点から、スチレン、ベンジル(メタ)アクリレートが好ましい。これらの芳香環含有重合性モノマー(m-1)は、単独で用いてもよいし、又は2種以上を用いてもよい。すなわち、芳香環骨格を有する構成単位(a)が、スチレン由来の構成単位及びベンジル(メタ)アクリレート由来の構成単位からなる群から選択される一種以上であることが好ましい。
構成単位(b)は芳香環骨格を有さず、カルボキシ基を有する。カルボキシ基は、無水物として有していてもよい。カルボキシ基を有する構成単位(b)が、不飽和カルボン酸由来の構成単位(b-1)、多塩基酸由来の構成単位(b-2)、及び多塩基酸無水物由来の構成単位(b-3)からなる群から選択される一種以上であることが好ましい。構成単位(b)は、一般に以下の2つの方法により、樹脂(A)中に導入することができる。
これらのエポキシ基含有(メタ)アクリレート(m-3)は、単独で用いてもよいし、又は2種以上を用いてもよい。これらの中でも、入手のし易さ及び反応性の観点から、グリシジル(メタ)アクリレートが好ましい。また、カルボキシ基含有化合物としては、上述の第一の方法で挙げている不飽和カルボン酸を使用することができる。中でも、反応性の観点から、(メタ)アクリル酸が好ましい。
多塩基酸無水物(n-2)としては、上述の多塩基酸の無水物が挙げられる。これらの多塩基酸及び多塩基酸無水物は、単独で用いてもよいし、又は2種類以上を用いてもよい。これらの中でも、現像性を向上させる観点から、テトラヒドロフタル酸無水物が好ましい。
「構成単位(c-1)」
構成単位(c-1)は、芳香環骨格及びカルボキシ基を有さず、(メタ)アクリロイルオキシ基を有する。構成単位(c-1)は、一般に以下の2つの方法により、樹脂(A)中に導入することができる。
カルボキシ基含有(メタ)アクリル化合物(m-2)としては、例えば(メタ)アクリル酸、2-(メタ)アクリロイルオキシエチルコハク酸、2-(メタ)アクリロイルオキシエチルヘキサヒドロフタル酸、α-ブロモ(メタ)アクリル酸、β-フリル(メタ)アクリル酸などが挙げられる。中でも、樹脂(A)を合成する際の反応性や入手容易性の観点から、(メタ)アクリル酸が好ましい。これらのカルボキシ基含有(メタ)アクリル化合物は、単独で用いてもよいし、又は2種以上を用いてもよい。
カルボキシ基と反応する官能基含有重合性モノマーとしては、上述のエポキシ基含有(メタ)アクリレート(m-3)の他に、オキセタニル(メタ)アクリレート、(メタ)アクリル酸(3-メチルオキセタン-3-イル)メチル、(メタ)アクリル酸(3-エチルオキセタン-3-イル)メチル、(メタ)アクリル酸(3-メチルオキセタン-3-イル)エチル、(メタ)アクリル酸(3-エチルオキセタン-3-イル)エチル、(メタ)アクリル酸(3-クロロメチルオキセタン-3-イル)メチル、(メタ)アクリル酸(オキセタン-2-イル)メチル、(メタ)アクリル酸(2-メチルオキセタン-2-イル)メチル、(メタ)アクリル酸(2-エチルオキセタン-2-イル)メチル、(1-メチル-1-オキセタニル-2-フェニル)-3-(メタ)アクリレート、(1-メチル-1-オキセタニル)-2-トリフロロメチル-3-(メタ)アクリレート、(1-メチル-1-オキセタニル)-4-トリフロロメチル-2-(メタ)アクリレート等のオキセタニル基含有(メタ)アクリレート;2-イソシアナトエチル(メタ)アクリレート等のイソシアナト基含有(メタ)アクリレート等が挙げられる。これらのカルボキシ基と反応する官能基含有重合性モノマーは、単独で用いてもよいし、又は2種以上を用いてもよい。
構成単位(d)は、芳香環骨格、カルボキシ基、(メタ)アクリロイルオキシ基、及びカルボキシ基と反応する官能基を有さず、炭素原子数7~20の橋かけ脂環式炭化水素基を有する。樹脂(A)が構成単位(d)を有することにより、弾性回復率がより優れた硬化膜を与える感光性樹脂組成物を得ることができる。構成単位(d)は、共重合により樹脂(A)を製造するときに用いる重合性モノマーとして、炭素原子数7~20の橋かけ脂環式炭化水素基を有する重合性モノマー(m-5)を用いることにより導入する(炭素原子数7~20の橋かけ脂環式炭化水素基を有する重合性モノマー由来とする)。
