KR102604960B1 - 홀로그래픽 간섭법의 방법 및 시스템 - Google Patents
홀로그래픽 간섭법의 방법 및 시스템 Download PDFInfo
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- KR102604960B1 KR102604960B1 KR1020207000327A KR20207000327A KR102604960B1 KR 102604960 B1 KR102604960 B1 KR 102604960B1 KR 1020207000327 A KR1020207000327 A KR 1020207000327A KR 20207000327 A KR20207000327 A KR 20207000327A KR 102604960 B1 KR102604960 B1 KR 102604960B1
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- South Korea
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- holographic
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- 238000000034 method Methods 0.000 title claims description 36
- 238000005210 holographic interferometry Methods 0.000 title claims description 7
- 230000003287 optical effect Effects 0.000 claims abstract description 91
- 238000003384 imaging method Methods 0.000 claims abstract description 41
- 230000010287 polarization Effects 0.000 claims description 24
- 238000005286 illumination Methods 0.000 claims description 23
- 238000005259 measurement Methods 0.000 claims description 16
- 230000001427 coherent effect Effects 0.000 claims description 13
- 238000010586 diagram Methods 0.000 description 41
- 238000003860 storage Methods 0.000 description 19
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 8
- 230000008859 change Effects 0.000 description 8
- 230000006870 function Effects 0.000 description 7
- 238000012545 processing Methods 0.000 description 7
- 230000002452 interceptive effect Effects 0.000 description 6
- 238000004458 analytical method Methods 0.000 description 5
- 230000005540 biological transmission Effects 0.000 description 5
- 238000006073 displacement reaction Methods 0.000 description 5
- 239000007787 solid Substances 0.000 description 5
- 230000003595 spectral effect Effects 0.000 description 5
- -1 transition metal nitride Chemical class 0.000 description 5
- 229910021529 ammonia Inorganic materials 0.000 description 4
- 238000004590 computer program Methods 0.000 description 4
- 239000000835 fiber Substances 0.000 description 4
- 238000001914 filtration Methods 0.000 description 4
- 239000002245 particle Substances 0.000 description 4
- 239000004065 semiconductor Substances 0.000 description 4
- 229910052723 transition metal Inorganic materials 0.000 description 4
- 150000001875 compounds Chemical class 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- 230000000670 limiting effect Effects 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 238000012986 modification Methods 0.000 description 3
- 230000004048 modification Effects 0.000 description 3
- 230000008569 process Effects 0.000 description 3
- 230000000930 thermomechanical effect Effects 0.000 description 3
- 238000013459 approach Methods 0.000 description 2
- 238000004422 calculation algorithm Methods 0.000 description 2
- 238000004364 calculation method Methods 0.000 description 2
- 238000012512 characterization method Methods 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 238000004891 communication Methods 0.000 description 2
- 150000004820 halides Chemical class 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- 239000004615 ingredient Substances 0.000 description 2
- 239000011159 matrix material Substances 0.000 description 2
- 238000000691 measurement method Methods 0.000 description 2
- 230000001089 mineralizing effect Effects 0.000 description 2
- 230000001902 propagating effect Effects 0.000 description 2
- 238000004088 simulation Methods 0.000 description 2
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 1
- NRTOMJZYCJJWKI-UHFFFAOYSA-N Titanium nitride Chemical compound [Ti]#N NRTOMJZYCJJWKI-UHFFFAOYSA-N 0.000 description 1
- 229910052783 alkali metal Inorganic materials 0.000 description 1
- 150000001340 alkali metals Chemical class 0.000 description 1
- 230000004075 alteration Effects 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 230000003321 amplification Effects 0.000 description 1
