JP7276987B2 - ホログラフィ干渉測定分野の方法およびシステム - Google Patents
ホログラフィ干渉測定分野の方法およびシステム Download PDFInfo
- Publication number
- JP7276987B2 JP7276987B2 JP2019568108A JP2019568108A JP7276987B2 JP 7276987 B2 JP7276987 B2 JP 7276987B2 JP 2019568108 A JP2019568108 A JP 2019568108A JP 2019568108 A JP2019568108 A JP 2019568108A JP 7276987 B2 JP7276987 B2 JP 7276987B2
- Authority
- JP
- Japan
- Prior art keywords
- light
- holographic interferometer
- different
- rays
- light beams
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 238000000034 method Methods 0.000 title claims description 27
- 238000005210 holographic interferometry Methods 0.000 title description 4
- 230000003287 optical effect Effects 0.000 claims description 82
- 238000003384 imaging method Methods 0.000 claims description 33
- 238000005286 illumination Methods 0.000 claims description 22
- 230000010287 polarization Effects 0.000 claims description 21
- 238000005259 measurement Methods 0.000 claims description 16
- 230000001427 coherent effect Effects 0.000 claims description 11
- 238000010586 diagram Methods 0.000 description 34
- 230000002452 interceptive effect Effects 0.000 description 11
- 238000012545 processing Methods 0.000 description 10
- 230000006870 function Effects 0.000 description 9
- 230000008859 change Effects 0.000 description 8
- 238000006073 displacement reaction Methods 0.000 description 5
- 239000007787 solid Substances 0.000 description 5
- 230000003595 spectral effect Effects 0.000 description 5
- 230000005540 biological transmission Effects 0.000 description 4
- 238000004590 computer program Methods 0.000 description 4
- 239000000835 fiber Substances 0.000 description 4
- 239000004065 semiconductor Substances 0.000 description 4
- 235000012431 wafers Nutrition 0.000 description 4
- 150000001875 compounds Chemical class 0.000 description 3
- 238000010276 construction Methods 0.000 description 3
- 238000001914 filtration Methods 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 230000004048 modification Effects 0.000 description 3
- 238000012986 modification Methods 0.000 description 3
- 230000004075 alteration Effects 0.000 description 2
- 238000004458 analytical method Methods 0.000 description 2
- 238000003491 array Methods 0.000 description 2
- 238000004422 calculation algorithm Methods 0.000 description 2
- 238000013461 design Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 239000004615 ingredient Substances 0.000 description 2
- 230000000670 limiting effect Effects 0.000 description 2
- 239000011159 matrix material Substances 0.000 description 2
- 230000001902 propagating effect Effects 0.000 description 2
- 230000004044 response Effects 0.000 description 2
- 239000000243 solution Substances 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 230000003321 amplification Effects 0.000 description 1
- 230000006399 behavior Effects 0.000 description 1
- 238000004364 calculation method Methods 0.000 description 1
- 230000021615 conjugation Effects 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 238000007689 inspection Methods 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 238000000386 microscopy Methods 0.000 description 1
- 238000003199 nucleic acid amplification method Methods 0.000 description 1
- 238000005457 optimization Methods 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 230000002829 reductive effect Effects 0.000 description 1
- 230000002441 reversible effect Effects 0.000 description 1
- 238000005070 sampling Methods 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- 238000009827 uniform distribution Methods 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