炭素原子数7~20の橋かけ脂環式炭化水素基を有する重合性モノマー(m-5)としては、例えば、ジシクロペンテニル(メタ)アクリレート、トリシクロデカニル(メタ)アクリレート、イソボルニル(メタ)アクリレート、アダマンチル(メタ)アクリレート、ノルボルネン(ビシクロ[2.2.1]ヘプト-2-エン)、5-メチルビシクロ[2.2.1]ヘプト-2-エン、5-エチルビシクロ[2.2.1]ヘプト-2-エン、テトラシクロ[4.4.0.12,5.17,10]ドデカ-3-エン、8-メチルテトラシクロ[4.4.0.12,5.17,10]ドデカ-3-エン、8-エチルテトラシクロ[4.4.0.12,5.17,10]ドデカ-3-エン、ジシクロペンタジエン、トリシクロ[5.2.1.02,6]デカ-8-エン、トリシクロ[5.2.1.02,6]デカ-3-エン、トリシクロ[4.4.0.12,5]ウンデカ-3-エン、トリシクロ[6.2.1.01,8]ウンデカ-9-エン、トリシクロ[6.2.1.01,8]ウンデカ-4-エン、テトラシクロ[4.4.0.12,5.17,10.01,6]ドデカ-3-エン、8-メチルテトラシクロ[4.4.0.12,5.17,10.01,6]ドデカ-3-エン、8-エチリデンテトラシクロ[4.4.0.12,5.17,12]ドデカ-3-エン、8-エチリデンテトラシクロ[4.4.0.12,5.17,10.01,6]ドデカ-3-エン、ペンタシクロ[6.5.1.13,6.02,7.09,13]ペンタデカ-4-エン、ペンタシクロ[7.4.0.12,5.19,12.08,13]ペンタデカ-3-エン等が挙げられる。これらの中でも、耐熱性の観点から、トリシクロデカニル(メタ)アクリレートが好ましい。これらの炭素原子数7~20の橋かけ脂環式炭化水素基を有する重合性モノマーは、単独で用いてもよいし、又は2種以上を用いてもよい。
本実施形態の樹脂(A)は、必要に応じて、上述の構成単位以外の、エチレン性炭素-炭素二重結合を有するラジカル重合性モノマー(m-6)由来の構成単位(e)を有してもよい。
エチレン性炭素-炭素二重結合を有するラジカル重合性モノマー(m-6)としては、例えば、ブタジエン、イソプレン、クロロプレン等のジエン化合物;メチル(メタ)アクリレート、エチル(メタ)アクリレート、n-プロピル(メタ)アクリレート、イソ-プロピル(メタ)アクリレート、n-ブチル(メタ)アクリルレート、sec-ブチル(メタ)アクリレート、イソ-ブチル(メタ)アクリレート、tert-ブチル(メタ)アクリルレート、ベンジル(メタ)アクリレート、シクロペンチル(メタ)アクリレート、シクロヘキシル(メタ)アクリレート、メチルシクロヘキシル(メタ)アクリレート、エチルシクロヘキシル(メタ)アクリレート、1,4-シクロヘキサンジメタノールモノ(メタ)アクリレート、ロジン(メタ)アクリレート、ノルボルニル(メタ)アクリレート、5-メチルノルボルニル(メタ)アクリレート、5-エチルノルボルニル(メタ)アクリレート、テトラヒドロフルフリル(メタ)アクリレート、1,1,1-トリフルオロエチル(メタ)アクリレート、パーフルオロエチル(メタ)アクリレート、パーフルオロ-n-プロピル(メタ)アクリレート、パーフルオロ-イソプロピル(メタ)アクリレート、3-(N,N-ジメチルアミノ)プロピル(メタ)アクリレート、トリフェニルメチル(メタ)アクリレート、フェニル(メタ)アクリレート、クミル(メタ)アクリレート、4-フェノキシフェニル(メタ)アクリレート、フェノキシエチル(メタ)アクリレート、フェノキシポリエチレングリコール(メタ)アクリレート、ノニルフェノキシポリエチレングリコールモノ(メタ)アクリレート、ビフェニルオキシエチル(メタ)アクリレート、ナフタレン(メタ)アクリレート、アントラセン(メタ)アクリレート、(メタ)アクロイルオキシエチルイソシアネート(すなわち2-イソシアナトエチル(メタ)アクリレート)とε-カプロラクタムとの反応生成物、(メタ)アクロイルオキシエチルイソシアネートとプロピレングリコールモノメチルエーテルとの反応生成物等の(メタ)アクリル酸エステル化合物;(メタ)アクリル酸アミド、(メタ)アクリル酸N,N-ジメチルアミド、(メタ)アクリル酸N,N-ジエチルアミド、(メタ)アクリル酸N,N-ジプロピルアミド、(メタ)アクリル酸N,N-ジ-イソプロピルアミド、(メタ)アクリル酸アントラセニルアミド等の(メタ)アクリル酸アミド;(メタ)アクリル酸アニリド、(メタ)アクリロニトリル、アクロレイン、塩化ビニル、塩化ビニリデン、フッ化ビニル、フッ化ビニリデン、N-ビニルピロリドン、ビニルピリジン、酢酸ビニル、ビニルトルエン等のビニル化合物;シトラコン酸ジエチル、マレイン酸ジエチル、フマル酸ジエチル、イタコン酸ジエチル等の不飽和ジカルボン酸ジエステル化合物;N-フェニルマレイミド、N-シクロヘキシルマレイミド、N-ラウリルマレイミド、N-(4-ヒドロキシフェニル)マレイミド等のモノマレイミド化合物が挙げられる。