- GPBUGPUPKAGMDK-UHFFFAOYSA-N azanylidynemolybdenum Chemical compound [Mo]#N GPBUGPUPKAGMDK-UHFFFAOYSA-N 0.000 description 1
- OVMJQLNJCSIJCH-UHFFFAOYSA-N azanylidyneneodymium Chemical compound [Nd]#N OVMJQLNJCSIJCH-UHFFFAOYSA-N 0.000 description 1
- SKKMWRVAJNPLFY-UHFFFAOYSA-N azanylidynevanadium Chemical compound [V]#N SKKMWRVAJNPLFY-UHFFFAOYSA-N 0.000 description 1
- 230000006399 behavior Effects 0.000 description 1
- 239000011575 calcium Substances 0.000 description 1
- 229910052791 calcium Inorganic materials 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000010419 fine particle Substances 0.000 description 1
- 238000001093 holography Methods 0.000 description 1
- 238000010348 incorporation Methods 0.000 description 1
- 238000007689 inspection Methods 0.000 description 1
- 238000005305 interferometry Methods 0.000 description 1
- 229910001337 iron nitride Inorganic materials 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 229910052744 lithium Inorganic materials 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 239000002105 nanoparticle Substances 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- PXHVJJICTQNCMI-UHFFFAOYSA-N nickel Substances [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 1
- 238000003199 nucleic acid amplification method Methods 0.000 description 1
- 238000005457 optimization Methods 0.000 description 1
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 1
- 229920005591 polysilicon Polymers 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- 239000011253 protective coating Substances 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 230000002441 reversible effect Effects 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
- 230000035882 stress Effects 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 230000008646 thermal stress Effects 0.000 description 1
- 238000012932 thermodynamic analysis Methods 0.000 description 1
- 238000010937 topological data analysis Methods 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- 230000001052 transient effect Effects 0.000 description 1
- 238000009827 uniform distribution Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
- G03H1/04—Processes or apparatus for producing holograms
- G03H1/0402—Recording geometries or arrangements
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/24—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
- G01B11/2441—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures using interferometry
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/02—Interferometers
- G01B9/02001—Interferometers characterised by controlling or generating intrinsic radiation properties
- G01B9/02002—Interferometers characterised by controlling or generating intrinsic radiation properties using two or more frequencies
- G01B9/02005—Interferometers characterised by controlling or generating intrinsic radiation properties using two or more frequencies using discrete frequency stepping or switching
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/02—Interferometers
- G01B9/02015—Interferometers characterised by the beam path configuration
- G01B9/02032—Interferometers characterised by the beam path configuration generating a spatial carrier frequency, e.g. by creating lateral or angular offset between reference and object beam
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/02—Interferometers
- G01B9/02097—Self-interferometers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
- G03H1/04—Processes or apparatus for producing holograms
- G03H1/0443—Digital holography, i.e. recording holograms with digital recording means
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
- G03H1/26—Processes or apparatus specially adapted to produce multiple sub- holograms or to obtain images from them, e.g. multicolour technique
- G03H1/2645—Multiplexing processes, e.g. aperture, shift, or wavefront multiplexing
- G03H1/265—Angle multiplexing; Multichannel holograms
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B2290/00—Aspects of interferometers not specifically covered by any group under G01B9/02
