KR102456403B1 - 빔 주사 장치 및 패턴 묘화 장치 - Google Patents

빔 주사 장치 및 패턴 묘화 장치 Download PDF

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Publication number
KR102456403B1
KR102456403B1 KR1020197012050A KR20197012050A KR102456403B1 KR 102456403 B1 KR102456403 B1 KR 102456403B1 KR 1020197012050 A KR1020197012050 A KR 1020197012050A KR 20197012050 A KR20197012050 A KR 20197012050A KR 102456403 B1 KR102456403 B1 KR 102456403B1
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KR
South Korea
Prior art keywords
scanning
substrate
writing
origin
reflective surface
Prior art date
Application number
KR1020197012050A
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English (en)
Korean (ko)
Other versions
KR20190053950A (ko
Inventor
마사키 가토
요시아키 기토
Original Assignee
가부시키가이샤 니콘
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Application filed by 가부시키가이샤 니콘 filed Critical 가부시키가이샤 니콘
Publication of KR20190053950A publication Critical patent/KR20190053950A/ko
Application granted granted Critical
Publication of KR102456403B1 publication Critical patent/KR102456403B1/ko

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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/10—Scanning systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/10—Scanning systems
    • G02B26/12—Scanning systems using multifaceted mirrors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/24—Curved surfaces
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70591—Testing optical components
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70833—Mounting of optical systems, e.g. mounting of illumination system, projection system or stage systems on base-plate or ground

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Mechanical Optical Scanning Systems (AREA)
  • Laser Beam Printer (AREA)
KR1020197012050A 2016-09-29 2017-09-04 빔 주사 장치 및 패턴 묘화 장치 KR102456403B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2016191020 2016-09-29
JPJP-P-2016-191020 2016-09-29
PCT/JP2017/031734 WO2018061633A1 (ja) 2016-09-29 2017-09-04 ビーム走査装置およびパターン描画装置

Publications (2)

Publication Number Publication Date
KR20190053950A KR20190053950A (ko) 2019-05-20
KR102456403B1 true KR102456403B1 (ko) 2022-10-20

Family

ID=61759492

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020197012050A KR102456403B1 (ko) 2016-09-29 2017-09-04 빔 주사 장치 및 패턴 묘화 장치

Country Status (5)

Country Link
JP (1) JP7056572B2 (ja)
KR (1) KR102456403B1 (ja)
CN (1) CN109804314B (ja)
TW (1) TWI770062B (ja)
WO (1) WO2018061633A1 (ja)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7400985B2 (ja) 2020-08-25 2023-12-19 株式会社ニコン パターン描画装置用の検査装置

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008304529A (ja) * 2007-06-05 2008-12-18 Konica Minolta Business Technologies Inc マルチビーム走査装置及び当該装置を備えた画像形成装置
JP2014048575A (ja) 2012-09-03 2014-03-17 Opcell Co Ltd 薄膜に多数の微少孔を高速に作成する方法とそれを用いた装置
WO2015166910A1 (ja) 2014-04-28 2015-11-05 株式会社ニコン パターン描画装置、パターン描画方法、デバイス製造方法、レーザ光源装置、ビーム走査装置、および、ビーム走査方法

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5911083B2 (ja) * 1976-03-19 1984-03-13 キヤノン株式会社 情報用ビ−ム検出光学系を有する走査光学系
JPS5911082B2 (ja) * 1976-03-16 1984-03-13 キヤノン株式会社 情報用ビ−ム取り出し部材を有する走査光学系
US4130339A (en) * 1976-03-16 1978-12-19 Canon Kabushiki Kaisha Scanning optical system including optical system for detecting an information beam
JPH08110488A (ja) * 1994-10-11 1996-04-30 Canon Inc 光走査装置
JPH10239609A (ja) * 1997-02-27 1998-09-11 Ricoh Co Ltd 光走査装置
JP3913424B2 (ja) 1999-11-16 2007-05-09 株式会社リコー 走査光学系および光走査装置
CN1209656C (zh) * 2003-05-07 2005-07-06 天津大学 小扇面激光扫描技术方法
US20050200929A1 (en) 2004-03-15 2005-09-15 Michael Plotkin Out of plane start of scan
JP2006276805A (ja) 2004-05-14 2006-10-12 Dainippon Screen Mfg Co Ltd 画像記録装置
JP5094678B2 (ja) * 2008-10-20 2012-12-12 キヤノン株式会社 走査光学ユニット及びそれを用いたカラー画像形成装置
TWI695235B (zh) * 2014-04-01 2020-06-01 日商尼康股份有限公司 圖案描繪裝置及元件製造方法
JP6428675B2 (ja) 2016-02-22 2018-11-28 株式会社ニコン パターン描画用の光源装置

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008304529A (ja) * 2007-06-05 2008-12-18 Konica Minolta Business Technologies Inc マルチビーム走査装置及び当該装置を備えた画像形成装置
JP2014048575A (ja) 2012-09-03 2014-03-17 Opcell Co Ltd 薄膜に多数の微少孔を高速に作成する方法とそれを用いた装置
WO2015166910A1 (ja) 2014-04-28 2015-11-05 株式会社ニコン パターン描画装置、パターン描画方法、デバイス製造方法、レーザ光源装置、ビーム走査装置、および、ビーム走査方法

Also Published As

Publication number Publication date
JPWO2018061633A1 (ja) 2019-07-11
CN109804314B (zh) 2022-04-01
TWI770062B (zh) 2022-07-11
CN109804314A (zh) 2019-05-24
TW201827936A (zh) 2018-08-01
JP7056572B2 (ja) 2022-04-19
KR20190053950A (ko) 2019-05-20
WO2018061633A1 (ja) 2018-04-05

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