本実施形態で用いる樹脂(A)は、構成単位の総量(構成モノマーの総モル数)に対し、前記芳香環骨格を有する構成単位(a)の含有量が5~50モル%である。構成単位(a)の含有量が5モル%以上であれば、感光性樹脂組成物として良好な着色剤分散性を有し、現像性も良好である。構成単位(a)の含有量が50モル%以下であれば、構成単位(b)、構成単位(c)、および構成単位(d)の含有量を十分に確保できるため、感光性樹脂組成物としての光硬化性、現像性、また硬化物としての弾性回復率など、必要な特性のバランスが取れた感光性樹脂組成物が得られる。必要に応じて、前記構成単位(a)の含有量は、5~10モル%や、10~20モル%や、20~30モル%や、30~40モル%や、40~50モル%であってもよい。
構成単位(a)、構成単位(b)、構成単位(c)、構成単位(d)以外の構成単位(e)を導入する場合、構成単位の総量(構成モノマーの総モル数)に対し、0モル%超~60モル%であることが好ましく、0モル%超~50モル%であることがより好ましい。
構成単位(a)~(d)以外の構成単位(e)の導入例としては、構成単位(a)~(d)の導入に用いる上述の重合性モノマー以外のエチレン性炭素-炭素二重結合を有するラジカル重合性モノマーを用いて、樹脂(A)の合成を行う他、以下の導入例が挙げられる。例えば、前記樹脂(A-1)の好ましい構成の場合、エポキシ基含有(メタ)アクリレートを含む重合体である樹脂(A)前駆体のエポキシ基にカルボキシ基含有(メタ)アクリル化合物を付加させた場合には、未反応のエポキシ基が残存しているエポキシ基含有(メタ)アクリレート由来の構成単位については、カルボキシ基と反応する官能基を有する構成単位(c-2)としてカウントされる。また、カルボキシ基含有(メタ)アクリル化合物が付加してエポキシ基が消失したエポキシ基含有(メタ)アクリレート由来の構成単位については、構成単位(a)、構成単位(b)、構成単位(c)、構成単位(d)以外の構成単位(e)としてカウントされる。
本実施形態で用いる樹脂(A)を得るための共重合反応、又は付加反応を行う前の樹脂(A)前駆体を得るための共重合反応における反応条件は、常法に従って適宜設定すればよい。共重合反応は、例えば、溶媒中に共重合させるための重合性モノマーと重合開始剤とを滴下しながら、好ましくは50~150℃、より好ましくは60~140℃で、1~12時間程度の反応を行えばよい。樹脂(A)前駆体への付加反応は、溶媒中に樹脂(A)前駆体と付加反応させるためのモノマーとを加え、付加反応触媒を更に添加し、好ましくは50~150℃、より好ましくは80~130℃で、3~12時間程度の反応を行えばよい。なお、この付加反応では、樹脂(A)前駆体を得るための共重合反応に用いた溶媒が含まれていても問題は無い。そのため、樹脂(A)前駆体を得るための共重合反応が終了した後に、溶媒を除去することなく、続けて付加反応を行うことができる。
本発明で用いる樹脂(A)は、ゲルパーミエーションクロマトグラフィー(GPC)によるポリスチレン換算で得られる重量平均分子量が、1000~50000であることが好ましく、3000~40000であることがより好ましく、5000~20000であることが更に好ましい。重量平均分子量が1000以上であれば、アルカリ現像後にパターンの欠けが発生しないため好ましい。一方、重量平均分子量が50000以下であれば、現像時間が適度な時間となり、使用上実用的であるため好ましい。
樹脂(A)の配合量は、特に限定されないが、溶剤(C)を除く感光性樹脂組成物の総量100質量部に対し、5~40質量部であることが好ましく、10~30質量部であることがより好ましい。樹脂(A)の配合量が5質量%以上であれば、良好な硬化性を有するため好ましい。一方、樹脂(A)の配合量が40質量部以下であれば、良好な塗布性を有するため好ましい。
本実施形態に使用される反応性希釈剤(B)は、分子内に少なくとも一つのエチレン性不飽和基を有する化合物である。中でもエチレン性不飽和基を複数有する化合物が好ましい。反応性希釈剤(B)を用いることにより、硬化膜の強度や、基材に対する密着性を向上させることができる。