- G01B2290/45—Multiple detectors for detecting interferometer signals
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
- G03H1/04—Processes or apparatus for producing holograms
- G03H1/0443—Digital holography, i.e. recording holograms with digital recording means
- G03H2001/0454—Arrangement for recovering hologram complex amplitude
- G03H2001/0456—Spatial heterodyne, i.e. filtering a Fourier transform of the off-axis record
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
- G03H1/04—Processes or apparatus for producing holograms
- G03H1/0443—Digital holography, i.e. recording holograms with digital recording means
- G03H2001/046—Synthetic aperture
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
- G03H1/26—Processes or apparatus specially adapted to produce multiple sub- holograms or to obtain images from them, e.g. multicolour technique
- G03H1/2645—Multiplexing processes, e.g. aperture, shift, or wavefront multiplexing
- G03H2001/266—Wavelength multiplexing
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H2222/00—Light sources or light beam properties
- G03H2222/10—Spectral composition
- G03H2222/13—Multi-wavelengths wave with discontinuous wavelength ranges
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H2226/00—Electro-optic or electronic components relating to digital holography
- G03H2226/11—Electro-optic recording means, e.g. CCD, pyroelectric sensors
- G03H2226/13—Multiple recording means
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Computing Systems (AREA)
- Theoretical Computer Science (AREA)
- Instruments For Measurement Of Length By Optical Means (AREA)
- Length Measuring Devices By Optical Means (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US15/614,687 | 2017-06-06 | ||
| US15/614,687 US10725428B2 (en) | 2017-06-06 | 2017-06-06 | Methods and systems of holographic interferometry |
| PCT/IL2018/050617 WO2018225068A1 (en) | 2017-06-06 | 2018-06-06 | Methods and systems of holographic interferometry |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR20200015938A KR20200015938A (ko) | 2020-02-13 |
| KR102604960B1 true KR102604960B1 (ko) | 2023-11-23 |
Family
ID=64460237
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020207000327A Active KR102604960B1 (ko) | 2017-06-06 | 2018-06-06 | 홀로그래픽 간섭법의 방법 및 시스템 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US10725428B2 (enExample) |
| EP (1) | EP3635328B1 (enExample) |
| JP (1) | JP7276987B2 (enExample) |
| KR (1) | KR102604960B1 (enExample) |
| CN (1) | CN110914634B (enExample) |
| IL (1) | IL271219B2 (enExample) |
| WO (1) | WO2018225068A1 (enExample) |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US10725428B2 (en) | 2017-06-06 | 2020-07-28 | RD Synergy Ltd. | Methods and systems of holographic interferometry |
| US11892292B2 (en) | 2017-06-06 | 2024-02-06 | RD Synergy Ltd. | Methods and systems of holographic interferometry |
| CN112969899B (zh) | 2018-10-30 | 2023-03-10 | Rd 辛纳基有限公司 | 全息干涉法的系统和方法 |
| JP7227604B2 (ja) * | 2019-03-20 | 2023-02-22 | 株式会社日立ハイテクサイエンス | 三次元形状測定方法および三次元形状測定装置 |
| CN111459004B (zh) * | 2020-04-14 | 2021-09-14 | 清华大学 | 双光路合成孔径全息图拼接方法 |
| US11499815B2 (en) | 2020-12-08 | 2022-11-15 | International Business Machines Corporation | Visual quality assessment augmentation employing holographic interferometry |
| CN113472985B (zh) * | 2021-06-28 | 2023-03-24 | 平湖莱顿光学仪器制造有限公司 | 一种基于微分干涉显微镜采集图像的视频处理方法和装置 |
| KR102780556B1 (ko) * | 2022-10-12 | 2025-03-12 | (주)힉스컴퍼니 | 디지털 홀로그래픽 현미경의 빔 세기와 빔 경로 길이를 조절하는 방법 및 장치 |
| US12467737B1 (en) * | 2025-03-06 | 2025-11-11 | Camtek Ltd. | Self-referencing interferometric microscope |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2003302205A (ja) * | 2002-02-07 | 2003-10-24 | Nikon Corp | シアリング干渉測定方法及びシアリング干渉計、投影光学系の製造方法、投影光学系、及び投影露光装置 |
| JP2013124992A (ja) * | 2011-12-15 | 2013-06-24 | Canon Inc | 多波長干渉計を有する計測装置 |
Family Cites Families (24)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4478481A (en) | 1982-02-12 | 1984-10-23 | University Of Dayton | Production of diffraction limited holographic images |
