KR102435805B1 - 착색 조성물, 착색 경화막 및 표시 소자 - Google Patents

착색 조성물, 착색 경화막 및 표시 소자 Download PDF

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KR102435805B1
KR102435805B1 KR1020140178999A KR20140178999A KR102435805B1 KR 102435805 B1 KR102435805 B1 KR 102435805B1 KR 1020140178999 A KR1020140178999 A KR 1020140178999A KR 20140178999 A KR20140178999 A KR 20140178999A KR 102435805 B1 KR102435805 B1 KR 102435805B1
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KR20150070017A (ko
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세이타로 핫토리
마사토 오모테
나츠코 와다
히로시 마시마
류 마츠모토
아츠시 이토
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제이에스알 가부시끼가이샤
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)
  • Polymerisation Methods In General (AREA)
  • Liquid Crystal (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Electroluminescent Light Sources (AREA)
  • Graft Or Block Polymers (AREA)
  • Paints Or Removers (AREA)
KR1020140178999A 2013-12-16 2014-12-12 착색 조성물, 착색 경화막 및 표시 소자 Active KR102435805B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2013259318 2013-12-16
JPJP-P-2013-259318 2013-12-16

Publications (2)

Publication Number Publication Date
KR20150070017A KR20150070017A (ko) 2015-06-24
KR102435805B1 true KR102435805B1 (ko) 2022-08-25

Family

ID=53413823

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020140178999A Active KR102435805B1 (ko) 2013-12-16 2014-12-12 착색 조성물, 착색 경화막 및 표시 소자

Country Status (4)

Country Link
JP (6) JP6520091B2 (https=)
KR (1) KR102435805B1 (https=)
CN (2) CN104714367B (https=)
TW (1) TWI665514B (https=)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI769146B (zh) * 2016-01-08 2022-07-01 日商富士軟片股份有限公司 著色組成物、著色組成物的製造方法、彩色濾光片、圖案形成方法、固體攝像元件及圖像顯示裝置
JP6607054B2 (ja) * 2016-01-20 2019-11-20 三菱ケミカル株式会社 感光性樹脂組成物、硬化物、ブラックマトリックス及び画像表示装置
KR102247840B1 (ko) 2016-03-18 2021-05-03 제이에스알 가부시끼가이샤 표시 소자용 기판, 표시 소자용 기판의 제조 방법 및 표시 소자
WO2022163449A1 (ja) * 2021-01-28 2022-08-04 東レ株式会社 着色樹脂組成物、着色膜、加飾基板

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007016214A (ja) * 2005-06-09 2007-01-25 Toray Ind Inc 樹脂組成物およびそれを用いた表示装置
KR100933735B1 (ko) * 2001-12-25 2009-12-24 후지필름 가부시키가이샤 염료함유 네가티브 경화성 조성물, 및 이것을 사용한 컬러 필터 및 그 제조방법
JP2011039316A (ja) * 2009-08-12 2011-02-24 Fujifilm Corp 着色硬化性組成物、カラーフィルタ及びその製造方法、固体撮像素子、液晶ディスプレイ、有機ｅｌディスプレイ、並びに画像表示デバイス
JP2011065170A (ja) * 2010-10-18 2011-03-31 Fujifilm Corp 染料含有ネガ型硬化性組成物、カラーフィルタおよびその製造方法
JP2013242348A (ja) * 2012-05-17 2013-12-05 Taiyo Ink Mfg Ltd パターン形成方法、アルカリ現像型の熱硬化性樹脂組成物、及びプリント配線板