本実施形態で使用する溶剤(C)は、樹脂(A)を溶解することができ且つ樹脂(A)と反応しない不活性な溶剤であれば特に限定されず、任意に選択することができる。また、溶剤(C)は、前述の反応性希釈剤(B)と相溶性を有することが好ましい。溶剤(C)としては、樹脂(A)を製造する際に用いることができる溶媒と同じものを用いることができる。溶剤(C)としては、プロピレングリコールモノメチルエーテル等の(ポリ)アルキレングリコールモノアルキルエーテル及びプロピレングリコールモノメチルエーテルアセテート等の(ポリ)アルキレングリコールモノアルキルエーテルアセテートが好ましい。
本実施形態に用いる光重合開始剤(D)としては、特に限定されないが、例えば、ベンゾイン、ベンゾインメチルエーテル、ベンゾインエチルエーテル、ベンゾインブチルエーテル等のベンゾイン化合物;アセトフェノン、2,2-ジメトキシ-2-フェニルアセトフェノン、1,1-ジクロロアセトフェノン、4-(1-t-ブチルジオキシ-1-メチルエチル)アセトフェノン、2-メチル-1-[4-(メチルチオ)フェニル]-2-モルホリノ-プロパン-1-オン、2-ベンジル-2-ジメチルアミノ-1-(4-モルホリノフェニル)ブタノン-1等のアセトフェノン化合物;2-メチルアントラキノン、2-アミルアントラキノン、2-t-ブチルアントラキノン、1-クロロアントラキノン等のアントラキノン化合物;キサントン、チオキサントン、2,4-ジメチルチオキサントン、2,4-ジイソプロピルチオキサントン、2-クロロチオキサントン等のキサントン化合物;アセトフェノンジメチルケタール、ベンジルジメチルケタール等のケタール化合物;ベンゾフェノン、4-(1-t-ブチルジオキシ-1-メチルエチル)ベンゾフェノン、3,3’,4,4’-テトラキス(t-ブチルジオキシカルボニル)ベンゾフェノン等のベンゾフェノン化合物;アシルホスフィンオキサイド化合物等が挙げられる。これらの光重合開始剤は、単独で用いてもよいし、又は2種以上を用いてもよい。
着色剤(E)は、溶剤(C)に溶解又は分散するものであればよく、特に限定されない。着色剤(E)としては、例えば、染料及び顔料が挙げられる。着色剤(E)としては、染料のみ用いてもよいし、顔料のみ用いてもよいし、染料と顔料とを組み合わせて用いてもよい。本実施形態の感光性樹脂組成物の樹脂硬化膜をブラックマトリックス、カラーフィルター、ブラックカラムスペーサのいずれかとして用いる場合、上記の着色剤(E)は、樹脂硬化膜で形成される部材の目的などに応じて、単独で又は2種以上を組み合わせて用いることができる。例えば、着色剤(E)として、黒色のものを用いた場合、感光性樹脂組成物の樹脂硬化膜は、ブラックマトリックスおよびブラックカラムスペーサとして好適なものとなる。
これらの染料は、単独で用いてもよいし、2種以上を混合して用いてもよい。
黒色顔料としては、本実施形態の感光性樹脂組成物の樹脂硬化膜を備える画像表示素子の光学密度の観点から、有機黒色顔料が好ましく、ラクタム系有機ブラックがより好ましい。
本実施形態の感光性樹脂組成物は、分散剤(F)を含有しても良い。分散剤(F)は、公知の分散剤を特に制限なく用いることができる。分散剤(F)を用いることにより、特に着色剤(E)として顔料を用いた場合の着色剤分散性が向上する。分散剤(F)としては、経時の分散安定性に優れることから高分子分散剤を用いることが好ましい。高分子分散剤は任意に選択できるが、例えば、ウレタン系分散剤、ポリエチレンイミン系分散剤、ポリオキシエチレンアルキルエーテル系分散剤、ポリオキシエチレングリコールジエステル系分散剤、ソルビタン脂肪族エステル系分散剤、脂肪族変性エステル系分散剤などが挙げられる。このような高分子分散剤として、EFKA(登録商標、BASFジャパン社製)、Disperbyk(登録商標、ビックケミー社製)、ディスパロン(登録商標、楠本化成株式会社製)、SOLSPERSE(登録商標、ゼネカ社製)等の商品名で市販されているものを用いてもよい。分散剤の配合量は、使用する顔料等の種類に応じて適宜設定すればよい。
本実施形態の感光性樹脂組成物は、公知の混合装置を用いて、上述の各成分を混合することによって製造することができる。
工程I:樹脂(A1)、溶剤(C1)、着色剤(E)、及び任意成分の分散剤(F)を混合する工程。
工程II:樹脂(A2)、反応性希釈剤(B)、溶剤(C2)、光重合開始剤(D)、及び工程Iで得られた混合物を混合する工程。
本実施形態の樹脂硬化膜は、本実施形態の感光性樹脂組成物を光硬化させた樹脂硬化膜である。
本実施形態の樹脂硬化膜は、着色剤分散性、耐溶剤性及び弾性回復率が良好であるため、画像表示素子の部材であるブラックマトリックス、カラーフィルター、ブラックカラムスペーサ、BPDLとして好適である。
