TWI896819B - 感光性樹脂組成物及感光性樹脂組成物之製造方法 - Google Patents

感光性樹脂組成物及感光性樹脂組成物之製造方法

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Publication number
TWI896819B
TWI896819B TW110144962A TW110144962A TWI896819B TW I896819 B TWI896819 B TW I896819B TW 110144962 A TW110144962 A TW 110144962A TW 110144962 A TW110144962 A TW 110144962A TW I896819 B TWI896819 B TW I896819B
Authority
TW
Taiwan
Prior art keywords
resin
meth
constituent unit
group
acrylate
Prior art date
Application number
TW110144962A
Other languages
English (en)
Chinese (zh)
Other versions
TW202231674A (zh
Inventor
林俊亮
木下健宏
Original Assignee
日商力森諾科股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日商力森諾科股份有限公司 filed Critical 日商力森諾科股份有限公司
Publication of TW202231674A publication Critical patent/TW202231674A/zh
Application granted granted Critical
Publication of TWI896819B publication Critical patent/TWI896819B/zh

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/26—Esters containing oxygen in addition to the carboxy oxygen
    • C08F220/30—Esters containing oxygen in addition to the carboxy oxygen containing aromatic rings in the alcohol moiety
    • C08F220/301—Esters containing oxygen in addition to the carboxy oxygen containing aromatic rings in the alcohol moiety and one oxygen in the alcohol moiety
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/26—Esters containing oxygen in addition to the carboxy oxygen
    • C08F220/32—Esters containing oxygen in addition to the carboxy oxygen containing epoxy radicals
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Optics & Photonics (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Engineering & Computer Science (AREA)
  • Materials For Photolithography (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
TW110144962A 2020-12-11 2021-12-02 感光性樹脂組成物及感光性樹脂組成物之製造方法 TWI896819B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2020-205539 2020-12-11
JP2020205539 2020-12-11

Publications (2)

Publication Number Publication Date
TW202231674A TW202231674A (zh) 2022-08-16
TWI896819B true TWI896819B (zh) 2025-09-11

Family

ID=81972881

Family Applications (1)

Application Number Title Priority Date Filing Date
TW110144962A TWI896819B (zh) 2020-12-11 2021-12-02 感光性樹脂組成物及感光性樹脂組成物之製造方法

Country Status (5)

Country Link
JP (1) JPWO2022124052A1 (https=)
KR (1) KR102830809B1 (https=)
CN (1) CN116529670B (https=)
TW (1) TWI896819B (https=)
WO (1) WO2022124052A1 (https=)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN115677939A (zh) * 2022-11-25 2023-02-03 茂名清荷科技有限公司 一种感光性接枝聚合物以及含有其的感光性树脂组合物

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW201809884A (zh) * 2016-05-27 2018-03-16 日商昭和電工股份有限公司 黑色柱狀間隔物形成用感光性樹脂組成物、黑色柱狀間隔物及圖像顯示裝置

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JP3101986B2 (ja) * 1992-07-24 2000-10-23 ジェイエスアール株式会社 耐熱性感放射線性樹脂組成物
JPH11327127A (ja) * 1998-05-12 1999-11-26 Mitsubishi Chemical Corp 遮光性感光性樹脂組成物及びそれを用いたカラーフィルター
JP2004004531A (ja) * 2002-01-30 2004-01-08 Sumitomo Chem Co Ltd 感光性樹脂組成物
JP2006043643A (ja) 2004-08-06 2006-02-16 Hiroshima Univ ビスフェノール類縁化合物の除去方法
CN101178541B (zh) * 2006-10-31 2012-04-25 三洋化成工业株式会社 感光性树脂组合物
KR20120064191A (ko) * 2010-12-09 2012-06-19 동우 화인켐 주식회사 안료 분산 조성물, 착색 수지 조성물, 컬러 필터와 이를 구비한 화상 표시 장치
JP6078970B2 (ja) * 2012-03-30 2017-02-15 住友化学株式会社 着色感光性樹脂組成物
JP2015222279A (ja) 2012-09-26 2015-12-10 昭和電工株式会社 樹脂組成物、感光性樹脂組成物、及びカラーフィルター
JP6157193B2 (ja) * 2013-04-22 2017-07-05 昭和電工株式会社 （メタ）アクリレート系ポリマー、該ポリマーを含む組成物及びその用途
JP2015017244A (ja) * 2013-06-12 2015-01-29 富士フイルム株式会社 硬化性組成物、硬化膜、近赤外線カットフィルタ、カメラモジュールおよびカメラモジュールの製造方法
KR101987107B1 (ko) * 2014-03-31 2019-06-10 동우 화인켐 주식회사 착색 감광성 수지 조성물 및 이로부터 제조되는 컬러 필터
JP6401529B2 (ja) * 2014-07-15 2018-10-10 東京応化工業株式会社 感光性組成物
JP2017181798A (ja) * 2016-03-30 2017-10-05 アーゼッド・エレクトロニック・マテリアルズ（ルクセンブルグ）ソシエテ・ア・レスポンサビリテ・リミテ 低温硬化可能なネガ型感光性組成物
JP2018145263A (ja) * 2017-03-02 2018-09-20 東京応化工業株式会社 硬化性組成物、硬化物、及び硬化物の製造方法
CN110997740B (zh) * 2017-08-03 2023-01-17 昭和电工株式会社 共聚物以及滤色器用感光性树脂组合物
KR102626467B1 (ko) * 2017-08-03 2024-01-17 가부시끼가이샤 레조낙 감광성 수지 조성물 및 그 제조 방법
JP6403357B1 (ja) * 2017-12-21 2018-10-10 昭和電工株式会社 樹脂組成物、感光性樹脂組成物、樹脂硬化膜、画像表示素子およびカラーフィルター

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW201809884A (zh) * 2016-05-27 2018-03-16 日商昭和電工股份有限公司 黑色柱狀間隔物形成用感光性樹脂組成物、黑色柱狀間隔物及圖像顯示裝置

Also Published As

Publication number Publication date
KR102830809B1 (ko) 2025-07-04
CN116529670A (zh) 2023-08-01
CN116529670B (zh) 2026-03-31
WO2022124052A1 (ja) 2022-06-16
KR20230098322A (ko) 2023-07-03
TW202231674A (zh) 2022-08-16
JPWO2022124052A1 (https=) 2022-06-16

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