- G03H1/04—Processes or apparatus for producing holograms
- G03H1/0402—Recording geometries or arrangements
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/24—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
- G01B11/2441—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures using interferometry
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/02—Interferometers
- G01B9/02001—Interferometers characterised by controlling or generating intrinsic radiation properties
- G01B9/02002—Interferometers characterised by controlling or generating intrinsic radiation properties using two or more frequencies
- G01B9/02005—Interferometers characterised by controlling or generating intrinsic radiation properties using two or more frequencies using discrete frequency stepping or switching
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/02—Interferometers
- G01B9/02015—Interferometers characterised by the beam path configuration
- G01B9/02032—Interferometers characterised by the beam path configuration generating a spatial carrier frequency, e.g. by creating lateral or angular offset between reference and object beam
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/02—Interferometers
- G01B9/02097—Self-interferometers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
- G03H1/04—Processes or apparatus for producing holograms
- G03H1/0443—Digital holography, i.e. recording holograms with digital recording means
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
- G03H1/26—Processes or apparatus specially adapted to produce multiple sub- holograms or to obtain images from them, e.g. multicolour technique
- G03H1/2645—Multiplexing processes, e.g. aperture, shift, or wavefront multiplexing
- G03H1/265—Angle multiplexing; Multichannel holograms
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B2290/00—Aspects of interferometers not specifically covered by any group under G01B9/02
- G01B2290/45—Multiple detectors for detecting interferometer signals
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
- G03H1/04—Processes or apparatus for producing holograms
- G03H1/0443—Digital holography, i.e. recording holograms with digital recording means
- G03H2001/0454—Arrangement for recovering hologram complex amplitude
- G03H2001/0456—Spatial heterodyne, i.e. filtering a Fourier transform of the off-axis record
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
- G03H1/04—Processes or apparatus for producing holograms
- G03H1/0443—Digital holography, i.e. recording holograms with digital recording means
- G03H2001/046—Synthetic aperture
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
- G03H1/26—Processes or apparatus specially adapted to produce multiple sub- holograms or to obtain images from them, e.g. multicolour technique
- G03H1/2645—Multiplexing processes, e.g. aperture, shift, or wavefront multiplexing
- G03H2001/266—Wavelength multiplexing
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H2222/00—Light sources or light beam properties
- G03H2222/10—Spectral composition
- G03H2222/13—Multi-wavelengths wave with discontinuous wavelength ranges
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H2226/00—Electro-optic or electronic components relating to digital holography
- G03H2226/11—Electro-optic recording means, e.g. CCD, pyroelectric sensors
- G03H2226/13—Multiple recording means
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Computing Systems (AREA)
- Theoretical Computer Science (AREA)