本実施形態の樹脂硬化膜は、例えば、以下に示す方法により製造できる。
まず、樹脂硬化膜の被形成面上に感光性樹脂組成物を塗布し、樹脂層(塗膜)を形成する。次いで、所定のパターンのマスクを介して、樹脂層を露光し、露光部分を光硬化させる。次に、樹脂層の未露光部分を現像液で現像し、所定のパターンを有する樹脂硬化膜とする。その後、必要に応じて、樹脂硬化膜のポストベーク(熱処理)を行う。
樹脂層を露光する際には、所定のパターンのハーフトーンマスクを用いてもよい。この場合、未露光部分及び半露光部分を現像液で現像して、所定のパターンを有する樹脂硬化膜とする。
感光性樹脂組成物を塗布した後には、必要に応じて、循環式オーブン、赤外線ヒーター、ホットプレート等の加熱手段を用いて加熱することにより、樹脂層に含まれる溶剤(C)を揮発させてもよい。塗布後の加熱条件は、特に限定されず、感光性樹脂組成物の組成に応じて適宜設定すればよい。例えば、塗布後の加熱温度は50℃~120℃とすることができ、加熱時間は30秒~30分間とすることができる。
画像表示素子の具体例としては、液晶表示素子、有機EL表示素子等が挙げられる。画像表示素子を製造するにあたっては、制限はなく、常法に従って製造を行うことができる。
[合成例1]
攪拌装置、滴下ロート、コンデンサー、温度計及びガス導入管を備えたフラスコに、溶媒としてプロピレングリコールモノメチルエーテルアセテート140gを加え、フラスコ内を窒素ガス置換しながら攪拌し、120℃に昇温させた。
次いで、トリシクロデカニルメタクリレート 68.0g(モル比0.3)、スチレン 11.0g(モル比0.1)及びグリシジルメタクリレート 88.0g(モル比0.6)からなるモノマー混合物に、t-ブチルパーオキシ-2-エチルヘキサノエート(重合開始剤、日油株式会社製、パーブチル(登録商標)O) 18.4gを添加したものを別途用意した。このモノマー及び重合開始剤の混合物を、滴下ロートから2時間にわたってフラスコ中に滴下した。滴下終了後、120℃で更に2時間攪拌して共重合反応を行い、樹脂(A-1)の前駆体を生成させた。その後、フラスコ内を空気に置換して、アクリル酸 43.4g(モル比0.58)、トリフェニルホスフィン(触媒) 1.1g、メチルハイドロキノン(重合禁止剤) 0.1gを、上記の樹脂(A-1)前駆体溶液中に投入した。その後、110℃で10時間にわたり反応を続けた。次いで、フラスコ内にテトラヒドロフタル酸無水物 61.0g(モル比0.39)を添加し、110℃で3時間にわたり反応を続けて、樹脂(A-1)(樹脂試料No.p1)の溶液を得た。この樹脂溶液中に含まれる樹脂(A-1)の酸価は79KOHmg/gであり、重量平均分子量は8300、不飽和基当量は480であった。
この樹脂溶液にプロピレングリコールモノメチルエーテルアセテートを更に添加して、合成例1の樹脂(A-1)溶液(固形分濃度44質量%)を調製した。なお、固形分とは、樹脂溶液を130℃で2時間加熱したときの加熱残分を意味し、樹脂(A-1)と重合開始剤とが主成分となる。
表1の材料を用いる以外は、合成例1と同様にして、合成例2~5、比較合成例1の樹脂(A-1)(樹脂試料No.p2~5、No.cp1)の溶液を得た。この樹脂溶液にプロピレングリコールモノメチルエーテルアセテートを更に添加して、合成例2~5、及び比較合成例1の樹脂(A-1)溶液(固形分濃度44質量%)を調製した。
それぞれ、樹脂(A-1)(樹脂試料No.p2~5、No.cp1)の酸価、重量平均分子量、不飽和基当量の値を表1に示す。
攪拌装置、滴下ロート、コンデンサー、温度計及びガス導入管を備えたフラスコに、溶媒としてプロピレングリコールモノメチルエーテルアセテート140gを加え、フラスコ内を窒素ガス置換しながら攪拌し、120℃に昇温させた。
次いで、トリシクロデカニルメタクリレート 24.9g(モル比0.1)、ベンジルメタクリレート 99.6g(モル比0.5)及びメタクリル酸 38.9g(モル比0.4)からなるモノマー混合物に、t-ブチルパーオキシ-2-エチルヘキサノエート(重合開始剤、日油株式会社製、パーブチル(登録商標)O) 4.3gを添加したものを別途用意した。このモノマー及び重合開始剤の混合物を、滴下ロートから2時間にわたってフラスコ中に滴下した。滴下終了後、120℃で更に2時間攪拌して共重合反応を行い、樹脂(A-2)の前駆体を合成した。その後、フラスコ内を空気に置換して、グリシジルメタクリレート 24.1g(モル比0.15)、トリフェニルホスフィン(触媒) 1.8g及びメチルハイドロキノン(重合禁止剤) 1.0gを、上記の樹脂(A-2)前駆体溶液中に投入した。その後、110℃で10時間にわたり反応を続けて、樹脂(A-2)の溶液を得た。この樹脂溶液中に含まれる樹脂(A-2)の酸価は80KOHmg/gであり、重量平均分子量は9000、不飽和基当量は1200であった。