| JPH04204032A (ja) * | 1990-11-30 | 1992-07-24 | Hitachi Ltd | レンズ光学性能測定装置 |
| US5515183A (en) * | 1991-08-08 | 1996-05-07 | Citizen Watch Co., Ltd. | Real-time holography system |
| JPH08219718A (ja) * | 1995-02-08 | 1996-08-30 | Nikon Corp | 面位置検出装置 |
| US7471430B1 (en) | 1997-12-15 | 2008-12-30 | The United States Of America As Represented By The Secretary Of The Air Force | Holographic image corrector |
| JP2000346612A (ja) * | 1999-06-04 | 2000-12-15 | Sony Corp | 干渉計および干渉測定方法 |
| US6512385B1 (en) | 1999-07-26 | 2003-01-28 | Paul Pfaff | Method for testing a device under test including the interference of two beams |
| JP2001227907A (ja) * | 2000-02-16 | 2001-08-24 | Fuji Photo Optical Co Ltd | フーリエ変換を用いた縞解析方法 |
| JP4583611B2 (ja) * | 2001-01-11 | 2010-11-17 | 富士フイルム株式会社 | 斜入射干渉計装置 |
| JP2003167500A (ja) * | 2001-11-30 | 2003-06-13 | Art Nau:Kk | ホログラム作成方法 |
| EP1411321B1 (en) | 2002-10-15 | 2017-04-19 | Mitutoyo Corporation | Interferometer using an integrated imaging array, a high-density polarizer and a phase-shifting array |
| FR2852409B1 (fr) | 2003-03-11 | 2005-06-17 | Dispositif pour la generation d'une porteuse dans un interferogramme | |
| JP2004309402A (ja) * | 2003-04-10 | 2004-11-04 | Mitsutoyo Corp | 干渉測定装置及び位相シフト縞解析装置 |
| EP1631788B1 (en) | 2003-05-16 | 2007-03-14 | Universite Libre De Bruxelles | Digital holographic microscope for 3d imaging and process using it |
| KR20060052699A (ko) | 2003-06-11 | 2006-05-19 | 솔비젼 인코포레이티드 | 감도 및 다이내믹 레인지가 증가된 3d 및 2d 측정장치 및방법 |
| JP2005233772A (ja) * | 2004-02-19 | 2005-09-02 | Mitsutoyo Corp | 干渉計 |
| DE102006049612A1 (de) * | 2006-10-20 | 2008-04-30 | Carl Zeiss Smt Ag | Beleuchtungseinrichtung und Maske für eine Mikrolithographie-Projektionsbelichtungsanlage sowie Verfahren zur lithographischen Belichtung eines Gegenstandes |
| JP2008304567A (ja) * | 2007-06-05 | 2008-12-18 | Tdk Corp | ホログラム記録媒体及びその製造方法 |
| US20110255097A1 (en) | 2010-03-18 | 2011-10-20 | Gilad Golan | Method and system for evaluating a height of structures |
| US9360423B2 (en) | 2011-07-01 | 2016-06-07 | Canon Kabushiki Kaisha | Optical system for a holographic microscope including a spatial filter |
| JP6202499B2 (ja) | 2012-09-27 | 2017-09-27 | 国立大学法人北海道大学 | 光位相測定方法、光位相測定装置および光通信装置 |
| WO2015118475A1 (en) * | 2014-02-06 | 2015-08-13 | Lyncee Tec S.A. | Digital holographic device |
| US9955863B2 (en) * | 2015-05-28 | 2018-05-01 | Cylite Pty Ltd | High resolution 3-D spectral domain optical imaging apparatus and method |
| US10725428B2 (en) | 2017-06-06 | 2020-07-28 | RD Synergy Ltd. | Methods and systems of holographic interferometry |
-
2017
- 2017-06-06 US US15/614,687 patent/US10725428B2/en active Active
-
2018
- 2018-06-06 KR KR1020207000327A patent/KR102604960B1/ko active Active
- 2018-06-06 CN CN201880045899.5A patent/CN110914634B/zh active Active
- 2018-06-06 WO PCT/IL2018/050617 patent/WO2018225068A1/en not_active Ceased
- 2018-06-06 JP JP2019568108A patent/JP7276987B2/ja active Active
- 2018-06-06 EP EP18813728.5A patent/EP3635328B1/en active Active
- 2018-06-06 IL IL271219A patent/IL271219B2/en unknown
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2003302205A (ja) * | 2002-02-07 | 2003-10-24 | Nikon Corp | シアリング干渉測定方法及びシアリング干渉計、投影光学系の製造方法、投影光学系、及び投影露光装置 |
| JP2013124992A (ja) * | 2011-12-15 | 2013-06-24 | Canon Inc | 多波長干渉計を有する計測装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| CN110914634B (zh) | 2022-02-18 |
| EP3635328C0 (en) | 2025-08-06 |
| KR20200015938A (ko) | 2020-02-13 |
| EP3635328B1 (en) | 2025-08-06 |
| CN110914634A (zh) | 2020-03-24 |
| US20180348703A1 (en) | 2018-12-06 |
| EP3635328A1 (en) | 2020-04-15 |
| IL271219B2 (en) | 2024-12-01 |
| JP2020522716A (ja) | 2020-07-30 |
| JP7276987B2 (ja) | 2023-05-18 |
| IL271219B1 (en) | 2024-08-01 |
| EP3635328A4 (en) | 2021-03-17 |
| WO2018225068A1 (en) | 2018-12-13 |
| US10725428B2 (en) | 2020-07-28 |
| IL271219A (en) | 2020-01-30 |
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