KR102586622B1 - 기판 처리 장치, 기판 처리 방법 및 기억 매체 - Google Patents

기판 처리 장치, 기판 처리 방법 및 기억 매체 Download PDF

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KR102586622B1
KR102586622B1 KR1020160124619A KR20160124619A KR102586622B1 KR 102586622 B1 KR102586622 B1 KR 102586622B1 KR 1020160124619 A KR1020160124619 A KR 1020160124619A KR 20160124619 A KR20160124619 A KR 20160124619A KR 102586622 B1 KR102586622 B1 KR 102586622B1
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substrate
wafer
eddy current
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Korean (ko)
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KR20170040100A (ko
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데츠오 후쿠오카
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도쿄엘렉트론가부시키가이샤
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    • H01L22/12—
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P74/00—Testing or measuring during manufacture or treatment of wafers, substrates or devices
    • H10P74/20—Testing or measuring during manufacture or treatment of wafers, substrates or devices characterised by the properties tested or measured, e.g. structural or electrical properties
    • H10P74/203—Structural properties, e.g. testing or measuring thicknesses, line widths, warpage, bond strengths or physical defects
    • H01L21/324—
    • H01L21/67098—
    • H01L21/6835—
    • H01L22/30—
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0431—Apparatus for thermal treatment
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/70—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping
    • H10P72/74—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using temporarily an auxiliary support
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P74/00—Testing or measuring during manufacture or treatment of wafers, substrates or devices
    • H10P74/27—Structural arrangements therefor
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P95/00—Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass
    • H10P95/90—Thermal treatments, e.g. annealing or sintering

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  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
KR1020160124619A 2015-10-02 2016-09-28 기판 처리 장치, 기판 처리 방법 및 기억 매체 Active KR102586622B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JPJP-P-2015-196855 2015-10-02
JP2015196855A JP6406201B2 (ja) 2015-10-02 2015-10-02 基板処理装置、基板処理方法及び記憶媒体

Publications (2)

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KR20170040100A KR20170040100A (ko) 2017-04-12
KR102586622B1 true KR102586622B1 (ko) 2023-10-11

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KR1020160124619A Active KR102586622B1 (ko) 2015-10-02 2016-09-28 기판 처리 장치, 기판 처리 방법 및 기억 매체

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JP (1) JP6406201B2 (https=)
KR (1) KR102586622B1 (https=)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102467605B1 (ko) * 2017-06-28 2022-11-16 도쿄엘렉트론가부시키가이샤 열처리 장치, 열처리 장치의 관리 방법 및 기억 매체
JP2020035834A (ja) * 2018-08-28 2020-03-05 キオクシア株式会社 加熱処理装置および加熱処理方法
JP7281901B2 (ja) * 2018-12-27 2023-05-26 東京エレクトロン株式会社 基板処理装置、および基板処理方法
CN113206019B (zh) * 2021-04-08 2022-10-21 北京北方华创微电子装备有限公司 一种用于检测晶圆的翘曲度的装置及检测方法
CN117512544A (zh) * 2024-01-05 2024-02-06 上海陛通半导体能源科技股份有限公司 Pvd磁控溅射镀膜设备

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2006049659A1 (en) 2004-10-29 2006-05-11 Kimberly-Clark Worldwide, Inc. Self-adjusting portals with movable data tag readers for improved reading of data tags
JP2008200674A (ja) 2002-09-20 2008-09-04 Tokyo Electron Ltd 塗布方法及び塗布装置
JP2008294155A (ja) 2007-05-23 2008-12-04 Tokyo Electron Ltd 加熱処理装置、加熱処理方法及び記憶媒体

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3374467B2 (ja) * 1993-09-14 2003-02-04 株式会社ニコン 投影露光装置及び露光方法
JPH11195579A (ja) * 1997-12-26 1999-07-21 Nikon Corp 露光装置及び露光方法
JP3284121B2 (ja) * 2000-02-25 2002-05-20 株式会社東芝 レジスト塗布方法、レジストパターン形成方法及び溶液供給装置
JP3708786B2 (ja) * 2000-03-27 2005-10-19 株式会社東芝 レジストパターン形成方法及び半導体製造システム
JP2005024317A (ja) * 2003-06-30 2005-01-27 Nikon Corp ステージ位置検出装置及び露光装置
JP4572539B2 (ja) * 2004-01-19 2010-11-04 株式会社ニコン 露光装置及び露光方法、デバイス製造方法
JP4587170B2 (ja) * 2005-01-20 2010-11-24 キヤノン株式会社 露光装置及びデバイスの製造方法
JP4738033B2 (ja) 2005-03-23 2011-08-03 大日本スクリーン製造株式会社 基板処理装置
JP4606355B2 (ja) * 2006-03-14 2011-01-05 東京エレクトロン株式会社 熱処理装置、熱処理方法及び記憶媒体
JP2008182057A (ja) * 2007-01-25 2008-08-07 Nikon Corp 露光装置
JP2009123816A (ja) 2007-11-13 2009-06-04 Sokudo:Kk 熱処理装置および熱処理方法
JP5417655B2 (ja) * 2008-12-16 2014-02-19 株式会社アドウェルズ 傾き調整方法および傾き調整装置並びにその傾き調整方法において調整されるデバイス
US9281226B2 (en) * 2012-04-26 2016-03-08 Applied Materials, Inc. Electrostatic chuck having reduced power loss
JP6145334B2 (ja) * 2013-06-28 2017-06-07 株式会社荏原製作所 基板処理装置
JP6230887B2 (ja) * 2013-11-29 2017-11-15 住友化学株式会社 半導体評価装置、半導体ウェハの評価方法および半導体ウェハの製造方法

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008200674A (ja) 2002-09-20 2008-09-04 Tokyo Electron Ltd 塗布方法及び塗布装置
WO2006049659A1 (en) 2004-10-29 2006-05-11 Kimberly-Clark Worldwide, Inc. Self-adjusting portals with movable data tag readers for improved reading of data tags
JP2008294155A (ja) 2007-05-23 2008-12-04 Tokyo Electron Ltd 加熱処理装置、加熱処理方法及び記憶媒体

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Publication number Publication date
JP6406201B2 (ja) 2018-10-17
KR20170040100A (ko) 2017-04-12
JP2017069517A (ja) 2017-04-06

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