この樹脂溶液にプロピレングリコールモノメチルエーテルアセテートを更に添加して、合成例6の樹脂(A-2)(樹脂試料No.p6)の溶液(固形分濃度40質量%)を調製した。
表1の材料を用いる以外は、合成例6と同様にして、樹脂(A-2)の溶液を得た。この樹脂溶液にプロピレングリコールモノメチルエーテルアセテートを更に添加して、合成例7及び比較合成例2の樹脂(A-2)(樹脂試料No.p7、No.cp2)の溶液(固形分濃度40質量%)を調製した。
それぞれ、樹脂(A-2)(樹脂試料No.p1~p7、mp1、mp2)の酸価、重量平均分子量、不飽和基当量の値を表1に示す。
合成例に記載された、酸価、不飽和基当量及び重量平均分子量は、以下に記載する方法によって得られた値である。
(1)酸価:JIS K6901 5.3.2に従ってブロモチモールブルーとフェノールレットの混合指示薬を用いて測定された樹脂(A)の酸価である。樹脂(A)1g中に含まれる酸性成分を中和するのに要する水酸化カリウムのmg数を意味する。
(2)不飽和基当量:重合性不飽和結合のモル数当たりの重合体の質量であり、モノマーの使用量に基づいて算出した計算値である。
(3)重量平均分子量(Mw):ゲルパーミエーションクロマトグラフィー(GPC)を用いて、下記条件にて測定した標準ポリスチレン換算した重量平均分子量を意味する。 カラム:ショウデックス(登録商標) LF-804+LF-804(昭和電工株式会社製)
カラム温度:40℃
試料:共重合体の0.2%テトラヒドロフラン溶液
展開溶媒:テトラヒドロフラン
検出器:示差屈折計(ショウデックス(登録商標) RI-71S)(昭和電工株式会社製)
流速: 1mL/min
樹脂(A1)として、合成例1の樹脂(A-1)(樹脂試料No.p1)を固形分換算で10.7質量部、溶剤(C1)としてプロピレングリコールモノメチルエーテルアセテート(PGMEA)200質量部、着色剤(E)として3,7-ビス(2-オキソ-1H-インドール3(2H)-イリデン)ベンゾ[1,2-b:4,5-b’]ジフラン-2,6-(3H,7H)-ジオン(IBS0100CF、製品名:Irgaphor Black S 0100CF、BASF社製)35.7質量部、分散剤(F)としてアジスパーPB822(PB822、味の素ファインテクノ株式会社製)3.7質量部をペイントシェイカーで3時間混合することにより、ミルベース(試料No.m1)を作製した。合成例1の樹脂(A-1)溶液に含まれていた溶剤の量は、配合成分としての溶剤(C1)の中に合算されている。
下記表2に記載の配合(質量部基準)を用いる以外は作製例1と同様にして、作製例2~4,6,7、比較作製例1,2のミルベース(試料No.m2~m4、m6、m7、cm1、cm2)を作製した。
樹脂(A2)として、合成例1の樹脂(A-1)(樹脂試料No.p1)を固形分換算で9.3質量部、反応性希釈剤(B)としてジペンタエリスリトールヘキサアクリレート(DPHA、製品名:A-DPH、新中村工業株式会社製)37質量部、溶剤(C2)としてプロピレングリコールモノメチルエーテルアセテート33質量部、光重合開始剤(D)としてエタノン,1-[9-エチル-6-(2-メチルベンゾイル)-9H-カルバゾール-3-イル]-,1-(o-アセチルオキシム)(OXE 02、製品名:IRGACURE OXE 02、BASF社製)3.7質量部、および作製例1のミルベース(ミルベース試料No.m1、合成例1の樹脂(A-1)(樹脂試料No1)を固形分換算で10.7質量部、PGMEAを200質量部、IBS0100CFを35.7質量部、及びアジスパーPB822を3.7質量部の混合物)を混合して感光性樹脂組成物を調整した。表3の配合において、ミルベースに含まれていた樹脂(A1)10.7質量部(表3において、「*1」を付けた。「*1」は、ミルベースに含まれていた樹脂であることを意味する。)と新たに加える樹脂(A2)(樹脂試料No.p1)9.3質量部は、樹脂(A)成分として固形分換算で合算して記載した。合成例1の樹脂(A-1)溶液に含まれていた溶剤の量は、配合成分としての溶剤(C)の中に合算されている。また、ミルベースに含まれていた溶剤(C1)200質量部と、新たに加えた溶剤(C2)33質量部は、溶剤(C)成分として合算して記載した。
