KR102415438B1 - 백색 감광성 수지 조성물, 그것을 사용한 경화물 및 그 경화물을 구성 성분으로서 함유하는 터치 패널 - Google Patents

백색 감광성 수지 조성물, 그것을 사용한 경화물 및 그 경화물을 구성 성분으로서 함유하는 터치 패널 Download PDF

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Publication number
KR102415438B1
KR102415438B1 KR1020150032962A KR20150032962A KR102415438B1 KR 102415438 B1 KR102415438 B1 KR 102415438B1 KR 1020150032962 A KR1020150032962 A KR 1020150032962A KR 20150032962 A KR20150032962 A KR 20150032962A KR 102415438 B1 KR102415438 B1 KR 102415438B1
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KR
South Korea
Prior art keywords
group
photosensitive resin
resin composition
white
white photosensitive
Prior art date
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KR1020150032962A
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English (en)
Korean (ko)
Other versions
KR20150106841A (ko
Inventor
유키 오노
Original Assignee
닛테츠 케미컬 앤드 머티리얼 가부시키가이샤
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Publication of KR20150106841A publication Critical patent/KR20150106841A/ko
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Publication of KR102415438B1 publication Critical patent/KR102415438B1/ko

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means

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  • Physics & Mathematics (AREA)
  • Materials For Photolithography (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Engineering & Computer Science (AREA)
  • Theoretical Computer Science (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Human Computer Interaction (AREA)
KR1020150032962A 2014-03-12 2015-03-10 백색 감광성 수지 조성물, 그것을 사용한 경화물 및 그 경화물을 구성 성분으로서 함유하는 터치 패널 KR102415438B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JPJP-P-2014-049358 2014-03-12
JP2014049358A JP6388776B2 (ja) 2014-03-12 2014-03-12 白色感光性樹脂組成物、それを用いた硬化物、及びその硬化物を構成成分として含むタッチパネル

Publications (2)

Publication Number Publication Date
KR20150106841A KR20150106841A (ko) 2015-09-22
KR102415438B1 true KR102415438B1 (ko) 2022-06-30

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020150032962A KR102415438B1 (ko) 2014-03-12 2015-03-10 백색 감광성 수지 조성물, 그것을 사용한 경화물 및 그 경화물을 구성 성분으로서 함유하는 터치 패널

Country Status (4)

Country Link
JP (1) JP6388776B2 (ja)
KR (1) KR102415438B1 (ja)
CN (1) CN104914670B (ja)
TW (1) TWI671589B (ja)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102235159B1 (ko) * 2014-04-15 2021-04-05 롬엔드하스전자재료코리아유한회사 감광성 수지 조성물, 및 이를 이용한 절연막 및 전자소자
TWI732580B (zh) 2020-06-03 2021-07-01 新應材股份有限公司 感光性樹脂組成物、隔壁、光轉換層以及光發射裝置

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008037719A (ja) * 2006-08-09 2008-02-21 Sumitomo Chemical Co Ltd 感光性ペースト
JP2008070416A (ja) 2006-09-12 2008-03-27 Sumitomo Chemical Co Ltd パターン形成方法
JP2013257543A (ja) 2012-05-16 2013-12-26 Fujifilm Corp 感放射線性組成物、カラーフィルタ、カラーフィルタの製造方法
WO2014034768A1 (ja) * 2012-08-31 2014-03-06 富士フイルム株式会社 感光性樹脂組成物、硬化物及びその製造方法、樹脂パターン製造方法、硬化膜、液晶表示装置、有機ｅｌ表示装置、並びに、タッチパネル表示装置

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
RU2005116302A (ru) * 2002-10-28 2006-01-20 Циба Спешиалти Кемикэлз Холдинг Инк. (Ch) Улучшение стабильности фотоинициаторов при хранении
JP4279890B2 (ja) 2004-02-20 2009-06-17 日本写真印刷株式会社 電子機器表示窓の保護パネル及び保護パネルの製造方法
JP4121540B2 (ja) 2004-02-20 2008-07-23 日本写真印刷株式会社 表示窓に保護パネルが付された電子機器
KR100996591B1 (ko) * 2006-12-26 2010-11-25 주식회사 엘지화학 액정 디스플레이용 블랙 매트릭스 고감도 감광성 수지조성물 및 이를 이용하여 제조되는 블랙 매트릭스
JP5744528B2 (ja) * 2011-01-11 2015-07-08 東京応化工業株式会社 タッチパネル用着色感光性樹脂組成物、タッチパネル、及び表示装置
CA2830592A1 (en) * 2011-03-25 2012-10-04 Toray Industries, Inc. Black resin composition, resin black matrix substrate, and touch panel
JP2013008272A (ja) 2011-06-27 2013-01-10 Toppan Printing Co Ltd 加飾透明保護基板一体型タッチパネルおよびその製造方法
JP6217296B2 (ja) * 2013-01-22 2017-10-25 東洋インキＳｃホールディングス株式会社 感光性樹脂組成物、ならびにそれを用いた塗膜

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008037719A (ja) * 2006-08-09 2008-02-21 Sumitomo Chemical Co Ltd 感光性ペースト
JP2008070416A (ja) 2006-09-12 2008-03-27 Sumitomo Chemical Co Ltd パターン形成方法
JP2013257543A (ja) 2012-05-16 2013-12-26 Fujifilm Corp 感放射線性組成物、カラーフィルタ、カラーフィルタの製造方法
WO2014034768A1 (ja) * 2012-08-31 2014-03-06 富士フイルム株式会社 感光性樹脂組成物、硬化物及びその製造方法、樹脂パターン製造方法、硬化膜、液晶表示装置、有機ｅｌ表示装置、並びに、タッチパネル表示装置

Also Published As

Publication number Publication date
CN104914670A (zh) 2015-09-16
JP6388776B2 (ja) 2018-09-12
TWI671589B (zh) 2019-09-11
KR20150106841A (ko) 2015-09-22
JP2015172716A (ja) 2015-10-01
CN104914670B (zh) 2019-11-01
TW201539127A (zh) 2015-10-16

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