Family Cites Families (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0812292B2 (ja) 1989-07-20 1996-02-07 凸版印刷株式会社 耐熱性カラーフィルターおよびその製造方法
JP2891418B2 (ja) 1988-11-26 1999-05-17 凸版印刷株式会社 カラーフィルターおよびその製造方法
JPH0635188A (ja) 1992-07-15 1994-02-10 Nippon Kayaku Co Ltd カラーフィルター用光重合組成物及びカラーフィルター
JP3940523B2 (ja) 1999-04-27 2007-07-04 セイコーエプソン株式会社 インクジェット方式カラーフィルタ用樹脂組成物、カラーフィルタおよびカラーフィルタの製造方法
JP3929653B2 (ja) * 1999-08-11 2007-06-13 富士フイルム株式会社 ネガ型レジスト組成物
JP2002311586A (ja) * 2001-04-18 2002-10-23 Fuji Photo Film Co Ltd 電子線又はｘ線用ネガ型レジスト組成物
JP2003207888A (ja) * 2002-01-11 2003-07-25 Fuji Photo Film Co Ltd 染料含有ネガ型硬化性組成物、並びにこれを含むカラーフィルタ及びその製造方法
JP2005266673A (ja) * 2004-03-22 2005-09-29 Kyocera Chemical Corp カラーフィルター、液晶表示装置、ポジ型感光性樹脂組成物及びスペーサーの製造方法
WO2006098261A1 (ja) * 2005-03-14 2006-09-21 Sakata Inx Corp. 処理顔料及びその用途
WO2006098291A1 (ja) * 2005-03-15 2006-09-21 Toray Industries, Inc. 感光性樹脂組成物
JP5235408B2 (ja) * 2005-03-31 2013-07-10 富士フイルム株式会社 染料含有硬化性組成物、並びに、カラーフィルタおよびその製造方法
CN101024624B (zh) * 2006-02-24 2013-09-11 富士胶片株式会社 肟衍生物、可光聚合的组合物、滤色片及其制造方法
JP5193446B2 (ja) * 2006-08-31 2013-05-08 旭化成イーマテリアルズ株式会社 ポジ型感光性樹脂組成物
JP5157522B2 (ja) 2008-02-28 2013-03-06 Ｊｓｒ株式会社 着色層形成用感放射線性組成物、カラーフィルタおよびカラー液晶表示素子
JP5254650B2 (ja) * 2008-03-28 2013-08-07 富士フイルム株式会社 感光性樹脂組成物、遮光性カラーフィルター及びその製造方法、並びに、固体撮像素子
JPWO2010087232A1 (ja) * 2009-01-29 2012-08-02 日本電気株式会社 ネガ型感光性絶縁樹脂組成物及びそれを用いたパターン形成方法
SG173468A1 (en) * 2009-01-29 2011-09-29 Toray Industries Resin composition and display device formed using same
JP5353415B2 (ja) * 2009-04-27 2013-11-27 Ｊｓｒ株式会社 着色組成物、カラーフィルタおよびカラー液晶表示素子
JP5358630B2 (ja) * 2011-08-17 2013-12-04 富士フイルム株式会社 レジストパターン形成方法、ナノインプリント用モールドの製造方法、及びフォトマスクの製造方法
JP5941635B2 (ja) * 2011-08-31 2016-06-29 富士フイルム株式会社 着色組成物、並びに、これを用いたカラーフィルタの製造方法、カラーフィルタ、及び、固体撮像素子
JPWO2013084932A1 (ja) * 2011-12-09 2015-04-27 Jsr株式会社 着色剤、着色組成物、カラーフィルタ及び表示素子
TWI568802B (zh) * 2012-04-13 2017-02-01 Jsr股份有限公司 著色組成物、彩色濾光片及顯示元件
JP2013231897A (ja) * 2012-05-01 2013-11-14 Fujifilm Corp 感光性樹脂組成物、感光性積層体、フレキシブル回路基板、及び永久パターン形成方法

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100933735B1 (ko) * 2001-12-25 2009-12-24 후지필름 가부시키가이샤 염료함유 네가티브 경화성 조성물, 및 이것을 사용한 컬러 필터 및 그 제조방법
JP2007016214A (ja) * 2005-06-09 2007-01-25 Toray Ind Inc 樹脂組成物およびそれを用いた表示装置
JP2011039316A (ja) * 2009-08-12 2011-02-24 Fujifilm Corp 着色硬化性組成物、カラーフィルタ及びその製造方法、固体撮像素子、液晶ディスプレイ、有機ｅｌディスプレイ、並びに画像表示デバイス
JP2011065170A (ja) * 2010-10-18 2011-03-31 Fujifilm Corp 染料含有ネガ型硬化性組成物、カラーフィルタおよびその製造方法
JP2013242348A (ja) * 2012-05-17 2013-12-05 Taiyo Ink Mfg Ltd パターン形成方法、アルカリ現像型の熱硬化性樹脂組成物、及びプリント配線板

Also Published As

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JP2022141747A (ja) 2022-09-29
CN111176071A (zh) 2020-05-19
JP6520091B2 (ja) 2019-05-29
KR20150070017A (ko) 2015-06-24
JP7136268B2 (ja) 2022-09-13
CN111176071B (zh) 2024-10-29
JP2024109711A (ja) 2024-08-14
JP7703077B2 (ja) 2025-07-04
JP2015135476A (ja) 2015-07-27
TWI665514B (zh) 2019-07-11
CN104714367A (zh) 2015-06-17
JP2019095797A (ja) 2019-06-20
JP7616162B2 (ja) 2025-01-17
TW201530258A (zh) 2015-08-01
JP6911971B2 (ja) 2021-07-28
JP2020126265A (ja) 2020-08-20
JP6699717B2 (ja) 2020-05-27
JP2021157181A (ja) 2021-10-07
CN104714367B (zh) 2020-03-13

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