表3~5の配合を用いる以外は実施例1と同様にして、実施例2~17、比較例1~8の感光性樹脂組成物を調整した。
以下に示す方法により感光性樹脂組成物の着色剤分散性を評価した。
まず、実施例1~17及び比較例1~8の感光性樹脂組成物を10cm×10cmのIZO基板上に、塗膜の厚さが1.5μmとなるようにスピンコートした。この後、90℃で3分間加熱することにより溶剤を揮発させた。次に、塗膜の全面をウシオ電機株式会社製マルチライトML-251D/Bと照射光学ユニットPM25C-100を用いて露光(露光量50mJ/cm2)し、光硬化させた。その後、0.2質量%の水酸化カリウム水溶液で120秒間現像し、更に230℃で30分間ポストベークすることで、目的とする硬化塗膜を得た。透過濃度計(361T、X-lite社)を用いることにより、厚さ1μmの硬化塗膜についての光学密度(Optical Density:OD)を測定した。結果を表6~8に示す。光学密度が高いほど着色剤分散性に優れているといえる。
光学密度と同様の方法で基板上に2.5μmの塗膜を作製し25℃において、圧縮変位及び弾性回復率を、弾性測定装置(DUH-W201S、株式会社島津製作所)を以下の測定条件に従って用いることにより測定した。
パターンを押す押圧体として、50μmの直径を有する平らな押圧体を、荷重を負荷-除荷する方法で用いた。弾性回復率は、比較した群間で識別可能な結果を得るために300mNの荷重を加える試験で測定した。3gf/秒の荷重速度及び3秒の保持時間を一定に維持した。弾性回復率に関して、平らな押圧体に3秒間一定に荷重をかけ、次に、荷重前後のパターンの実際の弾性回復率を、三次元厚さ測定装置を用いることにより測定した。弾性回復率は、10分の回復時間の経過後に回復した距離の、一定の力を加えた際に圧縮された距離(圧縮変位)に対する比を意味し、それは次式で表される。
弾性回復率(%)=[(回復距離/圧縮変位)×100]
結果を6~8に示す。
実施例1~実施例17及び比較例1~比較例8の感光性樹脂組成物を10cm×10cmのIZO基板(表面にIZOからなる配線パターンが形成されている基板)上に、塗膜の厚さが1.5μmとなるようにスピンコートした。この後、IZO基板を90℃で3分間加熱することにより溶剤を揮発させた。次に、塗膜にパターンマスクを載せ、マスクの上からウシオ電機株式会社製マルチライトML-251D/Bと照射光学ユニットPM25C-100を用いて露光(露光量120mJ/cm2)し、光硬化させた。その後、0.2質量%の水酸化カリウム水溶液で現像し、現像時間(未露光部が洗い流され始めてからパターンの変化がなくなるまでの時間)と現像形態を確認した。
現像形態は未露光部が剥がれながら洗い流される剥離形態と未露光部が溶けながら洗い流される溶解形態があるが剥離が起こると表示不良が起こる可能性があるため溶解が好ましい。粉溶解はわずかに未露光部が粉として残った状態で溶解する形態をいう。
結果を6~8に示す。
◎(優): 現像時間が10~40秒および現像形態が完全溶解
○(可): 現像時間が10~40秒および現像形態が粉溶解
×(不可): 現像時間41秒以上および現像形態が完全剥離もしくは粉剥離
本発明の感光性樹脂組成物は、着色剤分散性、現像性及び弾性回復率に優れているため、本発明の感光性樹脂組成物を硬化した樹脂硬化膜は、着色剤分散性及び弾性回復率に優れる。そのような樹脂硬化膜は、画像表示素子の部材であるブラックマトリックス、カラーフィルター、ブラックカラムスペーサ、BPDLとして好適である。
Claims (13)
- 樹脂(A)と、
反応性希釈剤(B)と、
溶剤(C)と、
光重合開始剤(D)と、
着色剤(E)と、
を含有する感光性樹脂組成物であって、
前記樹脂(A)が、
芳香環骨格を有する構成単位(a)と、
カルボキシ基を有する構成単位(b)と、
構成単位(c)と、
炭素原子数7~20の橋かけ脂環式炭化水素基を有する構成単位(d)と、
を有し、
前記構成単位(c)は、
(メタ)アクリロイルオキシ基を有する構成単位(c-1)、及び
カルボキシ基と反応する官能基を有する構成単位(c-2)からなる群から選択される少なくとも一種であり、
前記樹脂(A)の構成単位の総量に対し、前記芳香環骨格を有する構成単位(a)の含有量が5~50モル%であることを特徴とする感光性樹脂組成物。 - 前記カルボキシ基を有する構成単位(b)が、不飽和カルボン酸由来の構成単位(b-1)、多塩基酸由来の構成単位(b-2)、及び多塩基酸無水物由来の構成単位(b-3)からなる群から選択される一種以上である請求項1に記載の感光性樹脂組成物。