- Instruments For Measurement Of Length By Optical Means (AREA)
- Length Measuring Devices By Optical Means (AREA)
Description
1.較正を使用してθx,yおよびBを決定する(θx,yは上記したように、Bはビーム・ストップなどの非反射性の物体を使用することによって、決定できる)。
2.A2≒(Σx,y(Ix,y-B2))/(nm)を使用してAを推定する
3.[Acos(φ)]および[Asin(φ)]で立てられた過制約なn*m線形方程式:
2Bcos(θx,y)[Acos(φ)]+2Bsin(θx,y)[Asin(φ)]-(Ix,y-A2-B2)=0
を、ムーア-ペンローズの係数行列の擬似逆行列を使用して解く。
4.この解からAおよびφを抽出する。
5.必要に応じて、Aの新しい推定値を用いてステップ3を繰り返し、次いでステップ4を繰り返す。Aおよびφが収束するまで繰り返す。
Claims (13)
- 参照ミラーを有しないホログラフィ干渉計であって、
少なくとも1つの照明源によって照射された対象構造から集光された少なくとも2つの光線が作り出した干渉パターンを取り込む少なくとも1つの撮像デバイスと、
少なくとも2つのアパーチャであって、前記少なくとも2つの光線のうちの1つの光線の光経路に沿ってそれぞれ位置する、少なくとも2つのアパーチャと、を備え、
前記少なくとも2つのアパーチャは、前記少なくとも2つの光線のそれぞれ1つの光軸から離れるようにそれぞれ異なって位置し、この結果異なる有効波数を有する異なる集光された角度範囲の前記少なくとも2つの光線の2つのサブセットを通過させ、
前記少なくとも2つの光線のそれぞれは、前記少なくとも1つの撮像デバイスに対して異なる角度で前記少なくとも1つの撮像デバイスに届き、前記干渉パターンを作り出す、
ホログラフィ干渉計。 - 元の光線を前記少なくとも2つの光線へと分割する少なくとも1つのビーム・スプリッタ
を更に備える、請求項1に記載のホログラフィ干渉計。 - 前記元の光線は、前記対象構造から反射された光線である、請求項2に記載のホログラフィ干渉計。
- 前記対象構造を照射する単色コヒーレント光源を更に備える、請求項3に記載のホログラフィ干渉計。
- 前記対象構造は環境光によって照射される、請求項3に記載のホログラフィ干渉計。
- 前記元の光線の光経路に沿って位置し、アパーチャ面を作り出す、レンズを更に備え、
前記ビーム・スプリッタは、前記元の光線の前記光経路に沿って前記対象構造と前記アパーチャ面との間に位置し、この結果分割されたアパーチャ面を作り出す、請求項3に記載のホログラフィ干渉計。 - 前記少なくとも2つのアパーチャは、分割された前記アパーチャ面に位置する、請求項6に記載のホログラフィ干渉計。
- 前記少なくとも2つの光線は、前記対象構造から反射される、請求項1に記載のホログラフィ干渉計。
- 前記干渉パターンは、前記対象構造の高さ測定値を得るのに使用される、請求項1に記載のホログラフィ干渉計。
- 少なくとも1つの照明源によって照射された対象構造から集光された少なくとも2つの光線が作り出した干渉パターンを取り込むための少なくとも1つの撮像デバイスを配置するステップと、
少なくとも2つのアパーチャであって、前記少なくとも2つの光線のうちの1つの光線の光経路に沿ってそれぞれ位置する、少なくとも2つのアパーチャを、配置するステップと、を含み、
前記少なくとも2つのアパーチャは、前記少なくとも2つの光線のそれぞれ1つの光軸から離れるようにそれぞれ異なって位置し、この結果異なる有効波数を有する異なる集光された角度範囲の前記少なくとも2つの光線の2つのサブセットを通過させ、それぞれの前記サブセットは、異なる角度で集光された光を含み、
前記少なくとも2つの光線のそれぞれは、異なる角度で前記少なくとも1つの撮像デバイス上で干渉し合う、
参照ミラーを有しないホログラフィ干渉計を設定する方法。 - コヒーレント光源から生じる元の光線を少なくとも2つの光線へと分割する少なくとも1つのビーム・スプリッタと、
前記少なくとも2つの光線が物体から反射された後で作り出した干渉パターンを取り込む、少なくとも1つの撮像デバイスと、
少なくとも1つのミラーと、
を備え、
前記少なくとも2つの光線は、異なる有効波数に対応する前記物体に対して異なる入射角を有し、前記少なくとも1つのミラーは、前記少なくとも2つの光線のうちの少なくとも1つの光線の前記元の光線の元の光軸からの距離を変えて前記異なる入射角を作り出す、
ホログラフィ干渉計。 - 前記少なくとも1つのビーム・スプリッタは少なくとも1つの偏光ビーム・スプリッタを含む、請求項11に記載のホログラフィ干渉計。
- 前記少なくとも1つの撮像デバイスは、異なる偏光角を有する光が作り出した干渉パターンを各々取り込む少なくとも2つの撮像デバイスを含む、請求項11に記載のホログラフィ干渉計。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US15/614,687 US10725428B2 (en) | 2017-06-06 | 2017-06-06 | Methods and systems of holographic interferometry |
US15/614,687 | 2017-06-06 | ||
PCT/IL2018/050617 WO2018225068A1 (en) | 2017-06-06 | 2018-06-06 | Methods and systems of holographic interferometry |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2020522716A JP2020522716A (ja) | 2020-07-30 |
JP2020522716A5 JP2020522716A5 (ja) | 2021-07-26 |
JP7276987B2 true JP7276987B2 (ja) | 2023-05-18 |
Family
ID=64460237
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2019568108A Active JP7276987B2 (ja) | 2017-06-06 | 2018-06-06 | ホログラフィ干渉測定分野の方法およびシステム |
Country Status (7)
Country | Link |
---|---|
US (1) | US10725428B2 (ja) |
EP (1) | EP3635328A4 (ja) |
JP (1) | JP7276987B2 (ja) |
KR (1) | KR102604960B1 (ja) |
CN (1) | CN110914634B (ja) |
IL (1) | IL271219A (ja) |
WO (1) | WO2018225068A1 (ja) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US10725428B2 (en) | 2017-06-06 | 2020-07-28 | RD Synergy Ltd. | Methods and systems of holographic interferometry |
US11892292B2 (en) | 2017-06-06 | 2024-02-06 | RD Synergy Ltd. | Methods and systems of holographic interferometry |
WO2020089900A1 (en) | 2018-10-30 | 2020-05-07 | RD Synergy Ltd. | Methods and systems of holographic interferometry |
CN111459004B (zh) * | 2020-04-14 | 2021-09-14 | 清华大学 | 双光路合成孔径全息图拼接方法 |
