KR102490394B1 - 다이 본딩 장치, 반도체 장치의 제조 방법, 및 박리 장치 - Google Patents
다이 본딩 장치, 반도체 장치의 제조 방법, 및 박리 장치 Download PDFInfo
- Publication number
- KR102490394B1 KR102490394B1 KR1020210005259A KR20210005259A KR102490394B1 KR 102490394 B1 KR102490394 B1 KR 102490394B1 KR 1020210005259 A KR1020210005259 A KR 1020210005259A KR 20210005259 A KR20210005259 A KR 20210005259A KR 102490394 B1 KR102490394 B1 KR 102490394B1
- Authority
- KR
- South Korea
- Prior art keywords
- die
- dicing tape
- adsorbing
- needle
- concave portion
- Prior art date
Links
- 239000004065 semiconductor Substances 0.000 title claims description 8
- 238000004519 manufacturing process Methods 0.000 title claims description 6
- 238000000034 method Methods 0.000 claims abstract description 19
- 238000001179 sorption measurement Methods 0.000 claims description 17
- 230000000149 penetrating effect Effects 0.000 claims description 14
- 229910052751 metal Inorganic materials 0.000 claims description 5
- 239000002184 metal Substances 0.000 claims description 5
- 238000004299 exfoliation Methods 0.000 claims 3
- 235000017166 Bambusa arundinacea Nutrition 0.000 claims 1
- 235000017491 Bambusa tulda Nutrition 0.000 claims 1
- 241001330002 Bambuseae Species 0.000 claims 1
- 235000015334 Phyllostachys viridis Nutrition 0.000 claims 1
- 239000011425 bamboo Substances 0.000 claims 1
- 239000000758 substrate Substances 0.000 description 47
- 235000012431 wafers Nutrition 0.000 description 29
- 238000012986 modification Methods 0.000 description 19
- 230000004048 modification Effects 0.000 description 19
- 238000010586 diagram Methods 0.000 description 8
- 238000000926 separation method Methods 0.000 description 7
- 239000000853 adhesive Substances 0.000 description 6
- 230000001070 adhesive effect Effects 0.000 description 6
- 238000012546 transfer Methods 0.000 description 6
- 239000000463 material Substances 0.000 description 5
- 210000000078 claw Anatomy 0.000 description 4
- 230000002093 peripheral effect Effects 0.000 description 4
- 238000007664 blowing Methods 0.000 description 2
- 230000008094 contradictory effect Effects 0.000 description 2
- 238000002347 injection Methods 0.000 description 2
- 239000007924 injection Substances 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 101710171187 30S ribosomal protein S10 Proteins 0.000 description 1
- 101710171221 30S ribosomal protein S11 Proteins 0.000 description 1
- 101710171220 30S ribosomal protein S12 Proteins 0.000 description 1
- 101710171219 30S ribosomal protein S13 Proteins 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000013013 elastic material Substances 0.000 description 1
- 230000006870 function Effects 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000012544 monitoring process Methods 0.000 description 1
- 239000008188 pellet Substances 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 210000003296 saliva Anatomy 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 210000005239 tubule Anatomy 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67132—Apparatus for placing on an insulating substrate, e.g. tape
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/50—Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the subgroups H01L21/06 - H01L21/326, e.g. sealing of a cap to a base of a container
- H01L21/52—Mounting semiconductor bodies in containers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67144—Apparatus for mounting on conductive members, e.g. leadframes or conductors on insulating substrates
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67703—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
- H01L21/67721—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations the substrates to be conveyed not being semiconductor wafers or large planar substrates, e.g. chips, lead frames
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6835—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
- H01L21/6836—Wafer tapes, e.g. grinding or dicing support tapes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6838—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping with gripping and holding devices using a vacuum; Bernoulli devices
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K13/00—Apparatus or processes specially adapted for manufacturing or adjusting assemblages of electric components
- H05K13/04—Mounting of components, e.g. of leadless components
- H05K13/0404—Pick-and-place heads or apparatus, e.g. with jaws
- H05K13/0408—Incorporating a pick-up tool
- H05K13/0409—Sucking devices
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2221/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
- H01L2221/67—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
- H01L2221/683—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L2221/68304—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
- H01L2221/68327—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support used during dicing or grinding
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2221/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
- H01L2221/67—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
- H01L2221/683—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L2221/68304—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
- H01L2221/68381—Details of chemical or physical process used for separating the auxiliary support from a device or wafer
- H01L2221/68386—Separation by peeling
- H01L2221/6839—Separation by peeling using peeling wedge or knife or bar
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Power Engineering (AREA)
- Die Bonding (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2020029518A JP7412219B2 (ja) | 2020-02-25 | 2020-02-25 | ダイボンディング装置、半導体装置の製造方法および剥離装置 |
JPJP-P-2020-029518 | 2020-02-25 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20210108306A KR20210108306A (ko) | 2021-09-02 |
KR102490394B1 true KR102490394B1 (ko) | 2023-01-19 |
Family
ID=77661541
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020210005259A KR102490394B1 (ko) | 2020-02-25 | 2021-01-14 | 다이 본딩 장치, 반도체 장치의 제조 방법, 및 박리 장치 |
Country Status (2)
Country | Link |
---|---|
JP (1) | JP7412219B2 (ja) |
KR (1) | KR102490394B1 (ja) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2018166836A (ja) * | 2017-03-30 | 2018-11-01 | 株式会社三洋物産 | 遊技機 |
JP2018166837A (ja) * | 2017-03-30 | 2018-11-01 | 株式会社三洋物産 | 遊技機 |
JP2018166838A (ja) * | 2017-03-30 | 2018-11-01 | 株式会社三洋物産 | 遊技機 |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2009277912A (ja) | 2008-05-15 | 2009-11-26 | Fujitsu Microelectronics Ltd | 剥離方法及び剥離装置 |
JP2011054648A (ja) | 2009-08-31 | 2011-03-17 | Elpida Memory Inc | 半導体装置の製造方法 |
JP2014192358A (ja) * | 2013-03-27 | 2014-10-06 | Canon Machinery Inc | チップ剥離装置およびチップ剥離方法 |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH06204319A (ja) * | 1993-01-07 | 1994-07-22 | Fujitsu Ltd | 半導体チップのピックアップ方法及びピックアップ装置 |
JPH11145162A (ja) * | 1997-11-11 | 1999-05-28 | Miyagi Oki Denki Kk | Icチップのピックアップ装置 |
JP4574251B2 (ja) | 2003-09-17 | 2010-11-04 | ルネサスエレクトロニクス株式会社 | 半導体装置の製造方法 |
JP2008053260A (ja) | 2006-08-22 | 2008-03-06 | Nidec Tosok Corp | ピックアップ装置 |
KR101074532B1 (ko) * | 2009-08-02 | 2011-10-17 | 유병소 | 엘이디 칩 분류장치 및 그 제거유닛 |
JP5107408B2 (ja) * | 2010-08-31 | 2012-12-26 | 東京エレクトロン株式会社 | ピックアップ方法及びピックアップ装置 |
JP6967411B2 (ja) * | 2017-09-19 | 2021-11-17 | ファスフォードテクノロジ株式会社 | 半導体製造装置、半導体装置の製造方法およびコレット |
-
2020
- 2020-02-25 JP JP2020029518A patent/JP7412219B2/ja active Active
-
2021
- 2021-01-14 KR KR1020210005259A patent/KR102490394B1/ko active IP Right Grant
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2009277912A (ja) | 2008-05-15 | 2009-11-26 | Fujitsu Microelectronics Ltd | 剥離方法及び剥離装置 |
JP2011054648A (ja) | 2009-08-31 | 2011-03-17 | Elpida Memory Inc | 半導体装置の製造方法 |
JP2014192358A (ja) * | 2013-03-27 | 2014-10-06 | Canon Machinery Inc | チップ剥離装置およびチップ剥離方法 |
Also Published As
Publication number | Publication date |
---|---|
KR20210108306A (ko) | 2021-09-02 |
JP2021136265A (ja) | 2021-09-13 |
JP7412219B2 (ja) | 2024-01-12 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
KR102490394B1 (ko) | 다이 본딩 장치, 반도체 장치의 제조 방법, 및 박리 장치 | |
CN108400096B (zh) | 半导体制造装置及半导体器件的制造方法 | |
JP5805411B2 (ja) | ダイボンダのピックアップ方法およびダイボンダ | |
KR101666276B1 (ko) | 콜릿 및 다이 본더 | |
JP6941513B2 (ja) | 半導体製造装置および半導体装置の製造方法 | |
KR101970884B1 (ko) | 반도체 제조 장치 및 반도체 장치의 제조 방법 | |
CN108346585B (zh) | 半导体制造装置及半导体器件的制造方法 | |
JP6967411B2 (ja) | 半導体製造装置、半導体装置の製造方法およびコレット | |
TWI733164B (zh) | 半導體製造裝置、頂出治具及半導體裝置之製造方法 | |
JP2015076410A (ja) | ボンディング方法及びダイボンダ | |
JP6211359B2 (ja) | フリップチップボンダ及びボンディング方法 | |
JP2013065628A (ja) | ダイボンダ並びにダイピックアップ装置及びダイピックアップ方法 | |
TWI719896B (zh) | 黏晶裝置,剝離單元,夾頭及半導體裝置的製造方法 | |
JP2014239090A (ja) | ピックアップシステム | |
WO2021240840A1 (ja) | ピックアップ装置およびピックアップ方法 | |
US20220238357A1 (en) | Die Bonding Apparatus and Manufacturing Method for Semiconductor Device | |
JP2012199461A (ja) | ダイボンダ | |
JP2023134300A (ja) | 半導体製造装置、キャリア治具および半導体装置の製造方法 | |
JP2023002408A (ja) | ダイボンディング装置、ウェハおよび半導体装置の製造方法 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
E902 | Notification of reason for refusal | ||
E701 | Decision to grant or registration of patent right | ||
GRNT | Written decision to grant |