- 前記樹脂(A)が、(メタ)アクリロイルオキシ基を有する構成単位(c-1)を有する請求項1又は2に記載の感光性樹脂組成物。
- 前記芳香環骨格を有する構成単位(a)が、スチレン由来の構成単位及びベンジル(メタ)アクリレート由来の構成単位からなる群から選択される一種以上である請求項1~3のいずれか1項に記載の感光性樹脂組成物。
- 前記樹脂(A)が、樹脂(A-1)と樹脂(A-2)とを含有し、
前記樹脂(A-1)は、前記芳香環骨格を有する構成単位(a)の含有量が、樹脂(A-1)の構成単位の総量に対し、5~30モル%であり、
前記樹脂(A-2)は、前記芳香環骨格を有する構成単位(a)の含有量が、樹脂(A-2)の構成単位の総量に対し、35モル%~50モル%である請求項1~4のいずれか1項に記載の感光性樹脂組成物。 - 前記樹脂(A)の総量に対し、前記樹脂(A-1)を10~90質量%含有し、前記樹脂(A-2)を10~90質量%含有し、
前記樹脂(A-1)が、エポキシ基を有する樹脂(A-1)前駆体のエポキシ基にカルボキシ基含有(メタ)アクリル化合物が付加し、さらに前記エポキシ基の開環により生じたヒドロキシ基に多塩基酸または多塩基酸無水物が付加した樹脂であり、
前記樹脂(A-2)が、カルボキシ基を有する樹脂(A-2)前駆体のカルボキシ基の一部にエポキシ基含有(メタ)アクリレート又はイソシアナト基含有(メタ)アクリレートが付加した樹脂であり、
前記エポキシ基を有する樹脂(A-1)前駆体は、芳香環含有重合性モノマー、エポキシ基含有(メタ)アクリレート、及び炭素原子数7~20の橋かけ脂環式炭化水素基を有する重合性モノマーの重合体であり、
前記カルボキシ基を有する樹脂(A-2)前駆体は、芳香環含有重合性モノマー、カルボキシ基含有重合性モノマー、炭素原子数7~20の橋かけ脂環式炭化水素基を有する重合性モノマーの重合体である請求項1~5のいずれか1項に記載の感光性樹脂組成物。 - 前記着色剤(E)が、有機黒色顔料である請求項1~6のいずれか1項に記載の感光性樹脂組成物。
- 分散剤(F)をさらに含有する請求項1~7のいずれか1項に記載の感光性樹脂組成物。
- 前記樹脂(A)を2~20質量%を含有し、
前記反応性希釈剤(B)を3~20質量%を含有し、
前記溶剤(C)を50~90質量%を含有し、かつ
前記着色剤(E)を3~30質量%を含有する請求項1~8のいずれか1項に記載の感光性樹脂組成物。 - 請求項1~9のいずれか1項に記載の感光性樹脂組成物の硬化物からなるブラックカラムスペーサ。
- 請求項10に記載のブラックカラムスペーサを備えることを特徴とする画像表示素子。
- 工程I:樹脂(A1)と、溶剤(C1)と、着色剤(E)と、任意成分の分散剤(F)とを混合する工程と、
工程II:樹脂(A2)と、反応性希釈剤(B)と、溶剤(C2)と、光重合開始剤と(D)、及び工程Iで得られた混合物を混合する工程と
をこの順に有する感光性樹脂組成物の製造方法であって、
前記樹脂(A1)および前記樹脂(A2)が、それぞれ、
芳香環骨格を有する構成単位(a)と、
カルボキシ基を有する構成単位(b)と、
構成単位(c)と、
炭素原子数7~20の橋かけ脂環式炭化水素基を有する構成単位(d)と
を有し、
前記構成単位(c)は(メタ)アクリロイルオキシ基を有する構成単位(c-1)及びカルボキシ基と反応する官能基を有する構成単位(c-2)からなる群から選択される少なくとも一種であり、
前記樹脂(A1)および前記樹脂(A2)はそれぞれ、前記芳香環骨格を有する構成単位(a)の含有量が、構成単位の総量に対し、5~60モル%であることを特徴とする感光性樹脂組成物の製造方法。 - 前記樹脂(A1)が、樹脂(A-1)および樹脂(A-2)のうちのいずれか一方であり、
前記樹脂(A2)が、前記樹脂(A-1)および前記樹脂(A-2)のうちの前記樹脂(A1)と異なるもう一方であり、
前記樹脂(A-1)は、前記芳香環骨格を有する構成単位(a)の含有量が、前記樹脂(A-1)の構成単位の総量に対し、5~30モル%であり、
前記樹脂(A-2)は、前記芳香環骨格を有する構成単位(a)の含有量が、樹脂(A-2)の構成単位の総量に対し、35モル%~50モル%である請求項12に記載の感光性樹脂組成物の製造方法。
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