US11499815B2 (en) | 2020-12-08 | 2022-11-15 | International Business Machines Corporation | Visual quality assessment augmentation employing holographic interferometry |
CN113472985B (zh) * | 2021-06-28 | 2023-03-24 | 平湖莱顿光学仪器制造有限公司 | 一种基于微分干涉显微镜采集图像的视频处理方法和装置 |
Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2000346612A (ja) | 1999-06-04 | 2000-12-15 | Sony Corp | 干渉計および干渉測定方法 |
JP2001227907A (ja) | 2000-02-16 | 2001-08-24 | Fuji Photo Optical Co Ltd | フーリエ変換を用いた縞解析方法 |
JP2003302205A (ja) | 2002-02-07 | 2003-10-24 | Nikon Corp | シアリング干渉測定方法及びシアリング干渉計、投影光学系の製造方法、投影光学系、及び投影露光装置 |
JP2004309402A (ja) | 2003-04-10 | 2004-11-04 | Mitsutoyo Corp | 干渉測定装置及び位相シフト縞解析装置 |
JP2005233772A (ja) | 2004-02-19 | 2005-09-02 | Mitsutoyo Corp | 干渉計 |
JP2002206914A5 (ja) | 2001-01-11 | 2007-12-06 | ||
US20130003073A1 (en) | 2011-07-01 | 2013-01-03 | Canon Kabushiki Kaisha | Optical system for a holographic microscope |
Family Cites Families (20)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4478481A (en) | 1982-02-12 | 1984-10-23 | University Of Dayton | Production of diffraction limited holographic images |
JPH04204032A (ja) * | 1990-11-30 | 1992-07-24 | Hitachi Ltd | レンズ光学性能測定装置 |
US5515183A (en) * | 1991-08-08 | 1996-05-07 | Citizen Watch Co., Ltd. | Real-time holography system |
JPH08219718A (ja) * | 1995-02-08 | 1996-08-30 | Nikon Corp | 面位置検出装置 |
US7471430B1 (en) | 1997-12-15 | 2008-12-30 | The United States Of America As Represented By The Secretary Of The Air Force | Holographic image corrector |
US6512385B1 (en) | 1999-07-26 | 2003-01-28 | Paul Pfaff | Method for testing a device under test including the interference of two beams |
JP4583611B2 (ja) | 2001-01-11 | 2010-11-17 | 富士フイルム株式会社 | 斜入射干渉計装置 |
JP2003167500A (ja) * | 2001-11-30 | 2003-06-13 | Art Nau:Kk | ホログラム作成方法 |
EP1411321B1 (en) | 2002-10-15 | 2017-04-19 | Mitutoyo Corporation | Interferometer using an integrated imaging array, a high-density polarizer and a phase-shifting array |
FR2852409B1 (fr) | 2003-03-11 | 2005-06-17 | Dispositif pour la generation d'une porteuse dans un interferogramme | |
DK1631788T3 (da) | 2003-05-16 | 2007-07-23 | Univ Bruxelles | Digitalt holografisk mikroskop til 3D billedfrembringelse og en proces til anvendelse deraf |
DE112004001034T5 (de) | 2003-06-11 | 2006-10-19 | Solvision, Longueuil | 3D- und 2D-Meßsystem und -verfahren mit erhöhter Sensitivität und erhöhtem Dynamikbereich |
DE102006049612A1 (de) * | 2006-10-20 | 2008-04-30 | Carl Zeiss Smt Ag | Beleuchtungseinrichtung und Maske für eine Mikrolithographie-Projektionsbelichtungsanlage sowie Verfahren zur lithographischen Belichtung eines Gegenstandes |
JP2008304567A (ja) * | 2007-06-05 | 2008-12-18 | Tdk Corp | ホログラム記録媒体及びその製造方法 |
US20110255097A1 (en) | 2010-03-18 | 2011-10-20 | Gilad Golan | Method and system for evaluating a height of structures |
JP5954979B2 (ja) * | 2011-12-15 | 2016-07-20 | キヤノン株式会社 | 多波長干渉計を有する計測装置 |
WO2014050141A1 (ja) | 2012-09-27 | 2014-04-03 | 国立大学法人北海道大学 | 光位相測定方法、光位相測定装置および光通信装置 |
EP3102982B1 (en) * | 2014-02-06 | 2020-08-12 | Lyncee Tec S.A. | Digital holographic device |
CN107615005B (zh) * | 2015-05-28 | 2021-06-01 | 赛莱特私人有限公司 | 高分辨率3-d谱域光学成像设备和方法 |
US10725428B2 (en) | 2017-06-06 | 2020-07-28 | RD Synergy Ltd. | Methods and systems of holographic interferometry |
-
2017
- 2017-06-06 US US15/614,687 patent/US10725428B2/en active Active
-
2018
- 2018-06-06 WO PCT/IL2018/050617 patent/WO2018225068A1/en unknown
- 2018-06-06 EP EP18813728.5A patent/EP3635328A4/en active Pending
- 2018-06-06 JP JP2019568108A patent/JP7276987B2/ja active Active
- 2018-06-06 CN CN201880045899.5A patent/CN110914634B/zh active Active
