KR102490287B1 - 감광성 실록산 수지 조성물, 경화막 및 터치패널용 부재 - Google Patents

감광성 실록산 수지 조성물, 경화막 및 터치패널용 부재 Download PDF

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Publication number
KR102490287B1
KR102490287B1 KR1020197022236A KR20197022236A KR102490287B1 KR 102490287 B1 KR102490287 B1 KR 102490287B1 KR 1020197022236 A KR1020197022236 A KR 1020197022236A KR 20197022236 A KR20197022236 A KR 20197022236A KR 102490287 B1 KR102490287 B1 KR 102490287B1
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KR
South Korea
Prior art keywords
resin composition
group
siloxane resin
polysiloxane
photosensitive siloxane
Prior art date
Application number
KR1020197022236A
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English (en)
Korean (ko)
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KR20190122656A (ko
Inventor
히데유키 코바야시
미츠히토 스와
에이스케 이즈카
Original Assignee
도레이 카부시키가이샤
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Application filed by 도레이 카부시키가이샤 filed Critical 도레이 카부시키가이샤
Publication of KR20190122656A publication Critical patent/KR20190122656A/ko
Application granted granted Critical
Publication of KR102490287B1 publication Critical patent/KR102490287B1/ko

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00—Layered products comprising a layer of synthetic resin
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
    • C08F290/02—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated end groups
    • C08F290/06—Polymers provided for in subclass C08G
    • C08F290/068—Polysiloxanes
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/40—Treatment after imagewise removal, e.g. baking
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Theoretical Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Human Computer Interaction (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Materials For Photolithography (AREA)
  • Silicon Polymers (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
KR1020197022236A 2017-03-15 2018-02-27 감광성 실록산 수지 조성물, 경화막 및 터치패널용 부재 KR102490287B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2017049436 2017-03-15
JPJP-P-2017-049436 2017-03-15
PCT/JP2018/007150 WO2018168435A1 (ja) 2017-03-15 2018-02-27 感光性シロキサン樹脂組成物、硬化膜およびタッチパネル用部材

Publications (2)

Publication Number Publication Date
KR20190122656A KR20190122656A (ko) 2019-10-30
KR102490287B1 true KR102490287B1 (ko) 2023-01-19

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020197022236A KR102490287B1 (ko) 2017-03-15 2018-02-27 감광성 실록산 수지 조성물, 경화막 및 터치패널용 부재

Country Status (5)

Country Link
JP (1) JP6458902B1 (zh)
KR (1) KR102490287B1 (zh)
CN (1) CN110419000B (zh)
TW (1) TWI765978B (zh)
WO (1) WO2018168435A1 (zh)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP4257632A1 (en) * 2021-02-18 2023-10-11 Hunet Plus Co., Ltd. Photosensitive composition comprising organic metal compound and polysiloxane copolymer, and preparation method therefor

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007136870A (ja) * 2005-11-18 2007-06-07 Eastman Kodak Co 画像形成要素および画像形成方法

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CN1324402C (zh) * 2001-10-30 2007-07-04 钟渊化学工业株式会社 感光性树脂组合物、使用该组合物的感光性薄膜及层压体
TW200728908A (en) * 2006-01-25 2007-08-01 Kaneka Corp Photosensitive dry film resist, printed wiring board using same, and method for producing printed wiring board
CN101896537B (zh) * 2007-12-10 2012-10-24 株式会社钟化 具有碱显影性的固化性组合物、使用该组合物的绝缘性薄膜以及薄膜晶体管
JP5515714B2 (ja) * 2009-12-16 2014-06-11 Ｊｓｒ株式会社 着色組成物、カラーフィルタおよびカラー液晶表示素子
JP5734579B2 (ja) * 2010-03-26 2015-06-17 三洋化成工業株式会社 感光性樹脂組成物
JP5624783B2 (ja) * 2010-03-26 2014-11-12 三洋化成工業株式会社 感光性樹脂組成物
WO2012067153A1 (ja) * 2010-11-17 2012-05-24 横浜ゴム株式会社 シリコーン樹脂組成物、これを用いる、シリコーン樹脂含有構造体、光半導体素子封止体、シリコーン樹脂組成物の使用方法
CN103827247B (zh) * 2011-08-10 2016-08-17 东亚合成株式会社 活性能量射线固化型空隙填充用树脂组合物
TWI458630B (zh) * 2012-09-21 2014-11-01 Nippon Synthetic Chem Ind Laminated body and its use
JP6295950B2 (ja) * 2013-03-28 2018-03-20 東レ株式会社 感光性樹脂組成物、保護膜又は絶縁膜、タッチパネル及びその製造方法
JP6385852B2 (ja) * 2015-02-20 2018-09-05 富士フイルム株式会社 感光性樹脂組成物、硬化膜の製造方法、硬化膜、タッチパネル、タッチパネル表示装置、液晶表示装置、及び、有機ｅｌ表示装置
JP6488149B2 (ja) * 2015-02-26 2019-03-20 太陽ホールディングス株式会社 光硬化性熱硬化性樹脂組成物、その硬化物、およびプリント配線板
JP6240240B2 (ja) * 2016-03-04 2017-11-29 株式会社日本触媒 感光性樹脂組成物

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007136870A (ja) * 2005-11-18 2007-06-07 Eastman Kodak Co 画像形成要素および画像形成方法

Also Published As

Publication number Publication date
CN110419000A (zh) 2019-11-05
KR20190122656A (ko) 2019-10-30
JP6458902B1 (ja) 2019-01-30
TWI765978B (zh) 2022-06-01
CN110419000B (zh) 2023-07-28
WO2018168435A1 (ja) 2018-09-20
TW201837609A (zh) 2018-10-16
JPWO2018168435A1 (ja) 2019-03-28

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