- 2018-06-06 KR KR1020207000327A patent/KR102604960B1/ko active IP Right Grant
-
2019
- 2019-12-05 IL IL271219A patent/IL271219A/en unknown
Patent Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2000346612A (ja) | 1999-06-04 | 2000-12-15 | Sony Corp | 干渉計および干渉測定方法 |
JP2001227907A (ja) | 2000-02-16 | 2001-08-24 | Fuji Photo Optical Co Ltd | フーリエ変換を用いた縞解析方法 |
JP2002206914A5 (ja) | 2001-01-11 | 2007-12-06 | ||
JP2003302205A (ja) | 2002-02-07 | 2003-10-24 | Nikon Corp | シアリング干渉測定方法及びシアリング干渉計、投影光学系の製造方法、投影光学系、及び投影露光装置 |
JP2004309402A (ja) | 2003-04-10 | 2004-11-04 | Mitsutoyo Corp | 干渉測定装置及び位相シフト縞解析装置 |
JP2005233772A (ja) | 2004-02-19 | 2005-09-02 | Mitsutoyo Corp | 干渉計 |
US20130003073A1 (en) | 2011-07-01 | 2013-01-03 | Canon Kabushiki Kaisha | Optical system for a holographic microscope |
Also Published As
Publication number | Publication date |
---|---|
KR20200015938A (ko) | 2020-02-13 |
US20180348703A1 (en) | 2018-12-06 |
KR102604960B1 (ko) | 2023-11-23 |
CN110914634B (zh) | 2022-02-18 |
EP3635328A1 (en) | 2020-04-15 |
EP3635328A4 (en) | 2021-03-17 |
WO2018225068A1 (en) | 2018-12-13 |
IL271219A (en) | 2020-01-30 |
CN110914634A (zh) | 2020-03-24 |
JP2020522716A (ja) | 2020-07-30 |
US10725428B2 (en) | 2020-07-28 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP7276987B2 (ja) | ホログラフィ干渉測定分野の方法およびシステム | |
TWI659204B (zh) | 光譜光束分佈度量 | |
JP6830492B2 (ja) | 分光ビームプロファイルオーバーレイ計測 | |
US7061623B2 (en) | Interferometric back focal plane scatterometry with Koehler illumination | |
KR101159380B1 (ko) | 파면 조정 및 향상된 3?d 측정을 위한 방법 및 장치 | |
JP5222954B2 (ja) | 偏光スキャンを利用した干渉計 | |
TWI671501B (zh) | 用於特徵化一樣本之方法及白光干涉測量計、用於處理來自具有一圖案化結構之一樣本之白光干涉測量資料之方法及用於量測具有一圖案化結構之一樣本之白光干涉測量計 | |
TW201203419A (en) | Inspection method and apparatus, and associated computer readable product | |
JP2020517096A (ja) | 層特定的照明スペクトルによる計量システム及び方法 | |
US11892292B2 (en) | Methods and systems of holographic interferometry | |
JP2009098215A (ja) | 顕微鏡装置、及び顕微鏡装置における位相変化量の算出方法。 | |
WO2014102792A1 (en) | Optical method and system for critical dimensions and thickness characterization | |
US20220065617A1 (en) | Determination of a change of object's shape | |
Bühl et al. | Digital synthesis of multiple off-axis holograms with overlapping Fourier spectra | |
JP2006250849A (ja) | 光コヒーレンストモグラフィー装置を用いた光画像計測方法及びその装置 | |
CN113196003B (zh) | 分别用于确定输入光场的输入相位和/或输入振幅的方法,干涉仪和信号处理设备 | |
KR20170023363A (ko) | 디지털 홀로그래피 마이크로스코프를 이용한 고단차 측정 방법 | |
CN107923735B (zh) | 用于推导物体表面的形貌的方法和设备 | |
KR102382055B1 (ko) | 간섭계용 에지 등록 | |
Abdelsalam et al. | Digital holographic shape measurement using Fizeau microscopy | |
EP3514482A1 (en) | Exit pupil expander used to distribute light over a liquid-crystal variable retarder | |
JP2017026494A (ja) | 白色干渉計による形状測定装置 | |
TRỊNH et al. | Shearing interference microscope for step‐height measurements | |
JP2009079933A (ja) | 大型サンプル測定用干渉計装置 | |
JPWO2011135698A1 (ja) | 変形計測方法 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20210518 |
|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20210518 |
|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20220222 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20220405 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20220704 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20221101 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20230201 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20230404 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20230428 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 7276987 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |